JPS5781228A - Optical beam scanner - Google Patents

Optical beam scanner

Info

Publication number
JPS5781228A
JPS5781228A JP15783580A JP15783580A JPS5781228A JP S5781228 A JPS5781228 A JP S5781228A JP 15783580 A JP15783580 A JP 15783580A JP 15783580 A JP15783580 A JP 15783580A JP S5781228 A JPS5781228 A JP S5781228A
Authority
JP
Japan
Prior art keywords
scanning
plane
luminous flux
mirror
laser luminous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15783580A
Other languages
Japanese (ja)
Inventor
Hiroyoshi Funato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP15783580A priority Critical patent/JPS5781228A/en
Priority to US06/318,340 priority patent/US4470659A/en
Publication of JPS5781228A publication Critical patent/JPS5781228A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/106—Scanning systems having diffraction gratings as scanning elements, e.g. holographic scanners

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE:To lower costs, and facilitate wiring of a light source lighting circuit by determining the direction of a scanning beam reflected by a concave mirror in the direction intersecting with the rotating plane of a hologram lens disc. CONSTITUTION:A diffracted laser luminous flux focusing constantly at the point P is made into a divergent laser luminous flux which is made incident to a concave mirror 5, after which it is reflected as a scanning beam SB by the effect of the mirror 5, and focuses toward a scanning plane 6. The point P where the laser luminous flux diffracted by a hologram lens disc 7 focuses once, the center Cn of curvature of the mirror 5, and the scanning line by the beam SB are on the same plane 13. Thereby, the beam SB is focused at arbitrary points on the scanning line on the scanning plane.
JP15783580A 1980-11-10 1980-11-10 Optical beam scanner Pending JPS5781228A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP15783580A JPS5781228A (en) 1980-11-10 1980-11-10 Optical beam scanner
US06/318,340 US4470659A (en) 1980-11-10 1981-11-05 Light beam scanning apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15783580A JPS5781228A (en) 1980-11-10 1980-11-10 Optical beam scanner

Publications (1)

Publication Number Publication Date
JPS5781228A true JPS5781228A (en) 1982-05-21

Family

ID=15658368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15783580A Pending JPS5781228A (en) 1980-11-10 1980-11-10 Optical beam scanner

Country Status (1)

Country Link
JP (1) JPS5781228A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170261847A1 (en) * 2015-09-24 2017-09-14 Ushio Denki Kabushiki Kaisha Exposure method, method of fabricating periodic microstructure, method of fabricating grid polarizing element and exposure apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170261847A1 (en) * 2015-09-24 2017-09-14 Ushio Denki Kabushiki Kaisha Exposure method, method of fabricating periodic microstructure, method of fabricating grid polarizing element and exposure apparatus
US10101652B2 (en) * 2015-09-24 2018-10-16 Ushio Denki Kabushiki Kaisha Exposure method, method of fabricating periodic microstructure, method of fabricating grid polarizing element and exposure apparatus

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