JPS58132029A - Surface treatment of substrate - Google Patents

Surface treatment of substrate

Info

Publication number
JPS58132029A
JPS58132029A JP1335082A JP1335082A JPS58132029A JP S58132029 A JPS58132029 A JP S58132029A JP 1335082 A JP1335082 A JP 1335082A JP 1335082 A JP1335082 A JP 1335082A JP S58132029 A JPS58132029 A JP S58132029A
Authority
JP
Japan
Prior art keywords
treatment
substrate
organic polymer
polymer material
discharge treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1335082A
Other languages
Japanese (ja)
Inventor
Shinichi Nishi
眞一 西
Kinu Hougen
法元 きぬ
Takuo Sato
佐藤 拓生
Fumio Shimada
文生 島田
Hisanori Tsuchino
久憲 土野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP1335082A priority Critical patent/JPS58132029A/en
Publication of JPS58132029A publication Critical patent/JPS58132029A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To impart improved adhesiveness to the surface of a substrate comprising an organic polymer material without causing its coloration or loss of transparency, by subjecting the surface to gas discharge and chemical treatments. CONSTITUTION:The surface of a substrate comprising an organic polymer material is subjected to gas discharge and chemical treatments. The gas discharge treatment which can be applied includes a vauum glow discharge treatment, corona discharge treatment and plasma discharge treatment, among which the former two are preferred. The chemical treatment includes an acid treatment, alkali treatment, and coupling agent treatment, and especially, a treatment is preferred in which a substrate is immersed in an alkaline solution containing alkali metal or alkaline earth metal ions. This surface treatment process is most suitable when a polymethyl methacrylate resin or its derivative is used as an organic polymer material desirable for use in an information recording system in which recording is performed through a transparent substrate excellent in smoothness, such as an optical information recording medium.

Description

【発明の詳細な説明】 本発明は有機高分子材料からなる基板の表面処理方法に
関し、晩に詳しく祉、基板表面を気体放電処理および化
学@場することを特徴とする基板の表向処理方法に関す
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a surface treatment method for a substrate made of an organic polymer material, and a method for surface treatment of a substrate, which is characterized in that the surface of the substrate is subjected to gas discharge treatment and chemical treatment. Regarding.

従来プラスチックフィルム、プラスチック板等に対して
、その表面に設けられる高分子層、金属層、あるいは檀
々の分舷噛との接着性を向上させる目的で真空ダロー放
電処理、プラズマ放電処理、コロナ放電処理等の気体放
電処理を含め先程々の表面処理が行なわれてき友。
Conventionally, plastic films, plastic plates, etc. have been subjected to vacuum dull discharge treatment, plasma discharge treatment, and corona discharge treatment for the purpose of improving adhesion to the polymer layer, metal layer, or ship's shunt provided on the surface. The surface treatment mentioned earlier, including gas discharge treatment, has been carried out.

しかしながら、これらの方法を用いて、有機高分子材料
からなる基板の表向の接着性を所望の程度まで向上させ
るためには、前記気体放電処理の時間を長くしなけれに
ならないか、または放11に強度を太き−くしなければ
ならないために、基板自体が黄色に着色する現象が起こ
る。この様な着色は材料特性上、商品イメージ上好まし
くなく、特に光学部材として前記基板を用いる場合、基
板が表面処理で着色することは致命的な欠陥となる。信
えば、この有機高分子材料からなる基板を光が透過する
条件下で、使用される場合であり、特に、前記基板が光
学的情報紀鍮織体に用いられる場合には、この基板の着
色現象が、前記基板上に記録される情報の書込み、読み
出し等における実質的な光エネルギーの減少、またはレ
ーザ光の様な光の散乱等によシ、情報記録感度の低下や
再生信号の8/N比の低下など、実用上極めて重大な欠
陥の原因となっていた。上記処理時間を短くするか放電
強直を弱めるかして処理の程度を11滅すれば、上記の
不利な点の発現を防止てきるが、前記基板上に設けられ
美記録層勢の所望の接着性等の表内特性が侮られず、こ
れまで気体放電処理は実質的に使用できないとみられて
いた。
However, in order to improve the surface adhesion of a substrate made of an organic polymer material to a desired level using these methods, it is necessary to increase the time of the gas discharge treatment or to increase the time of the gas discharge treatment. Since the strength must be made thicker, the substrate itself becomes yellowish. Such coloring is unfavorable in terms of material properties and product image. Particularly when the substrate is used as an optical member, coloring the substrate during surface treatment is a fatal defect. If the substrate is made of an organic polymer material, the substrate is used under conditions where light can pass through it, and in particular, when the substrate is used for an optical information woven material, the coloring of the substrate is This phenomenon is caused by a substantial decrease in optical energy during writing and reading of information recorded on the substrate, or by scattering of light such as laser light, resulting in a decrease in information recording sensitivity and an increase in the reproduction signal. This caused extremely serious defects in practice, such as a decrease in the N ratio. If the degree of treatment is reduced by shortening the treatment time or weakening the discharge stiffness, the above-mentioned disadvantages can be prevented, but the desired adhesion of the recording layer provided on the substrate can be improved. Until now, it was considered that gas discharge treatment could not be practically used because of the characteristics listed in the table, such as the properties of the metal.

上記着色の問題の他に、強い放電処理によシ発生する失
透また祉白濁化の現象も同様に気体放電処理の使用範8
を限定していた。
In addition to the above-mentioned coloring problem, the phenomenon of devitrification and clouding caused by strong discharge treatment can also be caused by the use of gas discharge treatment.
was limited.

本発明の目的はかかる着色または失透を抑えながら、光
分な表面処理方法を施して、有機高分子材料からなる基
板とその上に設けられる配鍮層等との間OiI着性を改
曽することにある。
The purpose of the present invention is to improve the OiI adhesion between a substrate made of an organic polymer material and a brass layer provided thereon by applying an optical surface treatment method while suppressing such coloration or devitrification. It's about doing.

かかる目的は、有機高分子材料からなる基板表両を気体
放電処理および化学処理することを特徴とする基板の表
面処理方法によって達成される。
This object is achieved by a method for surface treatment of a substrate, which comprises subjecting both surfaces of a substrate made of an organic polymeric material to gas discharge treatment and chemical treatment.

本発明の好ましい実施態様に従えば、前記気体放電処理
がプラズマ放電処理もしく拡コロナ放電@層であること
、前記化学処理がアルカリ金属またはアルカリ土類金属
のイオンを含有するアルカリ111液に前記基板を浸漬
する処理であることであり、さらに他の好ましい”実施
一様に従えば、前記有機高分子材料がポリメチルメタク
リル酸又はそのllI4体であることt−特徴とする表
面処理方法とすることである。
According to a preferred embodiment of the present invention, the gas discharge treatment is a plasma discharge treatment or an expanding corona discharge@layer, and the chemical treatment is performed in an alkali 111 solution containing alkali metal or alkaline earth metal ions. According to another preferred embodiment, the surface treatment method is characterized in that the organic polymer material is polymethyl methacrylic acid or its 11-4 form. That's true.

以下、本発明について詳述する。The present invention will be explained in detail below.

本発明の気体放電処理とは、III:空ダロー放電処理
、コ0す放電処理およびプラズマ放電処理等をいう。こ
こに、真壁グー−放電処ffiは、高真空中において高
電圧を印加したとぎ電界の陰極付近に発生するグロー放
電発光下に有機高分子材料の基板を曝すことで基板の表
向処理を行なうものである。コロナ放電処理は、大気中
もしくは真空中において、直流高電圧又は交流高電圧を
1縁よシ印加してコロナ放電させて、雰囲気気体をイオ
ン化させ、このイオン流に有411高分子材料の基板を
曝すことで基板の表向処理を行なうものである。また、
プラズマ放電処理は、大気中もしくは特定気体の低中圧
中において、aJ#M波発振を行なわせて、プラズマ放
電f:打なわせ雰囲気の気体をイオン化させ、このイオ
ンIK有機高分子材料の基板を@すことで基板の表−処
理を行なうものである。本発明においては、前記基板の
表面への有機動勢の汚染を防ぐ意味で、プラズマ放電処
理、コロナ放電処理が最も好ましい。
The gas discharge treatment according to the present invention refers to III: empty Darrow discharge treatment, CO2 discharge treatment, plasma discharge treatment, and the like. Here, the Makabe Gou discharge treatment ffi performs surface treatment on a substrate made of an organic polymer material by exposing it to glow discharge light emitted near the cathode of a high voltage applied electric field in a high vacuum. It is something. In the corona discharge treatment, a DC high voltage or an AC high voltage is applied across one edge in the atmosphere or vacuum to cause a corona discharge, ionize the atmospheric gas, and apply a substrate made of a 411 polymer material to this ion flow. The surface treatment of the substrate is performed by exposing the substrate. Also,
In plasma discharge treatment, aJ#M wave oscillation is performed in the atmosphere or in a specific gas at low and intermediate pressures to ionize the gas in the plasma discharge f: irradiation atmosphere, and this ion IK organic polymer material substrate is By doing this, the surface of the substrate is processed. In the present invention, plasma discharge treatment and corona discharge treatment are most preferred in terms of preventing contamination of the surface of the substrate with organic moieties.

本発明の化学処理とは、酸処珈、アルカリ処理、カップ
リング剤処理、例えばシラン糸やチタン系カップリング
剤を用いた処理などのいずれか1つ箇えは前2@のいず
れ゛かと後者とを組み合わせた表自処[を盲う。
The chemical treatment of the present invention includes acid treatment, alkali treatment, coupling agent treatment, for example, treatment using silane thread or titanium coupling agent, etc. The combination of the expression [blind.

本発明の表面処理方法の利点は、気体放電処理後に化学
処理を行なうことによシ、有機高分子材料からなる基板
の着色中失透を実質的に起こさせずに装着性等の光分な
表面特性が得られることである。本発明の表面処理方法
を施した有機高分子材料の基板でFi接着剤や別種の下
引層等を用いる必豐がないために、化学変化等の経時劣
化の問題が無いようにできることも、本発明の−B−処
理方法による利点に含まれる。
The advantage of the surface treatment method of the present invention is that chemical treatment is performed after gas discharge treatment, thereby substantially preventing devitrification during coloring of the substrate made of an organic polymer material, and improving light intensity such as attachability. surface properties can be obtained. Since it is not necessary to use an Fi adhesive or a different type of subbing layer on the organic polymer material substrate treated with the surface treatment method of the present invention, it is possible to avoid problems of deterioration over time such as chemical changes. Among the advantages of the -B- treatment method of the present invention.

本発明の表面処理方法は、従来の方法による気体放電処
理において着色を生じるか、まえは失透する様な有機高
分子材料においても、特に有効である。本発明の有機高
分子材料としては、例えば、ポリエチレンテレフタレー
ト、ポリブチレンテレフタレートの様なポリエステル類
、ポリスチレン、ポリ−α−メチルスチレンの様なボリ
スチレ/類、ポリメチルメタクリレート、ポリエチルメ
タクリレート、ホリハイドロキ7エチルメタクリレート
の様なテクリルエステル類、ポリカーボネート類、セル
ローストリアセテート、セルロースアセテートブチレー
トの様なセルロース111%であって、本発明の表面処
理方法はいずれにも適用できる。
The surface treatment method of the present invention is particularly effective for organic polymeric materials that become colored or devitrify in conventional gas discharge treatment. Examples of the organic polymer material of the present invention include polyesters such as polyethylene terephthalate and polybutylene terephthalate, polystyrene, polystyrenes such as poly-α-methylstyrene, polymethyl methacrylate, polyethyl methacrylate, and polyhydrox-7-ethyl The surface treatment method of the present invention can be applied to any of 111% cellulose such as tecrylic esters such as methacrylate, polycarbonates, cellulose triacetate, and cellulose acetate butyrate.

上記の様な有機高分子材料からなる基板の厚さは限定さ
れず、例えばフィルム状態の79謹厚から30謹厚の板
状基板まで用いることができる。
The thickness of the substrate made of the above-mentioned organic polymer material is not limited, and can be used, for example, from 79 mm thick in the form of a film to a plate-like substrate with a thickness of 30 mm thick.

光学的情報記f&謀体の如く、透明で平渭性に優れた基
板を通して、一般的には、1μm前後のビーム径に絞り
込まれたレーザ光を用いて情報の書き込み、読み出し等
記録、再生を行なうような情報記録法等に好ましく用い
られる有機高分子材料として、ポリメチルメタクリレー
ト樹脂およびその銹導体の場合には、本発明の表面処理
方法が最本好ましい。
Optical information recording: Recording, reading, etc. of information is generally performed using a laser beam narrowed to a beam diameter of around 1 μm through a transparent and flat substrate, such as an optical information recorder. In the case of polymethyl methacrylate resin and its rust conductor, the surface treatment method of the present invention is most preferable as an organic polymer material preferably used in such an information recording method.

本発明の表面処理方法で行なわれる気体放電処理にLl
)゛ラズマ放電処理、コロナ放電処理が特に好ましい処
理法である。
Ll in the gas discharge treatment performed in the surface treatment method of the present invention.
) Particularly preferred treatment methods are plasma discharge treatment and corona discharge treatment.

コロナ放電処理は直流高電圧もしくは交流高電圧の高圧
発生機、好ましくは電圧が1〜100KVにおいて、出
力1〜20 KW金含有る発生装置を用いて、大気中常
圧下に行うことができる。この処理は放電位置において
コロナ放電下で気体がイオン化している雰−気中を豹電
体支持ローラー上有機為分子材料からなる基板を一速度
毎分1〜500nmにて送って前記基板の表向処理を行
なうのが好ましい。放電電極はタングステン線、金メツ
キー等の細1mlがよく、有機高分子材料の基板上から
0.1〜50−の位置に設置して均一な放電を施して、
柑いることができる。
The corona discharge treatment can be carried out in the atmosphere under normal pressure using a DC high voltage or AC high voltage generator, preferably a gold-containing generator with a voltage of 1 to 100 KV and an output of 1 to 20 KW. This treatment involves transporting a substrate made of an organic or molecular material on a leopard electric support roller at a speed of 1 to 500 nm per minute through an atmosphere in which gas is ionized under corona discharge at a discharge position. It is preferable to carry out a direct treatment. The discharge electrode is preferably a thin 1ml tungsten wire, gold metal key, etc., and is placed at a position of 0.1 to 50 mm from the organic polymer material substrate to generate a uniform discharge.
I can smell it.

本発明のフラズマ放電処理は最も好ましい処理方法であ
シ、真![o、o 1〜20 Torrの低中圧中の雰
−気で行なわれ、好箇しくは0.1〜2 Torrであ
る。圧力が低すぎるとプラズマ処理効果が充分でなく、
為すぎると過大電流が流れて危険である。
The plasma discharge treatment of the present invention is the most preferred treatment method. [o, o It is carried out in an atmosphere of low to medium pressure of 1 to 20 Torr, preferably 0.1 to 2 Torr. If the pressure is too low, the plasma treatment effect will not be sufficient,
If the voltage is too high, excessive current will flow, which is dangerous.

1ラスマ放電を行なわせるaIbfi111tIL発振
用電源への印加電圧Fi0.5〜5KVが好ましく、発
振出力は1〜10 GWが好ましい。低すぎるとカスの
イオン化が翁<、プラズマが安定して発生せず、高すぎ
ると危険である。
The voltage Fi applied to the aIbfi111tIL oscillation power supply that causes one lasma discharge is preferably 0.5 to 5 KV, and the oscillation output is preferably 1 to 10 GW. If it is too low, the ionization of the dregs will be reduced, and plasma will not be generated stably, and if it is too high, it is dangerous.

プラズマ放電用ガスFikrs N2  %の不活性ガ
スが好筐し、いが、CF4、CF14等のガスも用いる
ことができる。カス流量社用いるカスや扁1lId波発
振条件によ#)14なるが、Arの場合毎分10〜50
mが好ましい。
As the plasma discharge gas, an inert gas containing Fikrs N2% is suitable, but gases such as CF4 and CF14 can also be used. 14 depending on the oscillation conditions of the 1lId wave used by Kasu flow company, but in the case of Ar it is 10 to 50 times per minute.
m is preferred.

1ラズマ放電用電極間距離は、ガスのaI類や流量、お
よび扁崗波発振条件により異なるが、1〜10cmの間
に設定される。
1. The distance between the electrodes for lasma discharge is set between 1 and 10 cm, although it varies depending on the aI class of the gas, the flow rate, and the oscillation conditions of the planar wave.

前記有機高分子材料は、プラズマ放電下のガス雰囲気中
に設置されるか、搬送される。
The organic polymeric material is placed or transported in a gas atmosphere under plasma discharge.

以上の如く条件を設定することにより、有機高分子材料
からなる基板向に対して、勢力的なプラズマを発生さゼ
ることが可能となシ、好ましい表′内処理が行なわれる
By setting the conditions as described above, it is possible to generate a powerful plasma toward the substrate made of an organic polymer material, and a preferable in-plane treatment can be performed.

上記処理方法で、前記基板の表FkJは好適な状態に活
性化され、次に行なわれる前記基板の化学処理法に対し
て、光分な表面特性が付与されることになる。
In the above treatment method, the surface FkJ of the substrate is activated to a suitable state and imparts optical surface characteristics to the subsequent chemical treatment of the substrate.

本発明の表面6塩方法で行なわれる化学処理には、有機
高分子材料からなる基板表面の親水性を向上させ得る全
ての処理方法が含まれ、有機高分子の1alii11組
成、重合度、平均分子量およびその表自よに一鵬、また
は蒸着等によシ設けられる層のS類や性質により異なり
、画一的には決定されないが、酸処理、アルカリ処理、
カップリング剤処m勢が含まれる。
The chemical treatment carried out in the surface 6-salt method of the present invention includes all treatment methods that can improve the hydrophilicity of the surface of a substrate made of an organic polymer material, including the 1alii11 composition, degree of polymerization, and average molecular weight of the organic polymer. It varies depending on the S type and properties of the layer provided by vapor deposition, etc., and is not uniformly determined, but acid treatment, alkali treatment,
Coupling agent treatment is included.

酸処理には硝酸、備酸等の無機酸の1〜50重量パーセ
ント水溶液が用いられ、アルカリ処理には水酸化ナトリ
ウム、水酸化カリウム勢のアルカリ金jIlitたけ水
酸化マグネシウム等のアルカリ土類金属のイオンを含む
1〜50重量パーセントの水溶液、メタノールもしくは
エタノール等のアルコール溶液または前記アルコールと
水との任意の比率の混合溶液が用いられる。酸処理、ア
ルカリ処理共に、1〜30分間の処理時間および10〜
90℃の処理lml1jでhyzわれるが、有−高分子
材料自身の処理液への溶解または着色、失透を防止する
ためには、好適な処理条件として、50℃、lO分間程
度がよい。
For acid treatment, a 1 to 50% by weight aqueous solution of an inorganic acid such as nitric acid or bolic acid is used, and for alkali treatment, an alkali metal such as sodium hydroxide or potassium hydroxide or an alkaline earth metal such as magnesium hydroxide is used. An aqueous solution containing ions of 1 to 50 weight percent, an alcohol solution such as methanol or ethanol, or a mixed solution of the alcohol and water in any ratio is used. Both acid treatment and alkali treatment have a treatment time of 1 to 30 minutes and a treatment time of 10 to 30 minutes.
Although the treatment lml1j at 90°C causes hyzing, in order to prevent the polymeric material itself from dissolving in the processing liquid, discoloring, and devitrification, the preferable processing conditions are 50°C and about 10 minutes.

前記化学処理後の光分な水洗は基板表面の清浄さを保つ
ために必歎とされる。
Light and water rinsing after the chemical treatment is required to maintain the cleanliness of the substrate surface.

また前記カップリング剤処理には、シラン系カップリン
グ剤やチタン系カップリング剤の0.1〜100重量パ
ーセントの水溶液またはアルコール溶液が用いられる。
Further, in the coupling agent treatment, an aqueous or alcoholic solution of 0.1 to 100 weight percent of a silane coupling agent or a titanium coupling agent is used.

処理時間は1〜30分間、処理m度は10〜70℃で行
なわれる。
The treatment time is 1 to 30 minutes, and the treatment temperature is 10 to 70°C.

シラン系カップリング剤として、例えばトーレ・シリコ
ーン■製のSH6020、SH6026、5)1603
2、 SH6040、SH6050、SH6075、信
越化学■製のKBM−403、KBM−503、Kfl
M−602等を用いることができるが、8H−6040
が、特にポリメチルメタクリレート樹脂を用いた時に好
ましい接着性を与える。
As a silane coupling agent, for example, SH6020, SH6026, 5) 1603 manufactured by Toray Silicone ■
2. SH6040, SH6050, SH6075, KBM-403, KBM-503, Kfl manufactured by Shin-Etsu Chemical ■
M-602 etc. can be used, but 8H-6040
provides favorable adhesion, especially when using polymethyl methacrylate resins.

チタン系カップリング剤として、例えば米国Kenri
ch Petroch@m1cals社製のブレンアク
トTT8.38S、4611,55,1388゜134
8%を用いることができるが、希薄溶液で用いた場合、
ポリメチルメタクリート樹脂には。
As a titanium-based coupling agent, for example, Kenri Co., Ltd.
ch Petroch@m1cals Blen Act TT8.38S, 4611, 55, 1388° 134
8% can be used, but when used in dilute solution,
For polymethyl methacrylate resin.

46Bが好ましいItC′iM性を与える。46B provides favorable ItC'iM properties.

本発明において用いられる各種カップリング剤またはそ
の主成分のam式は以下のjlI9である。
The am formula of various coupling agents or their main components used in the present invention is jlI9 below.

以下余白 5H6020:  H2N−(CH2)2−N[(−(
CI(2)、−8i(QC)15)3SH6026: 
アミノシラン (CH2) 3−81 (OCH5) 5SH6040
;  CHz−CI−CH20−(CH2)3−8i(
OCH5)s\に 8)(6050:  1級、2級および3級アミノシラ
ンの混合物S■ 6075  :  CH2=CH81
(OCOC[(3)。
Below margin 5H6020: H2N-(CH2)2-N[(-(
CI(2), -8i(QC)15)3SH6026:
Aminosilane (CH2) 3-81 (OCH5) 5SH6040
; CHz-CI-CH20-(CH2)3-8i(
OCH5)s\8) (6050: Mixture of primary, secondary and tertiary aminosilane S■ 6075: CH2=CH81
(OCOC[(3).

KIM 602  :  H2N−(C12)2−NH
−(CH2)5−81(OCH3)3H5 TTg  :  CH3−CH−0−Ti−(OCOC
17H35)5H 461a  ;  (CslH170)1−’rt −
(P−(OC15H27)、OR14[P+0c15H
z7)20H)2 ―紀シラン糸カップリング剤およびチタン系カップリン
グM紘共にSt状態で基板の表面処理剤として用いる他
に、―布液中に固形分の0.01〜10重量パーセント
分として添加して、―設時に用いても光分Kf用に耐え
得る接着性を与える。
KIM 602: H2N-(C12)2-NH
-(CH2)5-81(OCH3)3H5 TTg: CH3-CH-0-Ti-(OCOC
17H35)5H 461a; (CslH170)1-'rt-
(P-(OC15H27), OR14[P+0c15H
z7) 20H) 2 - In addition to using both the silane thread coupling agent and the titanium coupling agent in the St state as a surface treatment agent for substrates, it is also used as a solid content of 0.01 to 10% by weight in the fabric solution. It is added to provide adhesion that can withstand optical Kf even when used during installation.

本発明の表自処理を施し九有績高分子材料からなる基板
上に設けられるl1114層、例えば、光学的情報記録
媒体用の記録層として、金Is像粒子が分散された高分
子からなる層管用いた場合、本発明の表面処理法の効果
は極めて大きい。例えば、銀粒子が分散され九ゼラチン
層、銅粒子が分散されたポリビニルアルコール層、ま友
は鉄粒子が分散され九ポリスチレン層などにおいて接着
性が着しく改良される。
An 1114 layer provided on a substrate made of a polymeric material subjected to the surface treatment of the present invention, for example, a layer made of a polymer in which gold Is image particles are dispersed, as a recording layer for an optical information recording medium. When using pipes, the effect of the surface treatment method of the present invention is extremely large. For example, adhesion is significantly improved in a gelatin layer containing silver particles, a polyvinyl alcohol layer containing copper particles, and a polystyrene layer containing iron particles.

本発明の表面処理方法によシ、処理tjikした有機高
分子材料からなる基板を用いることによシ、光学的情報
記録媒体が高品質で安定して供給できる様になった。か
かる有機高分子材料を用いた媒体は基板材料にガラスを
用いたそれに比べて、軽く取シ扱いに@!利であって、
破損しにくい友めに、情報の書ぎ込み、読み出し勢紀録
再生のための高速回転操作が安全に行なわれるという利
点を有し、本発明O@境方法は前記利点tCに嬌めるも
のである。
By using a substrate made of an organic polymer material treated by the surface treatment method of the present invention, it has become possible to stably supply high quality optical information recording media. Media using such organic polymer materials are easier to handle than those using glass as the substrate material. It is a benefit,
It has the advantage that the high-speed rotation operation for writing information, reading out information, and playing back the history record can be performed safely without being easily damaged. be.

本発明の表面処理方法で処理を施した基板上に記録層等
となる塗布薄II′に設けた時の―布薄膜強度、接着性
等を調べる1合、基板上に設けられ友―布試料の乾燥時
接着特性は、有機高分子材料からなる基板に対する一布
薄@O接着力を意味し、後記の実施例における測定法は
塗布薄穣の上に6己粘着性テープ〔3M:スコッチテー
プ〕を貼付け、このテープをフィルムから急激に剥離さ
せることによシ該薄輿が剥離するか否かによって評価し
た。
1. To examine the strength, adhesion, etc. of a cloth thin film when it is provided on a substrate treated with the surface treatment method of the present invention as a recording layer etc., a cloth sample is provided on the substrate. The dry adhesion property of refers to the adhesion force of one cloth @O to a substrate made of an organic polymer material, and the measurement method in the examples described later is to apply a self-adhesive tape [3M: Scotch tape] on top of the thin layer. ] was pasted on the film, and the tape was rapidly peeled off from the film, and evaluation was made based on whether or not the thin film peeled off.

本発明O好ましい実施m様を以下の実施例に基づ−て詳
細かつ具体的に説明する。しかし、本発明の実施態様は
これに限定されるものではない。
Preferred embodiments of the present invention will be described in detail and specifically based on the following examples. However, embodiments of the present invention are not limited thereto.

実施例1 清浄な8インチ角O1−犀のポリメチ羨メタクリレート
基板(三菱レーヨン■製、アクリライト)ft日電アネ
ルバ@製のプラズマCVO装置を用いてプラズマ放電処
理した。プラズマ放電処理はアルゴンガスを用いて0.
4 Torrの真空下I KVの電圧を印加して、20
WO高#波出力でプラズマを発生させ、処理時間は10
分間であり九。
Example 1 A clean 8-inch square O1 polymethacrylate methacrylate substrate (manufactured by Mitsubishi Rayon ■, Acrylite) was subjected to plasma discharge treatment using a plasma CVO apparatus manufactured by Nichiden ANELVA@. Plasma discharge treatment is performed using argon gas.
Applying a voltage of I KV under a vacuum of 4 Torr,
Plasma is generated with WO high # wave output, processing time is 10
Nine minutes.

処境済ポリメチルメタクリレート基板を50℃olo7
11@パーセントの水敵化カリウム水溶液に10分浸漬
して化学処理し水洗、乾燥した。
Treated polymethyl methacrylate substrate at 50℃olo7
It was chemically treated by immersing it in an 11% potassium water solution for 10 minutes, washing with water, and drying.

前記処理済基板上に0.5重量パーセントのシランカッ
プリングM()−レ拳シリコーン■製ノ81(−604
0)t−含有するコロイド銀のゼラチン溶液を乾燥膜厚
0.5 jmとなる様にワイヤー・パー−布し友。
On the treated substrate, 0.5% by weight of silane coupling M()-Reken Silicone ■No. 81(-604) was applied.
0) Wire a gelatin solution containing colloidal silver to a dry film thickness of 0.5 m.

比較fll 実施例1゛における化学処理を省いてプラズマ処理のみ
を行なう九。
Comparison Example 9, in which the chemical treatment in Example 1 was omitted and only plasma treatment was performed.

比稙f12 実jli+flllにおけるプラズマ放電処fi1−省
いて化学処理のみを行なった。
The plasma discharge treatment fi1- in the real jli+flll was omitted and only the chemical treatment was performed.

実施fI12 実施例1と同様1cプラズマ処理を行なった後、シラン
カップリング削8H6040C)IOIIE量パーセン
トのメタノールと水の1:111液に室温下で10分間
浸漬し、水洗、乾燥させた。
Implementation fI12 After performing 1C plasma treatment in the same manner as in Example 1, it was immersed for 10 minutes at room temperature in a 1:111 solution of methanol and water (8H6040C)IOIIE volume percent, washed with water, and dried.

前記処j18If基板上にコロイド銀のゼラチン溶液i
t燥@llO,5jmとなる様にワイヤ・バー−布した
Colloidal silver gelatin solution i on the treated j18If substrate
Wire bar cloth was made so that the thickness was 5 m.

実施例1〜2、比較9141〜2で得られた試料の乾燥
時接着特性を評価し、その結果を第1表に示した。
The dry adhesion properties of the samples obtained in Examples 1-2 and Comparative 9141-2 were evaluated, and the results are shown in Table 1.

第1表より、本発明に基づく、気体放電処理と化学処理
の組合せられたGflllrを用いた実施例1および2
の表面処理方法が極めて好ましい接着特性を示すことが
明らかである。
From Table 1, Examples 1 and 2 using Gfllr combined with gas discharge treatment and chemical treatment based on the present invention.
It is clear that the surface treatment method shown in Figure 1 shows very favorable adhesion properties.

なお、ここで評価し九ポリメチルメタクリレート基板か
らなる試料はすべて優れた透明性を有し、表肉処境によ
シ着色または白濁等の失透は全く鰺められなかった。
All of the samples evaluated here made of 9-polymethyl methacrylate substrates had excellent transparency, and no devitrification such as discoloration or cloudiness was observed in the surface area.

以下余白 第   1   表 ◎印 ・・・ 全く剥離はみられなかった。Margin below Chapter 1 Table ◎ mark: No peeling was observed.

()印 ・・・ 部分的な剥離がみられ友。Marked in parentheses: Partial peeling is observed.

X印 ・・・ 殆んど剥離した。X mark: Almost peeled off.

実施f13 実施例1において、−4液としてコロイド金のポリビニ
ルアルコール溶液を用いても優れた乾燥時接着特性を示
した。
Example f13 In Example 1, even when a polyvinyl alcohol solution of colloidal gold was used as the -4 liquid, excellent dry adhesive properties were exhibited.

実施1i14 実m9@iにおいて、ポリメチルメタクリレート基板の
かわりにポリカーボネート基板を用いても、同様に優れ
た接着特性を示し、透明性も損なわれなかった。
Even when a polycarbonate substrate was used in place of the polymethyl methacrylate substrate in Example 1i14 and m9@i, similarly excellent adhesive properties were exhibited, and transparency was not impaired.

実施例5 実施f11において、化学処理液として水酸化カリウム
水溶液のかわ如に12Nの硫!lIを用い、5分間浸漬
し友。以下同様にして―布試料を141九ところ、優れ
た接着特性を示した。
Example 5 In Example f11, 12N sulfur was added to the potassium hydroxide aqueous solution as the chemical treatment liquid. Soak for 5 minutes using lI. The following fabric samples were prepared in the same manner and exhibited excellent adhesive properties.

実施例6 清浄な8インチ角の1■屡のポリメチルメタクリレート
ート基板販のヴエーターフォーン(Vat−aphon
e ) 3 KWのコロナ放電処理機を用いて常圧下、
前記基板膜FIaをコロナ放電処理しえ。電極と基板膜
−との距離は1.5雪で2KWの出力で3化学処理以降
は、実施例1と同様に行なって、ms試料を得たところ
、優れた接着特性を示した。
Example 6 A clean 8-inch square polymethyl methacrylate substrate (Vat-aphon)
e) Under normal pressure using a 3 KW corona discharge treatment machine,
The substrate film FIa is subjected to a corona discharge treatment. The distance between the electrode and the substrate film was 1.5 cm, the output was 2 KW, and the third chemical treatment and subsequent treatments were carried out in the same manner as in Example 1 to obtain a ms sample, which showed excellent adhesion properties.

Claims (1)

【特許請求の範囲】[Claims] 有機高分子材料からなる基板表面を気体放電処理および
化学処理することを特徴とする基板の表−6場方法。
6. A method for manufacturing a substrate, which comprises subjecting the surface of the substrate made of an organic polymer material to gas discharge treatment and chemical treatment.
JP1335082A 1982-02-01 1982-02-01 Surface treatment of substrate Pending JPS58132029A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1335082A JPS58132029A (en) 1982-02-01 1982-02-01 Surface treatment of substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1335082A JPS58132029A (en) 1982-02-01 1982-02-01 Surface treatment of substrate

Publications (1)

Publication Number Publication Date
JPS58132029A true JPS58132029A (en) 1983-08-06

Family

ID=11830652

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1335082A Pending JPS58132029A (en) 1982-02-01 1982-02-01 Surface treatment of substrate

Country Status (1)

Country Link
JP (1) JPS58132029A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5922161A (en) * 1995-06-30 1999-07-13 Commonwealth Scientific And Industrial Research Organisation Surface treatment of polymers
JP2008144107A (en) * 2006-12-13 2008-06-26 Air Water Inc Surface treatment method and polarizing plate of triacetyl cellulose film
JP2015034285A (en) * 2013-07-10 2015-02-19 リケンテクノス株式会社 Method of producing easily-adhesive poly (meth) acryl imide film

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5922161A (en) * 1995-06-30 1999-07-13 Commonwealth Scientific And Industrial Research Organisation Surface treatment of polymers
JP2008144107A (en) * 2006-12-13 2008-06-26 Air Water Inc Surface treatment method and polarizing plate of triacetyl cellulose film
JP2015034285A (en) * 2013-07-10 2015-02-19 リケンテクノス株式会社 Method of producing easily-adhesive poly (meth) acryl imide film

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