JPS58125963A - Charge transfer image pickup device - Google Patents

Charge transfer image pickup device

Info

Publication number
JPS58125963A
JPS58125963A JP57008178A JP817882A JPS58125963A JP S58125963 A JPS58125963 A JP S58125963A JP 57008178 A JP57008178 A JP 57008178A JP 817882 A JP817882 A JP 817882A JP S58125963 A JPS58125963 A JP S58125963A
Authority
JP
Japan
Prior art keywords
shift register
region
charge transfer
channel
horizontal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57008178A
Other languages
Japanese (ja)
Inventor
Ikuo Akiyama
秋山 郁男
Yasuo Ishihara
石原 保雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP57008178A priority Critical patent/JPS58125963A/en
Publication of JPS58125963A publication Critical patent/JPS58125963A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/148Charge coupled imagers
    • H01L27/14887Blooming suppression

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

PURPOSE:To eliminate the lateral drift which is porduced when a subject of high luminance is photographed, by making a channel width at the junction part between a vertical shift register group and a horizontal shift register less than the channel width of the vertical shift register group. CONSTITUTION:The channel width WV' is reduced fro a region 61 close to a channel region 24 of a horizontal shift register in a channel region 60 of a vertical shift register. As a result, the channel potential phiV of a region 71 (61) is set slightly lower than the channel potential phiH of a region 71 (24). Therefore the width WV' is selected so that the channel potential difference phiV'-phiH between regions 70 and 71 is sufficiently higher than the level of the maximum signal charge of a charge transfer image pickup device. Thus the charge transfer of the horizontal shift register is carried out only at the region 71. Then a part of the signal charge never gets into the region 70. As a resutl, the lateral drift caused when a subject of high luminance is photographed is completely eliminated. At the same time, a part of the signal charge is never injected into a well 73 under a vertical charge transfer electrode 22. This eliminates the generation of a lateral linear pseudo signal.

Description

【発明の詳細な説明】 不発明は電荷転送装置を用いた固体撮像装置に関するも
の′tある。固体撮像装置は、小型軽量、低消費電力、
高信頼性t−特徴とし、しかも撮像管におけるような焼
き付きの心配もないため、近年。
DETAILED DESCRIPTION OF THE INVENTION The invention relates to a solid-state imaging device using a charge transfer device. Solid-state imaging devices are small, lightweight, low power consumption,
In recent years, it has been characterized by high reliability and there is no worry about burn-in like in image pickup tubes.

多方面にわたって研究開発がなされている。Research and development is being carried out in many fields.

@1図は上述した電荷転送撮像装置のうち、イyp−ラ
イン転送方式と呼ばれるものの櫃略図であり、複数列の
電荷転送装置から放る垂直シフトレジスタ群lOと、各
垂直シフトレジスタの片側に隣接して配置された充電変
換素子群11亡、各垂直シフトレジスタの一端に電気的
に結合した水平シフトレジスタ12と、水平シフトレジ
スタ12の一端に設けられた電荷検出部13から構成さ
nている。
Figure @1 is a schematic diagram of one of the charge transfer imaging devices described above, which is called an yp-line transfer method. It consists of a group of charging conversion elements 11 arranged adjacent to each other, a horizontal shift register 12 electrically coupled to one end of each vertical shift register, and a charge detection section 13 provided at one end of the horizontal shift register 12. There is.

第2図は第1図に示す電荷転送撮像装置のうち垂直シフ
トレジスタ群10と水平シフトレジスタ12との結合領
域14の拡大図であり、垂直シフトレジスタl0IDチ
ヤネル領域20d垂直電荷転送電極21.22と%垂直
シフトレジスタ1Gから水平シフトレジスタ12への信
号電荷の転送を制御する垂直トランス71ゲート電極2
3で被われている。また水平シフトレジスタ12のチャ
ネル領域24は水平電荷転送電1i25.26.27.
28.29で被われている。さらに同図において、チャ
ネル領域20 t)末端O領域30t−水平電荷転送電
極27の一部で被うことにより、垂直シフトレジスタ1
Gと水平シフトレジスタ12が電気的に結合さnてiる
・第3図は第2図に示す結合領域の1−1線上の断面を
模式的に示したtのである。半導体基板31の主面W−
は絶縁層32′を介して上述した垂直電荷転送電極21
b 22s垂直トランスフアゲート電極23゜水平電荷
転送電極27が形成されている。また上記や各電極下に
は1例えば基板半導体とは反対の導電型tもっ埋込みチ
ャネル層33が形放さn、またチャネル領域の外側には
例えば埋込みチャネル層33の不純物と反対の導電型不
純物tドーピングしたチャネルストップ領域34が形成
されている。また半導体の主面は例えば金属層35で光
遮蔽されている。同図において領域36は垂直シフトレ
ジスタと水平シフトレジスタを電気的に結合している第
2図の領域30 k示し、また領域37は水平シフトレ
ジスタOチャネル領域を示しているー かかる構造の電荷転送撮像装置の動作は、第1図におい
て光電変換素子群11に入射光量に応じて蓄積さまた信
号電荷が映儂信号υフレーム周期。
FIG. 2 is an enlarged view of the coupling region 14 between the vertical shift register group 10 and the horizontal shift register 12 in the charge transfer imaging device shown in FIG. and % Vertical transformer 71 gate electrode 2 that controls the transfer of signal charges from the vertical shift register 1G to the horizontal shift register 12
Covered by 3. Further, the channel region 24 of the horizontal shift register 12 has horizontal charge transfer voltages 1i25.26.27.
It is covered by 28.29. Furthermore, in the same figure, by covering the channel region 20t) with the terminal O region 30t and a part of the horizontal charge transfer electrode 27, the vertical shift register 1
G and the horizontal shift register 12 are electrically coupled. FIG. 3 schematically shows a cross section of the coupling region shown in FIG. 2 on the line 1--1. Principal surface W− of semiconductor substrate 31
is the vertical charge transfer electrode 21 mentioned above via the insulating layer 32'.
b 22s vertical transfer gate electrode 23° horizontal charge transfer electrode 27 is formed. Further, below the above and each electrode, a buried channel layer 33 having a conductivity type t opposite to that of the substrate semiconductor is formed, and outside the channel region, for example, an impurity t having a conductivity type opposite to that of the buried channel layer 33 is formed. A doped channel stop region 34 is formed. Further, the main surface of the semiconductor is shielded from light by, for example, a metal layer 35. In the figure, region 36 represents the region 30k of FIG. 2 that electrically couples the vertical shift register and the horizontal shift register, and region 37 represents the horizontal shift register O channel region - charge transfer imaging of such a structure. The operation of the device is shown in FIG. 1, in which signal charges are accumulated in the photoelectric conversion element group 11 according to the amount of incident light and the signal charges are accumulated in the photoelectric conversion element group 11 according to the image signal υ frame period.

あるいはフィールド周期ごとに対応する垂直シフトレジ
スタ群lOへ読み出されたのち、映倫信号の水平走査周
期(IH)ごとに前記垂直シフトレジメタ群10内を並
列に下方向に一次転送される。
Alternatively, after being read out to the corresponding vertical shift register group 10 for each field period, the signals are primarily transferred downward in parallel within the vertical shift register group 10 for each horizontal scanning period (IH) of the video signal.

垂直シフトレジスタ群10の末端1で転送さnた信号電
荷は、垂直トランスフ1ゲート電極23がオン状態とな
る水平走査周期(IH)ごとに水平シフトレジスタ12
へ並列に注入され、!1.水平シフトレジスタ12へ送
られた信号電荷は、次の周期で垂直シフトレジスタ群1
0から信号電荷が転送されてぐる間に1水千方向に順次
転送され、電荷検出部13から映倫信号として外部へ取
り出される・ この様な従来の電荷転送撮像装置では、高輝度被写体を
撮像した場合などに、映像が横方向に流n72:o、あ
るいは映像の前に横線状の偽信号が現われたりする一撮
像動作上好ましくない現象が見受けらnた。この現象は
前記電荷転送撮像装置を単板カラーカメラに応用した場
合など、色ずれ、ある匹は色のシェーデングの原因とも
なっていた。
The signal charge transferred at the end 1 of the vertical shift register group 10 is transferred to the horizontal shift register 12 every horizontal scanning period (IH) when the vertical transfer 1 gate electrode 23 is in the ON state.
Injected in parallel to ! 1. The signal charges sent to the horizontal shift register 12 are transferred to the vertical shift register group 1 in the next cycle.
Signal charges are transferred from 0 to 1,000 directions, and are taken out from the charge detection unit 13 as an image signal. In such conventional charge transfer imaging devices, high-brightness objects are imaged. In some cases, an undesirable phenomenon in terms of imaging operation has been observed, such as the image flowing in the horizontal direction or a horizontal line-like false signal appearing in front of the image. This phenomenon causes color shift and, in some cases, color shading when the charge transfer imaging device is applied to a single-chip color camera.

前記現象は第2図あるいは第3図に示す垂直シフトレジ
スタと水平シフトレジスタの結合領域の構造に起因する
ものである、l!4図(at、 (bl、(clは[e
現象を説明するためW−第3図に示す結合領域の断面図
の各部分における電位分布を模式的に示した翫ので、第
4図[al、 lblは垂直電荷転送電極21゜22と
水平電荷転送電極27がオン状態で、垂直トランスフ1
ゲート電@23がオフ状態となる時点の電位分布を示し
、第4図(c)は水平電荷転送電極27だけが前記状態
からオフ状態に変移し友時点の電位分布を示している。
The above phenomenon is caused by the structure of the coupling region of the vertical shift register and horizontal shift register shown in FIG. 2 or 3. Figure 4 (at, (bl, (cl) [e
In order to explain the phenomenon, the potential distribution in each part of the cross-sectional view of the coupling region shown in FIG. 3 is schematically shown in FIG. When the transfer electrode 27 is on, the vertical transfer 1
The potential distribution at the time when the gate electrode @23 is in the OFF state is shown, and FIG. 4(c) shows the potential distribution at the time when only the horizontal charge transfer electrode 27 changes from the above state to the OFF state.

また第5図はチャネル領域の層ξこの瀕埴でのチャネル
電位の関係を示す図である。以後、第2図、第3図、第
4図及び第5図を用いて前記現象を説明する。
Further, FIG. 5 is a diagram showing the relationship between the channel potentials in the layer ξ of the channel region. Hereinafter, the above phenomenon will be explained using FIGS. 2, 3, 4, and 5.

まず第4図(a)において第3図に示す領域36のチャ
ネル電位ψVが領域37のチャネル電位ψ8に比べて小
さいのは、第2図に示す領域3Qvチャネル幅Wvが水
平シフトレジスタυチャネル領域24の幅WHに比べて
小でいためである1丁なわちra5図においてチャネル
51w1!rvする領域のチャネル電位はψ□であるが
、チャネル幅Wvt肩する領域のチャネル電位ψVは狭
チャネル効果により上記チャネル電位ψMよりも小さく
なる−このため第4図(!l)において水平シフトレジ
スタのチャネル領域37χ上記2つのチャネル電位差ψ
□−ψV工り4小さなレベルの信号電荷が転送さnる場
合には、信号電荷は領域36に入いり込まず、効率の良
い転送が行なわれる。ところが同図(b)に示すように
信号電荷のレベルが上記電位差ψ8−ψvt越える程大
きくなると、上記信号電荷の一部は領域36へ入いり込
み、水平シフトレジスタの転送効率を蓄しく劣化さぜる
7これが前述した高輝f被写体撮像時の映僚の接方向へ
の流n。
First, in FIG. 4(a), the channel potential ψV of the region 36 shown in FIG. 3 is smaller than the channel potential ψ8 of the region 37 because the channel width Wv of the region 3Qv shown in FIG. 24, which is smaller than the width WH of the channel 51w1! The channel potential of the rv region is ψ□, but the channel potential ψV of the region shouldering the channel width Wvt becomes smaller than the channel potential ψM due to the narrow channel effect. Channel region 37χ The above two channel potential difference ψ
When signal charges with a small level of □-ψV are transferred, the signal charges do not enter the region 36, and efficient transfer is performed. However, as shown in FIG. 6(b), when the level of the signal charge increases to the extent that it exceeds the above potential difference ψ8−ψvt, a part of the signal charge enters the region 36, accumulating and deteriorating the transfer efficiency of the horizontal shift register. This is the tangential flow of the imager when photographing a high brightness object as described above.

原因となっていた。さらに同図(e)に示すように水平
電荷転送電極27がオフ状態となると、領域36へ入い
つ込んだ信号電荷の一部は垂直トランスファゲート23
下のバリア40 k乗り越えて垂直電荷転送電極22下
V】ウェル41へ注入される7ウエル41へ注入された
偽の信号電荷は垂直トランスファゲート電極23がオン
状態となるタイミングで再び水平シフトレジスタへ注入
さn、あたかも真の信号電荷であるように撮る舞う、こ
れが前述した高暉度触写体撮像時の横線−ヒの偽信号の
発生原因となっていた。
It was the cause. Furthermore, when the horizontal charge transfer electrode 27 is turned off as shown in FIG.
The false signal charges injected into the well 41 are transferred to the horizontal shift register again at the timing when the vertical transfer gate electrode 23 is turned on. The injected signal charges are photographed as if they were real signal charges, which is the cause of the generation of false horizontal line signals when the high-intensity tactile object is imaged.

不発明の目的は上記の欠点を無くした高品質な電荷転送
礒(#!Ic置χ提供する0とにある。
The object of the invention is to provide a high quality charge transfer device which eliminates the above-mentioned drawbacks.

不発明によれば、同一基板上に形成された電荷転送装置
から放る複数列の垂直シフトレジスタ群ξ、前記垂直シ
フトレジスタ群に対応して配置さnた光電変換素子群と
、前記垂直シフトレジスゲ群の一端に隣接して設けられ
た電荷転送水平シフトレジスタと、前記垂直シフトレジ
スタ群の末端のチャネル領域を前記水平シフトレジスタ
の水平電荷転送電極の一部で被うことにより設けられた
前記垂直シフトレジスタ群d前配水平ンフトレジスタと
の結合部と、前記水平シオトレジスタの一端に設けられ
た電荷検出部とから成る電荷転送撮像装置であって、前
記結合重のチャネル電位が前記電荷転送撮像装置の最大
信号電荷が前記水平シフトレジスタへ転送でnたときの
前記水平電荷転送電極下のチャネル電位より小さくなる
ように。
According to the invention, a plurality of columns of vertical shift register groups ξ emitted from a charge transfer device formed on the same substrate, n photoelectric conversion element groups arranged corresponding to the vertical shift register groups, and the vertical shift register groups ξ a charge transfer horizontal shift register provided adjacent to one end of the group; and a charge transfer horizontal shift register provided by covering a channel region at the end of the vertical shift register group with a part of the horizontal charge transfer electrode of the horizontal shift register. A charge transfer imaging device comprising a coupling portion with a front horizontal shift register and a charge detection portion provided at one end of the horizontal shift register, wherein the channel potential of the coupling layer is set to the charge transfer imaging device. so that the maximum signal charge of the device is smaller than the channel potential under the horizontal charge transfer electrode when transferred to the horizontal shift register.

前記結合部のチャネル@τ前記垂直シフトレジスタ群の
チャネル幅に比べて狭くしたことt特徴とする電荷転送
撮像装置が得られる。
A charge transfer imaging device is obtained in which the channel width of the coupling portion is narrower than the channel width of the vertical shift register group.

次に不発明の実施例につnて図面を用いて説明する一 本発明の基本構成は、従来例の第1図とほぼ同一である
。第6図は本発明化よる電荷転送撮像装置のうち第1図
に示す垂直シフトレジスタ群10七水平シフトレジスタ
12との結合@憤14の拡大図であ0.従来例の第2図
に対応している。また同図において第2図と同一番号の
ものは同−接置要素を示している。同図において垂直シ
フトレジスタのチャネル領域60は垂直電荷転送電極2
1゜22と、aXシフトレジスタから水平シフトレジス
タへの信号電荷の転送で制御する垂直トランスファゲー
ト電極23で被わnてお9、さらにチャネル領域60の
うち水平シフトレジスタのチャネル領域24に近い領域
61のチャネル幅Wv は、第2図に示す従来例の領域
30のチャネル幅W7に比べて狭められている。また水
平シフトレジスメのチャネル領域24は水平電荷転送電
極25゜26.27,28.29で被わnている。さら
に同図において、前記領域61は水平電荷転送電極27
の一部で嬢われており、これにエリ垂直シフトレジスタ
と水平シフトレジスタが電気的に結合重nている。第7
図は第6肉に示す結合領域のVl、−Vl線上の断面を
模式的に示した−ので、従来例の@3図に対応している
。半導体基板31の主面には絶縁層32g介して上述し
た垂直電荷転送電極21%22%垂直トランスファゲー
ト電極23.水平電荷転送1i1ff127が形成され
ている。また上記の各電極下には、例えば基板半導体ξ
は反対の導電型tもつ埋込みチャネル層33が形成さn
%またチャネル領域の外@には例えば埋込みチャネル層
33の不純物と反対の導電型不純物tドーピングしたチ
ャネルストップ領域34が形成さ几ている。また半導体
υ主面は例えば金属層35で光遮蔽されている。同図に
おいて領域70は垂直シフトレジスタ上水平シフトレジ
ス4vt気的に結合している第6図の領域61′@−示
し、また領域71に’X水平シフトレジスタのチャネル
領域W示している。
Next, a non-inventive embodiment will be described with reference to the drawings.The basic configuration of the present invention is almost the same as that of the conventional example shown in FIG. FIG. 6 is an enlarged view of the combination of the vertical shift register group 10 and the horizontal shift register 12 shown in FIG. 1 in the charge transfer imaging device according to the present invention. This corresponds to FIG. 2 of the conventional example. Further, in this figure, the same numbers as in FIG. 2 indicate the same attached elements. In the figure, the channel region 60 of the vertical shift register is the vertical charge transfer electrode 2.
1° 22 and a vertical transfer gate electrode 23 that controls the transfer of signal charges from the aX shift register to the horizontal shift register 9, and a region of the channel region 60 that is close to the channel region 24 of the horizontal shift register. The channel width Wv of 61 is narrower than the channel width W7 of the conventional region 30 shown in FIG. Further, the channel region 24 of the horizontal shift register is covered with horizontal charge transfer electrodes 25°26.27, 28.29. Furthermore, in the same figure, the area 61 is the horizontal charge transfer electrode 27
A vertical shift register and a horizontal shift register are electrically connected to this part. 7th
The figure schematically shows a cross section on the line Vl and -Vl of the joint region shown in the sixth part, and thus corresponds to Figure @3 of the conventional example. The above-mentioned vertical charge transfer electrode 21%22% vertical transfer gate electrode 23. is formed on the main surface of the semiconductor substrate 31 with an insulating layer 32g interposed therebetween. A horizontal charge transfer 1i1ff127 is formed. Furthermore, under each of the above electrodes, for example, the substrate semiconductor ξ
A buried channel layer 33 having the opposite conductivity type t is formed.
Also, outside the channel region, a channel stop region 34 doped with, for example, an impurity of a conductivity type opposite to that of the buried channel layer 33 is formed. Further, the main surface of the semiconductor υ is shielded from light by, for example, a metal layer 35. In the figure, a region 70 shows the region 61'@- of FIG. 6 where the vertical shift register and the horizontal shift register 4vt are electrically connected, and a region 71 shows the channel region W of the horizontal shift register.

かかる構造の電荷転送撮像装置の動作は、第1図、第2
図及び+ll!3図の従来例とほぼ同様なため、ここで
は第8図を用いて水平シフトレジスタでの電荷転送V模
様を説明するに止める1丁なわち第8図は第7図に示す
結合頭載の断面図の各部分における電位分布を模式的に
示したもので、垂直電荷転送電極21.22と水平電荷
転送電極27がオン状態で、垂直トランスフ1ゲート電
極23がオフ状態となる時点の電位分布を示している一 本発明の最大の特徴は狭チャネル効果を積極的に利用し
て、第8図に示す領域70のチャネル電位9: t−領
域710チャネル電位ψHvc比べて十分小さくしてい
る点である。すなわち第5図におiテチャネル鳴WVt
有する従来例の領域30のチャネル電位にψVであるが
、チャネル幅全W′V  に1で狭めた不発明による領
域61のチャネル電位?Vセ狭チーYネル効果により上
記チャネル電位ψ1より更に小さくなっている。そこで
第8図において領域70と領域71のチャネル電位差ψ
+V−ψ□が、不発明による電荷転送撮イ象装置の最大
信号電荷のレベルに比べて十分大さくなるよりI′l−
上記領域61のチャネル幅W、i選べば、水平シフトレ
ジスタでの電荷転送(1チ〒ネル領域71のみで行なわ
れ、信号電荷(h一部が領域70へ入いり込むこともな
くなる。よって不発明による電荷転送撮像容置でに水平
シフトレジスタでの電荷転送が効率良く行なわ几、従来
例にあった高輝度被写体撮像時の映像の横方向への流れ
は完全になくなる・′!た信号電荷の一部が垂直トラン
スファゲート23下のバリア72を乗り越えて垂直電荷
転送電極22下のウェル73へ注入場nることもないの
で、従来例にあった高輝度被写体撮像時の横線状の偽信
号の発生も完全に防止で14゜ 以上(/、Jように不発明ML工nは偽信号が発生しな
い高品質な電荷転送製像装置が実現できる・なお、ここ
で(1不発明tインターライン転送方式の電荷転′送!
fl装置lt′1I−7って説明したが、フレーム転送
方式のもので一同1に冥現できる。
The operation of the charge transfer imaging device having such a structure is shown in FIGS. 1 and 2.
Figures and +ll! Since it is almost the same as the conventional example shown in Fig. 3, we will only use Fig. 8 to explain the charge transfer V pattern in the horizontal shift register. This diagram schematically shows the potential distribution in each part of the cross-sectional view, and shows the potential distribution when the vertical charge transfer electrodes 21 and 22 and the horizontal charge transfer electrode 27 are in the on state and the vertical transfer 1 gate electrode 23 is in the off state. The greatest feature of the present invention is that the channel potential 9 of region 70 shown in FIG. 8 is made sufficiently smaller than the channel potential ψHvc of region 710 shown in FIG. It is. In other words, in FIG.
The channel potential of the region 30 in the conventional example having ψV is ψV, but the channel potential of the region 61 according to the invention in which the total channel width W'V is narrowed by 1? Due to the narrow channel effect, the channel potential is further smaller than the channel potential ψ1. Therefore, in FIG. 8, the channel potential difference ψ between the region 70 and the region 71 is
+V-ψ□ becomes sufficiently large compared to the maximum signal charge level of the charge transfer imaging device according to the invention, I'l-
If the channel width W and i of the region 61 are selected, the charge transfer in the horizontal shift register (is performed only in one channel region 71), and part of the signal charge (h) does not enter the region 70. In the charge transfer imaging device according to the invention, the charge transfer in the horizontal shift register is efficiently performed, and the horizontal flow of the image when imaging a high-brightness object, which was conventionally required, is completely eliminated. Since a part of the injection field does not cross over the barrier 72 under the vertical transfer gate 23 and enter the well 73 under the vertical charge transfer electrode 22, the horizontal line-like false signal when imaging a high-brightness object, which is the case in the conventional example, is eliminated. It is possible to completely prevent the occurrence of 14 degrees or more (/, J), so the uninvented ML technique can realize a high quality charge transfer imaging device that does not generate false signals. Here, (1 uninvented t interline Charge transfer using transfer method!
Although the fl device lt'1I-7 has been described, it can be realized as one device using a frame transfer method.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はインターライン転送方式の撮gI装置の概略図
、第2図(−謁1図に、おける垂直シフトレジスタと水
平シフトレジスタの結合領域の拡大図で従来例?示して
いる。箒3図は第2図のト]線上の断面図、第4図(a
)、ら)、 (clば第3図における電位分布模式rS
4.第5図にチャネル電位のチャネル幅依存性紮示す図
、第6卸は第1v!Jv−おける垂直シフトレジスタと
水平シフトレジスタの結合領域の拡大図で本発明による
構造が示されている4第7図は第6図の■−■線上の断
面図、第8図は第7図における電位分布模式図である・
図において、10け垂直シフトレジスタ群、11け光1
変換素子群、12に水平シフトレジスタ。 13は電荷検出部、14に垂直シフトレジスタと水平シ
フトレジスタの結合領域、201160fl垂直シフト
レジスタのチャネル領域、21.22は垂直電荷転送電
極、23は垂直トランスファゲート電1i、  24.
37.71は水平シフトレジスタのチャネル領域、25
〜29は水平電荷転送1鑞、3Q、36.61、70 
d水平m苛転送′JL甑(1) −&Iiで彼6A*垂
直シフトレジスタの末C11−領域、31に半導体基板
、32は絶縁層、33はJ1込みチマネル層、34はチ
ャネルストップ領域、35に金tA層である。 −3( 第1目 も2回 糖3図 第4−図 第6図 第6躬
FIG. 1 is a schematic diagram of an interline transfer type imaging device, and FIG. The figure is a cross-sectional view on the
), et al), (if cl, potential distribution model rS in Fig. 3
4. Figure 5 shows the channel width dependence of the channel potential. The structure according to the present invention is shown in an enlarged view of the coupling area of the vertical shift register and the horizontal shift register in Jv-4. FIG. 7 is a sectional view taken along the line ■-■ of FIG. 6, and FIG. This is a schematic diagram of potential distribution at
In the figure, there are 10 vertical shift registers, 11 light 1
Conversion element group, horizontal shift register 12. 13 is a charge detection section, 14 is a coupling region of the vertical shift register and horizontal shift register, 201160fl vertical shift register channel region, 21.22 is a vertical charge transfer electrode, 23 is a vertical transfer gate electrode 1i, 24.
37.71 is the channel area of the horizontal shift register, 25
~29 is horizontal charge transfer 1, 3Q, 36.61, 70
dHorizontal transfer' JL (1) -&Ii 6A* end of vertical shift register C11- region, 31 is semiconductor substrate, 32 is an insulating layer, 33 is a layer including J1, 34 is a channel stop region, 35 There is a gold tA layer. -3( 1st eye also 2 times

Claims (1)

【特許請求の範囲】[Claims] 同一基板上に形成さnた電荷転送装置から成る複数列の
垂直シフトレジスタ群と、前記垂直シフトレジスタ群に
対応して配置さfまた光電変換素子群と、前記垂直シフ
トレジスタ群の一端に隣接して設けられた電荷転送水平
シフトレジスタと、前記垂直シフトレジスタ群の末端の
チャネル領域上前記水平シフトレジスタの水平電荷転送
電極の一部で被うことにより設けられた前記垂直シフト
レジスタ群と前記水平シフトレジスタとの結合部亡、前
記水平シフトレジスタの一端に設けられた電荷検出部と
から成る電荷転送撮像装置であって、前記結合部のチャ
ネル電位が前記電荷転送撮像装置の最大信号電荷が前記
水平シフトレジスタへ転送されたときの前記水平電荷転
送電極下のチャネル電位より小さくなるように、前記結
合部のチャネル@を前記垂直シフトレジスタ群Oチ〒ネ
ルlIK比べて狭くしたことt特徴とする電荷転送撮像
装置〜
a plurality of vertical shift register groups formed on the same substrate and consisting of charge transfer devices; a photoelectric conversion element group disposed corresponding to the vertical shift register group; and a photoelectric conversion element group adjacent to one end of the vertical shift register group. a charge transfer horizontal shift register provided as a charge transfer horizontal shift register; A charge transfer imaging device comprising a coupling portion with a horizontal shift register and a charge detection portion provided at one end of the horizontal shift register, the channel potential of the coupling portion being such that the maximum signal charge of the charge transfer imaging device is The channel of the coupling portion is made narrower than the vertical shift register group O channel IIK so that the channel potential under the horizontal charge transfer electrode is lower than the channel potential under the horizontal charge transfer electrode when transferred to the horizontal shift register. Charge transfer imaging device
JP57008178A 1982-01-21 1982-01-21 Charge transfer image pickup device Pending JPS58125963A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57008178A JPS58125963A (en) 1982-01-21 1982-01-21 Charge transfer image pickup device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57008178A JPS58125963A (en) 1982-01-21 1982-01-21 Charge transfer image pickup device

Publications (1)

Publication Number Publication Date
JPS58125963A true JPS58125963A (en) 1983-07-27

Family

ID=11686055

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57008178A Pending JPS58125963A (en) 1982-01-21 1982-01-21 Charge transfer image pickup device

Country Status (1)

Country Link
JP (1) JPS58125963A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5484920A (en) * 1974-07-25 1979-07-06 Rca Corp Charge coupled device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5484920A (en) * 1974-07-25 1979-07-06 Rca Corp Charge coupled device

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