JPS5741380A - Manufacturing apparatus for oxide film - Google Patents

Manufacturing apparatus for oxide film

Info

Publication number
JPS5741380A
JPS5741380A JP11744580A JP11744580A JPS5741380A JP S5741380 A JPS5741380 A JP S5741380A JP 11744580 A JP11744580 A JP 11744580A JP 11744580 A JP11744580 A JP 11744580A JP S5741380 A JPS5741380 A JP S5741380A
Authority
JP
Japan
Prior art keywords
pure water
oxide film
atomized
furnace
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11744580A
Other languages
Japanese (ja)
Inventor
Kohei Ebara
Susumu Muramoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP11744580A priority Critical patent/JPS5741380A/en
Publication of JPS5741380A publication Critical patent/JPS5741380A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5025—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C04B41/87—Ceramics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

PURPOSE:To form an oxide film easily and stably on each surface of an Si wafer by utilizing humidified oxygen as an oxidizing gas using pure water atomized by ultrasonic vibration. CONSTITUTION:Ultrasonic vibration having 1MHz frequency is applied to pure water 3 in a pure water tank 2 from an ultrasonic vibrator 4 to generate atomized pure water 5. Gaseous oxygen 1 from the outside is passed through the position and introduced into an oxidizing furnace 7 as humidified gaseous oxygen. The furnace 7 is heated in an electric furnace 8, and an oxide film is formed on each surface of an Si wafer 9 set on a boat 10 on edge. Since the amount of generated steam of atomized pure water is regulated by the output of ultrasonic waves, the oxide film is formed stably under easy regulation.
JP11744580A 1980-08-26 1980-08-26 Manufacturing apparatus for oxide film Pending JPS5741380A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11744580A JPS5741380A (en) 1980-08-26 1980-08-26 Manufacturing apparatus for oxide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11744580A JPS5741380A (en) 1980-08-26 1980-08-26 Manufacturing apparatus for oxide film

Publications (1)

Publication Number Publication Date
JPS5741380A true JPS5741380A (en) 1982-03-08

Family

ID=14711822

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11744580A Pending JPS5741380A (en) 1980-08-26 1980-08-26 Manufacturing apparatus for oxide film

Country Status (1)

Country Link
JP (1) JPS5741380A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0234868A2 (en) * 1986-02-21 1987-09-02 Bio Rational Technologies Inc. Mist cultivation of cells

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0234868A2 (en) * 1986-02-21 1987-09-02 Bio Rational Technologies Inc. Mist cultivation of cells

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