JPS58130578A - Selenium optical battery - Google Patents
Selenium optical batteryInfo
- Publication number
- JPS58130578A JPS58130578A JP57011747A JP1174782A JPS58130578A JP S58130578 A JPS58130578 A JP S58130578A JP 57011747 A JP57011747 A JP 57011747A JP 1174782 A JP1174782 A JP 1174782A JP S58130578 A JPS58130578 A JP S58130578A
- Authority
- JP
- Japan
- Prior art keywords
- selenium
- layer
- deposited
- work function
- high work
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 title claims abstract description 49
- 229910052711 selenium Inorganic materials 0.000 title claims abstract description 49
- 239000011669 selenium Substances 0.000 title claims abstract description 49
- 230000003287 optical effect Effects 0.000 title abstract description 4
- 239000002184 metal Substances 0.000 claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 239000010408 film Substances 0.000 claims abstract description 9
- 239000010409 thin film Substances 0.000 claims abstract description 7
- 239000013078 crystal Substances 0.000 claims abstract description 5
- 239000004065 semiconductor Substances 0.000 claims abstract description 5
- 239000012780 transparent material Substances 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 abstract description 5
- 239000011521 glass Substances 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 3
- 238000002834 transmittance Methods 0.000 abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000010030 laminating Methods 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- ZIJTYIRGFVHPHZ-UHFFFAOYSA-N selenium oxide(seo) Chemical compound [Se]=O ZIJTYIRGFVHPHZ-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0272—Selenium or tellurium
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は第■族元素であるセレンを母材料として使用し
fc光電池に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an FC photovoltaic cell using selenium, a Group I element, as a matrix material.
従来、セレン光電池は光電変換素子としてセンサ素子の
一翼を担って来たが、そのエネルギー変換効率が低いこ
とから、安価で信頼性が高いにもかかわらず応用分野が
自から限られていた。変換効率が低ぐなる原因は、光電
池の母材である枯Ji’1化セレン膜および使用電極材
料の低い導電率に起因する光電池内部の直列抵抗の増大
によること仁j。Conventionally, selenium photovoltaic cells have played a role in sensor elements as photoelectric conversion elements, but their low energy conversion efficiency has limited their field of application despite their low cost and high reliability. The cause of the low conversion efficiency is an increase in the series resistance inside the photovoltaic cell due to the low conductivity of the dry selenium monoxide film that is the base material of the photovoltaic cell and the electrode material used.
明らかであった。直列抵抗を減少させる最も簡単で、し
かも確実な手段性光電池の基板上に形成する結晶化セレ
ン膜の膜厚を薄くすることである。It was obvious. The simplest and most reliable way to reduce series resistance is to reduce the thickness of the crystallized selenium film formed on the substrate of the photovoltaic cell.
基板上に真空蒸着法等によって成膜された時ノリでのセ
レン膜は非晶質であり、薄膜化するととtよ可能である
が、セレンの導電率を5〜6桁上昇さぐる目的で熱処理
によシ結晶化させる際に、基板からセレンが剥離もしく
は不連続になり、技術的に安定に光電池が作製できる結
晶化したセレン薄膜9を形成することができなかった。When a selenium film is formed on a substrate by vacuum evaporation, etc., it is amorphous, and it is possible to make it thinner, but heat treatment is required to increase the conductivity of selenium by 5 to 6 orders of magnitude. During crystallization, selenium peeled off or became discontinuous from the substrate, making it impossible to form a crystallized selenium thin film 9 that would allow a technically stable photovoltaic cell to be produced.
本発明は高導電率、高透過率をもつ基板を一方の電極材
料として用い、その上に結晶化セレン薄膜を技術的に安
定に形成し、これを利用して2RL、い構造をもつ高効
率のセレン光電池を提供することを目的とするものであ
る。本発明により、高効率セレン光電池が従来利用でき
ない分野にも、センサならびにエネルギー変換素子とし
て提供することができ、更に、豊富に存在するセレン物
質の有効利用を拡大することができる。The present invention uses a substrate with high conductivity and high transmittance as one electrode material, forms a technically stable crystallized selenium thin film on the substrate, and utilizes this to create a highly efficient 2RL structure. The purpose of the present invention is to provide a selenium photovoltaic cell. According to the present invention, high-efficiency selenium photovoltaic cells can be provided as sensors and energy conversion elements in fields where conventional selenium photovoltaic cells cannot be used, and furthermore, the effective use of abundant selenium substances can be expanded.
Jノを本発明の実施例について詳述し、併せてその光電
特性を説明する。Examples of the present invention will be described in detail, and the photoelectric characteristics thereof will also be explained.
本発明による高効率のセレン光電池の構造例を第1図に
z+: している。この実施例に用いられたセレン層1
は、高導電率及び高光透過率を有する材料層2を被着し
た透明材料としてのガラス基板3の光入射面と反対側に
位置するその材料層2側の表面に真空蒸着された。セレ
ン層1は160℃乃至200℃の温度で熱処理され、ア
モルファスから結晶に変換された。通常のセレン電池で
は、電力出力に寄与するセレン層の厚みは数十μm程度
である。An example of the structure of a highly efficient selenium photovoltaic cell according to the present invention is shown in FIG. Selenium layer 1 used in this example
was vacuum-deposited on the surface of the glass substrate 3, which is a transparent material on which the material layer 2 having high electrical conductivity and high light transmittance is coated, and which is located on the side opposite to the light incident surface of the material layer 2. The selenium layer 1 was heat treated at a temperature of 160° C. to 200° C. to convert it from amorphous to crystalline. In a typical selenium battery, the thickness of the selenium layer that contributes to power output is approximately several tens of micrometers.
第1図に示されたセレン電池では、セレン層1のJIJ
みは2乃至5μmであり、代表例としては4μmである
。このような薄層は、光電池の直列抵抗を低くするため
に必要である。さらに、ある金属又は半導体の超薄膜(
厚さは100A程度)4がセレン層lの導電性を改善す
るために光透過性基板(2゜3)■二に真空蒸着又はス
パッタリングで被着されている。セレン層1の背面への
オーミック電画(;の設置は、高仕事関数金属を用いて
行なわれ−Cいる。電極6と高光透過率を有する材料層
2と(′ζは外部導線5a、5bがそれぞれ接続されて
いる。In the selenium battery shown in FIG. 1, the JIJ of selenium layer 1 is
The thickness is 2 to 5 μm, typically 4 μm. Such thin layers are necessary to reduce the series resistance of the photovoltaic cell. Furthermore, ultra-thin films of certain metals or semiconductors (
A layer (having a thickness of about 100 A) 4 is deposited on a light-transmissive substrate (2° 3) by vacuum deposition or sputtering to improve the conductivity of the selenium layer 1. The installation of an ohmic electrode (; on the back side of the selenium layer 1 is carried out using a high work function metal -C). are connected to each other.
第2図は、太陽光シミュレータによるAMIの入射光に
おける本発明のセレン光電池の電流(I) −(V)特
性を示している。開放端電圧、閉路短、隋)v;電流密
度、及び曲線因子(F、F)は、それぞ77.0.4〜
0.5 V 、 9−10 mA/cm”、 0.4〜
0.5 であった。FIG. 2 shows the current (I)-(V) characteristics of the selenium photovoltaic cell of the present invention under the incident light of the AMI using a sunlight simulator. Open end voltage, closed circuit short, SUI)v; current density, and fill factor (F, F) are respectively 77.0.4 ~
0.5 V, 9-10 mA/cm", 0.4~
It was 0.5.
平均変換効率は反射防止膜なしで2.5%であ・′ンた
。The average conversion efficiency was 2.5% without an antireflection coating.
AMI効率は従来の光電池に比べて十倍程度改1!υN
れた。本発明により、セレンが所望の効率をイfする太
陽電池に用いられて成功を収めたことになるが、その効
率改善の主要な理由は、セレン層のII厚み及び光透過
膜に起因する直列抵抗の減少及び対向電極6におけるミ
ラー効果に基づく光電流の増加である。AMI efficiency is about 10 times higher than conventional photovoltaic cells! υN
It was. According to the present invention, selenium has been successfully used in solar cells to achieve the desired efficiency, but the main reason for the efficiency improvement is due to the II thickness of the selenium layer and the series This is a decrease in resistance and an increase in photocurrent due to the mirror effect at the counter electrode 6.
第3図は、この光電池の暗時におけるI−V特性の1例
を示す。白丸は順方向特性を示し、黒丸は逆方向特性で
ある。順方向において、理想ダイオードからのずれを示
すn値は0.3V〜0,5v間で約1.7である。この
n値は、セレン層内の粒界におけるキャリヤの再結合に
よるものと思われる。FIG. 3 shows an example of the IV characteristics of this photovoltaic cell in the dark. White circles indicate forward characteristics, and black circles indicate reverse characteristics. In the forward direction, the n value indicating the deviation from the ideal diode is approximately 1.7 between 0.3V and 0.5V. This n value is believed to be due to carrier recombination at grain boundaries within the selenium layer.
セレン材料を用いる利点は、大面積光電池を容易に製造
できることである。また、セレン膜の作成及び膜質の改
善によって効果V14%近くまで到達するものと思われ
る。An advantage of using selenium material is that large area photovoltaic cells can be easily manufactured. Furthermore, it is thought that the effect V will reach nearly 14% by creating a selenium film and improving the film quality.
々お、従来のセレン光電池は照度1000ル、クス。The conventional selenium photovoltaic cell has an illuminance of 1000 l.
負荷抵抗1にΩ、繰り返し周波数100Hzにおける応
答時間τ針、τdが第4図に示すように遅い欠点があっ
たが、本発明のセレン光電池では同じ測定条件で第5図
に示すように応答時間τ2.τdが約1/2となって、
ンリコン光電池と同等になった。光センサー又は光と電
気信号との変換に利用される可能性を示している。Although the response time τ and τd at a load resistance 1 of Ω and a repetition frequency of 100 Hz were slow as shown in Figure 4, the selenium photocell of the present invention had a slow response time as shown in Figure 5 under the same measurement conditions. τ2. τd becomes about 1/2,
It has become equivalent to the non-condensed photocell. It shows the possibility of being used as an optical sensor or for converting light and electrical signals.
さらに、前記のように、セレンを蒸着する代シに、セレ
ンをいれるつは並ひにセレンの表面を所要の温度以下に
保てばスパッタリングによってセレン層を作ることがで
きる。この場合には、形成されるセレン層が順次に結晶
化されるので、160℃〜200℃の熱処理による結晶
化を省くことが出来て製造工程が簡易になる利点がある
。Furthermore, as described above, instead of depositing selenium, a selenium layer can be formed by sputtering if selenium is added and the surface of the selenium is kept at a predetermined temperature or lower. In this case, since the selenium layer formed is sequentially crystallized, crystallization by heat treatment at 160° C. to 200° C. can be omitted, which has the advantage of simplifying the manufacturing process.
第1図は本発明の実施例を示す縦断面図、第2図及び第
3図、第4図及び第5図は従来及び本発明によるセレン
光電池の特性例を示す特性図及び波形図である。
1・・・セレン結晶膜、 2・・・透明導電層(電V
i)、3・・・ガラス基板、 4・・・金属又は牛導
体薄、シ1.5a、5b・・・外部導線、 6・・
・高仕事関数金+r5 ran(電極)。
特許出願人 国 岡 昭 夫
代理人 大塚 学
外1名
第 II¥1
第3 関
V(Vl
や4 図
第 5 閃
0.4m9 0.45m!ii手続
補正書(自発)
昭)157年3月1 日
特許庁長官 島 1)春 樹 殿
l 事件の表示
特願昭57−011747号
2 発明の名称
セレン光電池
3 補正をする者
事件との関係 出願人
国 岡 昭 夫
4代理人
東京都新宿区西新宿1−23−1
5、補IEの対象
明細書の「発明の詳細な説明」の欄
6、補正の内容
明細書の記載を次のように訂正する。
(1)第3頁、第12行と第14行〔セレン電池〕企〔
セレン光電池〕に訂正する。
(2)第4頁、第6行〔電流(I)−]の次に[1iL
b〕を挿入する。FIG. 1 is a longitudinal sectional view showing an embodiment of the present invention, and FIGS. 2, 3, 4, and 5 are characteristic diagrams and waveform charts showing characteristic examples of selenium photovoltaic cells according to the conventional and the present invention. . 1...Selenium crystal film, 2...Transparent conductive layer (electronic V
i), 3...Glass substrate, 4...Metal or cow conductor thin, 1.5a, 5b...External conductor, 6...
- High work function gold + r5 ran (electrode). Patent applicant Country Akio Oka Agent Otsuka 1 off-campus person No. II ¥1 3rd Seki V (Vl Ya 4 Figure 5 Flash 0.4m9 0.45m!ii Procedural amendment (voluntary) Showa) March 1, 157 Japan Patent Office Commissioner Shima 1) Haruki Tono Indication of the case Patent Application No. 1987-011747 2 Name of the invention Selenium photocell 3 Person making the amendment Relationship to the case Applicant Akio Oka 4 Agent Nishi, Shinjuku-ku, Tokyo Shinjuku 1-23-1 5, column 6 of "Detailed Description of the Invention" of the subject specification of the Supplementary IE, the statement in the description of the contents of the amendment is corrected as follows. (1) Page 3, lines 12 and 14 [Selenium battery]
selenium photocell]. (2) Page 4, line 6 [Current (I)-] is followed by [1iL
b].
Claims (1)
透明導電層と、該透明導電層上に形成された金属または
半導体薄膜と、該金属又は半導体薄膜上に形成されたセ
レン結晶膜と、該セレン結晶模上に形成された高仕事関
数金属層と、前記透明導電層と前記高仕事関数金属層と
にそれぞれ設けら引た外部導線対とを備えたセレン光電
池。A substrate made of a transparent material through which light enters, a transparent conductive layer formed on the substrate, a metal or semiconductor thin film formed on the transparent conductive layer, and a selenium crystal film formed on the metal or semiconductor thin film. A selenium photovoltaic cell comprising: a high work function metal layer formed on the selenium crystal pattern; and a pair of external conductive wires respectively provided on the transparent conductive layer and the high work function metal layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57011747A JPS58130578A (en) | 1982-01-29 | 1982-01-29 | Selenium optical battery |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57011747A JPS58130578A (en) | 1982-01-29 | 1982-01-29 | Selenium optical battery |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58130578A true JPS58130578A (en) | 1983-08-04 |
JPS629239B2 JPS629239B2 (en) | 1987-02-27 |
Family
ID=11786607
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57011747A Granted JPS58130578A (en) | 1982-01-29 | 1982-01-29 | Selenium optical battery |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58130578A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61226975A (en) * | 1985-03-30 | 1986-10-08 | Moririka:Kk | Pull color sensor |
JPS61226974A (en) * | 1985-03-30 | 1986-10-08 | Moririka:Kk | Selenium photodiode |
EP0276683A2 (en) * | 1987-01-14 | 1988-08-03 | Hitachi, Ltd. | Photoelectric conversion device |
US5101255A (en) * | 1987-01-14 | 1992-03-31 | Sachio Ishioka | Amorphous photoelectric conversion device with avalanche |
JP2014216502A (en) * | 2013-04-25 | 2014-11-17 | 日本放送協会 | Photoelectric conversion element and manufacturing method therefor |
-
1982
- 1982-01-29 JP JP57011747A patent/JPS58130578A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61226975A (en) * | 1985-03-30 | 1986-10-08 | Moririka:Kk | Pull color sensor |
JPS61226974A (en) * | 1985-03-30 | 1986-10-08 | Moririka:Kk | Selenium photodiode |
EP0276683A2 (en) * | 1987-01-14 | 1988-08-03 | Hitachi, Ltd. | Photoelectric conversion device |
US5101255A (en) * | 1987-01-14 | 1992-03-31 | Sachio Ishioka | Amorphous photoelectric conversion device with avalanche |
JP2014216502A (en) * | 2013-04-25 | 2014-11-17 | 日本放送協会 | Photoelectric conversion element and manufacturing method therefor |
Also Published As
Publication number | Publication date |
---|---|
JPS629239B2 (en) | 1987-02-27 |
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