JPS57208139A - Electron-beam exposure apparatus - Google Patents

Electron-beam exposure apparatus

Info

Publication number
JPS57208139A
JPS57208139A JP9474381A JP9474381A JPS57208139A JP S57208139 A JPS57208139 A JP S57208139A JP 9474381 A JP9474381 A JP 9474381A JP 9474381 A JP9474381 A JP 9474381A JP S57208139 A JPS57208139 A JP S57208139A
Authority
JP
Japan
Prior art keywords
register
value
electron
frequency
current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9474381A
Other languages
English (en)
Inventor
Yasuo Furukawa
Masaki Yamabe
Seigo Igaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9474381A priority Critical patent/JPS57208139A/ja
Publication of JPS57208139A publication Critical patent/JPS57208139A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP9474381A 1981-06-18 1981-06-18 Electron-beam exposure apparatus Pending JPS57208139A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9474381A JPS57208139A (en) 1981-06-18 1981-06-18 Electron-beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9474381A JPS57208139A (en) 1981-06-18 1981-06-18 Electron-beam exposure apparatus

Publications (1)

Publication Number Publication Date
JPS57208139A true JPS57208139A (en) 1982-12-21

Family

ID=14118599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9474381A Pending JPS57208139A (en) 1981-06-18 1981-06-18 Electron-beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS57208139A (ja)

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