JPS58135632A - インジウム−アンチモン−ヒ素系化合物薄膜の製造方法 - Google Patents

インジウム−アンチモン−ヒ素系化合物薄膜の製造方法

Info

Publication number
JPS58135632A
JPS58135632A JP57018375A JP1837582A JPS58135632A JP S58135632 A JPS58135632 A JP S58135632A JP 57018375 A JP57018375 A JP 57018375A JP 1837582 A JP1837582 A JP 1837582A JP S58135632 A JPS58135632 A JP S58135632A
Authority
JP
Japan
Prior art keywords
thin film
antimony
deposited
arsenic
indium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57018375A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0247850B2 (enrdf_load_stackoverflow
Inventor
Keiji Kuboyama
久保山 啓治
Takeki Matsui
雄毅 松居
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Priority to JP57018375A priority Critical patent/JPS58135632A/ja
Publication of JPS58135632A publication Critical patent/JPS58135632A/ja
Publication of JPH0247850B2 publication Critical patent/JPH0247850B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/002Controlling or regulating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Hall/Mr Elements (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
JP57018375A 1982-02-08 1982-02-08 インジウム−アンチモン−ヒ素系化合物薄膜の製造方法 Granted JPS58135632A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57018375A JPS58135632A (ja) 1982-02-08 1982-02-08 インジウム−アンチモン−ヒ素系化合物薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57018375A JPS58135632A (ja) 1982-02-08 1982-02-08 インジウム−アンチモン−ヒ素系化合物薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS58135632A true JPS58135632A (ja) 1983-08-12
JPH0247850B2 JPH0247850B2 (enrdf_load_stackoverflow) 1990-10-23

Family

ID=11969960

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57018375A Granted JPS58135632A (ja) 1982-02-08 1982-02-08 インジウム−アンチモン−ヒ素系化合物薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS58135632A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61259583A (ja) * 1985-05-14 1986-11-17 Asahi Chem Ind Co Ltd 半導体磁電変換素子

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61259583A (ja) * 1985-05-14 1986-11-17 Asahi Chem Ind Co Ltd 半導体磁電変換素子

Also Published As

Publication number Publication date
JPH0247850B2 (enrdf_load_stackoverflow) 1990-10-23

Similar Documents

Publication Publication Date Title
US8946692B2 (en) Graphene (multilayer) boron nitride heteroepitaxy for electronic device applications
US4046618A (en) Method for preparing large single crystal thin films
JP2018525516A (ja) 2次元遷移金属ジカルコゲナイド薄膜の製造方法
KR101800363B1 (ko) 전이금속 칼코겐화합물 박막 제조 방법
JPS5983997A (ja) エピタキシヤル多成分材料を含むヘテロ構造の形成方法
CN111206283B (zh) 一种二硒化铬二维材料的制备和应用
Wang et al. Unconventional two-dimensional germanium dichalcogenides
Rimoldi et al. Effect of substrates and thermal treatments on metalorganic chemical vapor deposition-grown Sb2Te3 thin films
He et al. Atomic layer deposition and characterization of Bi1Se1 thin films
Högberg et al. Growth and property characterization of epitaxial MAX-phase thin films from the Tin+ 1 (Si, Ge, Sn) Cn systems
JPH0658891B2 (ja) 薄膜単結晶ダイヤモンド基板
JPS58135632A (ja) インジウム−アンチモン−ヒ素系化合物薄膜の製造方法
US3463667A (en) Deposition of thin films
JPH0851001A (ja) セラミック抵抗体
JPS6121311B2 (enrdf_load_stackoverflow)
JPS595620A (ja) インジウム−ガリウム−アンチモン系化合物薄膜の製造方法
JPH0425718B2 (enrdf_load_stackoverflow)
US3700498A (en) Process for making electrophotographic plates
Kistaiah et al. X-ray studies on the thermal expansion of copper indium disulphide
JP3273110B2 (ja) セラミック抵抗体
JPS5878418A (ja) インジウム−アンチモン系複合結晶薄膜の製造法
KR860000161B1 (ko) 인듐 안티몬계 복합 결정반도체 및 그 제조방법
JPS596527A (ja) 高移動度のインジウム−アンチモン系複合結晶薄膜の製造方法
Mazur et al. Growth mechanism of Pb0. 9Cd0. 1Te: Pb thin films prepared by PVD technique
Chizmeshya et al. Nano-synthesis approach to the fabrication of monocrystalline silicon-like (III-V) yIV5-2y semiconductors