JPS58142934U - Turntable mechanism of polycrystalline silicon wafer manufacturing equipment - Google Patents

Turntable mechanism of polycrystalline silicon wafer manufacturing equipment

Info

Publication number
JPS58142934U
JPS58142934U JP4072882U JP4072882U JPS58142934U JP S58142934 U JPS58142934 U JP S58142934U JP 4072882 U JP4072882 U JP 4072882U JP 4072882 U JP4072882 U JP 4072882U JP S58142934 U JPS58142934 U JP S58142934U
Authority
JP
Japan
Prior art keywords
turntable
polycrystalline silicon
silicon wafer
forming surface
wafer manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4072882U
Other languages
Japanese (ja)
Inventor
敬志 横山
泰宏 前田
Original Assignee
株式会社　ほくさん
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社　ほくさん filed Critical 株式会社　ほくさん
Priority to JP4072882U priority Critical patent/JPS58142934U/en
Priority to US06/373,039 priority patent/US4561486A/en
Priority to AU83147/82A priority patent/AU562656B2/en
Priority to DE8282302246T priority patent/DE3277974D1/en
Priority to EP82302246A priority patent/EP0065373B1/en
Publication of JPS58142934U publication Critical patent/JPS58142934U/en
Pending legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本考案に係るターンテーブル機構を具備した多
結晶シリコンウェハ製造装置の一部を切欠した正面説明
図、第２図は同機構の一部を切欠した正面図、第３図は
他実施例による同機構の一部切欠正面図である。 ５・・・ターンテーブル、６・・・・・・ウェハ形成面
、７・・・・・・回収受皿、８・・・回転軸、９・・・
・・・ウェハ皿。Fig. 1 is a partially cut-away front explanatory view of a polycrystalline silicon wafer manufacturing apparatus equipped with a turntable mechanism according to the present invention, Fig. 2 is a partially cut-away front view of the same mechanism, and Fig. 3 is a partially cut-away front view of the same mechanism. It is a partially cutaway front view of the same mechanism according to an embodiment. 5... Turntable, 6... Wafer forming surface, 7... Collection tray, 8... Rotating shaft, 9...
...Wafer plate.

Claims (3)

【実用新案登録請求の範囲】[Scope of utility model registration request] （１）所望雰囲気にあって、ターンテーブルのウェハ形
成面におけるシリコン母材を、当該ターンテーブルの回
転による遠心力によって、拡径方向へ流動させることに
より、尚該融液による所望径の融液薄層を形成し、これ
を固化するようにした多結晶シリコンウェハ製造装置に
おいて、上記ウェハ形成面を有するターンテーブルの外
周側に、当該ウェハ形成面から飛散する融液を受承する
回収受皿が配設されてなる多結晶シリコンウェハ製造装
置のターンテーブル機構。(1) In a desired atmosphere, the silicon base material on the wafer forming surface of the turntable is made to flow in the direction of diameter expansion by the centrifugal force generated by the rotation of the turntable, and the melt has a desired diameter. In a polycrystalline silicon wafer manufacturing apparatus that forms a thin layer and solidifies the thin layer, a collection tray is provided on the outer peripheral side of the turntable having the wafer forming surface to receive the melt scattered from the wafer forming surface. Turntable mechanism of polycrystalline silicon wafer manufacturing equipment. （２）ターンテーブルが回転軸と、これに固設した回収
受皿とにより形成され、ターンテーブルのウェハ形成面
が、上記回収受皿にあって軸心位置に載置されたウェハ
皿の上面として形成されている実用新案登録請求の範囲
第１項記載の多結晶シリコンウェハ製造装置のターンテ
ーブル機構。(2) The turntable is formed by a rotating shaft and a collection tray fixed to the rotation shaft, and the wafer forming surface of the turntable is formed as the upper surface of the wafer tray placed on the axial center position of the collection tray. A turntable mechanism for a polycrystalline silicon wafer manufacturing apparatus according to claim 1, which has been registered as a utility model. （３）ウェハ形成面を有するターンテーブルの外周側に
配設された回収受皿が、上記ターンテーブルとは切離し
て固設されている実用新案登録請求の範囲第１項記載の
多結晶シリコンウェハ製造装置のターンテーブル機構。(3) Polycrystalline silicon wafer manufacturing according to claim 1, wherein the collection tray disposed on the outer circumferential side of a turntable having a wafer forming surface is fixed and separated from the turntable. Turntable mechanism of the device.
JP4072882U 1981-04-30 1982-03-23 Turntable mechanism of polycrystalline silicon wafer manufacturing equipment Pending JPS58142934U (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP4072882U JPS58142934U (en) 1982-03-23 1982-03-23 Turntable mechanism of polycrystalline silicon wafer manufacturing equipment
US06/373,039 US4561486A (en) 1981-04-30 1982-04-29 Method for fabricating polycrystalline silicon wafer
AU83147/82A AU562656B2 (en) 1981-04-30 1982-04-29 Fabricating polycrystalline silicon wafers
DE8282302246T DE3277974D1 (en) 1981-04-30 1982-04-30 Method fabricating a polycrystalline silicon wafer
EP82302246A EP0065373B1 (en) 1981-04-30 1982-04-30 Method fabricating a polycrystalline silicon wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4072882U JPS58142934U (en) 1982-03-23 1982-03-23 Turntable mechanism of polycrystalline silicon wafer manufacturing equipment

Publications (1)

Publication Number Publication Date
JPS58142934U true JPS58142934U (en) 1983-09-27

Family

ID=30051933

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4072882U Pending JPS58142934U (en) 1981-04-30 1982-03-23 Turntable mechanism of polycrystalline silicon wafer manufacturing equipment

Country Status (1)

Country Link
JP (1) JPS58142934U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5427720A (en) * 1977-08-03 1979-03-02 Nec Corp Process amplifier of color pickup unit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5427720A (en) * 1977-08-03 1979-03-02 Nec Corp Process amplifier of color pickup unit

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