JPS58171887A - Board for electronic circuit - Google Patents

Board for electronic circuit

Info

Publication number
JPS58171887A
JPS58171887A JP5349982A JP5349982A JPS58171887A JP S58171887 A JPS58171887 A JP S58171887A JP 5349982 A JP5349982 A JP 5349982A JP 5349982 A JP5349982 A JP 5349982A JP S58171887 A JPS58171887 A JP S58171887A
Authority
JP
Japan
Prior art keywords
layer
electronic circuit
board
aluminum
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5349982A
Other languages
Japanese (ja)
Inventor
長島 健二
博 松本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP5349982A priority Critical patent/JPS58171887A/en
Publication of JPS58171887A publication Critical patent/JPS58171887A/en
Pending legal-status Critical Current

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Landscapes

  • Insulated Metal Substrates For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の接衝分野〕 この発明は、放熱を必要とする混成集積回路等の電子回
路用基板に係り、特に導体層が溶射によ如形成される電
子回路用基[KMする。
[Detailed Description of the Invention] [Contact Field of the Invention] The present invention relates to an electronic circuit board such as a hybrid integrated circuit that requires heat dissipation, and particularly to an electronic circuit board in which a conductor layer is formed by thermal spraying. [KM.

〔発明の技術的前景〕[Technical foreground of invention]

・臂ワー素子等の熱損失の大きな半導体素子が組込まれ
る混成集積回路中・ダワー・モジ、−ルにあっては、放
熱性に優れた基板が要求される。
・For hybrid integrated circuits/download modules in which semiconductor elements with high heat loss such as armature elements are incorporated, a substrate with excellent heat dissipation is required.

第1図(a)〜(ωはそれぞれ従来の基板の構造を示す
ものである。第1llb)は、フェノール又はプラスエ
Iキシの樹脂基板1上に鋼箔を張付け、工、チングして
導体−臂ターン2を形成した積層基板、第15A伽)は
アル建す基板3上に同じくAgPd系のペーストを印刷
し、高温で焼成して導体・譬ターン4を形成したアル建
す基板である。
In Fig. 1(a) to (ω) respectively show the structure of a conventional board. 1llb), a steel foil is pasted on a resin board 1 of phenol or plus oxide, and conductors are formed by cutting and cutting. The laminated board on which the arm turn 2 is formed, No. 15A) is an aluminum board in which the same AgPd-based paste is printed on the aluminum board 3 and is fired at a high temperature to form the conductor/mantle turn 4.

第1図−)はこれら積層基板、アル電す基板よシも放熱
性に優れたアルミニウム積層板で6る。
Figure 1-) is an aluminum laminate board that has excellent heat dissipation properties as well as aluminum laminate boards.

このアルばニウム積層板は、アル建ニウム基板5上に絶
縁層σを形成し、この絶縁層6上VC@箔をエツチング
した導体・母ターフ1を形成するものである。このアル
1ニウム積噛板よりも、さらに放熱性に優れた基板とし
て第1図(d)に示す溶射基板がある。この溶射基板は
、例えばアルζニウムの金属基板8上に例えばアル電す
Oセラミ、り層9を溶射により形成し、この溶射セ2建
ツク層9上に同じく溶射で例えば銅の導体層10t−形
成するものである。
In this aluminum laminate, an insulating layer σ is formed on an aluminum substrate 5, and a conductor/mother turf 1 is formed by etching VC@foil on the insulating layer 6. A thermal sprayed substrate shown in FIG. 1(d) is a substrate that has even better heat dissipation than this aluminum laminated board. This thermal sprayed substrate is formed by thermally spraying a layer 9 of, for example, aluminum oxide ceramic on a metal substrate 8 made of, for example, aluminum, and on top of this thermal sprayed double-layer 9, a conductor layer 10t of, for example, copper is also formed by thermal spraying. -It is something that forms.

しかしながら、溶射セラミ、り層9には連結した空孔が
存在するので、長期の寿命試験(耐湿試験)で絶縁抵抗
が劣化したp、耐電圧特性が悪くなったりする。これを
防ぐ方法として、空孔内に熱硬性樹脂を含浸して上記欠
点を補う方法がとられるが、樹脂を含浸したセラミック
層9上に溶射て導体層10を形成したとしてもセラミ、
り層りの表面が滑らかな丸めに接着強度が極端Kllい
However, since there are connected pores in the thermally sprayed ceramic layer 9, the insulation resistance deteriorates during a long-term life test (humidity test), and the withstand voltage characteristics deteriorate. A method to prevent this is to compensate for the above drawback by impregnating the pores with a thermosetting resin, but even if the conductor layer 10 is formed by thermal spraying on the resin-impregnated ceramic layer 9, the ceramic
The surface of the layer is smooth and round, and the adhesive strength is extremely high.

そζで、本出願人は先に、セラミ、り層上に所望0”タ
ーンを有する導体層を溶射で形成しセラミ、り層、導体
層共に熱便化性樹脂を含浸する方法を提案した(眸公昭
56−8758 )、この方法によれば、絶縁抵抗、耐
電圧特性の向上ばか)でなく、接着強度中半田付は性の
向上を図ることが可能となった。
Therefore, the applicant previously proposed a method of forming a conductor layer having a desired 0'' turn on a ceramic layer by thermal spraying, and impregnating both the ceramic layer and the conductor layer with a heat-facilitating resin. According to this method, it was possible not only to improve insulation resistance and withstand voltage characteristics, but also to improve adhesive strength and soldering properties.

しかしながら、導体溶射により使用する金属粉の粒度か
細い金属粉を含んだ状鰺で溶射されると、次に上ける間
層点があった。
However, when conductive thermal spraying was carried out using a metal powder containing finer particle size of metal powder, there were interlayer points.

〔雪景技術の間層点〕[Interlayer point of snowscape technology]

すなわち、 1、  *対中に細い金属粉が酸化されやすく、半田付
は性が悪くなる。従って、放熱用のC11プロ、り等の
部品を半田付けしたときの接着強度が弱くなり、落下衝
撃性に問題があった。
That is, 1. *The thin metal powder inside the pair is easily oxidized, resulting in poor soldering properties. Therefore, when parts such as C11 Pro for heat dissipation are soldered, the adhesive strength becomes weak, and there is a problem in drop impact resistance.

2、熱硬化性樹脂の含浸性が悪くなる。このため、電気
的特性(耐電圧、絶縁抵抗)が幾化する。
2. The impregnability of the thermosetting resin deteriorates. Therefore, the electrical characteristics (withstand voltage, insulation resistance) change.

〔発明の目的〕[Purpose of the invention]

この発明は上記実情に−みてなされたもので、その目的
は、電気的特性及び機械的特性に優れ九電子回路用基I
[t−提供することにある。
This invention has been made in view of the above-mentioned circumstances, and its purpose is to provide nine electronic circuit substrates with excellent electrical and mechanical properties.
[t-To provide.

〔発明の概要〕[Summary of the invention]

この発明は、溶射金属粉の平均粒径をアンダーカットす
ることにより、樹脂含浸性を東くし、その結果電気的特
性(耐電圧、絶縁抵抗)の向上と、半田付は性の向上に
より機械的強度(落下衝撃性)の向上とを図るものであ
る。
This invention improves resin impregnation by undercutting the average particle size of thermal sprayed metal powder, resulting in improved electrical properties (withstanding voltage, insulation resistance) and improved mechanical soldering properties. The purpose is to improve strength (drop impact resistance).

〔発明の実施例〕[Embodiments of the invention]

以下、図画を参照してこの発明の一実施例を説明する。 Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

先ず、第2図k)K示すように金属基壁例えば厚さ2.
5sa+のアル1ニウム板21の表1iKアルオナ(ム
40s )の粗い11を吹付けてlO〜20μ簿荒した
後、平均tllSS〜40μ肩のアル建すの粉をデフ1
w溶射で堆積し、厚さ150〜200μのアル建す層2
2を形成する。さらに、第2図Th)K示すように、平
均粒径10〜74μ簿の銅粉を用いた溶射によ〉、上記
アルミナ層22上にメタルマスタを通して選択的に鋼層
21を形成する。次に、アル1ニウム板21を100℃
のホウドブレート(図示せず)上に載せた後、アル建す
層22及び鋼層2Sに熱硬化性エポキシ樹脂24を含浸
させる。その後、アル建す層22及び鋼層zso*mに
残りた樹脂を拭1O1150℃で2時間加熱を行い含浸
樹脂ta化させた後、表面をナンドペーーで磨き、鋼層
XSを露出させる。
First, as shown in FIG.
After roughening the surface of the 5sa+ aluminum plate 21 by spraying coarse 11 of iK Aloona (mu40s) to 10~20μ, apply powder with an average thickness of tllSS~40μ to the def1.
Al layer 2 deposited by thermal spraying and having a thickness of 150 to 200μ
form 2. Further, as shown in FIG. 2 Th)K, a steel layer 21 is selectively formed on the alumina layer 22 by thermal spraying using copper powder having an average particle size of 10 to 74 μm through a metal master. Next, the aluminum plate 21 was heated to 100°C.
After being placed on a metal plate (not shown), the aluminum layer 22 and the steel layer 2S are impregnated with a thermosetting epoxy resin 24. Thereafter, the resin remaining on the aluminum layer 22 and the steel layer zso*m is wiped and heated at 10150° C. for 2 hours to turn the impregnated resin into ta, and then the surface is polished with a sandpaper to expose the steel layer XS.

このようKして調造された溶射基!lKあっては、平均
粒径10μ簿以下の細い溶射銅粉がアンダーカットされ
ているため、従来の溶射基板に比べて次のような特性が
得られた。すなわち、1、 半田付は性については10
0 gぬれるようKなった。落下強度については、13
w口の二、ケルめっきされ九〇mゾロ、りを鋼層2J上
に半田付けし、1簿の高さから鉄板上に落下させる試験
において、従来は1〜2@で剥がれていたものが、10
g1以上落下させても0輪ブロックは剥がれなかった。
Thermal spray base prepared in this way! With LK, the thin thermal sprayed copper powder with an average particle size of 10 μm or less is undercut, so the following characteristics were obtained compared to conventional thermal sprayed substrates. That is, 1 for soldering and 10 for sex.
0 g It became wet. Regarding drop strength, 13
2. In a test in which a 90m long KEL-plated material was soldered onto a 2J steel layer and dropped onto a steel plate from a height of 100m, the material that conventionally peeled off after 1~2@ , 10
The 0-wheel block did not come off even if it was dropped over g1.

2、熱硬化性エポキシ樹脂24の含浸性については、従
来、絶縁層が1504211で耐電圧DC2kVであっ
たものが、I)C4,5kV以上の値が得られた。
2. Regarding the impregnability of the thermosetting epoxy resin 24, although the insulating layer was conventionally 1504211 and had a withstand voltage DC 2 kV, a value of I)C4.5 kV or more was obtained.

尚、上記実施例においては、セラミ、り屑としてアルミ
ナ層22を用いて説明したが、これに隈らず、ステアタ
イト(Mg0・810.)、フtルステライト(2Mg
0 ・810m )、ノ/L’ コア (Zr01−B
%O鵞)、マグネシア(MtO)、スピネル(MiO・
A40m )、窒化アル<=ラム(AtN)、窒化ゲロ
ン(IN )の単独又は混同物であってもよい。
In the above embodiment, the alumina layer 22 was used as the ceramic and scrap, but steatite (Mg0.810.) and phthulsterite (2Mg
0 ・810m), No/L' core (Zr01-B
%O), magnesia (MtO), spinel (MiO・
A40m), aluminum nitride (AtN), and gelon nitride (IN) may be used alone or as a mixture.

★九、溶射金属粉としては、鋼の代)に二、ケル凍、ア
ルζ;つムムt、スズ811%亜鉛Zmであってもよい
、tた、金属粉体の平均粒径の上限については74声罵
以上でも可能であるが、・ダターンが荒くなるので、1
00μ諷以下が望ましい。
★9. As for the thermal spray metal powder, it may be 2. Kerro, Al ζ, 811% tin, Zm, etc. Regarding the upper limit of the average particle size of the metal powder. It is possible to use more than 74 curses, but the ・datan becomes rough, so 1
00μ or less is desirable.

〔発明の効果〕〔Effect of the invention〕

以上のようにこの発明によれば、電気的特性及び機械的
特性に優れ良電子回路用基板を提供できる。
As described above, according to the present invention, it is possible to provide a high-quality electronic circuit board with excellent electrical and mechanical properties.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)〜(11)はそれぞれ従来の電子回路用基
板を示す断面図、第2図b)〜←)はこの発明の一実施
例に係る溶射基板の製造工程を示す断面図でめる。 21・・・アル電ニウム板、ZX−・アルミナ層、11
・−銅層、24・・・熱硬化性工Iキシ樹脂。
FIGS. 1(a) to (11) are sectional views showing conventional electronic circuit boards, and FIGS. 2(b) to ←) are sectional views showing the manufacturing process of a thermal sprayed board according to an embodiment of the present invention. Melt. 21... Aluminum plate, ZX-/alumina layer, 11
・-Copper layer, 24...Thermosetting resin.

Claims (3)

【特許請求の範囲】[Claims] (1)支持基板上に溶射によシ導体層を形成してなる電
子回路用基板において、前記導体層は平均粒径10〜1
00μ属の金属粉体を用いて形成されたことを特、徴と
する電子回路用基1fi。
(1) In an electronic circuit board in which a conductor layer is formed by thermal spraying on a support substrate, the conductor layer has an average particle size of 10 to 1
An electronic circuit board 1fi characterized in that it is formed using metal powder of the 00μ group.
(2)前記支持基体は、金属板上に溶射によりセラiッ
ク層を形成してなる特許請求の範囲第1項記載の電子回
路用基板。
(2) The electronic circuit board according to claim 1, wherein the support base is formed by forming a ceramic layer on a metal plate by thermal spraying.
(3)前記導体層及び前記セラ建、り層には熱硬化性樹
脂が含浸されている特許請求の範囲第2項記載の電子回
路用基板。
(3) The electronic circuit board according to claim 2, wherein the conductor layer and the ceramic layer are impregnated with a thermosetting resin.
JP5349982A 1982-03-31 1982-03-31 Board for electronic circuit Pending JPS58171887A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5349982A JPS58171887A (en) 1982-03-31 1982-03-31 Board for electronic circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5349982A JPS58171887A (en) 1982-03-31 1982-03-31 Board for electronic circuit

Publications (1)

Publication Number Publication Date
JPS58171887A true JPS58171887A (en) 1983-10-08

Family

ID=12944518

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5349982A Pending JPS58171887A (en) 1982-03-31 1982-03-31 Board for electronic circuit

Country Status (1)

Country Link
JP (1) JPS58171887A (en)

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