JPS5779648A - Multilayer wiring of semiconductor device - Google Patents

Multilayer wiring of semiconductor device

Info

Publication number
JPS5779648A
JPS5779648A JP15629280A JP15629280A JPS5779648A JP S5779648 A JPS5779648 A JP S5779648A JP 15629280 A JP15629280 A JP 15629280A JP 15629280 A JP15629280 A JP 15629280A JP S5779648 A JPS5779648 A JP S5779648A
Authority
JP
Japan
Prior art keywords
wiring
insulating film
multilayer wiring
semiconductor device
wiring layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15629280A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6146056B2 (enrdf_load_stackoverflow
Inventor
Chikao Fujinuma
Tetsuya Kubota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Original Assignee
Tokyo Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Sanyo Electric Co Ltd, Sanyo Electric Co Ltd, Sanyo Denki Co Ltd filed Critical Tokyo Sanyo Electric Co Ltd
Priority to JP15629280A priority Critical patent/JPS5779648A/ja
Publication of JPS5779648A publication Critical patent/JPS5779648A/ja
Publication of JPS6146056B2 publication Critical patent/JPS6146056B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP15629280A 1980-11-05 1980-11-05 Multilayer wiring of semiconductor device Granted JPS5779648A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15629280A JPS5779648A (en) 1980-11-05 1980-11-05 Multilayer wiring of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15629280A JPS5779648A (en) 1980-11-05 1980-11-05 Multilayer wiring of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5779648A true JPS5779648A (en) 1982-05-18
JPS6146056B2 JPS6146056B2 (enrdf_load_stackoverflow) 1986-10-11

Family

ID=15624615

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15629280A Granted JPS5779648A (en) 1980-11-05 1980-11-05 Multilayer wiring of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5779648A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63289839A (ja) * 1987-05-21 1988-11-28 Nec Corp 半導体装置の製造方法
JPH01225339A (ja) * 1988-03-04 1989-09-08 Nec Corp 樹脂層間膜を用いた多層配線構造体の製造方法
JPH03227021A (ja) * 1990-01-31 1991-10-08 Nec Corp 半導体装置の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54113277A (en) * 1978-02-24 1979-09-04 Hitachi Ltd Production of semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54113277A (en) * 1978-02-24 1979-09-04 Hitachi Ltd Production of semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63289839A (ja) * 1987-05-21 1988-11-28 Nec Corp 半導体装置の製造方法
JPH01225339A (ja) * 1988-03-04 1989-09-08 Nec Corp 樹脂層間膜を用いた多層配線構造体の製造方法
JPH03227021A (ja) * 1990-01-31 1991-10-08 Nec Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6146056B2 (enrdf_load_stackoverflow) 1986-10-11

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