JPS5792745A - Electron beam deflecting device - Google Patents

Electron beam deflecting device

Info

Publication number
JPS5792745A
JPS5792745A JP16859880A JP16859880A JPS5792745A JP S5792745 A JPS5792745 A JP S5792745A JP 16859880 A JP16859880 A JP 16859880A JP 16859880 A JP16859880 A JP 16859880A JP S5792745 A JPS5792745 A JP S5792745A
Authority
JP
Japan
Prior art keywords
cylinder
coils
electron beam
axis
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16859880A
Other languages
Japanese (ja)
Inventor
Mamoru Nakasuji
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP16859880A priority Critical patent/JPS5792745A/en
Publication of JPS5792745A publication Critical patent/JPS5792745A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path

Abstract

PURPOSE:To secure the stable deflection and scanning of the electron beam which are performed bymeans of deflecting coils, and preserve full mechanical strength of a vacuum cylinder by preparing the vacuum cylinder from a metal member with large electric resistance. CONSTITUTION:An electron beam deflecting device 10 for the adjustment of the beam axis is constituted of a vacuum cylinder 11, and axis adjusting coils (deflecting coils) 12 which are wound and fixed around the outer surface of the cylinder 11. The cylinder 11 is prepared from a metal member having a high electric resistivity. The thickness of the parts of the cylinder 11 on which the coils 12 are wound is made to be about 0.5mm.. The electron beam within the cylinder 11 is deflected and controlled by a magnetic field generated through the coils 12 by feeding a.c. current into the coils 12, thus the axis of the beam is adjusted. Vacuum cylinder 21 and 22 are connected to the top and the bottom of the cylinder 11.
JP16859880A 1980-11-29 1980-11-29 Electron beam deflecting device Pending JPS5792745A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16859880A JPS5792745A (en) 1980-11-29 1980-11-29 Electron beam deflecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16859880A JPS5792745A (en) 1980-11-29 1980-11-29 Electron beam deflecting device

Publications (1)

Publication Number Publication Date
JPS5792745A true JPS5792745A (en) 1982-06-09

Family

ID=15871015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16859880A Pending JPS5792745A (en) 1980-11-29 1980-11-29 Electron beam deflecting device

Country Status (1)

Country Link
JP (1) JPS5792745A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6433834A (en) * 1987-07-28 1989-02-03 Mitsubishi Electric Corp Electron beam device
JP2012094515A (en) * 2010-10-26 2012-05-17 General Electric Co <Ge> Device and method for improved transient response in electromagnetic control type x-ray tube

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52106267A (en) * 1976-03-03 1977-09-06 Hitachi Ltd Electronic line deflection unit
JPS52155963A (en) * 1976-06-21 1977-12-24 Jeol Ltd Electron ray unit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52106267A (en) * 1976-03-03 1977-09-06 Hitachi Ltd Electronic line deflection unit
JPS52155963A (en) * 1976-06-21 1977-12-24 Jeol Ltd Electron ray unit

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6433834A (en) * 1987-07-28 1989-02-03 Mitsubishi Electric Corp Electron beam device
JP2012094515A (en) * 2010-10-26 2012-05-17 General Electric Co <Ge> Device and method for improved transient response in electromagnetic control type x-ray tube

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