JPS5748637B2 - - Google Patents
Info
- Publication number
- JPS5748637B2 JPS5748637B2 JP47089196A JP8919672A JPS5748637B2 JP S5748637 B2 JPS5748637 B2 JP S5748637B2 JP 47089196 A JP47089196 A JP 47089196A JP 8919672 A JP8919672 A JP 8919672A JP S5748637 B2 JPS5748637 B2 JP S5748637B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17824871A | 1971-09-07 | 1971-09-07 | |
| US178240A US3884793A (en) | 1971-09-07 | 1971-09-07 | Electrode type glow discharge apparatus |
| US25450472A | 1972-05-18 | 1972-05-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4926184A JPS4926184A (cs) | 1974-03-08 |
| JPS5748637B2 true JPS5748637B2 (cs) | 1982-10-16 |
Family
ID=27390946
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47089196A Expired JPS5748637B2 (cs) | 1971-09-07 | 1972-09-07 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS5748637B2 (cs) |
| AU (1) | AU475272B2 (cs) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1435344A (en) * | 1973-08-31 | 1976-05-12 | Boc International Ltd | Sputtering apparatus |
| JPS561723Y2 (cs) * | 1975-02-03 | 1981-01-16 | ||
| JPS5596164U (cs) * | 1979-10-01 | 1980-07-03 | ||
| JPS57161057A (en) * | 1981-03-30 | 1982-10-04 | Mitsubishi Electric Corp | Chemical vapor phase growth device using plasma |
| JPS58147567A (ja) * | 1982-02-24 | 1983-09-02 | Mitsubishi Heavy Ind Ltd | アルミニウム又はアルミニウム合金タンク用防食剤 |
| JPS58171569A (ja) * | 1982-03-31 | 1983-10-08 | Hidetoshi Tsuchiya | スパッタリング方法 |
| US20050051422A1 (en) * | 2003-02-21 | 2005-03-10 | Rietzel James G. | Cylindrical magnetron with self cleaning target |
| WO2015076162A1 (ja) * | 2013-11-22 | 2015-05-28 | 東レ株式会社 | プラズマ電極、プラズマ処理電極、ｃｖｄ電極、プラズマｃｖｄ装置及び薄膜付基材の製造方法 |
-
1972
- 1972-09-05 AU AU46331/72A patent/AU475272B2/en not_active Expired
- 1972-09-07 JP JP47089196A patent/JPS5748637B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| AU4633172A (en) | 1974-03-14 |
| JPS4926184A (cs) | 1974-03-08 |
| AU475272B2 (en) | 1976-08-19 |