JPS58100439A - Prober - Google Patents
ProberInfo
- Publication number
- JPS58100439A JPS58100439A JP19854981A JP19854981A JPS58100439A JP S58100439 A JPS58100439 A JP S58100439A JP 19854981 A JP19854981 A JP 19854981A JP 19854981 A JP19854981 A JP 19854981A JP S58100439 A JPS58100439 A JP S58100439A
- Authority
- JP
- Japan
- Prior art keywords
- probe
- terminal
- tip
- inspection
- chemical etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Measuring Leads Or Probes (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は精度の良いプルービングを行うことのできるプ
ローパに関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a propper that can perform proving with high precision.
一般に、たとえば集積回路(IC)や大規模集積(9)
路(LSI)等の半導体装置の製造過程においては、電
気的特性の検査のためにブロー7を用いて半導体ウェー
ハ上の電極パッドに対してプロービングが行われている
。In general, for example integrated circuits (ICs) and large-scale integration (9)
2. Description of the Related Art In the manufacturing process of semiconductor devices such as LSI circuits (LSI), probing is performed on electrode pads on a semiconductor wafer using a blower 7 to test electrical characteristics.
その場合、従来はグロー2として、ガラスエポキシ基板
の先端にタングステンの針を多数配置したものを使用し
、その針の先端を電極パッドに接触させて検査を行って
いる。In this case, conventionally, a glow 2 in which a number of tungsten needles are arranged at the tips of a glass epoxy substrate is used, and inspection is performed by bringing the tips of the needles into contact with electrode pads.
ところが、このような従来のプ四−バの場合、針の位置
精度が非常に悪いため、検査時間が長くかかり、検査精
度も低下してしまうという問題がある。However, in the case of such a conventional processor, the positioning accuracy of the needle is very poor, so there are problems in that the inspection time is long and the inspection accuracy is also reduced.
特に、集、積度の増大に伴って、LSI等の微細化や多
ピン化が進むにつれて、プ四−パの針と電極バッ、ドと
の正確な接触を得ることは極めて困難になってしまう。In particular, as LSIs and other devices become smaller and have more pins, it has become extremely difficult to make accurate contact between the needle of the PCB and the electrode pad. Put it away.
本発明の目的は、前記従来技術の間層点を解決し、高精
度のブロービングを行うことのできるプローバを提供す
ることにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a prober that can solve the problem of interlayer points in the prior art and perform highly accurate probing.
この目的を達成するため、本発明によるブロー7は、所
定のパターンに切られたプローブ端子の裏面に形成°し
た導電めっき層によりプロービングを行うものであり、
導電めっき層の先端部は検査用端子部分として形成され
、プローブ端子のパターンは好ましくは化学的エツチン
グにより形成される。In order to achieve this purpose, the blow 7 according to the present invention performs probing using a conductive plating layer formed on the back surface of a probe terminal cut into a predetermined pattern.
The tip of the conductive plating layer is formed as a test terminal part, and the probe terminal pattern is preferably formed by chemical etching.
以下、本発明を図面に示す一実施例にしたがって説明す
る。Hereinafter, the present invention will be explained according to an embodiment shown in the drawings.
第1図は本発明によるプローバの一実施例の全体を示す
概略的斜視図であり、第2図はそのプローブ端子部の部
分断面図である。FIG. 1 is a schematic perspective view showing an entire embodiment of a prober according to the present invention, and FIG. 2 is a partial sectional view of the probe terminal portion thereof.
本実施例において、プローブカード1の検査用のプロー
ブ端子2はカラスエポキシ材料よりなり、検査される回
路のパターン(図示せず)に合せて所定のパターンに形
成されている。その場合のパターン形成は本実施例では
化学的なエツチングにより行われる。その結果1本実施
例のプローブ端子2は位置精度が非常に良好であり、微
細な回路構成の電極パッドに対しても正確にブロービン
グできる。In this embodiment, the test probe terminals 2 of the probe card 1 are made of glass epoxy material, and are formed in a predetermined pattern to match the pattern (not shown) of the circuit to be tested. In this case, pattern formation is performed by chemical etching in this embodiment. As a result, the probe terminal 2 of this embodiment has very good positional accuracy and can accurately blow into electrode pads with minute circuit configurations.
各プローブ端子2は化学的エツチングにより所定のパタ
ーンに切られた後、第2図に示すように、先端側を下方
に曲げられ、曲がり部分どうしは四角形のリング状平面
形状を持つ固定リング3により互いに一走されている。After each probe terminal 2 is cut into a predetermined pattern by chemical etching, the tip side is bent downward as shown in FIG. They are being chased by each other.
前記プローブ端子2の裏面側には銅めっき層4が導電層
として形成されている。この銅めっき層4の先端部は、
被検査物たとえば支持ペース5の上の牛導体ペレット6
の電極パッドと接触する検査用端子部分7として突起状
に形成されている。A copper plating layer 4 is formed as a conductive layer on the back side of the probe terminal 2. The tip of this copper plating layer 4 is
An object to be inspected, for example, a bovine conductor pellet 6 on a supporting pace 5
The test terminal portion 7 is formed in a protruding shape as the test terminal portion 7 that comes into contact with the electrode pad.
この検査用端子部分7はプローブ端子2の先端に鋼をめ
っきで成長させることにより作り出される。This test terminal portion 7 is produced by growing steel on the tip of the probe terminal 2 by plating.
前記プローブ端子2は第1図に示すように先端側がプロ
ーブカード1の孔8の中に延び、反対―は各プローブ端
子2毎に多数設けられたプリント配線9を経て図示しな
いコネクタに接続される。As shown in FIG. 1, the tip of the probe terminal 2 extends into the hole 8 of the probe card 1, and the opposite end is connected to a connector (not shown) via a large number of printed wiring 9 provided for each probe terminal 2. .
本実施例においては、プローブ端子2がガラスエポキシ
材料に化学的エツチングを施すことにより形成されてい
るので、プローブ端子2の位置精度はエツチングの精度
で決まり、極めて良好な位置精度が得られる。しかも、
検査用端子部分7が鋼をめっきで成長させることにより
形成されており、プローブ端子2およびその裏面側に形
成しり銅めっき層4と一体である。In this embodiment, since the probe terminal 2 is formed by chemically etching the glass epoxy material, the positional accuracy of the probe terminal 2 is determined by the etching accuracy, and extremely good positional accuracy can be obtained. Moreover,
The test terminal portion 7 is formed by growing steel by plating, and is integrated with the probe terminal 2 and the copper plating layer 4 formed on the back side thereof.
したがって、本実施例は非常に精度の良いブロービング
を行うことができる。Therefore, this embodiment can perform very accurate probing.
なお、本郷明は前記実施例のみに限定されるものではな
く、他のプローブ材料やめっ鑓材料等を用いてもよく、
また他の変形も可能である。It should be noted that Akira Hongo is not limited to the above embodiments, and other probe materials, metal materials, etc. may be used.
Other variations are also possible.
以上説明したように、本発明によれば、極めて高い精度
で正確なブロービングを得ることができる。As explained above, according to the present invention, accurate blobbing can be obtained with extremely high precision.
第15図は本発明によるプローバの一実施例の概略的斜
視図、第2図はプローブ端子部の部分断面図である。
1・・・プローブカード、2・・・プローブ端子、3・
・・固定リング、4・・・銅めっき層、5・・・支持ベ
ース、6・・・牛導体ペレット、7・・・検査用端子部
分、8・・・孔、9・・・プリント配線。
第 1 図FIG. 15 is a schematic perspective view of an embodiment of the prober according to the present invention, and FIG. 2 is a partial sectional view of the probe terminal portion. 1... Probe card, 2... Probe terminal, 3...
... Fixed ring, 4... Copper plating layer, 5... Support base, 6... Cattle conductor pellet, 7... Terminal part for inspection, 8... Hole, 9... Printed wiring. Figure 1
Claims (1)
子と、各プローブ端子の裏面に形成され、先端部に検査
用端子部分を成長させた導電めっき層とを備えたプロー
パ。 2、前記プローブ端子のパターンが化学的エツチングに
より形成されていることを特徴とする特許請求の範囲第
1項記載のプローバ。 3、前記導電めっき層は銅めっき層からなることを特徴
とする特許請求の範囲第1項または第2項記載のプロー
バ。[Claims] 1. A probe terminal comprising a probe terminal formed and glued in accordance with the pattern of the object to be inspected, and a conductive plating layer formed on the back surface of each probe terminal and having an inspection terminal portion grown at the tip. property. 2. The prober according to claim 1, wherein the pattern of the probe terminal is formed by chemical etching. 3. The prober according to claim 1 or 2, wherein the conductive plating layer is a copper plating layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19854981A JPS58100439A (en) | 1981-12-11 | 1981-12-11 | Prober |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19854981A JPS58100439A (en) | 1981-12-11 | 1981-12-11 | Prober |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58100439A true JPS58100439A (en) | 1983-06-15 |
Family
ID=16393013
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19854981A Pending JPS58100439A (en) | 1981-12-11 | 1981-12-11 | Prober |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58100439A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01284776A (en) * | 1988-05-11 | 1989-11-16 | Matsushita Electron Corp | Measuring instrument for flat passage type semiconductor device |
JPH02663U (en) * | 1988-06-13 | 1990-01-05 |
-
1981
- 1981-12-11 JP JP19854981A patent/JPS58100439A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01284776A (en) * | 1988-05-11 | 1989-11-16 | Matsushita Electron Corp | Measuring instrument for flat passage type semiconductor device |
JPH02663U (en) * | 1988-06-13 | 1990-01-05 |
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