JPS581128A - Transparent patterned electrode - Google Patents

Transparent patterned electrode

Info

Publication number
JPS581128A
JPS581128A JP9832481A JP9832481A JPS581128A JP S581128 A JPS581128 A JP S581128A JP 9832481 A JP9832481 A JP 9832481A JP 9832481 A JP9832481 A JP 9832481A JP S581128 A JPS581128 A JP S581128A
Authority
JP
Japan
Prior art keywords
electrode
transparent
segments
leads
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9832481A
Other languages
Japanese (ja)
Inventor
Takeshi Ikeda
毅 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP9832481A priority Critical patent/JPS581128A/en
Publication of JPS581128A publication Critical patent/JPS581128A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/134309Electrodes characterised by their geometrical arrangement
    • G02F1/134327Segmented, e.g. alpha numeric display

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Geometry (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PURPOSE:To avoid waste in a removing stage and to prevent a transparent patterned electrode on an insulating substrate used in an electrooptical display element such as a liq. crystal display device from looking like a thin electrode by removing only linear parts along the peripheries of the segments of the electrode and leads from an electrically conductive transparent film formed on the whole surface of the substrate. CONSTITUTION:By removing only linear parts 8 along the peripheries of segments 5 and leads 6 while leaving other parts 7 having no relation to the segments 5 and the leads 6, the segments 5 and the leads 6 are electrically isolated from each other. Since the parts 7 having no relation to the segments 5 and the leads 6 remain on the display surface, the transparent electrode does not look like a patterned thin electrode, and when removal is carried out using laser beams or electron beams, this method is advantageous because the parts to be removed is small.

Description

【発明の詳細な説明】 この発明は、液晶表示器などの電気光学的表示素子で使
用する絶縁基板上の透明パターン電極に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a transparent pattern electrode on an insulating substrate used in an electro-optic display element such as a liquid crystal display.

透明パターン電極の製造方法として、第1図に示すよう
に、 (Alガラス基板11+を用意し、 (B)このガ?ス基板(1)上に錫または塩化錫のよう
な酸化後、透明で導電性をもつ金属または金属の塩類(
2)を付着し、 (C)これを酸素中のような酸化雰囲気中で高11&に
加熱して酸化せしめ、透明導電@ (3+を形成し、(
D)この透明導電膜131 K対して、ネガ・パターン
状にレーザー光IIIまたは電子ビーム(9)を照射し
て不要な部分の透明導電膜(3)を削除させて、ポジ・
((転)ガラス基板+11を用意し− (B)このガラス基板(1)上Ellまたは塩化錫のよ
うな酸化後、透明で導電性をもつ金属または金属の塩類
(2)を付着し、 (0)この金属または金属の塩類(2)K対して、ネガ
・パターン状にレーザー光線または電子ビーム(9)を
照射して不要な部分を削除し、ポジ・パターン状に金属
または金属の塩II(21を残存せしめ、IJ))この
ポジ・パターン状に残存した金属または金属の塩類(2
)を酸素中のような酸化雰囲気中で高温度に加熱して酸
化せしめ、透明パターン電極(4)を得る方法、 が、この発明の発明者らによって先に提案されている。
As shown in Fig. 1, the method for manufacturing transparent pattern electrodes is as follows: (An Al glass substrate 11+ is prepared, and (B) a transparent material such as tin or tin chloride is deposited on this glass substrate (1) after oxidation. Conductive metals or metal salts (
2) is deposited and (C) is oxidized by heating to a high temperature of 11& in an oxidizing atmosphere such as in oxygen to form a transparent conductive @(3+), (
D) This transparent conductive film 131K is irradiated with a laser beam III or an electron beam (9) in a negative pattern to remove unnecessary portions of the transparent conductive film (3) and form a positive pattern.
((Turn) Prepare a glass substrate + 11 - (B) On this glass substrate (1), after oxidation such as Ell or tin chloride, a transparent and conductive metal or metal salt (2) is attached. 0) This metal or metal salt (2) K is irradiated with a laser beam or an electron beam (9) in a negative pattern to remove unnecessary parts, and the metal or metal salt II ( 21 remains, IJ)) The metal or metal salts (21) remained in this positive pattern.
) has been previously proposed by the inventors of the present invention, in which a transparent patterned electrode (4) is obtained by heating it at high temperature in an oxidizing atmosphere such as oxygen to oxidize it.

このような透明パターン電極の製造方法によると、精密
なパターン電極を量産的に製造することが可能であるが
、製造工程中に、レーザー光線または電子ビームによる
削除工程が存在し、この削除工程でエネルギーが消費さ
れるので、削除する部分が少いことが望ましい。
According to this manufacturing method of transparent pattern electrodes, it is possible to mass-produce precise pattern electrodes, but during the manufacturing process there is a deletion process using laser beams or electron beams, and this deletion process consumes energy. is consumed, so it is desirable to delete as few parts as possible.

また、従来の透明パターン電極は、第3図の平面図に示
すように、文字または図形の一部をなすセグメント(5
)と、このセグメント(5)から引き出されたリード(
6)からなり、セグメント(5)およびリード(6)以
外の部分(7)は完全に削除されていたために、電極が
透明であるとはいうもののノ(ターン電極が薄く見える
ことがあった0 そこで、この発明は、このような従来の透明)(ターン
電極が有する問題点を解決するために考えられたもので
ちって、第4図の平面図に示すように、セグメント(5
)およびリード(6)の周囲に沿った線状の部分(8)
だけを削除し、セグメント(5)およびリード+61 
K IIA係のない他の部分())を残存させて、各セ
グメント(5)およびリード(6)をそれぞれ電気的に
孤立させたものである。
Furthermore, as shown in the plan view of FIG. 3, the conventional transparent pattern electrode has a segment (5
) and the lead drawn from this segment (5) (
6), and the part (7) other than the segment (5) and lead (6) was completely removed, so although the electrode was transparent, the turn electrode sometimes appeared thin (0 Therefore, the present invention was devised to solve the problems of the conventional transparent turn electrode, and as shown in the plan view of FIG.
) and a linear portion (8) along the periphery of the lead (6)
Delete only segment (5) and lead +61
The other portions ()) not related to K IIA remain, and each segment (5) and lead (6) are electrically isolated.

なお、リード(6)の端部と外部素子(図示せず)との
接続の都合で、残存された部分イのうち、特に周辺部(
7fが邪魔になる場合には、この周辺部+71”を削除
すればよいのである。
Note that due to the connection between the end of the lead (6) and an external element (not shown), of the remaining portion A, especially the peripheral portion (
If 7f becomes a hindrance, this peripheral portion +71'' can be deleted.

このような基板0)上に形成された透明・;ターン電極
を液晶表示装置に組込む場合には、セグメント(5)お
よびリード(6)に関係のない残存部分(7)を無接続
とするか、あるいは、対向電極と同電位点に接続して、
液晶物質に電界を生ぜしめなければよいのである。
When the transparent turn electrode formed on such a substrate 0) is incorporated into a liquid crystal display device, the remaining portions (7) unrelated to the segments (5) and leads (6) may be left unconnected. , or connect to the same potential point as the counter electrode,
It is sufficient that no electric field is generated in the liquid crystal material.

透明導電膜(3)または酸化後、透明で導電性をもつ金
属または金属の塩類(2)などの物質を削除するために
照射するレーザー光線(9)の波長には、照射物質で吸
収され易い波長を選択すればよく、また、レーザー光線
(9)をネガ・パターン状に照射する装置としては、電
子計算様の出力装置として知られているレーザープリン
タと同様な原理で動作する装置でよく、第5図に示すよ
うに、・等速移動する基板(1)上に、レーザー光源a
eからのレーザー光線(9)を回転ミラー龜υによって
掃引させ、パターン信号発生器03からのパターン信号
によってレーザー光jla・を変調することにより実施
できる。
The wavelength of the laser beam (9) irradiated to remove the transparent conductive film (3) or a substance such as a transparent and conductive metal or metal salt (2) after oxidation includes a wavelength that is easily absorbed by the irradiated substance. In addition, the device that irradiates the laser beam (9) in a negative pattern may be a device that operates on the same principle as a laser printer, which is known as an output device for electronic calculations. As shown in the figure, a laser light source a is placed on a substrate (1) that moves at a constant speed.
This can be carried out by sweeping the laser beam (9) from e by a rotating mirror υ and modulating the laser beam jla by a pattern signal from a pattern signal generator 03.

また、電子ビームによりて、削除加工を行なう場合には
、険am管におゆる電子ビームの偏向および変調と同様
な原理により容易に実施することができる。
Further, when performing the deletion process using an electron beam, it can be easily carried out using the same principle as the deflection and modulation of the electron beam used in an AM tube.

レーザー光線は集光することにより高いエネルギー密度
が得られ、また、電子ビームは集束し、加速することに
より高いエネルギー密度が得られるから、この発明の透
明パターン電極の削除加工をレーザー光線または電子ビ
ームによって行なえば、パターン電極の形状や削除幅の
制御が容1)JVCなり、高精度のパターン電極を短時
間に、しかも、少いエネルギーによって作ることができ
る。
Since high energy density can be obtained by focusing a laser beam, and high energy density can be obtained by focusing and accelerating an electron beam, the removal process of the transparent pattern electrode of the present invention can be performed using a laser beam or an electron beam. For example, the shape and deletion width of the patterned electrode can be controlled by 1) JVC, and highly accurate patterned electrodes can be made in a short time and with less energy.

ゞ■上で説明したように、この発明の透明パターン電j
tf、表示面にセグメント(5)およびリード(6)に
関係のない部分+714.残存させているので5透明電
極がパターン状に+il<見えることがなく、また、製
造に際しても削除する部分が少くて有利であるなどの効
果を貴することができる。
As explained above, the transparent pattern electrode of this invention
tf, a portion unrelated to segment (5) and lead (6) on the display surface +714. Since it remains, the five transparent electrodes are not visible in a pattern, and there are fewer parts to be removed during manufacturing, which is advantageous.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図は、透明パターン電極の製造方法の
一例を工程順に示した断面図、第3図は、従来の透明パ
ターン電極の平面図、第4図は、この発明の透明パター
ン電極の平面図、第5図は、この発明の透明パターン電
極の製造工程で用いるレーザー光線照射装置の一例を示
す概略図である。 1・・・ガラスなどの絶縁基板、 3・・・透明導電膜、 5・・・セグメント、 6・・・リード、 8%・・・セグメントおよびリードに沿った線状の部分
1 and 2 are cross-sectional views showing an example of a method for manufacturing a transparent pattern electrode in the order of steps, FIG. 3 is a plan view of a conventional transparent pattern electrode, and FIG. 4 is a transparent pattern electrode of the present invention. FIG. 5 is a schematic diagram showing an example of a laser beam irradiation device used in the manufacturing process of the transparent pattern electrode of the present invention. 1... Insulating substrate such as glass, 3... Transparent conductive film, 5... Segment, 6... Lead, 8%... Linear portion along segment and lead,

Claims (1)

【特許請求の範囲】 文字または図形の一部をなすセグメントおよび該セグメ
ントより引き出されたリードの周囲に沿った線状の部分
以外の部分に透明導電膜を形成し。 各セグメントおよび該セグメントより引き出された各リ
ードをそれぞれ電気的に孤立させたことを特徴とする絶
縁基板上に形成された透明パターン電極。
[Claims] A transparent conductive film is formed on a portion other than a segment forming a part of a character or figure and a linear portion along the periphery of a lead drawn out from the segment. A transparent pattern electrode formed on an insulating substrate, characterized in that each segment and each lead drawn out from the segment are electrically isolated.
JP9832481A 1981-06-26 1981-06-26 Transparent patterned electrode Pending JPS581128A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9832481A JPS581128A (en) 1981-06-26 1981-06-26 Transparent patterned electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9832481A JPS581128A (en) 1981-06-26 1981-06-26 Transparent patterned electrode

Publications (1)

Publication Number Publication Date
JPS581128A true JPS581128A (en) 1983-01-06

Family

ID=14216717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9832481A Pending JPS581128A (en) 1981-06-26 1981-06-26 Transparent patterned electrode

Country Status (1)

Country Link
JP (1) JPS581128A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05303916A (en) * 1992-04-27 1993-11-16 Futaba Corp Manufacture of transparent conductive wiring film substrate
JP2005084493A (en) * 2003-09-10 2005-03-31 Toppan Printing Co Ltd Method for manufacturing color filter substrate and color filter substrate
JP2008040307A (en) * 2006-08-09 2008-02-21 Stanley Electric Co Ltd Liquid crystal display
JP2009122565A (en) * 2007-11-19 2009-06-04 Stanley Electric Co Ltd Liquid crystal display device and method for manufacturing the same
JP2009237444A (en) * 2008-03-28 2009-10-15 Stanley Electric Co Ltd Method for manufacturing liquid crystal display element, nd the liquid crystal display elemnt

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5081298A (en) * 1973-11-17 1975-07-01
JPS5093451A (en) * 1973-12-19 1975-07-25
JPS5525079A (en) * 1978-08-14 1980-02-22 Nissan Motor Liquid crystal display
JPS5734582A (en) * 1980-08-12 1982-02-24 Mitsubishi Electric Corp Display unit

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5081298A (en) * 1973-11-17 1975-07-01
JPS5093451A (en) * 1973-12-19 1975-07-25
JPS5525079A (en) * 1978-08-14 1980-02-22 Nissan Motor Liquid crystal display
JPS5734582A (en) * 1980-08-12 1982-02-24 Mitsubishi Electric Corp Display unit

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05303916A (en) * 1992-04-27 1993-11-16 Futaba Corp Manufacture of transparent conductive wiring film substrate
JP2005084493A (en) * 2003-09-10 2005-03-31 Toppan Printing Co Ltd Method for manufacturing color filter substrate and color filter substrate
JP2008040307A (en) * 2006-08-09 2008-02-21 Stanley Electric Co Ltd Liquid crystal display
JP2009122565A (en) * 2007-11-19 2009-06-04 Stanley Electric Co Ltd Liquid crystal display device and method for manufacturing the same
JP2009237444A (en) * 2008-03-28 2009-10-15 Stanley Electric Co Ltd Method for manufacturing liquid crystal display element, nd the liquid crystal display elemnt

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