JPS58156595A - Graphite crucible for silicon single crystal pulling apparatus - Google Patents

Graphite crucible for silicon single crystal pulling apparatus

Info

Publication number
JPS58156595A
JPS58156595A JP57036823A JP3682382A JPS58156595A JP S58156595 A JPS58156595 A JP S58156595A JP 57036823 A JP57036823 A JP 57036823A JP 3682382 A JP3682382 A JP 3682382A JP S58156595 A JPS58156595 A JP S58156595A
Authority
JP
Japan
Prior art keywords
graphite
crucible
graphite crucible
silicon
single crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57036823A
Other languages
Japanese (ja)
Other versions
JPH0218318B2 (en
Inventor
Yoshiji Aoyama
青山 好次
Shigeo Yasuda
茂雄 安田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Ibigawa Electric Industry Co Ltd
Original Assignee
Ibiden Co Ltd
Ibigawa Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd, Ibigawa Electric Industry Co Ltd filed Critical Ibiden Co Ltd
Priority to JP57036823A priority Critical patent/JPS58156595A/en
Publication of JPS58156595A publication Critical patent/JPS58156595A/en
Publication of JPH0218318B2 publication Critical patent/JPH0218318B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10Crucibles or containers for supporting the melt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Ceramic Products (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

PURPOSE:To prevent the shortening of the life of the titled graphite crucible caused by the warpage of the crucible, by using a graphite material having a specific thermal expansion coefficient and a specific average pore diameter. CONSTITUTION:A graphite crucible for the rotary pulling of a silicon single crystal is prepared by using a graphite material having a thermal expansion coefficient of 4.8-6.0X10<-6>/ deg.C between room temperature and 1,000 deg.C and an average pore diameter of 15,000Angstrom determined by mercury pressing method. The intrusion of silicon carbide generated by the reaction of silicon monoxide with the graphite crucible through the surface of the graphite can be prevented, and the life of the graphite crucible can be made more than twice the life of the conventional crucible.

Description

【発明の詳細な説明】 本発明社チョクラルスキー法と呼ばれる回転引上げ法に
よるV リコン単結晶引上げ装置において使用される悪
税ルツボの改良に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement of a crucible used in a V recon single crystal pulling apparatus using a rotational pulling method called the Czochralski method.

一般に、シリコン多結晶を単結晶化精製するために使用
されるシリコン単結晶引上は装置は、主としてシリコン
多結晶を溶融するための石英ルツボを内装するための黒
鉛ルツボからなっている。ところがシリコン単結晶引上
げ中の黒鉛ルツボは約1500℃の高温に加熱される。
In general, a silicon single crystal pulling apparatus used for refining silicon polycrystals into single crystals mainly consists of a graphite crucible containing a quartz crucible for melting silicon polycrystals. However, the graphite crucible during silicon single crystal pulling is heated to a high temperature of approximately 1500°C.

tたVQコン多結晶の溶解時には約1600“Cにまで
加熱されることになる。その結果、石英ルツボと黒鉛は
反応N して−酸化珪素と一酸化炭素が生成し、このよう生成し
た一酸化珪素は黒鉛ルツボと反応する結果、黒鉛ルツボ
の表層部分が炭化珪素に転化される。
When melting the VQcon polycrystal, it will be heated to about 1600"C. As a result, the quartz crucible and graphite will react with each other, producing silicon oxide and carbon monoxide. As a result of the silicon oxide reacting with the graphite crucible, the surface layer portion of the graphite crucible is converted into silicon carbide.

そして黒鉛Vフポは何度も使用されていくうちに、l!
に内部まで炭化珪素に転化することになり遂には内部ひ
ずみを起こして極端な反りにより耐久寿命を短くしてい
る欠点がある6通常、黒鉛ルツボの耐久寿命は使用する
黒鉛素材によっても異なるが5〜15日程度である。一
方、黒鉛ルツボと一酸化珪素ガスとの反応は1500〜
1600℃という低温の反応であるため、黒鉛ルツボを
構成している1つ1つの黒鉛粒子を完全に炭化珪素に転
化することはできず、実際には黒鉛粒子間に存在する気
孔の表面および黒鉛粒子と粒子とを継いでいる境界部分
が選択的に炭化珪素忙転化している。
And as graphite V-fupo was used many times, l!
The drawback is that the inside of the crucible is converted to silicon carbide, eventually causing internal strain and resulting in extreme warping, shortening the durability life6.Normally, the durability life of a graphite crucible varies depending on the graphite material used5. ~15 days. On the other hand, the reaction between the graphite crucible and silicon monoxide gas is
Because the reaction is carried out at a low temperature of 1600°C, it is not possible to completely convert each graphite particle that makes up the graphite crucible into silicon carbide, and in fact, the surface of the pores that exist between the graphite particles and the graphite Boundary portions connecting particles are selectively converted into silicon carbide.

この転化反応過程をI!に詳しく説明すると、−酸化珪
素と反応した2原子の炭素原子の1つは一酸化炭素とし
て逸散するととKなり、その代わりに炭素原子より原子
半径の大きい珪素原子が割り込む反応が繰返されること
罠よって黒鉛ルツボ自身使用回数が増加すると共に物理
的な不均一さによりミクロクラックが発生する。その結
果、黒鉛ルツボは反りが発生し、賽際使用上、黒鉛ルツ
ボの耐久寿命が短かくなる亀のと考えられる。
This conversion reaction process is I! To explain in detail: - One of the two carbon atoms that reacted with silicon oxide dissipates as carbon monoxide and becomes K, and the reaction is repeated in which a silicon atom with a larger atomic radius than the carbon atom intervenes in its place. Due to the trapping, the number of times the graphite crucible itself is used increases, and microcracks occur due to physical non-uniformity. As a result, the graphite crucible warps, which is thought to shorten the lifespan of the graphite crucible during use.

本発明者らは上記の点に鑑み黒鉛ルツボに反りが発生す
る原因について研究した結果、黒鉛素材の有する熱膨張
率(常温から1000℃ )を炭化珪素の有する熱膨張
率(常温から1000°C)より若干高くし、更に黒鉛
素材に含まれている細孔の平均径(水銀圧入法により求
められる)を小さくすることにより、従来法において発
生した反りによる寿命劣化を防止することができること
を新規に知見した。以下、本発明の実施例について説明
する0本発明の黒鉛ルツボは外径が33QInl、内径
が3051FIIであり、この黒鉛ルツボを2分割し、
これをシリコン単結晶を引上げたために使用した実施例
について比較例と対比してその結果を第1表に示した。
In view of the above points, the present inventors researched the causes of warpage in graphite crucibles and found that the coefficient of thermal expansion of graphite material (from room temperature to 1000°C) was compared with that of silicon carbide (from room temperature to 1000°C). ) and further reduce the average diameter of pores contained in the graphite material (obtained by mercury intrusion method), it is possible to prevent life deterioration due to warping that occurs in conventional methods. I found out. Examples of the present invention will be described below.The graphite crucible of the present invention has an outer diameter of 33QInl and an inner diameter of 3051FII, and this graphite crucible is divided into two parts.
Table 1 shows the results of the comparison with comparative examples for examples in which this was used to pull silicon single crystals.

第1表 炭化珪素の熱膨張率は常温から1000“Cの範囲にお
いて4.6 X 10  /Cであり、黒鉛ルツボに使
用する黒鉛素材の熱膨張率を炭化珪素のそれよりも高く
することにより黒鉛ルツボを使用中に起こる反りを防止
することができることが判った。
Table 1 The coefficient of thermal expansion of silicon carbide is 4.6 x 10 /C in the range from room temperature to 1000"C, and by making the coefficient of thermal expansion of the graphite material used in the graphite crucible higher than that of silicon carbide. It has been found that warping that occurs during use of a graphite crucible can be prevented.

この場合、黒鉛素材内のいずれの方向においても熱膨張
率は炭化珪素のそれよりも高いことが必要である。
In this case, the coefficient of thermal expansion in any direction within the graphite material must be higher than that of silicon carbide.

それと同時に黒鉛ルツボと一酸化珪素との反応は墨鉛素
材内に含まれる細孔の平均径が大きくなればなるほど黒
鉛素材内部へ深く浸透し、使用可能な耐久!命に好影響
を与えることから、本発明においては黒鉛素材の平均細
孔径を15000A以下にする必要がある。上記理由は
、熱膨張係数が炭化珪素の有する値より高い黒鉛素材を
使用した黒鉛ルツボにおいては約1500〜1600℃
の使用温度において黒鉛表面に転化した炭化珪素は繰り
返し使用する冷却サイクルにおいて、常に圧縮の内部応
力を保持しているために、反りの発生が少なくなるもの
と推察される。しかしながら黒鉛素材の熱膨張率が高過
ぎると、繰り返し使用するうちに冷却時の圧縮内部応力
4大きくなり、黒鉛表面に転化した炭化珪素層の盛り上
がり九本も太き≦な9、その亀裂に内部応力が集中する
結果黒鉛ルツボの耐久寿命は低下してくる1本発呼にお
いて、使用する黒鉛素材の熱膨張率は4.8〜6.0X
10  /Cの範囲内が最適である0本発における黒!
)ルツボの耐久寿命は゛反りの発生に基因するのではな
く、繰返して使用するうちに一酸化珪素と黒鉛ルツボと
の転化生成物である炭化珪素が黒鉛表面から次第に深く
侵入し黒鉛〃フポ自体の強度が徐々に劣化する。そして
その強度が転化した炭化珪°素により生じた黒鉛ルツボ
の内部応力より弱くなった時に黒鉛ルツボは破断し耐久
寿命に至るものである。−酸化珪素の侵入は黒鉛素材の
平均細孔径により大きく異なる。このことは本発明の実
施例の結果からも明らかなように平均細孔径が大きくな
るにつれ一酸化珪素の侵入が深くなるため耐久寿命社短
かくなってくる仁とが判る。
At the same time, the reaction between the graphite crucible and silicon monoxide penetrates deeper into the graphite material as the average diameter of the pores in the ink lead material increases, making it durable enough for use! In the present invention, the average pore diameter of the graphite material must be 15,000 A or less because it has a positive effect on life. The above reason is that in a graphite crucible using a graphite material whose thermal expansion coefficient is higher than that of silicon carbide,
It is presumed that silicon carbide, which has been converted to a graphite surface at the operating temperature of , always maintains compressive internal stress during repeated cooling cycles, which reduces the occurrence of warping. However, if the coefficient of thermal expansion of the graphite material is too high, the compressive internal stress 4 during cooling increases with repeated use, and the silicon carbide layer converted to the graphite surface grows thicker than 9. As a result of stress concentration, the durability life of the graphite crucible is reduced.In the case of a single call, the coefficient of thermal expansion of the graphite material used is 4.8 to 6.0X.
Black at 0 shot is optimal within the range of 10/C!
) The durability of the crucible is not due to the occurrence of warping; rather, as it is repeatedly used, silicon carbide, which is a conversion product of silicon monoxide and the graphite crucible, gradually penetrates deeper from the graphite surface, and the graphite crucible itself. strength gradually deteriorates. When the strength becomes weaker than the internal stress of the graphite crucible caused by the converted silicon carbide, the graphite crucible breaks and reaches the end of its durable life. -The penetration of silicon oxide varies greatly depending on the average pore diameter of the graphite material. As is clear from the results of the examples of the present invention, it can be seen that as the average pore diameter becomes larger, the penetration of silicon monoxide becomes deeper and the durability life becomes shorter.

・  それゆえ本発明の黒鉛ルツボにおいては1500
0A以下の平均細孔径を有する黒鉛素材を使用すること
が最適である。
・ Therefore, in the graphite crucible of the present invention, 1500
It is optimal to use a graphite material with an average pore size of 0A or less.

1    以上の説明より明らかなように本発明により
シ[リコン単結晶引上げに使用する黒鉛ルツボは従来l
  の約2倍以上となることからシリコン単結晶のコス
トを引下げ効果はきわめて大きい。
1. As is clear from the above explanation, the graphite crucible used for pulling silicon single crystal according to the present invention is different from the conventional graphite crucible.
The cost of silicon single crystals is about twice as high, so the effect of reducing the cost of silicon single crystals is extremely large.

特許登録出願人 揖斐川電気工業株式会社 代表者 多賀潤一部Patent registration applicant Ibigawa Electric Industry Co., Ltd. Representative Jun Taga

Claims (1)

【特許請求の範囲】[Claims] 熱膨張率が4.8〜6.OX 10 /Cであつて、か
つ平均細孔径が15.00OAである黒船素材を使用し
て成るV 13コン単結晶引上げ装置用黒鉛ルツボ。
Thermal expansion coefficient is 4.8-6. A graphite crucible for a V 13 con single crystal pulling device, which is made of black ship material which is OX 10 /C and has an average pore diameter of 15.00 OA.
JP57036823A 1982-03-08 1982-03-08 Graphite crucible for silicon single crystal pulling apparatus Granted JPS58156595A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57036823A JPS58156595A (en) 1982-03-08 1982-03-08 Graphite crucible for silicon single crystal pulling apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57036823A JPS58156595A (en) 1982-03-08 1982-03-08 Graphite crucible for silicon single crystal pulling apparatus

Publications (2)

Publication Number Publication Date
JPS58156595A true JPS58156595A (en) 1983-09-17
JPH0218318B2 JPH0218318B2 (en) 1990-04-25

Family

ID=12480470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57036823A Granted JPS58156595A (en) 1982-03-08 1982-03-08 Graphite crucible for silicon single crystal pulling apparatus

Country Status (1)

Country Link
JP (1) JPS58156595A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001031473A (en) * 1999-07-21 2001-02-06 Toyo Tanso Kk Graphite heater

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5626781A (en) * 1979-08-04 1981-03-14 Hitachi Chemical Co Ltd Manufacture of siccclad graphite material
JPS5632396A (en) * 1979-08-17 1981-04-01 Toshiba Ceramics Co Ltd Silicon single crystal pulling apparatus
JPS5684381A (en) * 1979-12-04 1981-07-09 Toshiba Ceramics Co Carbon silicate material
JPS56120584A (en) * 1980-06-26 1981-09-21 Hitachi Chemical Co Ltd Manufacture of carbonnsic composite member
JPS57191292A (en) * 1981-05-19 1982-11-25 Toshiba Ceramics Co Ltd Graphite crucible for preparing single crystal of semiconductor

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5626781A (en) * 1979-08-04 1981-03-14 Hitachi Chemical Co Ltd Manufacture of siccclad graphite material
JPS5632396A (en) * 1979-08-17 1981-04-01 Toshiba Ceramics Co Ltd Silicon single crystal pulling apparatus
JPS5684381A (en) * 1979-12-04 1981-07-09 Toshiba Ceramics Co Carbon silicate material
JPS56120584A (en) * 1980-06-26 1981-09-21 Hitachi Chemical Co Ltd Manufacture of carbonnsic composite member
JPS57191292A (en) * 1981-05-19 1982-11-25 Toshiba Ceramics Co Ltd Graphite crucible for preparing single crystal of semiconductor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001031473A (en) * 1999-07-21 2001-02-06 Toyo Tanso Kk Graphite heater

Also Published As

Publication number Publication date
JPH0218318B2 (en) 1990-04-25

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