JPS5724590A - Manufacture of semiconductor laser device - Google Patents
Manufacture of semiconductor laser deviceInfo
- Publication number
- JPS5724590A JPS5724590A JP10003980A JP10003980A JPS5724590A JP S5724590 A JPS5724590 A JP S5724590A JP 10003980 A JP10003980 A JP 10003980A JP 10003980 A JP10003980 A JP 10003980A JP S5724590 A JPS5724590 A JP S5724590A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- face
- resonance
- cleaving
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To obtain a structure effective to control the transverse made of laser oscillation, by forming a high loss surface, with the part to be oscillated left, by etching, and forming a resonance surface by cleaving. CONSTITUTION:An N-Ga1-xAlxAs layer 2, an N-Ga1-yAs layer 3, a P-Ga1-xAlxAs layer 4, a P-GaAs layer 5 are epitaxially grown in order on a GaAs substrate 1. Then, an insulating film 6 of Al2O3, SiO2 or the like is formed on the P-GaAs layer 5 to obtain a P-side electrode 7 and an N-side electrode 8 respectively. In this case, a stripe 9 is for injecting electricity. Accodingly, such an easy manufacturing method wherein the resonance face is formed by cleaving and the high loss face in formed by etching can make the reflectance of the resonance face samller and obtain a stable transverse mode oscillation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10003980A JPS5724590A (en) | 1980-07-21 | 1980-07-21 | Manufacture of semiconductor laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10003980A JPS5724590A (en) | 1980-07-21 | 1980-07-21 | Manufacture of semiconductor laser device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5724590A true JPS5724590A (en) | 1982-02-09 |
Family
ID=14263375
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10003980A Pending JPS5724590A (en) | 1980-07-21 | 1980-07-21 | Manufacture of semiconductor laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5724590A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5251884A (en) * | 1975-10-22 | 1977-04-26 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor laser |
JPS52105790A (en) * | 1976-03-01 | 1977-09-05 | Nec Corp | Injection type semiconductor laser element |
-
1980
- 1980-07-21 JP JP10003980A patent/JPS5724590A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5251884A (en) * | 1975-10-22 | 1977-04-26 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor laser |
JPS52105790A (en) * | 1976-03-01 | 1977-09-05 | Nec Corp | Injection type semiconductor laser element |
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