JPS5947400A - Method for removing oxide film from surface of zr and hf as well as its alloy - Google Patents

Method for removing oxide film from surface of zr and hf as well as its alloy

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Publication number
JPS5947400A
JPS5947400A JP15787382A JP15787382A JPS5947400A JP S5947400 A JPS5947400 A JP S5947400A JP 15787382 A JP15787382 A JP 15787382A JP 15787382 A JP15787382 A JP 15787382A JP S5947400 A JPS5947400 A JP S5947400A
Authority
JP
Japan
Prior art keywords
oxide film
ammonium
concentration
alloys
ammonium fluoride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15787382A
Other languages
Japanese (ja)
Other versions
JPS6056797B2 (en
Inventor
Satoko Yanagisawa
柳沢 里子
Kiichi Komada
駒田 紀一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP15787382A priority Critical patent/JPS6056797B2/en
Publication of JPS5947400A publication Critical patent/JPS5947400A/en
Publication of JPS6056797B2 publication Critical patent/JPS6056797B2/en
Expired legal-status Critical Current

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Abstract

PURPOSE:To remove thoroughly a titled film of various shapes without any problem in safety and the decrease in yield in an AC electrolytic treatment method in NH4F, by adding ammonium salt of such as citric acid or the like and specifying pH and current density. CONSTITUTION:Zr, Hf and an alloy thereof having an oxide film are subjected to Ac electrolysis in an aq. electrolytic soln. which contains 0.1-0.5mol concn. of NH4F and is adjusted to 5-6pH by adding >=1 kinds among NH4, Na and K salts of a citric acid, oxalic acid, and tartaric acid thereto. The current density in this stage is set at 0.02-0.5A/cm<2>. Then the dissolving rate of the base metal itself is suppressed extremely low, and the dissolving rate in the boundary layer part of the base metal and the oxide film layer is increased, whereby the oxide film is stripped from the base metal. If slight NH4NO3 is allowed to exist in the above-described aq. electrolytic soln., the power for stripping the oxide film particularly in the case of the Sn-contg. alloy is further improved.

Description

【発明の詳細な説明】 この発明は、Zr 、 Zr基合曾、 Elf 、 i
(、f  基合金等の■a族金属、或いは(扛らの合金
の表向酸化波膜を除去−支る方法に関するものである、
一般に、はとんどの金属又は@金iJ、釣)’r’r 
、柑造、熱処理、あるいは腐食性埴境での使用等によっ
てその表面に酸化被膜を1に5yするので1通常の場合
、つぎの1−程に供するたd)に表i?ii酸fヒ被膜
除去処理を施す必要があった。ところで、近年、航窒産
業、原子力産業、あるいはざq水利用#業等σ)めざま
しい発展にともない、 Zr、Zr  基合金、或いは
Hf、Hf基合金に対する需9′、Iが、色噌(,2て
おり。
[Detailed Description of the Invention] This invention relates to Zr, Zr group combination, Elf, i
This relates to a method for removing and supporting the surface oxidation wave film of group A metals such as (, f-based alloys, etc.), or () alloys.
In general, most metals or @Kin iJ, fishing)'r'r
In the normal case, the oxide film is formed on the surface by fermentation, heat treatment, or use in a corrosive clay environment. ii) It was necessary to perform acid f arsenic film removal treatment. By the way, in recent years, with the remarkable development of the navigation industry, the nuclear industry, the water utilization industry, etc., the demand for Zr, Zr-based alloys, or Hf, Hf-based alloys has increased dramatically. 2.

特に表面酸化皮膜を形成しやすいこれらの合金において
は、その酸化皮膜除去々JL I’ljが、7.14品
品′PIや製品7Jl]工処理工程全体の能率にElf
門な位置を占M)るようになってきた。
In particular, for these alloys that are prone to form oxide films on the surface, removing the oxide film has a significant effect on the efficiency of the entire processing process.
It has come to occupy a certain position.

従来−Zr、Zr基合金、IIf、卦よびIHi、b合
金から成る材オ;十等Vこ生じた六面酸化被膜の除去は
5機械的fl r4而イvF削m アロ イ’tj L
i 1” 、 ZrF4ヤij ノア ッ化物を谷融堪
攪偵処即によるのが一般的であったが。
Conventional - Materials made of Zr, Zr-based alloys, IIf, C and IHi, b alloys; Removal of the hexagonal oxide film produced by 5 mechanical fl r4 vF cutting Alloy 'tj L
It was common for ZrF4 and Noah to be investigated and investigated immediately.

前者の場合には、狭隘H1lや小さな凹i′il+ 、
あべ〕いは隅邪の被膜除去が困難であり、また地金もか
なり削り込んでしまうために歩留りの低下五−招くうえ
In the former case, the narrow H1l or the small concavity i′il+,
It is difficult to remove the coating of rough edges, and the base metal is also considerably etched away, resulting in a decrease in yield.

酸化被11はが極めて硬いので研削機の刃の損耗が著し
いものであった。一方、後場の場合+ctよ、高腐食1
生の俗融塩を高j温で1更用するため、な全面あるいは
コスト面で問題があるほか、地金のmm速度も極めて大
きいので歩留りが低くなり、さらに被膜除去処理後、全
組表面に付層してくる塩の除去作業が必要である等の不
都合ケ有していた。
Since the oxidized coating 11 was extremely hard, the blades of the grinding machine were significantly worn. On the other hand, in the latter case +ct, high corrosion 1
Since raw molten salt is used once at a high temperature, there are problems in terms of overall surface and cost, and the millimeter speed of the base metal is extremely high, resulting in a low yield. There were some inconveniences, such as the need to remove the salt that had accumulated on the surface.

そこで、このようf1表面酸化被膜の除去方法のほかに
Therefore, in addition to this method of removing the f1 surface oxide film.

■ 硝フン酸処理法 ■ HFカス処理法 ■ 1’Jli4F中での父流市、屏処理法等が試みら
れたが、1硝フツ酸処理法」でQ、32. riq”化
被811よりfl、l(金の俗)蝉速1ルg) h刀・
うi〈シ<人へい7;−めGこ極めて博い被膜((J、
J、 /1〕n 4’A 1jj−L丈ト)のトに人に
しか利用できず、かつtill、金Q)j全1’、”f
 !f、も人ムい/にいう入点があった。
■ Nitric and fluoric acid treatment method■ HF scum treatment method■ 1'Although the 1' Jli4F treatment method, etc., was attempted, Q, 32. riq” from 811 fl, l (gold common) cicada speed 1 ru g) h sword・
Ui〈shi〉human 7;-MeG very wide film ((J,
J, /1]n 4'A 1jj-L length) can only be used by people, and till, gold Q)j total 1', "f
! There was an entry point that said f.

′ま 7’h、Ifl F’  ガ ス クノル (−
中 bチ 1  と (1、イjン 〕をL 1甲 1
ノ/14  。
'Ma 7'h, Ifl F' Gas Knorr (-
Middle b 1 and (1, in) L 1 A 1
No/14.

まずJI F’ ”J 有カス流中f171−C5tJ
 O−6+1 (1(14’(JJII熱し、酸化被膜
と、地金の間(・こ7゛ノ累fL′4a′向C・)1.
・′1を一形成−ぜしぬ、然るr々、シュウ酸Jン七ニ
ウム:(ン。4モル、クエン酸アンモニウム: (1、
l fi ”F=ル、フッ化T 7 モ= ラム: (
1,1モー・し、 jQ jL、:b111’19 f
t: 7J〈A・二:11.3モルの混合液(90〜9
5C)中に7・メ漬シアー(フッ素化汁・吻を浴出させ
ることC′こよりh’s (j”、被11(御螢・刊1
−1(j’4:1方法であるが、この)j法でl” *
 l:’fl ’l!r品Q′こ1・いイ1(F  −
t  用いる ためにlど 全又、J i良:?(I 
乃くかさ 力 、 ツクL1明 二Tストが商くなると
いつ問題点か・イ′〕つ/午eそして、  I” NL
 F’中での父煽小1′I11処理法1 &、I、酸化
被lI■立の生成しているジルカロ・1角金浴1’14
C7+ [’fil処理法としでliq発されたもので
、2モルのフッ1ヒアンモニウムffj 7f9中に−
CO−1A/rA (r)iff、 %昌1j4.’ 
IJj −(+父流屯Mをイiい、地金全ある程度浴出
さ一艮ることによって酸化被膜を剥離する方法であるが
、この方法は1本来、金属全体の酊解を目的としたプロ
セスの111処理であるため1局部腐食が激しく、酸f
ヒ被膜のみの除去という目的に使用するには酸化被膜の
残留部分と地金の大量4g食部分が混在するようになる
という難点があった。
First of all, JI F' ”J
O-6+1 (1 (14' (JJII heat, between the oxide film and the base metal (・7゛ accumulation fL'4a' direction C・) 1.
・Formation of '1-zerinu, rru, J-7nium oxalate: (n. 4 mol, ammonium citrate: (1,
l fi ”F=le, fluoride T 7 mo=lam: (
1,1mo・shi, jQ jL, :b111'19 f
t: 7J〈A.2:11.3 mol mixture (90-9
5C) 7. Mezuke shea (fluoridated juice, to bathe the proboscis)
-1 (j'4:1 method, but this) j method l'' *
l:'fl 'l! r product Q'ko1・ii1 (F -
t To use it? (I
Nokukasa Riki, Tsuku L1 Akira When does the second T strike become a problem?
Zircalo-1 square gold bath 1'14 in which oxidized oxides are formed in F'.
C7+ ['fil treatment method, which was emitted by liq, and -
CO-1A/rA (r)iff, %Chang1j4. '
This is a method of removing the oxide film by bathing all of the base metal to some extent, but this method was originally a process aimed at degrading the entire metal. Because it is a 111 treatment, local corrosion is severe and acid f
When used for the purpose of removing only the arsenic film, there was a problem in that the remaining part of the oxide film and the large amount of 4g eroded part of the base metal were mixed together.

本発明者始は、上述のような観点から、安全上や過剰な
地金損失による歩留り低下という間にすを生ずることな
く、しかも棲雑な形状の物品であっても完全な処理が実
施でき、そして処理コストも低いrVa族金属基合金の
表面酸化被膜除去方法を見出すべく研究を行った結果、
以下faJ〜(e) Vこ7Jりず如き知見をイnるに
至ったのである。すなわち。
From the above-mentioned viewpoints, the inventors of the present invention have developed a method that can completely process even irregularly shaped articles without causing any problems related to safety or yield reduction due to excessive metal loss. , and as a result of research to find a method for removing the surface oxide film of rVa group metal-based alloys with low processing costs,
I have come to the following knowledge as faJ~(e)Vko7JRizu. Namely.

(at  Zr、Zr基合金、)lf、H,f基合金の
表面te化被被膜、電気的[は絶縁性が大であるけれど
も、屯M質溶液中で200V以下の交流電圧を印加して
特定糾の萌流全流すと絶縁破壊が表面全湊にわたって4
1:じ1表面酸化被膜に、地金にまで達する直径1,0
〜10011mの小孔が1ケ/ my? ’Hlxの密
度で′を成すること。
(at Zr, Zr-based alloys,) lf-, H-, f-based alloys have a surface te coating, which has high electrical insulation properties, but it is possible to apply an AC voltage of 200 V or less in a tungsten solution. When a certain amount of water is allowed to flow completely, dielectric breakdown occurs over the entire surface 4.
1: Di1 surface oxide film, diameter 1.0 that reaches down to the base metal
~10011m small hole/my? 'Hlx density'.

り)1図は、ジルカロイ−4のへソイ)1被眸がフッ化
′ノ゛ンモニウム水醪液中での市、用印力111cよっ
て絶縁破IHlij−さfLる反「1\が始脣つでから
5分後の告「11の様子を示す写真図であり5すでに酸
イヒ膜が月慴畠(、た部分と、絶縁破壊Vコよって生じ
た微却1孔(I4さ臓状Vこ見える)が13ぬられる。
1) Figure 1 shows a sample of Zircaloy-4 in which the specimen is placed in an aqueous solution of monomonium fluoride. This is a photographic diagram showing the condition of ``11'', which was published 5 minutes later. (visible) is colored 13.

しかモ、コノ現象Qj、地金可11i fm カ4” 
)04r(E していてもその表面が望気中で1自()
Q(二”t9. (酸イ]1されてしまうため、該節1
11部の存rL(−ないも(1)とN1に誦生ずる。そ
して、破膜のノ′、!さが5 Jim  程IR1Σノ
、上となっても、保護性金有する)部分の)−pをは1
−い−1げい5ttm  に止まり、それ以外の部分は
多数のクラックや刊1孔に富むた?【)、絶縁破壊のた
り)の印加?lCf−[−同、被II%)平がJ′〜大
しCも曲配置η1Hic←工]?1大−することがなく
、ま/杜、抽常の?il’、 l11′fと異なり絶縁
破壊が生な目的であるた)l)、被熱1iJl物がイリ
44fなll’41!をしていでも全表面に均−Vこ1
lll孔を形成できる?−と。
Shikamo, Kono phenomenon Qj, bullion possible 11i fm Ka4”
)04r(E Even if the surface is 1 self ()
Q(2”t9. (acid) 1), so the clause 1
Part 11 of the existence rL (- is recited in (1) and N1. And the part of the membrane rupture, ! 5 Jim degree IR1Σノ, even if it is above, it has a protective metal) part) - p is 1
-I-1 - 5ttm, and the rest of the area is full of many cracks and 1 hole. Application of [), dielectric breakdown]? lCf-[-same, II%) flat is J' ~ big C is also music arrangement η1Hic← 工]? 1. I don't have anything to do, and I don't have anything to do. Unlike il', l11'f, the purpose is to cause dielectric breakdown)l), and the heated object is 44f, ll'41! Even if the
Can llll holes be formed? - and.

fb、l  フッfL“アンモニウム層液がIVa 族
金J・191′、介金を俗解することは良く知られてい
るが、これにクエン酸・、シュウ酸、あるいは酒石酸の
アンモニウム塩、ナトリウム塩、カリウム塩、またはこ
れらの混合物の水溶Mを加え、pHk5〜6に維持でき
るようにすると、地金自身のmm速度が極めて低く抑え
られ、むしろ、地金と酸化被膜層の界面付近の、境界層
部分のmm速度が大きくなること。
fb, l fL "It is well known that ammonium layer liquid is commonly understood as IVa group metal J. When potassium salt or aqueous M of a mixture thereof is added to maintain the pH at 5 to 6, the mm velocity of the metal itself is suppressed to an extremely low level, and rather the boundary layer near the interface between the metal and the oxide film layer is suppressed. The mm velocity of the part increases.

第2図は、処理液による腐食進行の様子を示す写真図で
あV、左上が地金、その雌かは酸化被膜である。そして
、酸化被膜で白く見える部分14゜その下部がすでに腐
食されて地金との結合を失っている領域である。
FIG. 2 is a photographic diagram showing the progress of corrosion due to the treatment solution.V, the upper left is the base metal, and the lower left is the oxide film. The lower part of the part 14° that appears white due to the oxide film is an area that has already been corroded and has lost its bond with the base metal.

(c)シたがって、フン化アンモニウム水溶液に。(c) Therefore, in an aqueous ammonium fluoride solution.

クエン酸、シュウ酸、あるいは酒石酸のアンモニウム塩
、ナト+3ウム塩、カリウム塩1.またはこれらの混合
物の水my*加えて、PHを5〜6に維持できるように
した電解質浴液中で* Zr、Zr基及びI(f、Hf
基合金の表面酸化被膜に特定電流密度で交流上流すと、
前記酸化被膜に地金に達する均一な細孔全形成すること
ができ、さらに、これら細孔に酸化皮膜と地金との結合
が無くなり、酸化皮膜が地金から剥離すること。
Ammonium, sodium, and potassium salts of citric, oxalic, or tartaric acids1. Or add water to these mixtures in an electrolyte bath solution to maintain pH at 5 to 6.* Zr, Zr groups and I(f, Hf
When an alternating current is applied at a specific current density to the surface oxide film of the base alloy,
It is possible to form all uniform pores in the oxide film that reach the base metal, and furthermore, there is no bond between the oxide film and the base metal in these pores, and the oxide film is peeled off from the base metal.

tdl  前制電解質溶液中に硝酸アンモニウムのわず
かを存在させると、特にSn  k含有する合金の揚台
に酸fヒ皮膜剥離能力がさらに同上すること。
The presence of a small amount of ammonium nitrate in the tdl precontaining electrolyte solution further increases the ability of acid arsenic films to be removed, especially on SNK-containing alloys.

(e)  I、、I上のようなメカニズムであるから1
通711によって水素ガスを地金表面で発生させたり、
′出解質溶液中に超音波振動を印加したジすると、境界
層部分への新し、い反[5液の補給や、溶出した金属イ
オンの間隙部から外部への拡散促進、あるいは結合のゆ
るくなった酸化皮膜の剥離促進等の9’b果が得られる
こと。そして、水素カスの発生し:J、。
(e) I, , Since the mechanism is as above, 1
Hydrogen gas is generated on the surface of the metal by 711,
'When ultrasonic vibrations are applied to the solute solution, it replenishes new liquid to the boundary layer, promotes the diffusion of eluted metal ions to the outside from the gap, or promotes bonding. Benefits of 9'b, such as promoting the peeling of loose oxide films, can be obtained. And hydrogen scum is generated: J.

過酸化水素の添力!走に、よってよりj♀ぜ大されるこ
と、この発明は、上記知見に基づいてなさtしたもり〕
であり、酸化皮膜を有するZ r 、l r基合金、1
1!、Hf、Hf4合金を、フン化アンモニウムl’A
 tit: : (1゜1〜0.5モル、あるいはさら
に、該フッ化アンモニウA +7) 1/100〜11
5のlW[のイ11□1酌゛アンモニウムおよびフン化
アンモニウムの1710−・1/2  の8度の過酸化
水素の1棟以上全含み、かつ、クエン酸。
The power of hydrogen peroxide! This invention was made based on the above knowledge, and the running speed will be increased accordingly.]
and a Z r , l r based alloy with an oxide film, 1
1! , Hf, Hf4 alloy, ammonium fluoride l'A
tit: : (1°1 to 0.5 mol, or further, the ammonium fluoride A +7) 1/100 to 11
Contains at least one unit of 8% hydrogen peroxide of 1710-1/2 of ammonium and ammonium fluoride, and citric acid.

シュウ酸、脣た1よ酒石酸のアンモニウム堪、ナトリウ
ム埴、及びカリウム塩の1種以上を加えることによって
PII 5〜6を維持せしめた電解水溶液中にて、その
!、ま、あるいは超音波振動″I!′−該市′3解水酊
液に印7JII L iがらh 1hr流密度: O−
02〜0−5 A/alで交流量;解することにより、
地金の過度の溶解なしに表面酸化被膜を能率良く除去す
ることに特徴を有するものである。
In an electrolytic aqueous solution in which PII 5-6 was maintained by adding one or more of oxalic acid, tartaric acid, ammonium salt, sodium salt, and potassium salt, the! , or ultrasonic vibration ``I!'-The city'3 mark on the dehydrated liquor 7JII Ligarh 1hr flow density: O-
02-0-5 A/al is the amount of alternating current; by understanding,
It is characterized by efficiently removing the surface oxide film without excessively dissolving the base metal.

つぎに、この発明の方法に卦いて、処(lli液の組成
およびPI3.並ひに゛電流密度を前記のよう17も限
定した理由を説明する。
Next, regarding the method of the present invention, the reason why the composition of the LLI liquid, the PI3, and the current density are limited to 17 as described above will be explained.

ω フッ化アンモニウム濃度 第3図は、ジルカロイ−4を被処理材として使用した場
合に、同一の電流密度を得るのに必要な印加′tに圧に
対する水浴液中のフッ化アンモニウム#度の影響全示す
線図であり、第4図は5同じ被処理材のmm速度に対す
る液濃度の影響を示す線図であるが、これらの線図から
も明らかなように。
ω Ammonium fluoride concentration Figure 3 shows the influence of ammonium fluoride degree in the water bath liquid on the applied pressure required to obtain the same current density when Zircaloy-4 is used as the treated material. FIG. 4 is a diagram showing the influence of liquid concentration on the mm velocity of the same material to be treated, as is clear from these diagrams.

フッ化アンモニウム濃度が0.1モル未満では印加電圧
が高くなるうえ、処理液の劣化速度も速くなって処理作
業が困難となる。一方、フッ化アンモニウム濃度が0.
5モルを越えると、腐食速度が過大となって局部腐食を
生じ易ぐなり、また、同時に添加する緩衝剤がかなりの
高温まで過飽和となって析出するので好ましくない。こ
のようなことから、電解液中のフン化°アンモニウム濃
度f、0.1〜0.5モルと定めた。
If the ammonium fluoride concentration is less than 0.1 mol, the applied voltage will be high and the rate of deterioration of the treatment liquid will also be rapid, making treatment work difficult. On the other hand, the ammonium fluoride concentration is 0.
If it exceeds 5 moles, the corrosion rate becomes excessive and local corrosion tends to occur, and the buffer agent added at the same time becomes supersaturated and precipitates at a considerably high temperature, which is not preferable. For this reason, the ammonium fluoride concentration f in the electrolytic solution was determined to be 0.1 to 0.5 mol.

■ PH値 第5図は、mm速度に対するPHの影響を示す線図、第
6図は同一の電流密度を得るのに必要な印加電圧に対す
るPHの影響を示す線図であるが、これらの図からも、
P)1が5未満では腐食速度が過大になるとともに局S
腐食が発生し、−が6を越えると腐食速度が低下するに
もかかわらず消費電力量が大きくなって、いずれも好ま
しくないので両値を5〜6と定めた。
■PH value Figure 5 is a diagram showing the influence of PH on mm speed, and Figure 6 is a diagram showing the influence of PH on the applied voltage required to obtain the same current density. From too,
P) If 1 is less than 5, the corrosion rate will be excessive and the local S
If corrosion occurs and - exceeds 6, the amount of power consumption increases even though the corrosion rate decreases, which is not preferable, so both values were set at 5 to 6.

なお、第5図および第6図に示す実験を行うにあたって
…値を5未満にする場合にはクエン酸アンモニウムとシ
ュウ酸アンモニウムの良度の低下によジ、また5を越え
る場合にはアンモニアの添加によって、目的の…値とな
るように調整した、ωラ 緩衝剤の濃度 硝酸アンモニウム、過酸化水素、および、クエン酸、シ
ュウ酸または酒石酸のアンモニウム塩。
When conducting the experiments shown in Figures 5 and 6, it should be noted that if the value is less than 5, the quality of ammonium citrate and ammonium oxalate will deteriorate, and if it exceeds 5, the quality of ammonia will deteriorate. The concentration of the ω-ra buffer was adjusted to the desired value by adding ammonium nitrate, hydrogen peroxide, and ammonium salts of citric acid, oxalic acid, or tartaric acid.

ナ) IJウム塩及びカリウム塩等の緩衝剤の濃度につ
いては、処理液を用いて酸化皮膜を除去するのに必要な
上限時間である60−120分の間、液のPH値を5〜
6の間に保つためには第7図に示すようにフン化アンモ
ニウム濃度の1.5倍以」二であれば十分である、 特に、硝酸アンモニウム濃度を、フン化アンモニウムノ
1/lOO〜115の[tと定めたのは、ジルカロイ等
、 Sn  を含有する合金の場合、その含有率がせい
ぜい1〜2 q6に止まるためである。
n) Concerning the concentration of buffering agents such as IJium salt and potassium salt, the pH value of the solution should be adjusted to 5 to 5 for 60 to 120 minutes, which is the upper limit time required to remove the oxide film using the treatment solution.
In order to maintain the ammonium nitrate concentration at 1.5 times the ammonium fluoride concentration as shown in Figure 7, it is sufficient to maintain the ammonium nitrate concentration between 1/10 and 115 times the ammonium fluoride concentration. [The reason why t is determined is that in the case of alloys containing Sn such as Zircaloy, the content is limited to 1 to 2 q6 at most.

また、過酸化水素濃度を、フッ化アンモニウムの1/1
0〜1/2  の濃度と定めたのは、その濃度がフン化
アンモニウム濃度の1/10  未満では被処理物表面
における発泡効果が必要な時間だけ維持することが困難
であジ、一方1/2 ft越えると被処理物表面におけ
る発泡が過大となり、発泡による液面上昇が過大となる
In addition, the hydrogen peroxide concentration was reduced to 1/1 that of ammonium fluoride.
The reason for setting the concentration to be 0 to 1/2 is that if the concentration is less than 1/10 of the ammonium fluoride concentration, it will be difficult to maintain the foaming effect on the surface of the treated object for the necessary time; If it exceeds 2 ft, foaming on the surface of the object to be treated will become excessive, and the liquid level will rise excessively due to the foaming.

■ 電流密度 電流(M度が0 、02 A/al  未満では、処理
時の気泡発生級が少なくて酸化被膜剥離の促進効果が弱
(なり、一方005A/−を越えると発泡過大で液面上
昇がかなり大きくなるうえ1通電による液温上昇も太き
く、7oc以上の温度にまでなって冷却の必要を生ずる
ようになり、さらに、地金の浴出貨も太きくなって歩留
ジ低下を来たすことから、電流密度を0002〜0 、
5 A/cJと定めた。
■ Current density If the current density (M degree is less than 0.02 A/al), there will be less bubble generation during treatment and the effect of promoting oxide film peeling will be weak (on the other hand, if it exceeds 0.05 A/-, the liquid level will rise due to excessive foaming. In addition, the temperature of the liquid increases considerably with each energization, reaching a temperature of 7 oc or more, requiring cooling.Furthermore, the metal bath output also increases, causing a drop in yield. Therefore, the current density is set to 0002~0,
5 A/cJ.

処理液の温度については、第8図の浴解速匿に対する液
温度の影響を示す線図からも明らかなように、その上昇
とともに腐食速度も増大するものであるが、70Cを越
えると発泡が過大となり。
Regarding the temperature of the treatment solution, as is clear from the diagram showing the influence of solution temperature on bath decomposition speed in Figure 8, the corrosion rate increases as the temperature increases, but foaming occurs when the temperature exceeds 70C. It becomes excessive.

80’C以上になるとこの現象が極めて激しくなること
もあって、700以下に抑えるのが好ましい。
If the temperature exceeds 80'C, this phenomenon may become extremely severe, so it is preferable to keep it below 700C.

なお、以上に示した各データはジルカロイ−4について
のものであるが、その他のZr、Zr基合金。
Note that the data shown above is for Zircaloy-4, but it also applies to other Zr and Zr-based alloys.

およびHf、Hf基合金についても同様の結果が得ら几
た、 ところで、この8明を実施するにあたって、電解処理の
前処理として被処理材Vこ熱衝撃あるいは機械的衝撃分
与えfl、 !−,j、酸化被膜に微卸1なりラックが
生じて酸化被膜剥離が容易となるので好舊しく、また、
この発明の方法を実施し7た後に、何C)かの埋置で−
j%B酸化1g膜が残留t、−Cしiつブξ場合には、
後処理と[,7て硝フッ酸浴液に浸拍するか、金属ブラ
シやヤスリかけによって残留度11C4をft易に除去
することができる。そし7て、硝フッ酸溶液に浸漬する
場合(では、処理液中に超音波全発振するとより良い効
果がイPI−1れることも確認(−た。
Similar results were obtained for Hf and Hf-based alloys. By the way, in carrying out this 8-day process, as a pre-treatment for the electrolytic treatment, a thermal shock or a mechanical shock is applied to the treated material. -, j, it is preferable because a slight rack is formed in the oxide film, making it easier to peel off the oxide film, and
After carrying out the method of this invention, some C) implantation-
If j%B oxide 1g film remains t, -C and ξ, then
After treatment, residual 11C4 can be easily removed by immersion in a nitric-hydrofluoric acid bath or by sanding with a metal brush. It was also confirmed that when immersing in a nitric-hydrofluoric acid solution (PI-1), a better effect can be obtained if the entire ultrasonic wave is oscillated in the treatment solution.

1.2ついで、仁の発明を実施例により説明する。1.2 Next, Jin's invention will be explained with examples.

実施例1 まず、成分組成が、 Sn:1.50 MC’@’、a
、 F’e:(1,20M1%、Cr:0,10重fa
 % 、 Nl : 0−002 ’i ii%、zr
:残り、であるジルカロイ−4管(外径:]0.7E。
Example 1 First, the component composition is Sn: 1.50 MC'@', a
, F'e: (1,20M1%, Cr:0,10 heavy fa
%, Nl: 0-002'i ii%, zr
: The remainder is Zircaloy-4 tube (outer diameter:] 0.7E.

肉厚:0.62F+、長さ: 100ffIL、 酸化
被膜J”t : 部分によって異なるが3〜5μtn)
を用、籾し、第9図に示1.7たような9流童解表面除
染実験v箇に−よつで交流71j、 jF! ?実施し
、た。第9図において、工はフッ素樹脂製ビーカー、2
は被熱理相 31.1.7 /メ、樹脂被覆ヒータ、4
はフッ素側11t&被偵11、^i:、+−iii 、
  5は超音波洗浄機、6(l−j:車tTτMt、7
&よ山6i口:l *  ン号を1スシイダツクである
Thickness: 0.62F+, length: 100ffIL, oxide film J”t: 3~5μtn depending on the part)
The paddy was harvested and then subjected to a surface decontamination experiment as shown in Figure 9. ? carried out. In Figure 9, the work is a fluororesin beaker, 2
31.1.7 /Me, resin coated heater, 4
is fluorine side 11t & subject 11, ^i:, +-iii,
5 is an ultrasonic cleaner, 6 (l-j: car tTτMt, 7
&Yoyama 6i mouth: l * N is 1 sushi datsuk.

そ[、て、このときのTll解条1″口、1,1・;1
1:のと1・・すCあった、 処理液組成:フッ化アンモニウム・・−0゜:j〔ル。
So [, te, at this time Tll release 1'' mouth, 1, 1, ;1
1: Noto 1...C was present. Processing liquid composition: Ammonium fluoride...-0゜:j[ru.

6肖1冑アンモニウム・・0005モノ電。6.1 Ammonium...0005 Monoden.

シュウ酸アンモニウム・・()。l−1ニル。Ammonium oxalate (). l-1 nil.

クエン酸アンモニウム・・・l七ノ(。Ammonium citrate...l7 (.

過酸化水素・・・0.1モル。Hydrogen peroxide...0.1 mol.

液相: 700荀e。Liquid phase: 700 e.

液のpH: 5 。pH of liquid: 5.

電流密度: (1,1A、/cd 。Current density: (1,1A,/cd).

液温度ニア(JC。Liquid temperature near (JC.

処理時間:40分。Processing time: 40 minutes.

電解処理後、被処理材たるジルカロ4−11’fの表面
を観察したところ、酸化@119が完全にφ’I +’
:li除去されていることが確認された。
After the electrolytic treatment, we observed the surface of Zircalo 4-11'f, which was the material to be treated, and found that the oxidation @119 was completely φ'I +'
:li was confirmed to have been removed.

実M例2 1117厘f条f1が。Actual M example 2 1117 line f article f1.

処理yM Jitl a :フツ化アンモニウム・・−
0,1モル。
Processing yM Jitla: Ammonium fluoride...
0.1 mole.

クエン酸アンモニウム・〜0.5−rニル、液肘ニア0
0m!、 蔽のPII : 5 。
Ammonium citrate ~0.5-r, liquid elbow 0
0m! , Cover PII: 5.

電流密度:0003A/d。Current density: 0003A/d.

液温度ニア0C。Liquid temperature near 0C.

処理時間:90分。Processing time: 90 minutes.

とした以外は実施例1と同様にしてシルツノ0イー!1
′#全処理したところ、やにり酸化曳p、/バ完全に剥
離除去されていることが確聞さノ]、た、実施M+ 3 )If  の板材(幅:20餌、Jワさ:2富)、艮き
:IQQII11..酸化被膜If: 61tm)  
f用意し、第9図に示したような交流電解表面除染実験
装置6てよって交流電解を実施【、た、 このときの電解条件は下記のとおりであった。
The procedure was the same as in Example 1, except that Shirutsuno0E! 1
'#After the complete treatment, it was confirmed that the Yani oxidation was completely removed and removed.], Implementation M+ 3) If plate material (width: 20 baits, J width: 2 Tomi), costume: IQQII11. .. Oxide film If: 61tm)
AC electrolysis was carried out using the AC electrolysis surface decontamination experimental apparatus 6 as shown in Fig. 9.The electrolysis conditions at this time were as follows.

処理W 組成:フッ化アンモニウム・・・0.5モル。Treatment W Composition: Ammonium fluoride...0.5 mol.

クエン酸アンモニウム・・・1.5モル。Ammonium citrate...1.5 mol.

液輸ニア00mg。Fluid transfusion 00mg.

液の、[+: 5、 膚流密度: 0.5A/、−4。liquid, [+: 5, Skin flow density: 0.5A/, -4.

液温度ニア0C。Liquid temperature near 0C.

処理時間二60分。Processing time: 260 minutes.

電解処理後の祷処理月孕観整したところ、r俊fヒ皮膜
が完全に剥離除去されでいることが111をされし 実施例4 酸化被膜厚が6μm のシルカロー1−4 肯k 71
1い、電解条件を、 液温:65C。
After the electrolytic treatment, it was confirmed that the oxidation film had been completely peeled off and removed after the electrolytic treatment.
1. Electrolytic conditions: Liquid temperature: 65C.

市、面密度:0.1Δ/dを維持(但し7.印〕Jl+
串ル+:j、 。
City, areal density: Maintain 0.1Δ/d (however, 7. mark) Jl+
Kushiru+:j, .

初期が130V、末期がfiOVとなった)。The initial stage was 130V, and the final stage was fiOV).

超音波:甫解処理中発撮。Ultrasound: Taken during the dissolution process.

としたほかは、実施例1と同イ子の条1・1で744.
1竹処理を実施した。
744. in Article 1.1 of the same example as Example 1, except that
One bamboo treatment was carried out.

処理後のジルカロイ−4wに仁王、)Y□沢のない灰褐
色のスケール(王としてジルコニウム酸化′1qがら成
る)が表面に付着しているのが認められた。
After treatment, it was observed that a grey-brown scale (consisting of zirconium oxide '1q' as the king) with no sag was attached to the surface of Zircaloy-4W.

このスケールは、初めの黒色酸化被膜と暴なり。This scale is similar to the initial black oxide film.

ワイヤブラシでこする等の処理でも容易に除去できるよ
うな、地金とゆるい結合を持つスケールであった、 そこで、後処理として、こルL硝酸二8モル。
The scale was loosely bonded to the base metal and could be easily removed by scrubbing with a wire brush.Therefore, as a post-treatment, 28 mol of Kol-L nitric acid was used.

フン酸二0.5モルの溶液中に、超音波振動発振下で3
0分間v漬したところ、管の内面、外面とも酸化被膜が
完全に除去された。
In a solution of 0.5 mol of hydrofluoric acid, 3
When the tube was soaked in a vat for 0 minutes, the oxide film was completely removed from both the inner and outer surfaces of the tube.

なお、酸化被膜の剥離と、地金の浴出と金込みで計算し
た腐食速度は。
In addition, the corrosion rate was calculated based on the peeling of the oxide film, the extraction of the base metal, and the inclusion of metal.

@1段処理: 61.4 ”F/ drr?/ynim
@1 stage processing: 61.4 ”F/ drr?/ynim
.

後処理: 45.4岬/ dm’/m 。Post-processing: 45.4 cape/dm’/m.

であった。Met.

実施例5 処理中に超+1波振動を印力口しなかった以外は実施例
4と四二の条件でジルカロイ−4管を処理した。
Example 5 Zircaloy-4 tubes were treated under the conditions of Examples 4 and 42, except that ultra+1 wave vibration was not applied during the treatment.

その結果、腐食速度は。As a result, the corrosion rate is.

第1段処浬: 53.7キ/dイ/−1降処理: 43
.8 #v/ dn? 7ml’q、と低下し、黒色酸
化被膜のスポットの残1竹がF、Yめられた。
1st stage processing: 53.7ki/dii/-1 descent processing: 43
.. 8 #v/dn? The amount decreased to 7 ml'q, and the remaining one spot of the black oxide film was graded F and Y.

実施例(5 処理液組成とじで過酸イヒ水素を力11えない以外t:
↑実施例4と同一の条件でジルカロイ−1’f? %・
ケL即した。
Example (5) Except for not adding hydrogen peroxide to the composition of the treatment solution:
↑Zircaloy-1'f under the same conditions as Example 4? %・
I did it immediately.

その結果、腐食速度に ff1l処理: 45−8 W/ dn?/n+’q 
As a result, the corrosion rate of ff1l treatment: 45-8 W/dn? /n+'q
.

に低下し、気泡発生の低下が認められ/ζ。and a decrease in bubble generation was observed.

実施IQ 7 実施f!Al 4におけると四柱のジルカロイ−41i
!jを、まず、6oocK保持しf?:、 ?lS夕I
り“内に挿入し、該温度に達した後、室温の水中に投入
する操作全3回反復した。イの結果、酸化被膜表向には
第10図として示す写真図のような細かいクラックが発
生し、実施例4におけると同じ処+11+Φ作であって
も、印加布、IE:80V(初期)〜4 (J V C
末1llI)でもI A/ryrlの軍流密度を与える
ことがでAた。イして、45分の処理時間で酸化lJI
膜k・除くことができ、俊処理を砦することなく、金属
光沢のある汀を浄な表面を一得ることができた、 上述のように、この発明によj、ば、Z r + Z 
r基合金、またにIlf、Hf基合金の酸化被膜除去に
際して。
Implementation IQ 7 Implementation f! Zircaloy-41i with four pillars in Al 4
! j, first hold 6oocK and f? :, ? lS evening I
After the temperature reached the desired temperature, the operation was repeated three times in total. Even if it is the same place + 11 + Φ production as in Example 4, the applied cloth, IE: 80V (initial) ~ 4 (J V C
It was also possible to give a military flow density of IA/ryrl. oxidized lJI with a treatment time of 45 minutes.
As mentioned above, with this invention, it was possible to remove the film and obtain a clean surface with a metallic luster without having to worry about rapid processing.
For removing oxide films from r-based alloys, Ilf-based alloys, and Hf-based alloys.

(II  狭隘部や四部の酸化被膜も容易に除去できる
(II) The oxide film on the narrow parts and the four parts can be easily removed.

(11)  地金の(h失Iが少なく1歩留りが回−ヒ
する。
(11) The loss of I of the bullion is small and the yield is increased.

すなわち、地金の溶出は、厚さにして40〜80μmの
範囲に収咬る、 11iJ  安価な装置と材お+で処理できる、(lv
7  人手容易な50Hzまたは60 H,zの交流電
源がそのま1利用できる。
In other words, the elution of the base metal is limited to a thickness in the range of 40 to 80 μm, and can be processed using inexpensive equipment and material.
7. Easy-to-handle 50Hz or 60Hz AC power source can be used as is.

(vl  操作の安全性が高い。(vl Operation safety is high.

Ml  l+lえは第9Mに示したように、同時に2体
の被処理物が処理できる。
As shown in No. 9M, two objects to be processed can be processed at the same time.

等のすぐれた効果を得ることができ、 θ)  Zr、Zr基合金、またはHf、Hf基合金鋳
造の際に鋳塊表面に形成される酸fヒ被膜の除去。
θ) Removal of the acid and arsenic film formed on the surface of the ingot during casting of Zr, Zr-based alloys, or Hf, Hf-based alloys.

qし 同じく、鍛造の際に鍛造品の表面上に形成さルる
酸化被膜の除去。
Similarly, removal of oxide film formed on the surface of forged products during forging.

(1111同じく、熱処理によって表面に形成される酸
化被膜の除去。
(Same as 1111, removal of oxide film formed on the surface by heat treatment.

Q 同じく、暦食性環境におけるイII2用1411間
中に生成した表面酸化被膜の除去。
Q: Similarly, removal of the surface oxide film formed during the 1411 process in the eclipse environment.

(V)  表面酸化被膜がIl’4成さil、でいるZ
r + Z を左手)金、またはHf、Hf基合金のス
クラップ杓回収のil処理としての酸化被膜の除去。
(V) Z where the surface oxide film is formed Il'4
r + Z on the left) Removal of oxide film as il treatment for scrap recovery of gold, Hf, and Hf-based alloys.

等に適用して、すぐれた成果を得ることができるなど、
工業上有用な効果がもたらされるのである、
It can be applied to other areas to obtain excellent results, etc.
Industrially useful effects are brought about.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は事M液中での宙圧印IJI+によって金属tす
化被膜の絶縁破壊反応が始まった様子を示す?IT子顕
微鏡写真図、第2図IrJ、電解液による腐食通行の様
子を示す電子顕微鏡写真図、甲、3図は向−爪部密度を
得るのに必要な印加重圧に対する液濃度の影響を示す線
図、第4図は溶屏律凹に対する沿濃度の影響を示す線図
、第5図は耐jII¥沈μl−に対する一Jの影響を示
す線図、第6図はml−の市流密黒]を得るのに1必要
な印りn′由lF、に対する−1の影響を示す緑図、第
7図はPH値の変化に対する液組成の影響を示す線図、
第8図は浴M速度に対する液温度の影lif金示す線図
、第9図に父流東解表面に11染装置の概略構成図、第
10図は前処理によってクランクが発生した酸イヒ被膜
金示す電子顕微鏡写真図である。 図面において。 1・・・フン素樹脂製ビーカー。 2・・・処理材。 3・・・フッ素樹脂被0ヒータ。 4・・・フッ素樹脂被覆温度唱。 5・・・超音波洗浄機、6・・・電圧計、7・・・電5
流泪、    8・・・スライダック。 出願人  三菱金属株式会社 代nn 人g  L(l  fll  夫 r/1か1
名−ピ ≠ 1 図 In’++Y1 第2図 0Pm 乍3m 学4図 7−/イLγンtニフ4膚、llEmOQ)葦5図 秦7図 手続補正占(自発) 昭和57年10月8日 特許庁長官 若 杉 和 夫   殿 2 発明の名称 ZrおよびHf並びにその合金の表面酸化被膜除去方法 3、補正をする者 4、代 理 人 !11・11  東京都丁・代111区神111錦町−
JII′23番地宗保第二ビル8階 7、補1Fの内容  別紙の通り (1)  明細書、発明の詳細な説明の頂、上記の各箇
所、 「皮膜」とあるを、 「被膜」と3J正する。 記 ■ 明細書、第13頁、第17行、および第181f、
■ 明細書、第12頁、第2行(2箇所)、第6行、第
12行、および第16行、 ■ 明細書、第15行、第7行、 ■ 明細書、第17頁、第7首、および第9行、■ 明
細書、第19自、第11行、 ■ 明細書、第2()頁、第7行、 ■ 明細書、第22頁、第20行。 (2)  明細書、第0貞、発明の詳A111な説明の
珀、第17行〜第18行、 「印加して特定h(の電θ11不−流−4−と1.!−
ある苓−1「印加すると」と訂11−する。 (3)  第7図を別紙の通りにil’ +lJ−る0
8、 添付書類の目録 (1)訂正図面(第7図)     1 道具  上
Figure 1 shows how the dielectric breakdown reaction of the metal tungsten film begins due to the space stamp IJI+ in the liquid. IT electron microscope photograph, Figure 2 IrJ, electron microscope photograph showing the state of corrosion caused by electrolyte, Figure A, Figure 3 shows the influence of liquid concentration on the applied pressure necessary to obtain the density of the opposite claw part. Figure 4 is a diagram showing the influence of lateral concentration on the liquefaction rate, Figure 5 is a diagram showing the influence of 1J on the resistance to jII\sinking μl-, and Figure 6 is a diagram showing the influence of ml- on the commercial flow of ml-. A green diagram showing the influence of -1 on the mark n' y F, which is necessary to obtain 1 [dense black], Figure 7 is a diagram showing the influence of liquid composition on changes in pH value,
Figure 8 is a diagram showing the influence of liquid temperature on the bath M velocity, Figure 9 is a schematic diagram of the dyeing equipment 11 on the surface of the father's flow, and Figure 10 is the acid coating that has been cracked by pretreatment. It is an electron micrograph diagram showing gold. In the drawing. 1... Beaker made of fluorine resin. 2... Treated material. 3...Fluororesin coated heater. 4...Fluororesin coating temperature singing. 5... Ultrasonic cleaner, 6... Voltmeter, 7... Electric 5
Flowing Tears, 8...Sly Duck. Applicant Mitsubishi Metals Co., Ltd. nn Person g L (l fll Husband r/1 or 1
Name - P≠ 1 Fig. In'++Y1 Fig. 2 0Pm 乍3m Gaku4 Fig. 7-/I Lγnt nif 4 skin, llEmOQ) Reed 5 Fig. Qin 7 Fig. Procedural correction divination (spontaneous) October 8, 1982 Kazuo Wakasugi, Commissioner of the Japan Patent Office 2 Name of the invention: Method for removing surface oxide film on Zr and Hf and their alloys 3, Person making the amendment 4, Agent! 11/11 Tokyo 111-ku Kami 111 Nishikicho-
Contents of Supplementary 1F, 7th Floor, 8th Floor, Soho Daini Building, No. JII'23 As attached (1) At the top of the specification, detailed explanation of the invention, in each of the above locations, the word "film" is replaced with "film" in 3J Correct. ■Specification, page 13, line 17, and 181f,
■ Specification, page 12, line 2 (2 places), line 6, line 12, and line 16, ■ Specification, line 15, line 7, ■ Specification, page 17, line Head 7 and line 9, ■ Specification, page 19, line 11, ■ Specification, page 2 (), line 7, ■ Specification, page 22, line 20. (2) Specification, No. 0, Detailed Description of the Invention, A111, Lines 17 to 18, ``Applying the specified h(electrical θ11 current -4- and 1.!-
A certain Ryo-1 corrects 11- ``When applied.'' (3) il' +lJ-ru0 according to Figure 7 as attached.
8. List of attached documents (1) Corrected drawings (Figure 7) 1. Tools 1.

Claims (4)

【特許請求の範囲】[Claims] (1) 酸化被膜を有するZrおよびHf、並びにそn
らの合金を、フン化アンモニウム濃度=0.1〜0.5
モル。 で、かつ、クエン酸、シュウ酸、またけ酒石酸のアンモ
ニウム塩、ナトリウム塩、及びカリウム塩の1種以上を
加えることによってP1]5〜6f:維持せしめた電解
水溶液中にて、電流密度=0.02〜0 、5 A/r
Jで交流電解することを特徴とする。 ZrおよびHf
  並ひにそれらの合金の茨面酸化被膜除去方法、
(1) Zr and Hf with oxide film, and
ammonium fluoride concentration = 0.1 to 0.5
Mol. And, by adding one or more of ammonium salt, sodium salt, and potassium salt of citric acid, oxalic acid, and tartaric acid, P1]5 to 6f: Current density = 0 in the maintained electrolytic aqueous solution. .02~0,5 A/r
It is characterized by AC electrolysis at J. Zr and Hf
In addition, a method for removing the thorny oxide film on those alloys,
(2)酸化皮膜を有するZrおよびHf、並びにそれら
の合金を、フッ化アンモニウム濃度:0.1〜0.5モ
ル、 硝酸アンモニウム濃度:フン化アンモニウムの1、/1
00〜J15のri″11度、で、かつ、クエン酸、シ
ュウ酸、寸たは酒石酸のアンモニウム塩、ナトリウムJ
i、及びカリウノ、塙の1種以上を加えることによって
PH5〜6を#I#持せしめた電解水溶液中にて、市、
面密度: 0.(12〜0゜5 A/−で交流電解する
ことを特徴とする、ZrおよびHf 並ひにそれらの合
金の衆面酸化波tl’ii l!、′I去去状法
(2) Zr and Hf having an oxide film, and their alloys, ammonium fluoride concentration: 0.1 to 0.5 mol, ammonium nitrate concentration: 1/1 of ammonium fluoride
00~J15 ri″11 degrees, and ammonium salt of citric acid, oxalic acid, or tartaric acid, sodium J
In an electrolytic aqueous solution that has a pH of 5 to 6 by adding one or more of I, Kariuno, and Hanawa, Ichi,
Areal density: 0. (The general oxidation wave tl'ii l!,'I removal method of Zr and Hf and their alloys, characterized by alternating current electrolysis at 12~0°5 A/-
(3)酸化被膜を有するZrおよびHf、 111?ひ
に−そ−れclの合金を。 フッ化アンモニウノ、濃度:0゜1〜()。5モル、過
酸化水素濃度:フン化アンモニウムの1 / 1.0〜
]/2の1度。 で、かつ、クエン酸、シュウ酸、えたは酒石酸のアンモ
ニウム塩、ナトリウム塩、及びカリウ/、 j該の1種
以上を加えることによってPt+ 5〜6を維持せしめ
た電解水溶液中にて、電流密1ル:0゜()2〜0.5
 A、/Jでy流雷解すること1′’I!+’徴とする
。  ZrおよびHf  並びにそnらの合金の表面酸
化被膜除去方法、
(3) Zr and Hf with oxide film, 111? Hini Sore Cl alloy. Ammonium fluoride, concentration: 0°1~(). 5 mol, hydrogen peroxide concentration: 1/1.0 of ammonium fluoride
]/2 1 degree. And, ammonium salt, sodium salt, and potassium salt of citric acid, oxalic acid, or tartaric acid are added to the electrolytic aqueous solution in which Pt+ 5 to 6 is maintained by adding one or more of these. 1 le: 0゜()2~0.5
A, /J to understand the y style 1''I! +' sign. Method for removing surface oxide film of Zr and Hf and their alloys,
(4)  酸化被膜を有するZr卦よひHf、並ひにそ
nら合金を。 フッ化アンモニウム濃度=0.1〜0.5モル。 硝酸アンモニウム濃度:フッ化アンモニウムの1/10
0〜115の61度。 過酸化水素濃度:フッ化アンモニウムの1/1o〜1/
2の# 11 。 で、かつ、クエン酸、シュウ酸、または酒石酸のアンモ
ニウム塩、ナトリウム塩、及びカリウム塩の1揮以上を
)JlえることによってP115〜6を維持せしめた電
解水浴液中にて、゛「に流密度: 0.02〜0.5A
/4  で交流電解することを特徴とする、Zrおよび
Hf並ひにそれらの合金の表面酸化被膜除去方法。 +51  酸化被膜を有するZr卦よびHf、並びにそ
れらの合金を、 フッ化アンモニウム濃hi:0゜1〜0.5モル。 で、かつ、クエン酸、シュウ酸、または酒石酸のアンモ
ニウム塩、すトリウl−塩、及び1ノリウノ、j1%の
1抽以上全力日えることによってPl(5〜Gを維持せ
しめるとともに、超音波撮動を印加(、fr、 Tft
解水浴液中にて、宙、流密度二〇。02〜・0゜5A/
L−4で−交流電解することを特徴とするs Zr”・
よひIl、f51F・ひυ(−それらの合金の表向酸化
被Ilψ除人力法、(6)酸化被)IU ?有するZr
 丸−、I O−Jl、r 、 ’、fly、 lj、
)III −t−れらの合金を。 フッ化アンモニウム濃11 : 0゜1へ・0゜5モル
5硝酸アンモニウJ、濃度:フッfヒノ′−/モ−ウ/
・の1/10(1−−・+15 q) +、l;711
η。 で、かつ、クエンl″tす、シフ、つ自(”、!tμ−
はイ]当イi月で6′)アンモニウム塩、ナトリウA 
J4’4、及びカリウノ、11■の】A4以上を刀0え
ることによて)で、、115〜6分iN[1〒、ぜしめ
るとともに、超t1波振i+ill (r−印〕J]1
シた山)す7水m液中にて、°市、流密度二〇。02〜
0゜fiA/−で交汚甫、解することを特徴とする、Z
r:I、・よひITf 、lD D’にそnらの合金の
表面酸化被膜除去ノj法。 +71  酸化被膜をイ1するZrオ、・上ひ11f、
並ひ例−’(−れらの合金を。 フッ化アンモニウム濃IF:0.1〜0.5モル。 過酸化水素@度:フン化アンモニウJ・のl/10〜1
/2の濃度。 で、カッ、クエン酸、シュウ酸、または酒石酸のアンモ
ニウム塩、ナトリウム塩、及びカリウ裔塩の1種以上を
加えることによってP)l 5〜6を維持せしめるとと
もに、超音波振動?印力口した市、解水浴液中にて、電
流密度:0゜02〜0.5A/d  ’″C父流電流電
解ことを特徴とする。 ZrおよびHf並ひにそれらの
合金の表面酸化被膜除去方法、(8)  酸化被膜を有
するZr:13−よびHf、並びにそれらの合金を。 フッ化アンモニウム濃1i:0.1〜0.5モル。 硝酸アンモニウム濃度:フッ化アンモニウムの1/10
0〜115の濃度。 過酸化水素濃度:フッ化アンモニウムの1/10〜1/
2の濃度。 で、かつ、クエン酸、シュウ酸、または酒石酸のアンモ
ニウム塩、ナトリウム塩、及びカリウム塩の1棟以上を
加えることによってPF(5〜6を維持せしめるととも
に、超音波振Qfllを・印加した市ノゲ?Zk済液中
にて、tJt、流密度:0゜02〜・0゜5 A/LJ
  で交能市5角了することを特徴とする、Zrよ?よ
ひHf il[;びにそ扛らの合金の板面酸化被膜に+
ニー;E:方法。
(4) Zr, Hf, and other alloys with oxide films. Ammonium fluoride concentration = 0.1-0.5 mol. Ammonium nitrate concentration: 1/10 of ammonium fluoride
61 degrees from 0 to 115. Hydrogen peroxide concentration: 1/1o to 1/1 of ammonium fluoride
2 #11. and in an electrolytic water bath solution maintained at P115-6 by adding one or more ammonium salts, sodium salts, and potassium salts of citric acid, oxalic acid, or tartaric acid. Density: 0.02~0.5A
A method for removing a surface oxide film of Zr, Hf, and alloys thereof, the method comprising performing alternating current electrolysis at a temperature of /4. +51 Zr squares and Hf having an oxide film, and their alloys, ammonium fluoride concentration: 0°1 to 0.5 mol. At the same time, the ammonium salt of citric acid, oxalic acid, or tartaric acid, triuric acid salt, and 1% or more of citric acid, oxalic acid, or tartaric acid are maintained at full strength for at least 1 day to maintain Pl (5 to G), and ultrasonic imaging Apply motion (, fr, Tft
In the dehydration bath, the air flow density is 20. 02~・0゜5A/
s Zr” characterized by AC electrolysis in L-4
Yohi Il, f51F・hiυ (-surface oxidation of those alloys Ilψ removal force method, (6) oxidation) IU? has Zr
Maru-, I O-Jl, r, ', fly, lj,
)III-t-these alloys. Ammonium fluoride concentration 11: 0° 1 to 0° 5 mol 5 ammonium nitrate J, concentration:
1/10 of ・(1−−・+15 q) +, l; 711
η. And, Kuen l''t, Schiff, Tsuji ('',!tμ-
6') Ammonium salt, sodium A in the current month
J4'4, and Kariuno, 11■] By adding A4 or higher), 115 to 6 minutes iN [1〒, with the addition of super t1 wave vibration i+ill (r-marked) J] 1
In a 7 m water solution, the flow density is 20°. 02~
Z, characterized by the exchange and decontamination at 0゜fiA/-
r: Method for removing surface oxide film from alloys of I, ITf, ID D' and others. +71 Zr o, which removes the oxide film, 11f,
Parallel example-'(-These alloys. Ammonium fluoride concentrated IF: 0.1 to 0.5 mol. Hydrogen peroxide @ degree: Ammonium fluoride J. l/10 to 1
/2 concentration. By adding one or more of ammonium salt, sodium salt, and potassium salt of potassium, citric acid, oxalic acid, or tartaric acid, P)l 5 to 6 is maintained, and ultrasonic vibration? It is characterized by current electrolysis with a current density of 0°02 to 0.5 A/d''C in a dehydration bath solution.Surface oxidation of Zr and Hf and their alloys. Film removal method, (8) Zr:13- and Hf having oxide films, and alloys thereof. Ammonium fluoride concentration 1i: 0.1 to 0.5 mol. Ammonium nitrate concentration: 1/10 of ammonium fluoride.
Concentrations from 0 to 115. Hydrogen peroxide concentration: 1/10 to 1/ of ammonium fluoride
Concentration of 2. And, by adding one or more of ammonium salt, sodium salt, and potassium salt of citric acid, oxalic acid, or tartaric acid, PF (5 to 6) was maintained, and ultrasonic vibration Qfl was applied. ?Zk in finished liquid, tJt, flow density: 0°02~・0°5 A/LJ
Zr-yo, which is characterized by the completion of five corners in Konoichi? Yohi Hfil[;
Knee; E: Method.
JP15787382A 1982-09-10 1982-09-10 Method for removing surface oxide film of Zr and Hf and their alloys Expired JPS6056797B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15787382A JPS6056797B2 (en) 1982-09-10 1982-09-10 Method for removing surface oxide film of Zr and Hf and their alloys

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15787382A JPS6056797B2 (en) 1982-09-10 1982-09-10 Method for removing surface oxide film of Zr and Hf and their alloys

Publications (2)

Publication Number Publication Date
JPS5947400A true JPS5947400A (en) 1984-03-17
JPS6056797B2 JPS6056797B2 (en) 1985-12-11

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6162301A (en) * 1997-10-21 2000-12-19 Lam Research Corporation Methods and apparatus for cleaning semiconductor substrates after polishing of copper film
US6303551B1 (en) 1997-10-21 2001-10-16 Lam Research Corporation Cleaning solution and method for cleaning semiconductor substrates after polishing of cooper film
US6479443B1 (en) 1997-10-21 2002-11-12 Lam Research Corporation Cleaning solution and method for cleaning semiconductor substrates after polishing of copper film
US6593282B1 (en) 1997-10-21 2003-07-15 Lam Research Corporation Cleaning solutions for semiconductor substrates after polishing of copper film

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6162301A (en) * 1997-10-21 2000-12-19 Lam Research Corporation Methods and apparatus for cleaning semiconductor substrates after polishing of copper film
US6165956A (en) * 1997-10-21 2000-12-26 Lam Research Corporation Methods and apparatus for cleaning semiconductor substrates after polishing of copper film
US6303551B1 (en) 1997-10-21 2001-10-16 Lam Research Corporation Cleaning solution and method for cleaning semiconductor substrates after polishing of cooper film
US6479443B1 (en) 1997-10-21 2002-11-12 Lam Research Corporation Cleaning solution and method for cleaning semiconductor substrates after polishing of copper film
US6593282B1 (en) 1997-10-21 2003-07-15 Lam Research Corporation Cleaning solutions for semiconductor substrates after polishing of copper film

Also Published As

Publication number Publication date
JPS6056797B2 (en) 1985-12-11

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