JPS5768030A - Manufacture of x-ray exposure mask substrate - Google Patents
Manufacture of x-ray exposure mask substrateInfo
- Publication number
- JPS5768030A JPS5768030A JP14394480A JP14394480A JPS5768030A JP S5768030 A JPS5768030 A JP S5768030A JP 14394480 A JP14394480 A JP 14394480A JP 14394480 A JP14394480 A JP 14394480A JP S5768030 A JPS5768030 A JP S5768030A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- approx
- film
- projected
- ray exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title abstract 9
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000008602 contraction Effects 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000012044 organic layer Substances 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 229920005575 poly(amic acid) Polymers 0.000 abstract 1
- 229920001721 polyimide Polymers 0.000 abstract 1
- 239000009719 polyimide resin Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To obtain a mask substrate in extremely high accuracy by coating and drying organic solvent on the overall projected surface with a substrate projected in section on one surfac and smoothly polished on the surface to flatten the substrate by the contraction and expansion forces of the organic layer, and then etching the back surface of the substrate. CONSTITUTION:A substrate 11 is raised on one upper surface in the order of approx. several mum, is smoothly polished in a thickness of approx. 0.4mm. with a diameter of approx. 3 inches in a silicon wafer, polyamic acid solution is rotatably coated on the projected surface side of the substrate 11, is allowed to stand at 350 deg.C for 1hr, and is then gradually cooled. Thus, the solution is dried to form a polyimide resin film 12, and the substrate 11 is approximately flattened by the contraction and expansion forces. Thereafter, X-ray exposure circuit pattern is formed on the film 12, and is etched and removed until the center on the back surface of the substrate 11 is exposed from the film 12. In this manner, the pattern accuracy when the electron beam is drawn thereon can be reduced to the order of + or -0.1mum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14394480A JPS5768030A (en) | 1980-10-15 | 1980-10-15 | Manufacture of x-ray exposure mask substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14394480A JPS5768030A (en) | 1980-10-15 | 1980-10-15 | Manufacture of x-ray exposure mask substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5768030A true JPS5768030A (en) | 1982-04-26 |
Family
ID=15350684
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14394480A Pending JPS5768030A (en) | 1980-10-15 | 1980-10-15 | Manufacture of x-ray exposure mask substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5768030A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010102356A (en) * | 2002-03-29 | 2010-05-06 | Hoya Corp | Method of producing mask blank and method of producing transfer mask |
-
1980
- 1980-10-15 JP JP14394480A patent/JPS5768030A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010102356A (en) * | 2002-03-29 | 2010-05-06 | Hoya Corp | Method of producing mask blank and method of producing transfer mask |
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