JPS58196238A - Electroless plating process - Google Patents
Electroless plating processInfo
- Publication number
- JPS58196238A JPS58196238A JP7923282A JP7923282A JPS58196238A JP S58196238 A JPS58196238 A JP S58196238A JP 7923282 A JP7923282 A JP 7923282A JP 7923282 A JP7923282 A JP 7923282A JP S58196238 A JPS58196238 A JP S58196238A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- film
- electroless plating
- plating
- radically polymerizable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 15
- 238000007772 electroless plating Methods 0.000 title claims abstract description 10
- 239000000463 material Substances 0.000 claims abstract description 31
- 150000001875 compounds Chemical class 0.000 claims abstract description 16
- 239000004033 plastic Substances 0.000 claims abstract description 11
- 229920003023 plastic Polymers 0.000 claims abstract description 11
- -1 by coating Chemical compound 0.000 abstract description 10
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 5
- 239000011248 coating agent Substances 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 4
- 238000009499 grossing Methods 0.000 abstract 2
- 230000002411 adverse Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 238000007747 plating Methods 0.000 description 15
- 238000005406 washing Methods 0.000 description 13
- 238000005530 etching Methods 0.000 description 11
- 239000000126 substance Substances 0.000 description 11
- 238000010894 electron beam technology Methods 0.000 description 8
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 230000004913 activation Effects 0.000 description 3
- 150000001733 carboxylic acid esters Chemical class 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000007888 film coating Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- HODRTCMDYBNYNH-UHFFFAOYSA-N propan-2-one;prop-2-enoic acid Chemical compound CC(C)=O.OC(=O)C=C HODRTCMDYBNYNH-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000008313 sensitization Effects 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- LDCRTTXIJACKKU-ARJAWSKDSA-N dimethyl maleate Chemical compound COC(=O)\C=C/C(=O)OC LDCRTTXIJACKKU-ARJAWSKDSA-N 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、紫外線もしくは電子線等の活性光線を照射す
ることにより、グラスチック製基材に接触させたラジカ
ル重合性化合物をグラフトさせて表面改質を行なった該
基材上に無電解メッキする方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a glass substrate whose surface has been modified by grafting a radically polymerizable compound in contact with the glass substrate by irradiating it with actinic rays such as ultraviolet rays or electron beams. It relates to a method of electroless plating on materials.
本発明は、無電解メッキを簡略化することにより、無電
解メッキの効率化および物理的、化学的性能の改善にあ
る。従来のプラスチック等の高分子化合物への無電解メ
ッキは■脱脂、■エツチング(クロム酸混液に浸漬)、
■水洗(十分に)、■中和、■水洗、■感受性化、■水
洗、■活性化、■水洗、■化学メッキ、0水洗するとい
う長い工程がとられ、かつ、その条件が複雑であり、制
御が困難であるという問題点があった。特に工程■では
、被メッキ物に適合したエツチングを施し、被メツキ物
表面に化学的結合力を有するように活性化をはかりつつ
、表面の凹凸とその形状で付着力を増すようにし、更に
メッキ時の被メッキ物の水濡れ性を改良することである
。しかし、このエツチングはプラスチックメッキの場合
、最っとも律速となり、かつ下地を凹凸にするためメッ
キ膜の粗さを目立たせることになる。一般にグラスチッ
クでは親水性に乏しく、また金属イオンが析出して金属
膜となった時の該金属膜との付着力が得にくいので、プ
ラス、チックの種類によって強酸または強アルカリから
選ばれた液をエツチング剤として、この液中に70〜9
5℃位の高温下で処理し、粗面化することによって接着
力の増加をはかっている。エツチング条件は比較的過酷
な条件を必要としない場合でも数分以上はかかり槽が長
くなる。時間短縮のために条件を厳しくすれば表面粗さ
が大になり、用途が限られてくる。The present invention aims to improve the efficiency and physical and chemical performance of electroless plating by simplifying electroless plating. Conventional electroless plating on polymeric compounds such as plastics involves ■degreasing, ■etching (immersion in a chromic acid mixture),
■Water washing (sufficiently), ■Neutralization, ■Water washing, ■Sensitization, ■Water washing, ■Activation, ■Water washing, ■Chemical plating, and zero water washing are the long steps taken, and the conditions are complicated. , there was a problem that control was difficult. In particular, in step (2), etching is applied to suit the object to be plated, and the surface of the object to be plated is activated to have a chemical bonding force, while the unevenness and shape of the surface increase adhesion, and further plating is performed. The objective is to improve the water wettability of the object to be plated. However, in the case of plastic plating, this etching is most rate-limiting and makes the underlying surface uneven, making the roughness of the plating film more noticeable. In general, glass tiles have poor hydrophilicity, and when metal ions precipitate to form a metal film, it is difficult to obtain adhesion to the metal film. 70 to 9 as an etching agent in this solution.
The adhesive strength is increased by roughening the surface by treating it at a high temperature of about 5°C. Even when relatively harsh etching conditions are not required, it takes several minutes or more and the etching process becomes long. If the conditions are made stricter in order to shorten the time, the surface roughness will increase and the applications will be limited.
本発明者は以上の問題点を解決するために種々検討を重
ねた結果、従来法とは異なる次の発明をした。すなわち
、本発明は、紫外線もしくは電子線等の活性光線を照射
することにより、プラスチック製基材に接触させたラジ
カル重合性化合物をグラフト結合させて表面、改質を行
なった該基材上に無電解メッキする方法である。As a result of various studies to solve the above-mentioned problems, the present inventor has made the following invention which is different from the conventional method. That is, the present invention provides graft bonding of a radically polymerizable compound brought into contact with a plastic substrate by irradiating it with actinic rays such as ultraviolet rays or electron beams, thereby forming an inorganic material on the surface of the modified substrate. This is an electrolytic plating method.
プラスチック製基材の表面改質の方法としては、コロナ
放電処理、酸化処理、火炎処理、活性光線グラフト結合
、被膜塗布等の種々の表面処理方法が試みられている。Various surface treatment methods such as corona discharge treatment, oxidation treatment, flame treatment, actinic ray graft bonding, and film coating have been attempted as methods for surface modification of plastic substrates.
コロナ放電処理、酸化処理、火炎処理の諸方法は、基材
の化学的性質、機械的性質等を損う欠点を有している。The corona discharge treatment, oxidation treatment, and flame treatment methods have the disadvantage of impairing the chemical properties, mechanical properties, etc. of the substrate.
更に、コロナ放電処理では処理効果自身が小さい上、そ
の均一性と持続性が乏しいという難点がある。一方、被
膜塗布では高分子基材との接着性に問題があるばかりで
なく、ツーラスチック基材と塗布層との性質が異なると
いう2層構造性のために、処理された基材が固有の機械
的性質および化学的性質をかなり失なってしまうという
欠点を有している。なお、活性光線グラフト結合自身は
従来より知られているが、この方法では処理された基材
の性質が失なわれることも一般に少なく、良好な方法で
ある。Furthermore, corona discharge treatment has the disadvantage that the treatment effect itself is small and its uniformity and sustainability are poor. On the other hand, film coating not only has problems with adhesion to the polymeric substrate, but also has a two-layer structure in which the properties of the turastic substrate and the coating layer are different, so the treated substrate has its own unique characteristics. It has the disadvantage of considerably losing its mechanical and chemical properties. Incidentally, actinic ray graft bonding itself has been known for a long time, but this method generally causes less loss of properties of the treated base material and is therefore a good method.
本発明はグラフト結合による表面改質を行なうことによ
り、表面の物性が一都電わるが、基材の化学的性質およ
び機械的性質を保持しつつ、表面は平滑であるという特
徴を有する。また、エッチノブのような律速にはならず
効率的ICIIf&電解メッキを行うことができるもの
である。The present invention is characterized in that the physical properties of the surface are completely changed by surface modification by graft bonding, but the surface is smooth while maintaining the chemical and mechanical properties of the base material. Further, it does not become rate-limiting like an etch knob and can perform efficient ICIIf and electrolytic plating.
本発明に係わるプラスチック製基材としては、ポリエチ
レン、ポリプロピレン、エチレン−プロピレン共重合体
、ポリエステル、ポリカーボネート、ポリイミド、エポ
キシ樹脂等のフィルム、シート、板、その他成形品であ
り、2種以上の7ラスチツクを用いた基材でもよい。さ
らに、ガラス繊維、炭素繊維等により強化された、寸法
安定化した基材でもよい。本発明においては、表面改質
のため活性エネルギー線照射を行なうため、基材の形状
はフィルム、シート、板状のも、のが好ましい。本発明
で得られた、メッキされたテープ、シー、ト、ディスク
等は生産性、品質均一性の点で優位性を有するものであ
る。Plastic substrates according to the present invention include films, sheets, plates, and other molded products made of polyethylene, polypropylene, ethylene-propylene copolymer, polyester, polycarbonate, polyimide, epoxy resin, etc., and two or more types of 7 plastics. A base material using Furthermore, dimensionally stabilized substrates reinforced with glass fibers, carbon fibers, etc. may also be used. In the present invention, since active energy ray irradiation is performed for surface modification, the shape of the substrate is preferably a film, sheet, or plate. The plated tapes, sheets, discs, etc. obtained by the present invention are superior in terms of productivity and uniformity of quality.
本発明に係わるプラスチック製基材としては活性光線に
よりラジカル重合性化合物がグラフト結合し易く、かつ
、活性光線照射により劣化を受は難いグラスチックであ
ることが好ましく、また、電子線照射により劣化し易い
場合には、紫外線照射を用いることが望ましい。The plastic base material according to the present invention is preferably a glass material that is easy to graft-bond with radically polymerizable compounds by actinic rays and is not susceptible to deterioration by irradiation with actinic rays. If easy to do so, it is desirable to use ultraviolet irradiation.
本発明に用いられるラジカル重合性化合物としては、α
、β−エチレン性不飽和カルボン酸モジ〈ハα、β−エ
チレン性不飽和カルボン酸エステルを主とする単量体で
あり、α、β−エチレン性不飽和カルボン酸としてはア
クリル酸、メタクリル酸、イタコン酸、フマル酸、マレ
イン酸、無水マレイン酸等である。また、α、β−エチ
レン性不飽和カルボン酸エステルとしては、アクリル酸
メチル、メタクリル酸メチル、アクリル酸エチル、メタ
クリル酸エチル、アクリル酸ブチル、メタクリル酸ブチ
ル、フマル酸;舶し
ジメチル、マレイン酸モノ録、マレイン酸ジメチル等で
ある。ラジカル重合性化合物としては、α、β−エチレ
ン性不飽和カルボン酸もしくはα、β−エチレン性不飽
和カルボン酸エステル以外吟他のラジカル重合性化合物
を用いることが出来るが、その量は50重量%未満であ
る。金属との接着性の面から望ましくは、アクリル酸、
メタクリル酸、無水マレイン酸のようなカルボン酸が良
い。The radically polymerizable compound used in the present invention includes α
, β-ethylenically unsaturated carboxylic acid monomer (α, β-ethylenically unsaturated carboxylic acid ester); examples of α, β-ethylenically unsaturated carboxylic acids include acrylic acid and methacrylic acid. , itaconic acid, fumaric acid, maleic acid, maleic anhydride, etc. In addition, as α,β-ethylenically unsaturated carboxylic acid esters, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, fumaric acid; dimethyl maleate, etc. As the radically polymerizable compound, radically polymerizable compounds other than α,β-ethylenically unsaturated carboxylic acid or α,β-ethylenically unsaturated carboxylic acid ester can be used, but the amount thereof is 50% by weight. less than From the viewpoint of adhesion to metals, acrylic acid,
Carboxylic acids such as methacrylic acid and maleic anhydride are good.
表面改質において、必要に応じて用いられるラジカル重
合開始剤臀公知のものが用いられる。In surface modification, known radical polymerization initiators are used as needed.
例えば、ベンゾインエーテル類、アゾビスイソブチルニ
トリル類等の如く単独で使用できるもの、ベンゾフェノ
ン、アセトフェノン等の如く細分子の活性水素を引き抜
くことにより使用できるもの等があるが、電子線の場合
は必ずしも使用する必要がなく、紫外線の場合、ラジカ
ル重合性物質の種類と基材の種類との組み合せにより使
用しなくとも良い。For example, there are benzoin ethers, azobisisobutylnitrile, etc. that can be used alone, and benzophenone, acetophenone, etc. that can be used by abstracting active hydrogen from small molecules, but they are not necessarily used in the case of electron beams. In the case of ultraviolet rays, it is not necessary to use ultraviolet rays depending on the combination of the type of radically polymerizable substance and the type of base material.
本発明に用いられるラジカル重合性化合物単独で基材に
接触させることも可能であるが、基材表面に薄く塗布す
る(では溶剤を用いることが好ましい。溶剤としては、
基材表面を溶解変形させないものであシ、公知のものが
単独あるいは混合して用いられる。溶液の濃度は001
〜100重量%の範囲であり、望ましくは0.1〜10
重量%である。水、水と有機溶剤の混合物、水溶性溶剤
等は作業の安全性、経済性、後処理の面から有効である
。表面処理後、未反応物の除去が必要であり、水溶館弓
シカ〜重合性化合物、溶剤を用いた場合、水洗が可能で
あり、このような化合物を選択することができる。Although it is possible to bring the radically polymerizable compound used in the present invention into contact with the substrate alone, it is preferable to apply it thinly to the surface of the substrate (in this case, it is preferable to use a solvent. As the solvent,
Known materials that do not melt or deform the surface of the base material may be used alone or in combination. The concentration of the solution is 001
~100% by weight, preferably 0.1~10% by weight
Weight%. Water, a mixture of water and an organic solvent, a water-soluble solvent, etc. are effective from the viewpoints of work safety, economy, and post-treatment. After surface treatment, it is necessary to remove unreacted substances, and if a polymerizable compound or solvent is used, washing with water is possible, and such a compound can be selected.
本発明(Cおいて、ラジカル重合性化合物を基材表面に
接触させるには、塗布等のあらゆる手段が使用できるが
、塗布する場合、ロールコータ−170〜コーター、ス
プレー等公知の手段が用いられる。塗布の場合、接触さ
せる皮膜厚は1〜50μである。この塗膜上に約10μ
厚程度の保護層を設けることが望ましく、保護層として
はポリプロピレン、ポリエステル等が好ましい。保護層
で覆うことにより、ラジカル重合性化合物の揮散やはじ
き等がなくなるという利点がある。4朱浅層−・し貝?
1lIl訃、〜力・′叶hヒtすis4倉す3、本発明
に用いる紫外線の照射の1例を挙げると、2瞑の紫外線
ランプ5本を用い、基材表面とランプとの距離を12c
rnの場合、ラインスピードとして0.2〜20m/分
が望ましい。20 m 7分を超えると、十分な改質が
得られず0.2 m未満では基材の劣化を起こし、本来
の基材の性質を損う。電子線の照射の1例を挙げると、
0.1〜100Mrad の照射量が良好であるが、
基材嫁
の種l Vcより適宜選択することが望ましい。ポリエ
ステル製基材の場合は1〜5QMradが良好であり、
1Mrad未満では十分な改質が得られf 、50 M
r a dを超えるとラインスピートカ遅くなり、結
局、基材の劣化を起こす。In the present invention (C), any means such as coating can be used to bring the radically polymerizable compound into contact with the surface of the base material, but when coating, known means such as roll coater 170 to coater, spraying, etc. are used. In the case of coating, the thickness of the film to be contacted is 1 to 50μ.Approximately 10μ
It is desirable to provide a protective layer with a certain thickness, and the protective layer is preferably made of polypropylene, polyester, or the like. Covering with a protective layer has the advantage that volatilization and repelling of the radically polymerizable compound are eliminated. 4. Shuasa Formation - Shikai?
1LIL death, power -′ ′ 叶 す す す す 3 12c
In the case of rn, the line speed is preferably 0.2 to 20 m/min. If it exceeds 20 m for 7 minutes, sufficient modification will not be obtained, and if it is less than 0.2 m, the base material will deteriorate and the original properties of the base material will be impaired. To give an example of electron beam irradiation,
A dose of 0.1 to 100 Mrad is good, but
It is desirable to appropriately select the base material type from Vc. In the case of a polyester base material, 1 to 5Q Mrad is good;
Sufficient modification can be obtained at less than 1 Mrad f, 50 M
If r a d is exceeded, the line speaker becomes slow, eventually causing deterioration of the base material.
なお、活性光線として、場合によってはX線、α線等を
利用することも可能である。Note that, depending on the case, it is also possible to use X-rays, α-rays, etc. as the actinic light.
本発明では、基材に対し■1旨、■ラジカル重合性化合
物を接触させ、さらに保護フィルムで覆い、保護フィル
ムもしくは基材側から紫外線もしくは電子線等の活性光
線の照射、■感受性化、■水洗、■活性化、■水洗、■
化学メッキ、■水洗という工程で行い、■以降は従来と
同じ方法である。この工程で■はエツチングでないため
、表面の平滑性、基材の性質を保持しつつ、表面の改質
が起る。本発明の最大の特徴はエツチング操作をなくし
、基材の性質を保持しつつ、さらに表面凹凸を発生しな
い状態で無電解化学メッキでき−るというところにある
。また、基材の種類により、感受性化の操作を省略する
ことも可能である。In the present invention, (1) the substrate is brought into contact with (1) a radically polymerizable compound, further covered with a protective film, irradiated with actinic rays such as ultraviolet rays or electron beams from the protective film or the substrate side, (1) sensitized, (2) Washing with water, ■ Activation, ■ Washing with water, ■
The process is chemical plating, ■ washing with water, and the following steps are the same as conventional methods. In this step, since etching is not performed, the surface is modified while maintaining the surface smoothness and properties of the base material. The most important feature of the present invention is that it eliminates the etching operation and allows electroless chemical plating to be performed while retaining the properties of the base material and without generating surface irregularities. Furthermore, depending on the type of base material, it is also possible to omit the sensitization operation.
本発明によって得られるメッキ膜は均一でピンホールが
少なく、かつ付着力が大きいので、たとえば磁性金属(
Co、Ni、Feおよびこれらを主成分とする合金およ
び化合物)をメッキすることにより、磁気テープ、磁気
シート、磁気ディスクなどに有効である。また、銅など
をメッキし、後で必要なパターンにエツチングすればプ
リント回路に出来る。また、同様にパターンにして、プ
リント回路の焼付は用光学マスクにも出来る。本発明に
よれば、表面改質した部分のみしかメッキされないので
、両面メッキの有害な場合にはきわめて有効であり、磁
気記録体およびプリント回路などではきわめて有利であ
る。一方、従来のエツチング方法では片面のみ前処理す
ることは非常に困難であり、著しく利点がある。特に良
好な面は、エツチングしないためメッキ膜に凹凸がなく
、光沢が良好で、平滑性を求める磁気記録体ではきわめ
て有利でいため基板表面抵抗の低下がなく、電流漏洩の
トラブルが少ない。なお、基材の両面を1回の処理で行
なうことも出来る。The plating film obtained by the present invention is uniform, has few pinholes, and has strong adhesion.
Plating with Co, Ni, Fe, and alloys and compounds containing these as main components is effective for magnetic tapes, magnetic sheets, magnetic disks, etc. It can also be made into a printed circuit by plating it with copper or the like and later etching it into the required pattern. Furthermore, it can also be made into a pattern and used as an optical mask for printing printed circuits. According to the present invention, only the surface-modified portion is plated, so it is extremely effective in cases where double-sided plating is harmful, and is extremely advantageous for magnetic recording bodies and printed circuits. On the other hand, with conventional etching methods, it is very difficult to pre-process only one side, so this is a significant advantage. Particularly good aspects are that since no etching is performed, the plated film has no irregularities and has good gloss, which is extremely advantageous for magnetic recording materials that require smoothness, so there is no decrease in substrate surface resistance and there are fewer problems with current leakage. Note that it is also possible to treat both sides of the base material in one treatment.
さらに、本発明によりプラスチック袈基材に無電解メッ
キを行なった後、通常の電解メッキを行なうことも出来
る。Furthermore, after performing electroless plating on the plastic robe base material according to the present invention, normal electrolytic plating can be performed.
次に実施例を挙げて、さらに本発明の説明を行なう。Next, the present invention will be further explained with reference to Examples.
実施例1
2軸延伸したポリエチレンテレフタレートフィルム基材
(厚み70μ)を幅140WrM1長さゼン■製)を使
用してセンシタイジング2分間行なう。水洗後、レッド
シューマー(日本カニゼン昧製)を使用して、アクチペ
ーションヲ50℃、3分間行う。水洗後、ブルーシュー
マー(日本力×3ゼン■製)を使用して無電解化学メッ
キを60℃、1分間行ない、水洗する。十分風乾した後
、メッキ膜の機械的性質を調べるため、綿布で100回
こすった後の状態を観察したが良好であった。また、接
着性はセロファンテープ剥離を行なったが、剥れなかっ
た。Example 1 Sensitizing was carried out for 2 minutes using a biaxially stretched polyethylene terephthalate film base material (thickness 70 μm) with a width of 140 WrM and a length manufactured by Zen ■. After washing with water, activation is performed at 50° C. for 3 minutes using Red Schumer (manufactured by Nippon Kanizenmai). After washing with water, electroless chemical plating is performed at 60° C. for 1 minute using Blue Schumer (manufactured by Nippon Riki x 3 Zen ■), followed by washing with water. After sufficiently air-drying, the mechanical properties of the plating film were examined by rubbing it 100 times with a cotton cloth, and the condition was observed to be good. Further, the adhesiveness was tested by peeling off cellophane tape, but it did not peel off.
実施例1の0.1重量%のアクリル酸のアセトン溶液を
用いないで、電子線照射を行ない、メッキし、同様の操
作を行なう。メッキ膜は綿布で1回こすってはがれ、膜
の機械的強度及び接着性共に悪い結果であった。Electron beam irradiation and plating were carried out in the same manner as in Example 1 without using the 0.1% by weight acrylic acid acetone solution. The plated film was peeled off by rubbing once with a cotton cloth, and both the mechanical strength and adhesion of the film were poor.
実施例2
ポリイミドフィルム基材(KAPTONHタイプ東し■
製)を幅140fi、長さ140m1C切断様であった
。また、330℃のオープン中に20分間処理を行なっ
たが、フィルムの収縮した部分は見られたが、メッキ膜
との剥離は認められなかった。また、JISC6481
のはんだ耐熱性(260℃、60秒)の結果も良好であ
った。Example 2 Polyimide film base material (KAPTONH type East)
(manufactured by Manufacturer) was cut to a width of 140fi and a length of 140m1C. Further, the treatment was carried out for 20 minutes while the film was open at 330°C, and although some shrinkage of the film was observed, no peeling from the plating film was observed. Also, JISC6481
The results of soldering heat resistance (260° C., 60 seconds) were also good.
実施例3
こ
実施例2においてアクリル酸に代え島メタク(リル酸を
用いて同様の操作を行ない、試験したところ、同様結果
が得られ、良好であった。Example 3 The same procedure as in Example 2 was carried out using methacrylate (lyric acid) in place of acrylic acid, and the same results were obtained and the results were good.
実施例4
紫外線照射条件は2 KWの紫外線ランプ7本をフィル
ムの移動方向と垂直方向に並列に並べ、フィルムの移動
速度を10m/分にし、フィルムと紫外線ランプとの距
離を12c1nとする。ポリプロピレンフィルム(70
μ)の上に5μの厚さて、0,1重量%のアクリル酸の
アセトン溶液を塗布し、約10μのポリプロピレンフィ
ルムで覆う。この試料を上記の条件にて照射を行なう。Example 4 The ultraviolet irradiation conditions were as follows: seven 2 KW ultraviolet lamps were arranged in parallel in a direction perpendicular to the film movement direction, the film movement speed was 10 m/min, and the distance between the film and the ultraviolet lamp was 12c1n. Polypropylene film (70
A solution of 0.1% by weight acrylic acid in acetone is applied to a thickness of 5μ on top of the film and covered with a polypropylene film of about 10μ. This sample is irradiated under the above conditions.
水洗後、実施例1と同様の操作を行ない、試験したとこ
ろ、機械的性質、接着性共に良好な結果を示した。After washing with water, the same operation as in Example 1 was carried out and the test showed good results in both mechanical properties and adhesive properties.
実施例5
実施例2の0.1重量%のアクリル酸溶液の代わりに0
.055重量%アクリル酸溶液を用いて、同様の操作を
行ない、試験したところ、実施例2と同様の結果であり
、濃度の影響はほとんど認められなかった。Example 5 Instead of the 0.1% by weight acrylic acid solution of Example 2, 0
.. When a similar operation and test was performed using a 055% by weight acrylic acid solution, the results were similar to those in Example 2, and almost no influence of concentration was observed.
比較例2
実施例2の0.1重量%のアクリル酸のアセトン溶液を
用いないで、電子線照射を行ない、メッキして同様の操
作を行なった。機械的強度、接着性共に悪い結果であっ
た。Comparative Example 2 Electron beam irradiation was performed, plating was performed, and the same operation was performed without using the 0.1% by weight acrylic acid acetone solution of Example 2. Both mechanical strength and adhesion were poor.
実施例6
実施例1のポリエチレンテレフタレートフィルム基材に
代えてポリプロピレンフィルム基材(70μ)および電
子線照射2Q M r a dを用いて、同様の操作を
行ない、試験したところ、機械的強度、接着性共に良好
であった。Example 6 Similar operations were performed using a polypropylene film base material (70μ) and electron beam irradiation 2Q M r a d in place of the polyethylene terephthalate film base material of Example 1, and tests were conducted. Mechanical strength and adhesion were determined. Both genders were good.
特許出願人 東洋インキ製造株式会社patent applicant Toyo Ink Manufacturing Co., Ltd.
Claims (1)
を活性光線の照射によりグラフト結合させて表面改質を
行なった該基材上に無電解メッキすることを特徴とする
無電解メッキ方法。1. An electroless plating method, which comprises carrying out electroless plating on a plastic base material whose surface has been modified by graft bonding a radically polymerizable compound brought into contact with the base material by irradiation with actinic rays.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7923282A JPS58196238A (en) | 1982-05-13 | 1982-05-13 | Electroless plating process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7923282A JPS58196238A (en) | 1982-05-13 | 1982-05-13 | Electroless plating process |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58196238A true JPS58196238A (en) | 1983-11-15 |
JPH036225B2 JPH036225B2 (en) | 1991-01-29 |
Family
ID=13684130
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7923282A Granted JPS58196238A (en) | 1982-05-13 | 1982-05-13 | Electroless plating process |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58196238A (en) |
Cited By (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5912942A (en) * | 1982-07-09 | 1984-01-23 | インタ−ナシヨナル ビジネス マシ−ンズ コ−ポレ−シヨン | Method of adhering metal layer on polyester substrate |
EP0360112A2 (en) * | 1988-09-22 | 1990-03-28 | Miles Inc. | An article molded from a polycarbonate composition having improved platability |
US5087524A (en) * | 1988-09-22 | 1992-02-11 | Mobay Corporation | Article molded from a polycarbonate composition having improved platability |
FR2699927A1 (en) * | 1992-12-30 | 1994-07-01 | Hispano Suiza Sa | Assembling composite polyamide or polyimide unit and second unit |
JPH09214140A (en) * | 1995-11-29 | 1997-08-15 | Toppan Printing Co Ltd | Multilayered printed wiring board and its manufacture |
US5718981A (en) * | 1996-02-02 | 1998-02-17 | Eastman Kodak Company | Polyester photographic film support |
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JP2005347424A (en) * | 2004-06-01 | 2005-12-15 | Fuji Photo Film Co Ltd | Multi-layer printed wiring board and manufacturing method thereof |
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JP2010100671A (en) * | 2008-10-21 | 2010-05-06 | Toyobo Co Ltd | Polyimide film and production method thereof |
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JP2015527428A (en) * | 2012-06-29 | 2015-09-17 | ポリマーズ シーアールシー リミテッドPolymers CRC Ltd. | Method for modifying polymer surface |
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Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58100668A (en) * | 1981-12-09 | 1983-06-15 | Okuno Seiyaku Kogyo Kk | Composition for chemical plating |
-
1982
- 1982-05-13 JP JP7923282A patent/JPS58196238A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58100668A (en) * | 1981-12-09 | 1983-06-15 | Okuno Seiyaku Kogyo Kk | Composition for chemical plating |
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JPS6317905B2 (en) * | 1982-07-09 | 1988-04-15 | Intaanashonaru Bijinesu Mashiinzu Corp | |
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