JPS5735850A - Photoresist composition - Google Patents
Photoresist compositionInfo
- Publication number
- JPS5735850A JPS5735850A JP11138680A JP11138680A JPS5735850A JP S5735850 A JPS5735850 A JP S5735850A JP 11138680 A JP11138680 A JP 11138680A JP 11138680 A JP11138680 A JP 11138680A JP S5735850 A JPS5735850 A JP S5735850A
- Authority
- JP
- Japan
- Prior art keywords
- cyclized
- org
- aryl
- solvent
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 3
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 150000001993 dienes Chemical class 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- HWEONUWVYWIJPF-OWOJBTEDSA-N 1-azido-4-[(e)-2-(4-azidophenyl)ethenyl]benzene Chemical compound C1=CC(N=[N+]=[N-])=CC=C1\C=C\C1=CC=C(N=[N+]=[N-])C=C1 HWEONUWVYWIJPF-OWOJBTEDSA-N 0.000 abstract 1
- 125000003342 alkenyl group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 229920003211 cis-1,4-polyisoprene Polymers 0.000 abstract 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11138680A JPS5735850A (en) | 1980-08-13 | 1980-08-13 | Photoresist composition |
| US06/185,771 US4349619A (en) | 1979-09-19 | 1980-09-10 | Photoresist composition |
| EP80303280A EP0026088B1 (en) | 1979-09-19 | 1980-09-18 | Photoresist compositions |
| DE8080303280T DE3065699D1 (en) | 1979-09-19 | 1980-09-18 | Photoresist compositions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11138680A JPS5735850A (en) | 1980-08-13 | 1980-08-13 | Photoresist composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5735850A true JPS5735850A (en) | 1982-02-26 |
| JPS6315571B2 JPS6315571B2 (enrdf_load_stackoverflow) | 1988-04-05 |
Family
ID=14559858
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11138680A Granted JPS5735850A (en) | 1979-09-19 | 1980-08-13 | Photoresist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5735850A (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6093427A (ja) * | 1983-10-28 | 1985-05-25 | Nippon Kayaku Co Ltd | 感光性樹脂の硬化方法 |
| JPH05245984A (ja) * | 1992-03-05 | 1993-09-24 | Hitachi Chem Co Ltd | 電気用積層板 |
| JP2006241086A (ja) * | 2005-03-04 | 2006-09-14 | Nippon Kagaku Kogyosho:Kk | 新規な光線吸収材料 |
| JP2018529659A (ja) * | 2015-08-21 | 2018-10-11 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ Ｇｅｓｅｌｌｓｃｈａｆｔ ｍｉｔ ｂｅｓｃｈｒａｅｎｋｔｅｒ Ｈａｆｔｕｎｇ | 光学的に活性なデバイスのための化合物 |
| US11702396B2 (en) | 2017-02-15 | 2023-07-18 | Johnson & Johnson Surgical Vision, Inc. | Hydrophobic compounds for optically active devices |
| US11753387B2 (en) | 2017-02-15 | 2023-09-12 | Johnson & Johnson Surgical Vision, Inc. | Compounds for optically active devices |
-
1980
- 1980-08-13 JP JP11138680A patent/JPS5735850A/ja active Granted
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6093427A (ja) * | 1983-10-28 | 1985-05-25 | Nippon Kayaku Co Ltd | 感光性樹脂の硬化方法 |
| JPH05245984A (ja) * | 1992-03-05 | 1993-09-24 | Hitachi Chem Co Ltd | 電気用積層板 |
| JP2006241086A (ja) * | 2005-03-04 | 2006-09-14 | Nippon Kagaku Kogyosho:Kk | 新規な光線吸収材料 |
| JP2018529659A (ja) * | 2015-08-21 | 2018-10-11 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ Ｇｅｓｅｌｌｓｃｈａｆｔ ｍｉｔ ｂｅｓｃｈｒａｅｎｋｔｅｒ Ｈａｆｔｕｎｇ | 光学的に活性なデバイスのための化合物 |
| US11078177B2 (en) | 2015-08-21 | 2021-08-03 | Merck Patent Gmbh | Compounds for optically active devices |
| US11958819B2 (en) | 2015-08-21 | 2024-04-16 | Johnson & Johnson Surgical Vision, Inc. | Compounds for optically active devices |
| US11702396B2 (en) | 2017-02-15 | 2023-07-18 | Johnson & Johnson Surgical Vision, Inc. | Hydrophobic compounds for optically active devices |
| US11753387B2 (en) | 2017-02-15 | 2023-09-12 | Johnson & Johnson Surgical Vision, Inc. | Compounds for optically active devices |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6315571B2 (enrdf_load_stackoverflow) | 1988-04-05 |
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