JPS575333A - Organic treating apparatus for semiconductor substrate - Google Patents

Organic treating apparatus for semiconductor substrate

Info

Publication number
JPS575333A
JPS575333A JP7966480A JP7966480A JPS575333A JP S575333 A JPS575333 A JP S575333A JP 7966480 A JP7966480 A JP 7966480A JP 7966480 A JP7966480 A JP 7966480A JP S575333 A JPS575333 A JP S575333A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
organic
treated
tank
treating apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7966480A
Other languages
Japanese (ja)
Inventor
Shuichi Hayashida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP7966480A priority Critical patent/JPS575333A/en
Publication of JPS575333A publication Critical patent/JPS575333A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To provide a safety semiconductor substrate organic treating apparatus by isolating an organic treating tank and a treated material conveying tank when organically treating the semiconductor substrate. CONSTITUTION:When a semiconductor substrate is organically treated so as to improve the bonding of a photoresist to the substrate, an organic treatment tank and a treated material conveying tank 6 are isolated. A treated material 5 is set at a treated material conveying box 6, is moved to the organic treatment tank, it organically treated with vapor 4a produced from organic solvent 4, while the box is then moved to the original position, gas is exhausted, and the material is then removed. Thus, a worker is not adversely affected detrimentally, but instead, his safety is secured.
JP7966480A 1980-06-13 1980-06-13 Organic treating apparatus for semiconductor substrate Pending JPS575333A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7966480A JPS575333A (en) 1980-06-13 1980-06-13 Organic treating apparatus for semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7966480A JPS575333A (en) 1980-06-13 1980-06-13 Organic treating apparatus for semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS575333A true JPS575333A (en) 1982-01-12

Family

ID=13696421

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7966480A Pending JPS575333A (en) 1980-06-13 1980-06-13 Organic treating apparatus for semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS575333A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190027A (en) * 1982-04-30 1983-11-05 Nec Kyushu Ltd Semiconductor substrate organic processing apparatus
JPS62129647A (en) * 1985-11-28 1987-06-11 Yutaka Takahashi Circulating and heating device for bathtub water
JPS6425535A (en) * 1987-07-22 1989-01-27 Matsushita Electronics Corp Treatment of substrate for forming resist film

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190027A (en) * 1982-04-30 1983-11-05 Nec Kyushu Ltd Semiconductor substrate organic processing apparatus
JPS62129647A (en) * 1985-11-28 1987-06-11 Yutaka Takahashi Circulating and heating device for bathtub water
JPH046852B2 (en) * 1985-11-28 1992-02-07 Yutaka Takahashi
JPS6425535A (en) * 1987-07-22 1989-01-27 Matsushita Electronics Corp Treatment of substrate for forming resist film

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