JPS581578A - Thermal head - Google Patents

Thermal head

Info

Publication number
JPS581578A
JPS581578A JP10108681A JP10108681A JPS581578A JP S581578 A JPS581578 A JP S581578A JP 10108681 A JP10108681 A JP 10108681A JP 10108681 A JP10108681 A JP 10108681A JP S581578 A JPS581578 A JP S581578A
Authority
JP
Japan
Prior art keywords
layer
electrode
thick film
thermal head
glaze
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10108681A
Other languages
Japanese (ja)
Inventor
Toshiaki Naka
中 敏明
Kiyoshi Sato
清 佐藤
Tateo Sugano
菅野 健郎
Harutaka Tanmachi
反町 東天
Minoru Terajima
寺島 稔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10108681A priority Critical patent/JPS581578A/en
Publication of JPS581578A publication Critical patent/JPS581578A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/335Structure of thermal heads

Landscapes

  • Electronic Switches (AREA)

Abstract

PURPOSE:To provide the thermal head capable of eliminating a noble metal layer under a glaze layer, wherein a first electrode layer is provided on the glaze layer and a second and a third electrodes for matrix wiring are providing thereon. CONSTITUTION:On a glazed alumina base plate 1 having a glaze layer 2' coated thereon, a U-shaped resistor film (Ta-N) 3' and a first electrode layer 4' are formed by a thin film process and a protective layer 5' is formed to a printing part in the vicinity of a thermal head 11'. In the next process, after a thick film like insulating layer 6' covering the thin electrode layer 4' of a matrix forming part is formed, a second layer of a thick film like conductive layer 7' is formed by screen printing and, after curing, a thick film like insulating layer 8' is formed and a through hole 14' is provided. To the uppermost past thereof, a third layer of a thick film like conductive layer 9' is provided to form an upper electrode and the same electrodes of each groups are connected through the through-hole 14'. The insulating layer 6' is formed by using a resin cured at 300 deg.C or less so as not to generte oxidation of the resistor 3' nor the electrode 4'.

Description

【発明の詳細な説明】 本発明は基板端に近い部分に発熱体が形成され、印字後
直ちに印字を見ることができるようなラストラインウジ
プルタイプのサーマルヘッドに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a last-line magnifying-pull type thermal head in which a heating element is formed near the edge of a substrate, and the print can be seen immediately after printing.

従来のこの種ザーマルヘッドの構造を第1図に平面図(
A)と側断面mm)によh示寸。
Figure 1 shows a plan view of the structure of a conventional thermal head of this type (
A) and side cross section mm).

図において1はアルミナ基板、2はグレーズ層、従来構
造ではグレーズ層2と基板1間に貴金属導体層15から
なる第1層の電極層を設けているが、グレーズ層2は8
00°C以上で焼成するため第1層の電極層は厚膜金導
体等の貴金属材料を使用せねばならず、コストアップの
原因となっている0又発熱ドツト11は第1層の′シ極
層上に位置しているその表面の凹凸等によりグレーズ層
2に欠陥を生じやすく長寿命ヘッドが実現しにくい欠点
があっ九。
In the figure, 1 is an alumina substrate, 2 is a glaze layer, and in the conventional structure, a first electrode layer consisting of a noble metal conductor layer 15 is provided between the glaze layer 2 and the substrate 1, but the glaze layer 2 is 8
Because it is fired at temperatures above 00°C, the first electrode layer must be made of a noble metal material such as a thick film gold conductor. The glaze layer 2 is prone to defects due to its surface irregularities located on the pole layer, making it difficult to realize a long-life head.

本発明はこの従来欠点を解決するもので、この目的に第
1層電極をグレーズ層上に設け、この上にマトリクス配
線用の第2.第3NI′に極を設けることにより、グレ
ーズ層下の貴金属厚膜導体をなくシ、ラストラインウジ
プルタイプのサーマルヘッドを構成することである。
The present invention solves this conventional drawback, and for this purpose, a first layer electrode is provided on the glaze layer, and a second layer electrode for matrix wiring is provided on the glaze layer. By providing a pole in the third NI', the noble metal thick film conductor under the glaze layer is eliminated, and a last line maggot pull type thermal head is constructed.

即ち、本発明にしたがえば、(1)グレーズアルミナ基
板上に薄膜プロセスにより発熱抵抗体および逆電流防止
用ダイオードと抵抗体を個々に接続する電極を形成する
0(2)このN膜上でマトリックス1層薄膜電極からマ
) IJソックス成部までを厚膜導体で配線する。(4
)マトリックス形成部に厚膜電極間を接続するためのス
ルーホールを設は次絶縁体を形成する。(5)マトリッ
クス形成部に各グループの同一セレクトを接続するため
の厚膜導体を形成する。(6)各2層の厚膜導体および
絶縁体は300°C以下の温度で硬化する熱硬化形樹脂
、もしくは紫外線硬化形の樹脂を用い、スクリーン印刷
によりパターン形成を行う。(η厚膜導体の抵抗を下げ
る必要のある場合には硬化後Cu、Ni、Au等の電解
めっきで低抵抗層を形成する。
That is, according to the present invention, (1) electrodes are formed on the glazed alumina substrate by a thin film process to individually connect the heat generating resistor and the reverse current prevention diode to the resistor; (2) electrodes are formed on this N film; Wire from the matrix 1-layer thin film electrode to the IJ sock component using a thick film conductor. (4
) A through hole is provided in the matrix forming part to connect between the thick film electrodes, and then an insulator is formed. (5) Form a thick film conductor to connect the same select of each group to the matrix forming part. (6) For each of the two layers of thick film conductors and insulators, a thermosetting resin that hardens at a temperature of 300° C. or less or an ultraviolet curable resin is used, and patterns are formed by screen printing. (η If it is necessary to lower the resistance of the thick film conductor, a low resistance layer is formed by electrolytic plating of Cu, Ni, Au, etc. after curing.

以上の構成によυ本発明にかかるサーマルヘッドが得ら
れる。
With the above configuration, the thermal head according to the present invention can be obtained.

以下本発明の実施例を第2図を用いて説明する。Embodiments of the present invention will be described below with reference to FIG.

第2図は本発明に係るサーマルヘッドの平面図(4)と
側断面図(B)である。本サーマルヘッドに先ず基板が
蓄熱層としてグレーズ層2をコーティングしたグレーズ
アルミナ基板1からなる。そして、この基板1上に薄膜
プロセスにより抵抗膜U字状の(Ta−N)3および第
1層目のKw< (Ni Cr−Au11′近傍の印字
部に酸化防止層(Stop)および耐摩耗層(Tax 
O8)からなる保護層5を形成する。
FIG. 2 is a plan view (4) and a side sectional view (B) of the thermal head according to the present invention. First, the substrate of this thermal head consists of a glazed alumina substrate 1 coated with a glaze layer 2 as a heat storage layer. Then, on this substrate 1, a U-shaped (Ta-N) 3 resistive film and an anti-oxidation layer (Stop) and an anti-wear layer are applied to the printed area near the first layer Kw< (Ni Cr-Au 11') using a thin film process. Layer (Tax
A protective layer 5 made of O8) is formed.

図から明らかなようにラストラインウィジプルタイグの
サーマルヘッドでは発熱ドツト11を基板13の近傍に
形成するため、印字された文字、図形が印字直後に見え
るという利点がある。
As is clear from the figure, the thermal head of the Last Line Widget Type has the advantage that the heat-generating dots 11 are formed near the substrate 13, so that printed characters and figures can be seen immediately after printing.

次にマトリックス形成部12の薄膜電極4をおおう厚膜
絶縁層6全スクリーン印刷しその後加熱硬化し形成する
。この上に第2層目の厚膜導体層7をスクリーン印刷し
加熱硬化し2マトリックス形成部の下部電極を設ける。
Next, the thick film insulating layer 6 covering the thin film electrode 4 of the matrix forming portion 12 is entirely screen printed, and then heated and cured to form the thick film insulating layer 6. On top of this, a second thick film conductor layer 7 is screen printed and cured by heating to provide the lower electrodes of the two matrix forming portions.

更に厚膜絶縁層8を形成しスルーホール14;ε設ける
。最上部には第3層目の厚膜導体層9で下部電極を形成
し各グループの同一セレクトをスルーホール14を介し
て接続する。厚膜絶縁層6および厚膜導体層7は熱硬化
形樹脂(エポキシ樹脂)を會むペースト材で形成されて
いるが、これは薄膜抵抗体3および電極4等の酸化が生
じないよう300°0以下で硬化する低温硬化形のもの
で月つスフ・リーン印刷が可能で必れば他の樹脂でもよ
い。例えば紫外線硬化形の樹脂が使用できる。
Further, a thick insulating layer 8 is formed and through holes 14; ε are provided. At the top, a lower electrode is formed with a third layer of thick film conductor layer 9, and the same selections of each group are connected via through holes 14. The thick film insulating layer 6 and the thick film conductor layer 7 are made of a paste material containing thermosetting resin (epoxy resin), which is heated at 300° to prevent oxidation of the thin film resistor 3, electrode 4, etc. It is a low-temperature curing type that hardens at temperatures below 0, allowing for smooth and lean printing, and other resins may be used if necessary. For example, an ultraviolet curing resin can be used.

また本実施例で用いた厚膜導体層7.9を得る銀フィラ
ー人9の厚膜導体ペーストではシート抵抗が01Ω/口
でろシ幅0.2 mmのパターンを形成するとこの抵抗
は約5Ωとなる。配線抵抗も含めた各素子の抵抗が2%
以上の差があると印字むらの原因となるため本実施例で
は特に厚膜導体部分の抵抗を下げる目的で厚膜導体層7
.9の表面上に低抵抗層5が設けられている。この低抵
抗層15はNi、Au、Cu等の電解めっきにより形成
されている。
Further, in the thick film conductor paste of silver filler 9 used in this example to obtain the thick film conductor layer 7.9, when a sheet resistance is 01 Ω/hole and a pattern with a filter width of 0.2 mm is formed, this resistance is approximately 5 Ω. Become. The resistance of each element including wiring resistance is 2%
If there is a difference above, it will cause uneven printing, so in this embodiment, the thick film conductor layer 7 is
.. A low resistance layer 5 is provided on the surface of 9. This low resistance layer 15 is formed by electrolytic plating of Ni, Au, Cu, or the like.

以上の本発明によれば、従来のグレーズ層下の貴金属層
をなくすことができコストダウンが可能となる。またグ
レーズ層の欠陥も減り長寿命ヘッドが実現できる。
According to the present invention described above, the conventional noble metal layer under the glaze layer can be eliminated, making it possible to reduce costs. In addition, defects in the glaze layer are reduced and a long-life head can be realized.

またマトリックス部分は厚膜プロセスのみで形成できる
ためローコストプロセスとなる等の効果を発揮する。
Furthermore, since the matrix portion can be formed only by a thick film process, it exhibits effects such as a low-cost process.

【図面の簡単な説明】[Brief explanation of drawings]

4− 第1図は従来のサーマルヘッドを示す平面図(A)と側
断面図(B)、第2図は本発明に係るサーマルヘッドの
平面図囚と側断面図(B)である。 〔符号の説明〕 1.1・・・・・基 板 2゜2・・・・・・グレーズ層 4′ ・・・・・・・・・第1ノー電極6.8・・:・
・・絶縁層 7 ・・・・・・・第2層電極となる導体層9 ・・・
・・・・・・第3層電極となる導体層^       
        ミ 巧 423−
4- FIG. 1 is a plan view (A) and a side sectional view (B) showing a conventional thermal head, and FIG. 2 is a plan view and side sectional view (B) of a thermal head according to the present invention. [Explanation of symbols] 1.1...Substrate 2゜2...Glaze layer 4'...First no electrode 6.8...:.
... Insulating layer 7 ... Conductor layer 9 that becomes the second layer electrode ...
・・・・・・Conductor layer that becomes the third layer electrode ^
Mi Takumi 423-

Claims (1)

【特許請求の範囲】[Claims] ラストラインウジプルタイプのサーマルヘッドにおいて
、14L極を少なくとも3Iv構造とすると共に基板側
から数えて第11−電極の途中に発熱抵抗体が形成され
、第211を極および第31−電極によってマトリック
ス配線が接続形成され、1つ各′成極1tk1間の絶縁
層が低温硬化形の樹脂により形成さhていることを特徴
としたサーマルヘッド。
In the last line magnifying pull type thermal head, the 14L pole has at least a 3Iv structure, and a heating resistor is formed in the middle of the 11th electrode counting from the substrate side, and the 211th pole and the 31st electrode are matrix wiring. The thermal head is characterized in that the insulating layer between the two electrodes is formed of a low-temperature curing resin.
JP10108681A 1981-06-29 1981-06-29 Thermal head Pending JPS581578A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10108681A JPS581578A (en) 1981-06-29 1981-06-29 Thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10108681A JPS581578A (en) 1981-06-29 1981-06-29 Thermal head

Publications (1)

Publication Number Publication Date
JPS581578A true JPS581578A (en) 1983-01-06

Family

ID=14291283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10108681A Pending JPS581578A (en) 1981-06-29 1981-06-29 Thermal head

Country Status (1)

Country Link
JP (1) JPS581578A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59166948U (en) * 1983-04-22 1984-11-08 株式会社田村電機製作所 thermal head
JPS59166949U (en) * 1983-04-26 1984-11-08 株式会社田村電機製作所 thermal head

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59166948U (en) * 1983-04-22 1984-11-08 株式会社田村電機製作所 thermal head
JPH028772Y2 (en) * 1983-04-22 1990-03-02
JPS59166949U (en) * 1983-04-26 1984-11-08 株式会社田村電機製作所 thermal head
JPH028771Y2 (en) * 1983-04-26 1990-03-02

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