JPS5767002A - Decomposing apparatus for water - Google Patents

Decomposing apparatus for water

Info

Publication number
JPS5767002A
JPS5767002A JP55142431A JP14243180A JPS5767002A JP S5767002 A JPS5767002 A JP S5767002A JP 55142431 A JP55142431 A JP 55142431A JP 14243180 A JP14243180 A JP 14243180A JP S5767002 A JPS5767002 A JP S5767002A
Authority
JP
Japan
Prior art keywords
semiconductor
water
type semiconductor
type
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55142431A
Other languages
Japanese (ja)
Inventor
Hiroshi Nakanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP55142431A priority Critical patent/JPS5767002A/en
Publication of JPS5767002A publication Critical patent/JPS5767002A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
    • C01B3/04—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by decomposition of inorganic compounds, e.g. ammonia
    • C01B3/042—Decomposition of water
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Inorganic Chemistry (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:To enhance the hydrogen production efficiency by the photocatalytic decomposition of water by suspending fine powder of a composite semiconductor composed of a p-type semiconductor and an n-type semiconductor in water and irradiating light to generate oxygen and hydrogen. CONSTITUTION:A container 8 is partially provided with a light transmitting window 9 made of glass or quartz. 100ml water 10 is held in the container 8, and fine powder of a semiconductor obtd. by dispersing GaP as a p-type semiconductor in TiO2 as an n-type semiconductor is suspended in the water with an agitator 12. The container 8 is tightly sealed with a cover 14 having an outlet 13 leading out a generated gas. Light 4 with energy above the forbidden band of the fine semiconductor powder 11 is irradiated through the window 9. After the irradiation a gaseous mixture of oxygen with hydrogen is taken out of the outlet 13. As said semiconductor an n-type semiconductor with a p-type one dispersed on part of the surface or a p-type semiconductor with an n-type one dispersed on part of the surface is used.
JP55142431A 1980-10-14 1980-10-14 Decomposing apparatus for water Pending JPS5767002A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55142431A JPS5767002A (en) 1980-10-14 1980-10-14 Decomposing apparatus for water

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55142431A JPS5767002A (en) 1980-10-14 1980-10-14 Decomposing apparatus for water

Publications (1)

Publication Number Publication Date
JPS5767002A true JPS5767002A (en) 1982-04-23

Family

ID=15315150

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55142431A Pending JPS5767002A (en) 1980-10-14 1980-10-14 Decomposing apparatus for water

Country Status (1)

Country Link
JP (1) JPS5767002A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58155678A (en) * 1982-03-10 1983-09-16 Hiroshi Tsubomura Optical catalyst
JPS63171641A (en) * 1986-01-22 1988-07-15 Hitachi Ltd Method and apparatus for oxidizing and reducting dissolved material
US4774026A (en) * 1986-01-22 1988-09-27 Hitachi, Ltd. Process and apparatus for oxidizing or reducing dissolved substance
WO2011089904A1 (en) * 2010-01-22 2011-07-28 パナソニック株式会社 Hydrogen generation device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58155678A (en) * 1982-03-10 1983-09-16 Hiroshi Tsubomura Optical catalyst
JPH0364187B2 (en) * 1982-03-10 1991-10-04 Hiroshi Tsubomura
JPS63171641A (en) * 1986-01-22 1988-07-15 Hitachi Ltd Method and apparatus for oxidizing and reducting dissolved material
US4774026A (en) * 1986-01-22 1988-09-27 Hitachi, Ltd. Process and apparatus for oxidizing or reducing dissolved substance
WO2011089904A1 (en) * 2010-01-22 2011-07-28 パナソニック株式会社 Hydrogen generation device
CN102713010A (en) * 2010-01-22 2012-10-03 松下电器产业株式会社 Hydrogen generation device
US8734625B2 (en) 2010-01-22 2014-05-27 Panasonic Corporation Hydrogen generation device
JP5628840B2 (en) * 2010-01-22 2014-11-19 パナソニック株式会社 Hydrogen generation device
CN102713010B (en) * 2010-01-22 2015-10-07 松下知识产权经营株式会社 Hydrogen generation apparatus

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