JPS5767271A - X-ray generator - Google Patents

X-ray generator

Info

Publication number
JPS5767271A
JPS5767271A JP55143115A JP14311580A JPS5767271A JP S5767271 A JPS5767271 A JP S5767271A JP 55143115 A JP55143115 A JP 55143115A JP 14311580 A JP14311580 A JP 14311580A JP S5767271 A JPS5767271 A JP S5767271A
Authority
JP
Japan
Prior art keywords
insulator
rays
plasma
ray generator
capillaries
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55143115A
Other languages
Japanese (ja)
Inventor
Yoshitaka Kitamura
Masahiro Okabe
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP55143115A priority Critical patent/JPS5767271A/en
Publication of JPS5767271A publication Critical patent/JPS5767271A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/22—X-ray tubes specially designed for passing a very high current for a very short time, e.g. for flash operation

Abstract

PURPOSE:To generate a number of x rays by forming the insulator of a plasma x-ray generator with a number of penetrating holes and an electron pair on both its ends, supporting it so as to be revolved, and sequentially using capillaries. CONSTITUTION:A plasma x-ray generator has electrodes 2 and 3 on both ends of an insulator 1 with a penetrating hole 1A and a cathode 4. By applying the discharge of condensers C1 and C2, an electron beam is incident on the plasma within the penetrating hole 1 and x rays are emitted. In this case, the insulator 1 is formed into a barrel shape and provided with a number of penetrating holes 1A that are capillaries. The electrodes 2 and 3 are arranged on each both ends and supported externally so as to revolve. As a result, by sequentially using a new capillary 1A in a discharge passage, a number of x-rays can be generated without opening a high vacuum container and work efficiency sharply be improved.
JP55143115A 1980-10-14 1980-10-14 X-ray generator Pending JPS5767271A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55143115A JPS5767271A (en) 1980-10-14 1980-10-14 X-ray generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55143115A JPS5767271A (en) 1980-10-14 1980-10-14 X-ray generator

Publications (1)

Publication Number Publication Date
JPS5767271A true JPS5767271A (en) 1982-04-23

Family

ID=15331256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55143115A Pending JPS5767271A (en) 1980-10-14 1980-10-14 X-ray generator

Country Status (1)

Country Link
JP (1) JPS5767271A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002061787A3 (en) * 2001-01-31 2003-03-13 Plasmion Corp Method and apparatus having pin electrode for surface treatment using capillary discharge plasma
EP1401248A2 (en) * 2002-09-19 2004-03-24 ASML Netherlands B.V. Radiation source, lithographic apparatus, and device manufacturing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002061787A3 (en) * 2001-01-31 2003-03-13 Plasmion Corp Method and apparatus having pin electrode for surface treatment using capillary discharge plasma
US6632323B2 (en) 2001-01-31 2003-10-14 Plasmion Corporation Method and apparatus having pin electrode for surface treatment using capillary discharge plasma
EP1401248A2 (en) * 2002-09-19 2004-03-24 ASML Netherlands B.V. Radiation source, lithographic apparatus, and device manufacturing method
EP1401248A3 (en) * 2002-09-19 2009-08-12 ASML Netherlands B.V. Radiation source, lithographic apparatus, and device manufacturing method

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