JPS58169149A - Photomask - Google Patents

Abstract

PURPOSE:To automatically discriminate the kind of a photomask and to enable the rewriting of information, by forming a magnetic film for storing prescribed information on a peripheral part of the surface of a substrate and by forming a patterned film and the magnetic film with the same substance. CONSTITUTION:A metallic film of Cr or the like having a prescribed pattern 2 is formed on the surface of a transparent glass substrate 1, and a magnetic film 3 of a magnetic body such as iron oxide or Co-Cr is formed on a peripheral part of the surface of the substrate 1. Information about kind, lot number, etching conditions, etc. are written in the magnetic film 3 in manufacture, and it is automatically read out with a magnetic head or the like on an automatic processing line. When the mask is used in a stage for lithographing a semiconductor wafer, necessary information on the kind of the mask itself, the lot number of the wafer, etc. is written in the magnetic film 3, and control and application on an automatic processing line are conducted in accordance with the information.

Description

DETAILED DESCRIPTION OF THE INVENTION (1) Technical Field of the Invention The present invention relates to a novel structure capable of storing predetermined information in a photomask used in step 4 of the manufacturing process of a semiconductor device.

(2) Background of the Technology There are many IJ and IJ photomasks in the manufacturing process of semiconductor devices, and different types of photomasks are used for each photolithography process. Further, the series of photomasks differ depending on the type of semiconductor device.

That is, a very large number of photomasks exist in 185 semiconductor devices, and these large numbers of photomasks must be manufactured, managed, and used.

(3) Prior Art and Problems In recent years, full automation of semiconductor device manufacturing lines has been progressing, and the manufacturing, management, and use of photomasks as described above are no exception. Conventionally, these photo masks were distinguished by forming a pattern representing a predetermined mask number in the form of an all-island pattern on the periphery of the substrate surface, and having the operator recognize the number. As a result, efficiency decreased and accurate identification of i-suffix was not possible. Furthermore, since the mask number is the same as the metal pattern that is created at the same time as the regular pattern film is exposed and etched, the information once written cannot be changed.

(4) Purpose of the Invention The purpose of the present invention is to automatically identify the type of photomask without human intervention by automating the manufacturing process related to photomasks, and to write and print information used for identification. Our goal is to provide a photomask that can be used in a variety of ways.

(5) Structure of the Invention The photomask of the present invention is a photomask in which a predetermined pattern film is formed on the surface of a transparent substrate, in which a magnetic film is formed on the periphery of the surface of the nuclei crystal plate, and predetermined information is printed on the magnetic film. The % mark is that it is memorized. Furthermore, the pattern family of the pre-causal pattern and the layer in which the magnetic film is made of the same material are 4! be a sign.

(6) Embodiment of the Invention FIGS. 1 and 12 show a plan view and a cross-sectional view of a v-suffusion according to an embodiment of the present invention. The photomask of this example has a predetermined pattern of C on the surface of a rectangular transparent glass substrate l as shown in the symbol 2.
A magnetic film 3 is formed around the surface of the substrate 0 where the metal film is formed, such as at the right end in this example. A magnetic material such as iron oxide or cobalt chromium is used as the magnetic film. 4 is the area of the pattern that will actually be used. When the photomask of this example is manufactured by M, the photomask to be manufactured 7 is an example of an S-type mask, or is an F-type photomask.
ir! ;・Information such as toe number, workpiece, and ching conditions is displayed on the magnetic film 3.
The information is written on the memory card and automatically read out by a magnetic head or the like on an automatic processing line, and pattern printing, etching, etc. are performed based on the information.

Furthermore, when used in the phosphorography process for finished edges and semiconductor wafers, information necessary for management in the automatic wafer processing line, such as information indicating the type of mask itself and the lot number of the wafer to be used, is provided. etc. are written on the magnetic film 3.

The information #'i is processed and used in the automatic processing line based on this information. This information #'i is rewritten according to various situations.

FIG. 3 is a plan view of a complete circular photomask according to another embodiment of the present invention. Since the mask pattern 2 is not provided around the periphery of the normally perfectly circular photo area 7, it is possible to form a magnetic film 3 there and write information along the 0th circumference for the first operation as described above. For example, is it possible to read or write that information on a PJ? This can be easily achieved by rotating a perfectly circular mask while keeping the essential magnetic head fixed.

Another embodiment of the present invention is a combination in which the mask pattern film and the magnetic film are made of the same material. Normally, a photomask having a *sy pattern is formed by growing a gold JIIi film on the entire surface of a substrate, and then etching it. This embodiment is effective because the process and the tenging process are performed only once, and a metal film that can be attached to a magnetic film can be used for the pattern. As a magnetic film,
As mentioned above, iron oxide, cobalt chromium, etc. are used.
Patterns are formed from the same material.

(7) Effects of the invention As detailed above, according to the present invention, the production of a photomask,
During management and use, it is possible to write, rewrite, and read information on KN, so it can be used to perform automatic processing on guest birds.Also, if it is made of four materials, it can be used to Table for increasing 1 culm
A photomask of the present invention can be formed.

[Brief explanation of the drawing]

Fig. 1.2 is a plan view and a sectional view of one embodiment of the present invention, and Fig. 3 is a plan view of another embodiment of the present invention. It is a 3-layer magnetic film. , P.11 Agent Patent Attorney Hiroshi Matsuoka T1:・”'b
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Claims (1)

[Claims] 1. In a photomask in which a predetermined pattern film is formed on the surface of a transparent substrate, a magnetic film is formed around the surface of the crystal removal plate, and predetermined information is stored in the magnetic film. 2Ii. The photomask according to claim 1, wherein the predetermined pattern film and the magnetic film are formed of the same material.