JPS5751141A - Preparation of base material for optical fiber - Google Patents
Preparation of base material for optical fiberInfo
- Publication number
- JPS5751141A JPS5751141A JP12543380A JP12543380A JPS5751141A JP S5751141 A JPS5751141 A JP S5751141A JP 12543380 A JP12543380 A JP 12543380A JP 12543380 A JP12543380 A JP 12543380A JP S5751141 A JPS5751141 A JP S5751141A
- Authority
- JP
- Japan
- Prior art keywords
- reactor tube
- raw material
- heating
- gas
- material gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01815—Reactant deposition burners or deposition heating means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01876—Means for heating tubes or rods during or immediately prior to deposition, e.g. electric resistance heaters
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Abstract
PURPOSE:To obtain the titled base material having a core glass layer of uniform thickness in depositing a glass layer on the inner surface of a reactor tube by the modified (internal) CVD method, by heating a gas with perforated plates for heating the gas provided at a gas introductory end of the reactor tube and an auxiliary heat source. CONSTITUTION:Plural perforated plates 26 for heating a raw material gas are provided in an introductory end 27 for a raw material forming glass of a reactor tube 25, and a fixed auxiliary heating burner 24 for heating the zone of the perforated plates 26 from the outside of the reactor tube 25 is provided. The introductory end 27 for the raw material gas is constantly heated at about 700-800 deg.C by te auxiliary heating burner 24, and the raw material gas for forming glass is then introduced from the introductory end 27 into the reactor tube 25 to reciprocate a main heating burner 23 and heat the reactor tube 25. The raw material gas is reacted chemically to deposit a glass layer on the inner surface of the reactor tube 5. Thus, the raw material gas is heated efficiently by the perforated plates 26 to form the glass layer of uniform thickness on the inner surface of the reactor tube 25.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12543380A JPS5751141A (en) | 1980-09-09 | 1980-09-09 | Preparation of base material for optical fiber |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12543380A JPS5751141A (en) | 1980-09-09 | 1980-09-09 | Preparation of base material for optical fiber |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5751141A true JPS5751141A (en) | 1982-03-25 |
Family
ID=14909965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12543380A Pending JPS5751141A (en) | 1980-09-09 | 1980-09-09 | Preparation of base material for optical fiber |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5751141A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030049018A (en) * | 2001-12-13 | 2003-06-25 | 엘지전선 주식회사 | Chemical Preheating Method for Increasing Usable Length of Preform and Apparatus therefor |
-
1980
- 1980-09-09 JP JP12543380A patent/JPS5751141A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030049018A (en) * | 2001-12-13 | 2003-06-25 | 엘지전선 주식회사 | Chemical Preheating Method for Increasing Usable Length of Preform and Apparatus therefor |
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