JPH036225B2 - - Google Patents

Info

Publication number
JPH036225B2
JPH036225B2 JP57079232A JP7923282A JPH036225B2 JP H036225 B2 JPH036225 B2 JP H036225B2 JP 57079232 A JP57079232 A JP 57079232A JP 7923282 A JP7923282 A JP 7923282A JP H036225 B2 JPH036225 B2 JP H036225B2
Authority
JP
Japan
Prior art keywords
base material
film
plating
unsaturated carboxylic
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57079232A
Other languages
Japanese (ja)
Other versions
JPS58196238A (en
Inventor
Tadashi Ishibashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Ink SC Holdings Co Ltd
Original Assignee
Toyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg Co Ltd filed Critical Toyo Ink Mfg Co Ltd
Priority to JP7923282A priority Critical patent/JPS58196238A/en
Publication of JPS58196238A publication Critical patent/JPS58196238A/en
Publication of JPH036225B2 publication Critical patent/JPH036225B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明は、紫外線もしくは電子線等の活性光線
を照射することにより、プラスチツク製基材に接
触させたラジカル重合性化合物をグラフトさせて
表面改質を行なつた該基材上に無電解メツキする
方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a plastic substrate whose surface is modified by grafting a radically polymerizable compound in contact with the plastic substrate by irradiating it with actinic rays such as ultraviolet rays or electron beams. This relates to a method for electroless plating on materials.

本発明は、無電解メツキを簡略化することによ
り、無電解メツキの効率化および物理的、化学的
性能の改善にある。従来のプラスチツク等の高分
子化合物への無電解メツキは脱脂、エツチン
グ(クロム酸混液に浸漬)、水洗(十分に)、
中和、水洗、感受性化、水洗、活性化、
水洗、化学メツキ、水洗するという長い工
程がとられ、かつ、その条件が複雑であり、制御
が困難であるという問題点があつた。特に工程
では、被メツキ物に適合したエツチングを施し、
被メツキ物表面に化学的結合力を有するように活
性化をはかりつつ、表面の凹凸とその形状で付着
力を増すようにし、更にメツキ時の被メツキ物の
水濡れ性を改良することである。しかし、このエ
ツチングはプラスチツクメツキの場合、最つとも
律速となり、かつ下地を凹凸にするためメツキ膜
の粗さを目立たせることになる。一般にプラスチ
ツクでは親水性に乏しく、また金属イオンが析出
して金属膜となつた時の該金属膜との付着力が得
にくいので、プラスチツクの種類によつて強酸ま
たは強アルカリから選ばれた液をエツチング剤と
して、この液中に70〜95℃位の高温下で処理し、
粗面化することによつて接着力の増加をはかつて
いる。エツチング条件は比較的過酷な条件を必要
としない場合でも数分以上はかかり槽が長くな
る。時間短縮のために条件を厳しくすれば表面粗
さが大になり、用途が限られてくる。
The present invention aims to improve the efficiency and physical and chemical performance of electroless plating by simplifying electroless plating. Conventional electroless plating on polymeric compounds such as plastics involves degreasing, etching (soaking in a chromic acid mixture), rinsing (thoroughly),
Neutralization, washing with water, sensitization, washing with water, activation,
The problem was that it required a long process of washing with water, chemical plating, and washing with water, and the conditions were complex and difficult to control. In particular, in the process, etching is applied to match the object to be plated.
The purpose is to activate the surface of the object to be plated so that it has a chemical bonding force, increase the adhesion force with the unevenness and shape of the surface, and further improve the water wettability of the object to be plated during plating. . However, in the case of plastic plating, this etching becomes rate-limiting and makes the base uneven, making the roughness of the plating film noticeable. In general, plastics have poor hydrophilicity, and when metal ions precipitate to form a metal film, it is difficult to obtain adhesion to the metal film. As an etching agent, this solution is treated at a high temperature of about 70 to 95℃,
By roughening the surface, the adhesive strength is increased. Even when relatively harsh etching conditions are not required, it takes several minutes or more and the etching process becomes long. If the conditions are made stricter in order to shorten the time, the surface roughness will increase and the applications will be limited.

本発明者は以上の問題点を解決するために種々
検討を重ねた結果、従来法とは異なる次の発明を
した。すなわち、本発明は、紫外線もしくは電子
線等の活性光線を照射することにより、プラスチ
ツク製基材に接触させた、α,β−エチレン性不
飽和カルボン酸もしくはα,β−エチレン性不飽
和カルボン酸エステルを主とする単量体であるラ
ジカル重合性化合物をグラフト結合させて表面改
質を行なつた該基材上に無電解メツキする方法で
ある。
As a result of various studies to solve the above-mentioned problems, the present inventor has made the following invention which is different from the conventional method. That is, the present invention relates to the production of α,β-ethylenically unsaturated carboxylic acid or α,β-ethylenically unsaturated carboxylic acid, which is brought into contact with a plastic substrate by irradiation with actinic rays such as ultraviolet rays or electron beams. This is a method in which electroless plating is performed on the surface of the base material, which has been surface-modified by grafting a radically polymerizable compound, which is a monomer mainly composed of esters.

プラスチツク製基材の表面改質の方法として
は、コロナ放電処理、酸化処理、火災処理、活性
光線グラフト結合、被膜塗布等の種々の表面処理
方法が試みられている。コロナ放電処理、酸化処
理、火災処理の諸方法は、基材の化学的性質、機
械的性質等を損う欠点を有している。更に、コロ
ナ放電処理では処理効果自信が小さい上、その均
一性と持続性が乏しいという難点がある。一方、
被膜塗布では高分子基材との接着性に問題がある
ばかりでなく、プラスチツク基材と塗布層との性
質が異なるという2層構造性のために、処理され
た基材が固有の機械的性質および化学的性質をか
なり失なつてしまうという欠点を有している。な
お、活性光線グラフト結合自身は従来より知られ
ているが、この方法では処理された基材の性質が
失なわれることも一般に少なく、良好な方法であ
る。
Various surface treatment methods have been attempted to modify the surface of plastic substrates, such as corona discharge treatment, oxidation treatment, fire treatment, actinic radiation graft bonding, and film coating. Corona discharge treatment, oxidation treatment, and fire treatment methods have the disadvantage of impairing the chemical properties, mechanical properties, etc. of the substrate. Furthermore, the corona discharge treatment has the disadvantage that the treatment effect is not very reliable, and its uniformity and durability are poor. on the other hand,
In film application, not only is there a problem with adhesion to the polymeric substrate, but also the treated substrate has unique mechanical properties due to the two-layer structure in which the plastic substrate and the coating layer have different properties. It also has the disadvantage of considerably losing its chemical properties. Incidentally, actinic ray graft bonding itself has been known for a long time, but this method generally causes less loss of the properties of the treated base material and is therefore a good method.

本発明はグラフト結合による表面改質を行なう
ことにより、表面の物性が一部変わるが、基材の
化学的性質および機会的性質を保持しつつ、表面
は平滑であるという特徴を有する。また、エツチ
ングのような律速にはならず効率的に無電解メツ
キを行うことができるものである。
Although the physical properties of the surface are partially changed by surface modification by graft bonding, the present invention is characterized in that the surface is smooth while maintaining the chemical and mechanical properties of the base material. Furthermore, electroless plating can be carried out efficiently without being rate-limiting like etching.

本発明に係わるプラスチツク製基材としては、
ポリエチレン、ポリプロピレン、エチレン−プロ
ピレン共重合体、ポリエステル、ポリカーボネー
ト、ポリイミド、エポキシ樹脂等のフイルム、シ
ート、板、その他成形品であり、2種以上のプラ
スチツクを用いた基材でもよい。さらに、ガス繊
維、炭素繊維等により強化された、寸法安定化し
た基材でもよい。本発明においては、内面改質の
ため活性エネルギー線照射を行なうため、基材の
形状はフイルム、シート、板状のものが好まし
い。本発明で得られた、メツキされたテープ、シ
ート、デイスク等は生産性、品質均一性の点で優
位性を有するものである。
The plastic base material according to the present invention includes:
These include films, sheets, plates, and other molded products made of polyethylene, polypropylene, ethylene-propylene copolymer, polyester, polycarbonate, polyimide, epoxy resin, etc., and may also be base materials using two or more types of plastics. Furthermore, dimensionally stabilized substrates reinforced with gas fibers, carbon fibers, etc. may also be used. In the present invention, since active energy ray irradiation is performed to modify the inner surface, the shape of the base material is preferably a film, sheet, or plate. The plated tapes, sheets, disks, etc. obtained by the present invention are superior in terms of productivity and uniformity of quality.

本発明に係わるプラスチツク製基材としては活
性光線によりラジカル重合性化合物がグラフト結
合し易く、かつ、活性光線照射により劣化を受け
難いプラスチツクであることが好ましく、また、
電子線照射により劣化し易い場合には、紫外線照
射を用いることが望ましい。
The plastic base material according to the present invention is preferably a plastic that allows radically polymerizable compounds to be easily graft-bonded by actinic rays and is resistant to deterioration by irradiation with actinic rays.
If the material is easily deteriorated by electron beam irradiation, it is desirable to use ultraviolet irradiation.

本発明に用いられるラジカル重合性化合物とし
ては、α、β−エチレン性不飽和カルボン酸もし
くはα、β−エチレン性不飽和カルボン酸エステ
ルを主とする単量体であり、α、β−エチレン性
不飽和カルボン酸としてはアクリル酸、メタクリ
ル酸、イタコン酸、フマル酸、マレイン酸、無水
マレイン酸等である。また、α、β−エチレン性
不飽和カルボン酸エステルとしては、アクリル酸
メチル、メタクリル酸メチル、アクリル酸エチ
ル、メタクリル酸エチル、アクリル酸ブチル、メ
タクリル酸ブチル、フマル酸ジメチル、マレイン
酸モノエチル、マレイン酸ジメチル等である。ラ
ジカル重合性化合物としては、α、β−エチレン
性不飽和カルボン酸もしくはα、β−エチレン性
不飽和カルボン酸エステル以外に他のラジカル重
合性化合物を用いることが出来るが、その量は50
重量%未満である。金属との接着性の面から望ま
しくは、アクリル酸、メタクリル酸、無水マレイ
ン酸のようなカルボン酸が良い。
The radically polymerizable compound used in the present invention is a monomer mainly composed of α,β-ethylenically unsaturated carboxylic acid or α,β-ethylenically unsaturated carboxylic acid ester, Examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, fumaric acid, maleic acid, and maleic anhydride. In addition, as α,β-ethylenically unsaturated carboxylic acid esters, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, dimethyl fumarate, monoethyl maleate, maleic acid dimethyl etc. As the radical polymerizable compound, other radical polymerizable compounds can be used in addition to α, β-ethylenically unsaturated carboxylic acid or α, β-ethylenically unsaturated carboxylic acid ester, but the amount thereof is 50
less than % by weight. From the viewpoint of adhesion to metals, carboxylic acids such as acrylic acid, methacrylic acid, and maleic anhydride are preferable.

表面改質において、必要に応じて用いられるラ
ジカル重合開始剤は公知のものが用いられる。例
えば、ベンゾインエーテル類、アゾビスイソブチ
ルニトリル類等の如く単独で使用できるもの、ベ
ンゾフエノン、アセトフエノン等の如く他分子の
活性水素を引き抜くことにより使用できるもの等
があるが、電子線の場合は必ずしも使用する必要
がなく、紫外線の場合、ラジカル重合性物質の種
類と基材の種類との組み合せにより使用しなくと
も良い。
In surface modification, known radical polymerization initiators are used as needed. For example, there are benzoin ethers, azobisisobutylnitrile, etc. that can be used alone, and benzophenone, acetophenone, etc. that can be used by abstracting active hydrogen from other molecules, but they are not necessarily used in the case of electron beams. In the case of ultraviolet rays, it is not necessary to use ultraviolet rays depending on the combination of the type of radically polymerizable substance and the type of base material.

本発明に用いられるラジカル重合性化合物単独
で基材に接触させることも可能であるが、基材表
面に薄く塗布するには溶剤を用いることが好まし
い。溶剤としては、基材表面を溶解変形させない
ものであり、公知のものが単独あるいは混合して
用いられる。溶液の濃度は0.01〜100重量%の範
囲であり、望ましくは0.1〜10重量%である。水、
水と有機溶剤の混合物、水溶性溶剤等は作業の安
全性、経済性、後処理の面から有効である。表面
処理後、未反応物の除去が必要であり、水溶性の
ラジカル重合性化合物、溶剤を用いた場合、水洗
が可能であり、このような化合物を選択すること
ができる。
Although it is possible to bring the radically polymerizable compound used in the present invention into contact with the substrate alone, it is preferable to use a solvent in order to apply it thinly to the surface of the substrate. The solvent is one that does not dissolve or deform the surface of the base material, and known solvents may be used alone or in combination. The concentration of the solution ranges from 0.01 to 100% by weight, preferably from 0.1 to 10% by weight. water,
Mixtures of water and organic solvents, water-soluble solvents, etc. are effective from the viewpoints of work safety, economy, and post-treatment. After surface treatment, it is necessary to remove unreacted substances, and when a water-soluble radically polymerizable compound or solvent is used, washing with water is possible, and such a compound can be selected.

本発明において、ラジカル重合性化合物を基材
表面に接触させるには、塗布等のあらゆる手段が
使用できるが、塗布する場合、ロールコーター、
フローコーター、スプレー等公知の手段が用いら
れる。塗布の場合、接触させる被膜厚は1〜50μ
である。この塗膜上に約10μ厚程度の保護層を設
けることが望ましく、保護層としてはポリプロピ
レン、ポリエステル等が好ましい。保護層で覆う
ことにより、ラジカル重合性化合物の揮散やはじ
き等がなくなるという利点がある。保護層にも無
電解メツキが可能となる場合もある。
In the present invention, any means such as coating can be used to bring the radically polymerizable compound into contact with the surface of the base material.
Known means such as a flow coater and spray can be used. In the case of coating, the thickness of the film to be contacted is 1 to 50μ
It is. It is desirable to provide a protective layer with a thickness of about 10 μm on this coating film, and the protective layer is preferably made of polypropylene, polyester, or the like. Covering with a protective layer has the advantage that volatilization and repelling of the radically polymerizable compound are eliminated. Electroless plating may also be possible for the protective layer.

本発明に用いる紫外線の照射の1例を挙げる
と、2KWの紫外線ランプ5本を用い、基材表面
とランプとの距離を12cmの場合、ラインスピード
として0.2〜20m/分が望ましい。20m/分を超
えると、十分な改質が得られず0.2m未満では基
材の劣化を起こし、本来の基材の性質を損う。電
子線の照射の1例を挙げると、0.1〜100Mradの
照射量が良好であるが、基材の種類により適宜選
択することが望ましい。ポリエステル製基材の場
合は1〜50Mradが良好であり、1Mrad未満では
十分な改質が得られず、50Mradを超えるとライ
ンスピードが遅くなり、結局、基材の劣化を起こ
す。
To give an example of ultraviolet irradiation used in the present invention, when five 2KW ultraviolet lamps are used and the distance between the substrate surface and the lamps is 12 cm, the line speed is preferably 0.2 to 20 m/min. If it exceeds 20 m/min, sufficient modification will not be obtained, and if it is less than 0.2 m/min, the base material will deteriorate and lose its original properties. As an example of electron beam irradiation, an irradiation amount of 0.1 to 100 Mrad is suitable, but it is desirable to select the appropriate amount depending on the type of the base material. In the case of a polyester base material, 1 to 50 Mrad is good; if it is less than 1 Mrad, sufficient modification will not be obtained, and if it exceeds 50 Mrad, the line speed will slow down, eventually causing deterioration of the base material.

なお、活性光線として、場合によつてはX線、
α線等を利用することも可能である。
In addition, in some cases, X-rays,
It is also possible to use alpha rays, etc.

本発明では、基材に対し脱脂、ラジカル重
合性化合物を接触させ、さらに保護フイルムで覆
い、保護フイルムもしくは基材側から紫外線もし
くは電子線等の活性光線の照射、感受性化、
水洗、活性化、水洗、化学メツキ、水洗
という工程で行い、以降は従来と同じ方法であ
る。この工程ではエツチングでないため、表面
の平滑性、基材の性質を保持しつつ、表面の改質
が起る。本発明の最大の特徴はエツチング操作を
なくし、基材の性質を保持しつつ、さらに表面凹
凸を発生しない状態で無電解化学メツキできると
いうところにある。また、基材の種類により、感
受性化の操作を省略することも可能である。
In the present invention, the base material is degreased and brought into contact with a radically polymerizable compound, further covered with a protective film, and irradiated with actinic rays such as ultraviolet rays or electron beams from the protective film or the base material side, sensitized,
The process consists of washing with water, activation, washing with water, chemical plating, and washing with water, and the rest is the same as the conventional method. Since this step does not involve etching, surface modification occurs while maintaining the surface smoothness and properties of the base material. The most important feature of the present invention is that it eliminates the etching operation and allows electroless chemical plating to be performed while retaining the properties of the base material and without generating surface irregularities. Furthermore, depending on the type of base material, it is also possible to omit the sensitization operation.

本発明によつて得られるメツキ膜は均一でピン
ホールが少なく、かつ付着力が大きいので、たと
えば磁性金属(Co、Ni、Feおよびこれらを主成
分とする合金および化合物)をメツキすることに
より、磁気テープ、磁気シート、磁気デイスクな
どに有効である。また、銅などをメツキし、後で
必要なパターンにエツチングすればプリント回路
に出来る。また、同様にパターンにして、プリン
ト回路の焼付け用光学マスクにも出来る。本発明
によれば、表面改質した部分のみしかメツキされ
ないので、両面メツキの有害な場合にはきわめて
有効であり、磁気記録体およびプリント回路など
ではきわめて有利である。一方、従来のエツチン
グ方法では片面のみ前処理することは非常に困難
であり、著しく利点がある。特に良好な面は、エ
ツチングしないためメツキ膜に凹凸がなく、光沢
が良好で、平滑性を求める磁気記録体ではきわめ
て有利である。プリント回路で強力なエツチング
工程で浸漬する強酸もしくは強アルカリが残存し
ないため基板表面抵抗の低下がなく、電流漏洩の
トラブルが少ない。なお、基材の両面を1回の処
理で行なうことも出来る。
The plating film obtained by the present invention is uniform, has few pinholes, and has a strong adhesive force. Effective for magnetic tapes, magnetic sheets, magnetic disks, etc. It can also be made into a printed circuit by plating it with copper or the like and later etching it into the required pattern. It can also be made into a pattern and used as an optical mask for printing printed circuits. According to the present invention, only the surface-modified portion is plated, so it is extremely effective in cases where double-sided plating is harmful, and is extremely advantageous for magnetic recording bodies and printed circuits. On the other hand, with conventional etching methods, it is very difficult to pre-process only one side, so this is a significant advantage. A particularly good surface is that it does not undergo etching, so the plating film has no irregularities and has good gloss, which is extremely advantageous for magnetic recording materials that require smoothness. Since there is no residual strong acid or strong alkali that is used in the strong etching process for printed circuits, there is no decrease in board surface resistance and there are fewer problems with current leakage. Note that it is also possible to treat both sides of the base material in one treatment.

さらに、本発明によりプラスチツク製基材に無
電解メツキを行なつた後、通常の電解メツキを行
なうことも出来る。
Further, after electroless plating has been performed on a plastic substrate according to the present invention, normal electrolytic plating can be performed.

次に実施例を挙げて、さらに本発明の説明を行
なう。
Next, the present invention will be further explained with reference to Examples.

実施例 1 2軸延伸したポリエチレンテレフタレートフイ
ルム基材(厚み70μ)を幅140mm、長さ140mmに切
断し、0.1重量%のアクリル酸のアセトン溶液を
3μの厚さに塗布し、保護層のポリエチレンテレ
フタレートフイルム(厚み15μ)で覆い、試料と
する。電子線照射20Mradを行ない、保護層を除
去し、水洗する。この試料を感受性付与処理液を
ピンクシューマー(商品名 日本カニゼン(株)製)
を使用してセンシタイジング(感受性付与)2分
間行なう。水洗後、活性化処理液レツドシユーマ
ー(商品名 日本カニゼン(株)製)を使用して、ア
クチベーシヨン(活性化)を50℃、3分間行う。
水洗後、無電解ニツケルメツキ液(商品名 日本
カニゼン(株)製)を使用して無電解化学メツキを60
℃、1分間行ない、水洗する。十分風乾した後、
メツキ膜の機械的性質を調べるため、綿布で100
回こすつた後の状態を観察したが良好であつた。
また、接着性はセロフアンテープ剥離を行なつた
が、剥れなかつた。
Example 1 A biaxially stretched polyethylene terephthalate film base material (thickness 70μ) was cut into 140 mm width and 140 mm length, and a 0.1 wt% acrylic acid solution in acetone was added to the base material.
Coat it to a thickness of 3μ, cover with a protective layer of polyethylene terephthalate film (thickness 15μ), and use it as a sample. Perform electron beam irradiation at 20 Mrad, remove the protective layer, and wash with water. This sample was treated with a sensitizing treatment solution called Pink Schumer (trade name, manufactured by Nippon Kanigen Co., Ltd.).
Sensitize for 2 minutes using After washing with water, activation is performed at 50° C. for 3 minutes using an activation treatment solution, Red Shumer (trade name, manufactured by Nippon Kanigen Co., Ltd.).
After washing with water, apply electroless chemical plating for 60 minutes using electroless nickel plating liquid (product name: Nippon Kanigen Co., Ltd.).
℃ for 1 minute, then rinse with water. After thoroughly air drying,
In order to investigate the mechanical properties of the mesh film,
The condition after rubbing was observed, and it was found to be in good condition.
Further, the adhesive property was tested by peeling off cellophane tape, but it did not peel off.

比較例 1 実施例1の0.1重量%のアクリル酸のアセトン
溶液を用いないで、電子線照射を行ない、メツキ
し、同様の操作を行なう。メツキ膜は綿布で1回
こすつてはがれ、膜の機械的強度及び接着性共に
悪い結果であつた。
Comparative Example 1 Electron beam irradiation was performed and plating was performed without using the 0.1% by weight acetone solution of acrylic acid in Example 1, and the same operation was performed. The plating film was peeled off by rubbing it once with a cotton cloth, and the mechanical strength and adhesion of the film were poor.

実施例 2 ポリイミドフイルム基材(商品名 KAPTON
Hタイプ 東レ・デユポン(株)製)を幅140mm、長
さ140mmに切断し、0.1重量%のアクリル酸のアセ
トン溶液を3μの厚さに塗布し、保護層のポリエ
チレンフイルム(厚み15μ)を上に覆つて試料と
する。電子線照射40Mradを行ない、保護層を除
去し、水洗する。無電解化学メツキは実施例1と
同様に行う。結果は実施例1と同様であつた。ま
た、330℃のオーブン中に20分間処理を行なつた
が、フイルムの収縮した部分は見られたが、メツ
キ膜との剥離は認められなかつた。また、
JISC6481のはんだ耐熱性(260℃、60秒)の結果
も良好であつた。
Example 2 Polyimide film base material (product name KAPTON)
H type (manufactured by Toray Dupont Co., Ltd.) was cut into 140 mm width and 140 mm length, and a 0.1% by weight acetone solution of acrylic acid was applied to a thickness of 3μ, and a protective layer of polyethylene film (thickness 15μ) was placed on top. cover it with water and use it as a sample. Perform electron beam irradiation at 40 Mrad, remove the protective layer, and wash with water. Electroless chemical plating is carried out in the same manner as in Example 1. The results were similar to Example 1. Further, the film was treated in an oven at 330°C for 20 minutes, and although some shrinkage of the film was observed, no peeling from the plating film was observed. Also,
The results of JISC6481 soldering heat resistance (260°C, 60 seconds) were also good.

実施例 3 実施例2においてアクリル酸に代えてメタクリ
ル酸を用いて同様の操作を行ない、試験したとこ
ろ、同様結果が得られ、良好であつた。
Example 3 When the same operation as in Example 2 was carried out using methacrylic acid instead of acrylic acid and the test was conducted, the same results were obtained and the results were good.

実施例 4 紫外線照射条件は2KWの紫外線ランプ7本を
フイルムの移動方向と垂直方向に並列に並べ、フ
イルムの移動速度を10m/分にし、フイルムと紫
外線ランプとの距離を12cmとする。ポリプロピレ
ンフイルム(70μ)の上に5μの厚さで、0.1重量%
のアクリル酸のアセトン溶液を塗布し、約10μの
ポリプロピレンフイルムで覆う。この試料を上記
の条件にて照射を行なう。水洗後、実施例1と同
様の操作を行ない、試験したところ、機械的性
質、接着性共に良好な結果を示した。
Example 4 The ultraviolet irradiation conditions were as follows: seven 2KW ultraviolet lamps were arranged in parallel in a direction perpendicular to the film movement direction, the film movement speed was 10 m/min, and the distance between the film and the ultraviolet lamp was 12 cm. 5μ thick on polypropylene film (70μ), 0.1% by weight
Apply an acetone solution of acrylic acid and cover with approximately 10μ polypropylene film. This sample is irradiated under the above conditions. After washing with water, the same operation as in Example 1 was carried out and the test showed good results in both mechanical properties and adhesive properties.

実施例 5 実施例2の0.1重量%のアクリル酸溶液の代わ
りに0.05重量%のアクリル酸溶液を用いて、同様
の操作を行ない、試験したところ、実施例2と同
様の結果であり、濃度の影響はほとんど認められ
なかつた。
Example 5 A similar operation was carried out using a 0.05% by weight acrylic acid solution in place of the 0.1% by weight acrylic acid solution in Example 2, and the test was conducted. The results were the same as in Example 2, and the concentration was Almost no effect was observed.

比較例 2 実地例2の0.1重量%のアクリル酸のアセトン
溶液を用いないで、電子線照射を行ない、メツキ
して同様の操作を行なつた。機械的強度、接着性
共に悪い結果であつた。
Comparative Example 2 The same operation as in Practical Example 2 was performed without using the 0.1% by weight acrylic acid acetone solution, but with electron beam irradiation and plating. The results were poor in both mechanical strength and adhesiveness.

実施例 6 実施例1のポリエチレンテレフタレートフイル
ム基材に代えてポリプロピレンフイルム基材
(70μ)および電子線照射20Mradを用いて、同様
の操作を行ない、試験したところ、機械的強度、
接着性共に良好であつた。
Example 6 Similar operations were performed using a polypropylene film base material (70μ) and electron beam irradiation of 20 Mrad in place of the polyethylene terephthalate film base material of Example 1, and the results showed that the mechanical strength,
Both adhesion properties were good.

Claims (1)

【特許請求の範囲】[Claims] 1 ポリエチレン、ポリプロピレン、エチレン−
プロピレン共重合体、ポリエステル、ポリカーボ
ネート、ポリイミド、エポキシ樹脂等のフイル
ム、シート、板、その他成形品、2種以上のプラ
スチツクを用いた基材、さらにまたはガラス繊
維、炭素繊維等により強化されたプラスチツク製
基材に接触させた、α,β−エチレン性不飽和カ
ルボン酸もしくはα,β−エチレン性不飽和カル
ボン酸エステル単量体であるラジカル重合性化合
物の0.1〜10重量%溶液を保護層で覆い、活性光
線の照射によりグラフト結合させて表面改質を行
つた該基材上に無電解メツキをすることを特徴と
する無電解メツキ方法。
1 Polyethylene, polypropylene, ethylene-
Films, sheets, plates, and other molded products made of propylene copolymers, polyesters, polycarbonates, polyimides, epoxy resins, etc., base materials made of two or more types of plastics, or plastics reinforced with glass fibers, carbon fibers, etc. A 0.1 to 10% by weight solution of a radically polymerizable compound that is an α,β-ethylenically unsaturated carboxylic acid or α,β-ethylenically unsaturated carboxylic acid ester monomer is brought into contact with the substrate and covered with a protective layer. An electroless plating method, which comprises performing electroless plating on the base material whose surface has been modified by graft bonding by irradiation with actinic rays.
JP7923282A 1982-05-13 1982-05-13 Electroless plating process Granted JPS58196238A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7923282A JPS58196238A (en) 1982-05-13 1982-05-13 Electroless plating process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7923282A JPS58196238A (en) 1982-05-13 1982-05-13 Electroless plating process

Publications (2)

Publication Number Publication Date
JPS58196238A JPS58196238A (en) 1983-11-15
JPH036225B2 true JPH036225B2 (en) 1991-01-29

Family

ID=13684130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7923282A Granted JPS58196238A (en) 1982-05-13 1982-05-13 Electroless plating process

Country Status (1)

Country Link
JP (1) JPS58196238A (en)

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Patent Citations (1)

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