JPS58107485A - Method for sputtering ultra-plastic zn-al alloy - Google Patents

Method for sputtering ultra-plastic zn-al alloy

Info

Publication number
JPS58107485A
JPS58107485A JP20642581A JP20642581A JPS58107485A JP S58107485 A JPS58107485 A JP S58107485A JP 20642581 A JP20642581 A JP 20642581A JP 20642581 A JP20642581 A JP 20642581A JP S58107485 A JPS58107485 A JP S58107485A
Authority
JP
Japan
Prior art keywords
alloy
eutectoid
sputtering
plastic
sputtered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20642581A
Other languages
Japanese (ja)
Inventor
Keiji Sato
恵二 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP20642581A priority Critical patent/JPS58107485A/en
Publication of JPS58107485A publication Critical patent/JPS58107485A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon

Abstract

PURPOSE:To simplify heat treatment and surface treatment for enhancing strength and to reduce production cost, by carrying out the sputtering of an eutectoid alloy based on Zn and Al which is a fine crystal grain ultra-plastic alloy in such a state that said eutectoid alloy is heated to an eutectoid temp. or more. CONSTITUTION:A fine crystal grain ultra-plastic alloy, for example, a Zn-Al eutectoid alloy having a standard composition consisting of 22wt% Al and the remainder Zn is sputtered. At this time, while the Zn-Al alloy is held an eutectoid temp. or more, for example, at about 500 deg.C, for example, Ni is sputtered. By this method, tensile strength is enhanced about 60-70%.

Description

【発明の詳細な説明】 本尭明は責細細畠粒雇履性曾金である、221重−ム慮
、IA淋znt−凛準組成とする2鳳−ム1共析曾会(
以下Zn−22ム1という)のスパッタリング方fiK
−するものでるる〇 超塑性と扛ある種の金属が特定Oa[において低応力で
大変形′に現象で1?、この特徴を生かして4嶺の真!
1m形、ガス圧成形ヤホットホビングなどの澗工が*用
化名nている・ 4材料としてはZn−22ム1が歳も研究か進んでν9
、その発現温度が200℃〜301J$と比較的低いた
め、実用化も迩み、材料も市販1rtている。
[Detailed Description of the Invention] This book is a detailed description of the detailed structure of grains, with 221 weight considerations, IA, 1, and 2 sub-compositions.
Hereinafter referred to as Zn-22M1) sputtering methodfiK
-What is the phenomenon of superplasticity and large deformation of certain metals at low stress at a certain Oa? , Take advantage of this feature to create the true four-mine!
1m shape, gas pressure forming, hot hobbing, and other machining techniques have been used.4 The material used is Zn-22, which has been researched for many years.
Since its onset temperature is relatively low at 200°C to 301 J$, it has come to practical use, and the material is now commercially available.

しかしながらこのZn−22ム1扛5tiiiaでるる
ためには数μm以下の等輪倣細緒晶粒21@組繊でなけ
nfdならず、その丸め機械的強直が低いことか欠点と
なっている0その対策としてはMg、Ouなどt***
加するなどが行なわれているが、し刀・し仁の場合に框
同時に超履性詫が低下丁ゐという欠I:Lを生じる0 ところでこの超塑性Zn−22ム1も成形加工儀、共析
alj(275℃)以上で熱処息し、結晶粒を成長さぜ
る、あるいは等@微細組繊【層状組1IIKする仁とに
19機械的強度が同上することが知られてかり、!i!
lI[向上には主に仁O熱処境が同いて・いる0 またこのIn−22ム1は共析組繊である丸め湿式6式
% 九と見は前II&壇九よp1亜鉛露出鵠分tできるだけ
除去し、その後ジンゲート処114に行なってf)hら
、鋼めつき、ニッケルめつl!など1行なうなどの方法
が慣討名nてはいるか、必ずしも満足でさるものとなっ
ていない。
However, in order to form this Zn-22 membrane, it must be made of equicyclic thin-line grains of several micrometers or less, and its rounding mechanical stiffness is low, which is a drawback. Countermeasures include Mg, Ou, etc.
However, in the case of shito and shinin, the super-fineness of the frame simultaneously decreases, resulting in the defect I:L. It is known that mechanical strength increases when heat treatment is performed at a temperature higher than eutectoid alj (275°C) to grow crystal grains, or when microstructured fibers are formed. ! i!
lI [Improvement is mainly due to the heat treatment environment.0 Also, this In-22 M1 is a eutectoid composite fiber rounded wet type 6%. Remove as much as possible, and then send it to the Zingate treatment 114 for f) h, steel plating, nickel plating, etc. There are some methods that are commonly practiced, but they are not always satisfactory.

七のためZn−22ムLの狭面処暑としては脅威樹脂塗
装が中心となっている0 ところで本発明者はこのZn−22ム崖&金にめらρ為
しめスパッタリングに工9金属薄膜4に形成すると、後
の湿式めつさが容易で、かつ艮好なめっきが得ら几るこ
と全発見した。
7 Therefore, as a narrow surface treatment for Zn-22μL, the most common method is resin coating.By the way, the inventor of the present invention has developed a thin metal film for sputtering on this Zn-22M cliff and gold. It has been discovered that if the plating is formed in a similar manner, subsequent wet plating is easy and a good-looking plating can be obtained.

そして更((本発明ではZr*−224j1のスパッタ
リングのi余の基板加熱で、超塑性z!l−ム1會曽値
スパッタリング′@を共析温度以上に加熱する仁とにL
9、強度同上のための熱処理と衆面処場工fI4に簡易
化し、生産コストを低減ぜしめることt可能とするもの
でるる。
And further ((In the present invention, by heating the substrate for more than i during sputtering of Zr*-224j1, the superplastic z!l-mu1 value sputtering'@ is heated to above the eutectoid temperature.
9. It is possible to simplify the heat treatment for the same strength and the general processing process fI4, and reduce the production cost.

以下央mnに工9説明する0 実施例1 市暖のZn−22ム蕪合盆tエメリー研摩紙にぶり研摩
し、更にパフ研摩及びバフ研摩布に19水洗し友もの會
アルコールで洗浄し、2礁スパツタ俟虚に工す、濫mt
はぼ5uaCに保ちながらSU分間、1aiiスパツタ
リングした。その時のMi層は約t5μ謂で6つた。
The process will be explained in detail below.Example 1 Polished with a Zn-22mm emery abrasive paper, then washed with water on a puff polishing and buffing cloth, and washed with Tomonokai alcohol. 2 reef spatuta, overflowing mt
Sputtering was performed for 1 minute while maintaining the temperature at 5 uaC. The number of Mi layers at that time was approximately t5μ, so-called six.

この場曾引彊強度は、スパッタリング−の1 &4’q
f/d fi 29.81#f/−Klal上シタ。
The in-situ tensile strength is 1&4'q of sputtering.
f/d fi 29.81#f/-Klal upper sita.

実施−FI2 市販QZn−22ムB甘金tエメリー研摩紙に工9研M
しb更にパフ研摩及びパフ研摩布に工り水洗したものt
アルコールで洗浄し、2極スパツタ装置に工9%温fk
はぼ550℃に保ちながら50分間、)Iilスパッタ
リングした。その時のMIIwIは約1.5μ剛でるっ
た〇 この場合弓1張強度線、スパッタリング前の19.5時
f/−Sエフ橡f/−に同上し友〇なおこれら、Miを
スパッタリングした、Kn−22A1曾金への湿式めっ
きはいずnも良好でろった0 以上述べ九1うに本発明によれば超塑性Zn−22Aμ
酋曽のスパッタリングの一〇基1#L肩熱に2いてZn
−AJI曾金tその共析温度以上に21El熱すること
に、it)%!i!1llj同上のための熱処理と狭面
処塩工糧會簡易化し、生産コス)を低減ぜしめることk
OJ姓とするものでるる。
Implementation - FI2 Commercially available QZn-22 M
After that, it was further puff-polished and made into a puff-polishing cloth and washed with water.
Clean with alcohol and heat to 9% fk on a 2-pole sputtering device.
) Iil sputtering was performed for 50 minutes while maintaining the temperature at 550°C. At that time, the MIIwI is about 1.5μ stiffness.In this case, the bow 1 tensile strength line is 19.5 o'clock f/-S f/- before sputtering. Wet plating on Kn-22A1 metal was very good.As stated above, according to the present invention, superplastic Zn-22Aμ
10 bases of sputtering of Suso 1#L shoulder heat 2 and Zn
-AJI Sokin tTo heat 21El above its eutectoid temperature, it)%! i! 1llj To simplify the heat treatment and narrow-sided salt processing equipment for the above, and reduce production costs).
There are things with the surname OJ.

以  上 出願人 株式会社 第 二 稽 工 會代理人 弁1士
  最  上   務
Applicant: Dai-ichi Kenko Co., Ltd. Agent: Attorney-at-Law Mogami

Claims (1)

【特許請求の範囲】 償aa*a粒超雇性合金で塾るznspよびム1【主成
分とする共析會金へのam形属に訃いて、超wi性りn
−tj1合会を共析1鼠以上に加熱してスパッタリング
することt−特徴とするS層性Zn−ム1廿盆のスパッ
タリング方法■
[Claims] Znsp and mu 1 made of aaa * a grain super-absorbent alloy
- Sputtering by heating the tj1 joint to eutectoid 1 or higher temperature - Featured sputtering method for S-layer Zn-me 1-layer ■
JP20642581A 1981-12-21 1981-12-21 Method for sputtering ultra-plastic zn-al alloy Pending JPS58107485A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20642581A JPS58107485A (en) 1981-12-21 1981-12-21 Method for sputtering ultra-plastic zn-al alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20642581A JPS58107485A (en) 1981-12-21 1981-12-21 Method for sputtering ultra-plastic zn-al alloy

Publications (1)

Publication Number Publication Date
JPS58107485A true JPS58107485A (en) 1983-06-27

Family

ID=16523157

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20642581A Pending JPS58107485A (en) 1981-12-21 1981-12-21 Method for sputtering ultra-plastic zn-al alloy

Country Status (1)

Country Link
JP (1) JPS58107485A (en)

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