JPS58118148A - Light ignition type bidirectional thyristor - Google Patents

Light ignition type bidirectional thyristor

Info

Publication number
JPS58118148A
JPS58118148A JP57000066A JP6682A JPS58118148A JP S58118148 A JPS58118148 A JP S58118148A JP 57000066 A JP57000066 A JP 57000066A JP 6682 A JP6682 A JP 6682A JP S58118148 A JPS58118148 A JP S58118148A
Authority
JP
Japan
Prior art keywords
layer
light
thyristor
region
main surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57000066A
Other languages
Japanese (ja)
Inventor
Hiromichi Ohashi
弘通 大橋
Tsuneo Tsukagoshi
塚越 恒男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP57000066A priority Critical patent/JPS58118148A/en
Publication of JPS58118148A publication Critical patent/JPS58118148A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/111Devices sensitive to infrared, visible or ultraviolet radiation characterised by at least three potential barriers, e.g. photothyristors
    • H01L31/1113Devices sensitive to infrared, visible or ultraviolet radiation characterised by at least three potential barriers, e.g. photothyristors the device being a photothyristor

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Thyristors (AREA)
  • Light Receiving Elements (AREA)

Abstract

PURPOSE:To contrive uniformity of ignition sensitivity for the titled thyristor by a method wherein the P-base located on one main surface of a bidirectional SCR and a part of the N- emitter of the second SCR located on the other main surface opposing to the above surface are used as light-irradiation surface, and the life time of the P-base layer on said light-irradiation surface is made larger than that of the other layer. CONSTITUTION:A P1 layer and a P2 layer 6 are provided on an N type substrate 5 by performing a B-diffusion, an N1 layer 3 and an N2 layer 7 are formed by selectively diffusing P, and the N1 layer 3 is formed into a short-circuit emitter structure using an electrode 2. The N1 layer 3 is removed by etching and the P1 layer 4 is exposed, and a light-receiving region 12 is formed. Then, a mesa etching is performed from both main surfaces, and the exposed junctions J3 and J4 are covered by a glass layer 9. At this point, a groove 11 is formed at the same time, and a photo-electric current generated on the irradiation surface is led out effectively. As the light-receiving region 12 is P-diffused from the opposing main surfaces, a life time which is higher than that of the other region is obtained by the gettering action of P, and the ignition sensitivity of the SCRT2 having a center junction J4 which is located away from the power source and the SCRT1having a center junction J3 is located close to the light source can be made uniform, thereby enabling to obtain the highly reliable bidirectional SCR.

Description

【発明の詳細な説明】 発明の属する技術分野 本発明は光トリガ信号によりスイッチング動作する光点
弧形双方向サイリスタに関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a light-triggered bidirectional thyristor that performs a switching operation based on an optical trigger signal.

従来技術とその問題点 一般に双方向スイッチング特性を示す半導体制御整流装
置は、交互に導電性の異なる連続した5層を有し、これ
ら5層は内外側層を一方の趨層とする互いに逆極性の一
対の4層領域を形成してなる半導体基体と、半導体基体
の外側隣接領域tオーミ、り接続する一対の主電極と、
トリガ信号を付与する手段とを具備している。
Prior art and its problems Semiconductor controlled rectifiers exhibiting bidirectional switching characteristics generally have five successive layers of alternating conductivity, and these five layers have mutually opposite polarities with the inner and outer layers as one trend layer. a semiconductor substrate formed by forming a pair of four-layer regions; a pair of main electrodes that are electrically connected to an outer adjacent region of the semiconductor substrate;
and means for applying a trigger signal.

そして、かかる装置は、主電極間に一方の主電極が他方
の主電極より高電位となる電圧が印加された状態でゲー
) K ) ’Jガ信号を付与すると、一方の主電極か
ら他方の主電極に向う方向が順方向となる4層領域が導
通状態とな・す、逆に主電極間に他方の主電極が一方の
主電極より高電位となる電圧が印加された状態でゲート
にトリガ信号を付与すると他方の主電極から一方の主電
極に向う方向が順方向となる4層領域が導通状態となる
ように動作する。トリガ信号を付与する手段としては半
導体基体のいずれかの層へゲート電極を設け、このゲー
ト電極からゲート信号を流して#:皺會スイツチング動
作させるいわゆる電気ゲート方式が一般的である。
In such a device, when a voltage is applied between the main electrodes so that one main electrode has a higher potential than the other main electrode, when a signal is applied between the main electrodes, one main electrode is connected to the other main electrode. The four-layer region with the forward direction facing the main electrode is in a conductive state, and conversely, when a voltage is applied between the main electrodes so that the other main electrode has a higher potential than one main electrode, the gate When a trigger signal is applied, the four-layer region whose forward direction is from the other main electrode to one of the main electrodes becomes conductive. As a means for applying a trigger signal, a so-called electric gate method is generally used, in which a gate electrode is provided on any layer of a semiconductor substrate, and a gate signal is passed from this gate electrode to perform a #:wrinkle switching operation.

しか(ながら電気ゲート方式には次のような欠点がある
However, the electric gate method has the following drawbacks.

(1)対称的な双方向スイッチング特性を得るためには
ゲート電極を2個設け、かつ互いに電気的に絶縁された
2個のゲート回路葡必要とする。(2)ゲート爾、極が
1個の場合には対称的なスイッチング特性を得るのが難
しい。(3)、転流時においてゲート信号1流が付与さ
れる前に導通状態になるいわゆる誤点弧をするおそれが
ある。
(1) In order to obtain symmetrical bidirectional switching characteristics, two gate electrodes are provided and two gate circuits electrically insulated from each other are required. (2) When the gate has only one pole, it is difficult to obtain symmetrical switching characteristics. (3) During commutation, there is a risk of so-called erroneous ignition in which conduction occurs before one stream of gate signal is applied.

J=J−)−、述べ之vI気ゲート方式の欠点は、電気
的に絶縁した1個の光源により光トリガ信号を照射して
装at点弧させるいわゆる光ゲート方式にすることによ
り解消することができる。しかしながら光ゲート方式を
採用した双方向性サイリスタにおいても次の様な欠点が
あった。それは2aの4層領域の点弧感度の不均衡の問
題である。
J=J-)-, The disadvantages of the vI gate method can be overcome by using a so-called optical gate method in which a single electrically insulated light source irradiates a light trigger signal to ignite the at. Can be done. However, bidirectional thyristors employing the optical gate system also have the following drawbacks. It is a problem of imbalance in ignition sensitivity in the four-layer region of 2a.

第1図及び第2図に従来例を示した。第1図においてサ
イリスタ(↓)は2情の41−領域からなるサイリスタ
T、及びサイリスタIlN、部分からなり、1゛、にお
けるN型Jtji (3)とT、におけるN型I曽(7
)とは槓l一方向に投影した電極〈一部でのみ重なり、
好ましくは重なり合わない2うに形成されている。第2
図は第1図のA−、N部分の断面図(拡大図ンであり。
A conventional example is shown in FIGS. 1 and 2. In Fig. 1, the thyristor (↓) consists of a thyristor T consisting of two 41-regions, and a thyristor IIN, with an N-type Jtji (3) at 1゛ and an N-type Iso (7) at T.
) is an electrode projected in one direction (overlapping only in part,
Preferably, it is formed into two pieces that do not overlap. Second
The figure is a cross-sectional view (enlarged view) of portions A- and N in FIG.

一対の主電極のうち第1の主電極(2)は光でトリガー
する窓(以下受光部と呼ぶ)を除いてダイリスタT1に
おけるN型層(N1)と、サイリスタT、におけるP型
層(P、)とが一方の主表面でオーミック接続している
。また第2の主電極(8)はT、におけるN型層(Nり
と、1゛1におけるP型層(P、)がもう一方の主表面
でオーミック接続している。このサイリスタ(↓)はそ
の受光部へ光源Qlからの光信号によって点弧すること
ができる。この場合光点弧に有効なキャリアの発生領域
は逆バイアスされた中央接合J。
Of the pair of main electrodes, the first main electrode (2), excluding the light-triggered window (hereinafter referred to as the light receiving section), has an N-type layer (N1) in the dyristor T1 and a P-type layer (P) in the thyristor T. , ) are ohmically connected on one main surface. In addition, the second main electrode (8) has an N-type layer (Nri) at T, and a P-type layer (P,) at 1゛1 are ohmically connected on the other main surface.This thyristor (↓) can be ignited to its light receiving portion by an optical signal from the light source Ql.In this case, the carrier generation area effective for light ignition is the reverse biased central junction J.

及びJ4の近傍であり、光点弧感度を向上するためには
光を中央接合の近傍に照射する必要がある。
and near J4, and in order to improve the light ignition sensitivity, it is necessary to irradiate light near the central junction.

半導体基体り一方の主表面から光を照射する場合2個の
4層領域の点弧に有効なキャリアの発生領域となる逆バ
イアスされた中央接合と光源との距離は5層構造の中の
中央h (Ns)の厚さだけ異なる。
When light is irradiated from one main surface of the semiconductor substrate, the distance between the light source and the reverse biased central junction, which is the carrier generation region effective for ignition of the two four-layer regions, is the center of the five-layer structure. h (Ns).

したがってisから遠い中央接合J4ヲもつサイリスタ
′I′、が形成する4層領域の点弧に必要な光が中央層
内圧おいて吸収され、指舷函数的に減衰するため、その
光点弧感度は光源に近い中央接合J、をもつサイリスタ
T1が形成する41−鎖板より著しく低下することにな
る。その結果双す向のスイッチング特性が不ぞろいにな
り光源の幽さは遠い中央接合部をもつサイリスクIF2
の光点鴎感度で決定される(jソ下サイリスタT1を点
弧ζけるモードをI+モード、サイリスタT、を、尚弧
させるモード「モードと呼ぶ)、、そのためいきおいL
EDなとの光源の駆動電流が大きくなり、光源の寿命を
著しく低下させる問題があった。
Therefore, the light necessary for ignition of the four-layer region formed by thyristor 'I', which has central junction J4 far from IS, is absorbed at the internal pressure of the central layer and attenuates in a linear function, so that its light ignition sensitivity will be significantly lower than the 41-chain plate formed by the thyristor T1 with the central junction J, close to the light source. As a result, the switching characteristics in both directions are uneven, and the light source is dim.
(The mode in which the thyristor T1 is fired is called the I+ mode, and the mode in which the thyristor T is fired is called the "mode").
There is a problem in that the drive current for a light source such as an ED becomes large, significantly shortening the life of the light source.

発明の目的 本発明は上記事情に鑑みてなされたもので、その目的と
するとCろは2個のサイリスタ傾城全点弧させる光点弧
感度【均一化し、かつ光感度そのものt向上させた光点
弧形双方向サイリスタを提供することにある。さらに本
発明の目的はスイッチング特性がすぐれ、信頼性、経済
性のすぐれた光点弧形双方向サイリスタを提供すること
にある。
Purpose of the Invention The present invention has been made in view of the above circumstances, and its purpose is to uniformize the light ignition sensitivity and improve the light sensitivity itself by fully firing the two tilted thyristors. The purpose of the present invention is to provide an arc-shaped bidirectional thyristor. A further object of the present invention is to provide a light-ignited bidirectional thyristor with excellent switching characteristics, reliability, and economy.

発明の実施例 以下図面を参照して本発明の一実施例倉親明する。第3
図は本発明の光点弧形双方向サイリスタの平面図、第4
図は受光部A−A’に切断した所の一部断面図であり、
以下に述べる方法で製作される。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be explained below with reference to the drawings. Third
The figure is a plan view of the light-triggered bidirectional thyristor of the present invention.
The figure is a partial cross-sectional view taken along the light receiving section A-A'.
It is manufactured by the method described below.

厚み200μmのN型基板(5)の両側よりP型不純物
として、たとえばボロン等を深さ3077mで拡散し2
7層(4)及び21層(6)を形成する。次によく知ら
れているPEP技術によって所定の酸化膜を工、チング
して、この酸化膜をマスクとしてサイリスタT1及びT
、のN型領域であるN、 @ (31とN2層(7)を
たとえば燐等を不純物とした選択的な拡散を行なって1
深さ約15μmのエミ、り領域を形成する。この時第3
図に示した受光部領域μ4のみ相対する主表面より燐の
拡散を行なう。なお前記エミッタ領域はPベースが一部
篇出している、いわゆるショーチットエミッタ構造にな
っている。次いで受元8%域a湯をN、1m +31 
! 11+ 若干深<、RヘースNti (41;64
 II出する所までケミカルエッチフグしてこの部分の
高濃のN型I−を除去する。サイリスタけ)の周辺は7
0〜80 μmの深さで両面からメサエッチングを行な
い、側面に露出した接合J、及びJ4の表面はガラス膜
(9)を使ってバ、シベーションが施こされる、。
P-type impurities such as boron are diffused from both sides of the 200 μm thick N-type substrate (5) to a depth of 3077 m.
Form 7 layers (4) and 21 layers (6). Next, a predetermined oxide film is etched and etched using the well-known PEP technique, and using this oxide film as a mask, the thyristors T1 and T
, by selectively diffusing the N type region N,@(31) and the N2 layer (7) with impurities such as phosphorus.
An emitter region with a depth of about 15 μm is formed. At this time the third
Phosphorus is diffused only from the opposing main surface only in the light-receiving region μ4 shown in the figure. The emitter region has a so-called short-chit emitter structure in which a portion of the P base is exposed. Next, add 8% area A hot water to the receiving source, N, 1m +31
! 11+ Slightly deep <, R Heath Nti (41; 64
Chemically etch the area where it comes out to remove the highly concentrated N-type I- in this area. 7 around the thyristor
Mesa etching is performed from both sides to a depth of 0 to 80 .mu.m, and the surfaces of the junctions J and J4 exposed on the side surfaces are subjected to scivation using a glass film (9).

この時同時に受光部領域において、照射面で発生した光
電流を有効に導ひくための溝αυが形成される。受光部
領域u3は、相対する主表面より燐の拡散が行なわれる
ためいわゆる燐のゲッター作用により、他の領域より高
いライフタイムになる。したがって高い光感度が得られ
る。さらにこの部分す高濃暉に拡散された燐を除去する
ことにより、光の吸収が起きないため量子効率の向上に
さらに寄与できる。
At the same time, a groove αυ is formed in the light receiving region to effectively guide the photocurrent generated on the irradiation surface. The light receiving area u3 has a longer lifetime than other areas due to the so-called getter action of phosphorus since phosphorus is diffused from the opposing main surfaces. Therefore, high photosensitivity can be obtained. Furthermore, by removing the phosphorous diffused in this area, no light absorption occurs, which can further contribute to improving quantum efficiency.

第5図は本発明の他の実施例で受光部B−B’方向に切
断した所の一部断面図であり、上記一実施例と異なる所
は、サイリスタT、のN型領域NJ@ t7)の受光部
の真下が他のN型領域より深く形成されたことでおる。
FIG. 5 is a partial cross-sectional view of another embodiment of the present invention taken along the direction of the light receiving section BB', and the difference from the above embodiment is that the N-type region NJ@t7 of the thyristor T. ) is formed deeper than the other N-type regions.

これは燐のゲッター作用をさらに効果的なものとすると
同時に…モードにおいて1Pベ一ス層抵抗を大きく(7
てこの部分の光感度を上げる効果をはかっている。又受
光部の表面に薄い反射防止膜t+3例えばSiO膜をつ
けることによって、シリコン表面で損失する光を有効に
シリコン甲に導ひくことができる。
This makes the getter action of phosphorus even more effective, and at the same time increases the 1P base layer resistance in the mode (7
The effect is to increase the light sensitivity of the lever part. Furthermore, by attaching a thin antireflection film t+3, such as a SiO film, to the surface of the light receiving portion, light that is lost on the silicon surface can be effectively guided to the silicon shell.

次に本発明の効果を第6図を便って1す」する。Next, the effects of the present invention will be explained with reference to FIG.

同図において実線は従来例、点線は本発明を実施した場
合の童子効率の変化を示したもって゛めゐ。
In the figure, the solid line shows the conventional example, and the dotted line shows the change in doji efficiency when the present invention is implemented.

波長人=094μn1のLEI)を光源として1吏−)
た場合で比較すると本発明を実施することによりIモー
ドの量子効率yはほとんど輩化しないのに対し1モード
ではy=0.25がy=05まで改善され、Cモードと
1モードの量子効率が均等化することがわかる。さらに
Nベース層のライフタイムが上がることにより、光電流
も増加するので光感度は従来例とくらべてけで約2倍、
1モードで約3,5倍に向上した。
Wavelength person = 094μn1 LEI) as a light source 1 -)
By implementing the present invention, the quantum efficiency y of I mode hardly increases, while the quantum efficiency y of 1 mode improves from y=0.25 to y=05, and the quantum efficiency of C mode and 1 mode improves. It can be seen that the values are equalized. Furthermore, by increasing the lifetime of the N base layer, the photocurrent also increases, so the photosensitivity is approximately twice that of the conventional example.
The performance was improved by about 3.5 times in 1 mode.

さらに、サイリスタがターンオ/する時、Nペース中へ
のキャリアの蓄積が容易になゐため、プレイタイムなど
のスイッチング時間が大幅に改善することができる。
Furthermore, when the thyristor turns off/off, it becomes easy to accumulate carriers during N-pace, so switching time such as play time can be greatly improved.

本発明の効果を数値的に述べると、従来の構造において
I+モードに要する最少トリガノくワーに比較してIl
l+モードに景する最少トリガノ(ワーは約2倍である
のに対し、本発明においてはほぼ等しい最少トリガパワ
ーにより双方向に光点弧できる0又従来の構造における
鰻少トリガーノくワーをそれぞれのモードにおいて、4
以下に減少する事力1できる。
To describe the effects of the present invention numerically, compared to the minimum trigger power required for I+ mode in the conventional structure, Il
The minimum trigger power (war) that can be seen in the l+ mode is approximately twice as large, whereas in the present invention, light can be fired in both directions with approximately the same minimum trigger power. In mode, 4
It is possible to reduce the power to 1 below.

発明の変形例 なお本発明実施例において受光部を端に設けた場合につ
いて述べたが、中央部に設けても同じ効果が得られるの
は当然である。かかる方法で製作された本発明の光点弧
形双方向サイリスタは、耐圧600■通電容量16A%
  /dt200V/、、、1そして出力10mW次の
小容量LEDの微弱な光でトリガできる。
Modifications of the Invention Although the embodiments of the present invention have been described with respect to the case where the light receiving section is provided at the end, it is natural that the same effect can be obtained even if the light receiving section is provided at the center. The light-activated bidirectional thyristor of the present invention manufactured by such a method has a withstand voltage of 600 and a current carrying capacity of 16 A%.
/dt200V/...1 and can be triggered with the weak light of a small capacity LED of the order of 10mW output.

発明の効果 以上の様に本発明において、I”、III+モードの光
トリガパワーを均一化して、数mWの最少トリガーパワ
ーで双方向に光点弧が用舵で、かつスイッチング特性の
すぐれた高耐圧光点弧形へ力向ソイリスクを得る事がで
1!心。
Effects of the Invention As described above, in the present invention, the optical trigger power of the I'' and III+ modes is made uniform, and a minimum trigger power of several mW enables optical ignition in both directions, and a high switching characteristic is achieved. The pressure-resistant light ignition type allows you to obtain a force-directed soy risk!

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の光点弧形双方向サイリスタの平面図、第
2図は第1図のA−A’線部分断i1o図、第3図は本
発明の一実施例の平面図、第4図は第3図のA−A’線
部分断面図、第5図は本発明の他の実施例を示す断面図
、第6図は童子効率の関係を糾明した図である。 1:サイリスタ、2:謝1の主電極、3:N、#。 4:11層、5:N型基板、6:P!鳩、7:N、増。 8:第2の主電極、9ニガラス層、10:光 。 11;溝、12:受光部領域、13;嵐射防止膜0代理
人 升理士  則 近 慝 佑 (ほか1名) 第  1  図 第  2  図 第  3  図 /f 第4図 / 第  5  図           。 第  6  図 o、’i o、%1.0   /、/
FIG. 1 is a plan view of a conventional light-triggered bidirectional thyristor, FIG. 2 is a cross-sectional view taken along line AA' in FIG. 4 is a partial sectional view taken along the line AA' in FIG. 3, FIG. 5 is a sectional view showing another embodiment of the present invention, and FIG. 6 is a diagram illustrating the relationship between doji efficiency. 1: Thyristor, 2: Main electrode of 1, 3: N, #. 4: 11 layers, 5: N type substrate, 6: P! Dove, 7:N, increase. 8: second main electrode, 9 glass layer, 10: light. 11: Groove, 12: Light receiving area, 13: Storm radiation prevention film 0Representative: Masu Rishi, Noriyuki Chika (and 1 other person) Fig. 1 Fig. 2 Fig. 3 Fig./f Fig. 4/ Fig. 5. Figure 6 o,'i o,%1.0 /, /

Claims (1)

【特許請求の範囲】[Claims] 一方の主表面から他方の主表面に向って導電型の異なる
半導体層をNPNPの順に連続して配置された第1のサ
イリスタ領域と%  PNPNの順に連続配置された第
2のサイリスタ領域とが隣接して一体に形成され、前記
第1及び第2のサイリスタ領域が外部からの光信号によ
ってトリガされる双方向サイリスタにおいて、一方の主
表面に配置されたPペース領域の一部と、これと相対す
る他方の主表面に配置された第2サイリスタのNエミ、
り領域の一部を光信号の照射面とし、この領域のPペー
ス及びNベース層のライフタイムを1その他の領域のラ
イフタイムより大きくした事を特徴とする光点弧形双方
向サイリスタ。
A first thyristor region in which semiconductor layers of different conductivity types are successively arranged in the order of NPNP from one main surface to the other main surface and a second thyristor region in which semiconductor layers of different conductivity types are successively arranged in the order of %PNPN are adjacent to each other. In a bidirectional thyristor in which the first and second thyristor regions are integrally formed and triggered by an external optical signal, a portion of the P pace region disposed on one main surface and a portion opposite thereto. N emitter of the second thyristor disposed on the other main surface,
A light-triggered bidirectional thyristor characterized in that a part of the region is used as an irradiation surface for optical signals, and the lifetime of the P pace and N base layers in this region is longer than the lifetime of the other regions.
JP57000066A 1982-01-05 1982-01-05 Light ignition type bidirectional thyristor Pending JPS58118148A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57000066A JPS58118148A (en) 1982-01-05 1982-01-05 Light ignition type bidirectional thyristor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57000066A JPS58118148A (en) 1982-01-05 1982-01-05 Light ignition type bidirectional thyristor

Publications (1)

Publication Number Publication Date
JPS58118148A true JPS58118148A (en) 1983-07-14

Family

ID=11463808

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57000066A Pending JPS58118148A (en) 1982-01-05 1982-01-05 Light ignition type bidirectional thyristor

Country Status (1)

Country Link
JP (1) JPS58118148A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07122732A (en) * 1993-10-25 1995-05-12 Nec Corp Vertical photo triac
WO2003023870A1 (en) * 2001-09-12 2003-03-20 Cree, Inc. Large area silicon carbide devices and manufacturing methods therefor
EP1668750A2 (en) * 2003-08-29 2006-06-14 The Titan Corporation Laser-gated and pumped multi-layer semiconductor power switch with reduced forward losses

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07122732A (en) * 1993-10-25 1995-05-12 Nec Corp Vertical photo triac
WO2003023870A1 (en) * 2001-09-12 2003-03-20 Cree, Inc. Large area silicon carbide devices and manufacturing methods therefor
EP1668750A2 (en) * 2003-08-29 2006-06-14 The Titan Corporation Laser-gated and pumped multi-layer semiconductor power switch with reduced forward losses
EP1668750A4 (en) * 2003-08-29 2007-12-12 Titan Corp Laser-gated and pumped multi-layer semiconductor power switch with reduced forward losses

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