JPS57202540A - Peeling agent for photoresist - Google Patents

Peeling agent for photoresist

Info

Publication number
JPS57202540A
JPS57202540A JP8720281A JP8720281A JPS57202540A JP S57202540 A JPS57202540 A JP S57202540A JP 8720281 A JP8720281 A JP 8720281A JP 8720281 A JP8720281 A JP 8720281A JP S57202540 A JPS57202540 A JP S57202540A
Authority
JP
Japan
Prior art keywords
propylene glycol
deriv
dihydric alcohol
usable
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8720281A
Other languages
Japanese (ja)
Inventor
Akira Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MITSUWAKA JIYUNYAKU KENKYUSHO
MITSUWAKA JIYUNYAKU KENKYUSHO KK
MITSUWAKA JUNYAKU KENKYUSHO KK
Original Assignee
MITSUWAKA JIYUNYAKU KENKYUSHO
MITSUWAKA JIYUNYAKU KENKYUSHO KK
MITSUWAKA JUNYAKU KENKYUSHO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MITSUWAKA JIYUNYAKU KENKYUSHO, MITSUWAKA JIYUNYAKU KENKYUSHO KK, MITSUWAKA JUNYAKU KENKYUSHO KK filed Critical MITSUWAKA JIYUNYAKU KENKYUSHO
Priority to JP8720281A priority Critical patent/JPS57202540A/en
Publication of JPS57202540A publication Critical patent/JPS57202540A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

Abstract

PURPOSE:To enhance the photoresist peeling effect and to remove simply and thoroughly chromium from waste water after peeling by adding a water soluble dihydric alcohol or a deriv. thereof to an alkaline aqueous soln. CONSTITUTION:To an alkaline aqueous soln. is added a water soluble dihydric alcohol or a deriv. thereof. The usable dihydric alcohol is propylene glycol, butylene glycol, pentanediol or the like, and the usable deriv. is propylene glycol monoethyl ether, dipropylene glycol or the like. The alkali agent is sodium hydroxide, potassium hydroxide or the like. Among those compounds propylene glycol and sodium hydroxide are desirably combined because they are easily available and economical. The preferred concn. of propylene glycol is 1- 20wt%.
JP8720281A 1981-06-06 1981-06-06 Peeling agent for photoresist Pending JPS57202540A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8720281A JPS57202540A (en) 1981-06-06 1981-06-06 Peeling agent for photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8720281A JPS57202540A (en) 1981-06-06 1981-06-06 Peeling agent for photoresist

Publications (1)

Publication Number Publication Date
JPS57202540A true JPS57202540A (en) 1982-12-11

Family

ID=13908381

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8720281A Pending JPS57202540A (en) 1981-06-06 1981-06-06 Peeling agent for photoresist

Country Status (1)

Country Link
JP (1) JPS57202540A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0219789A2 (en) * 1985-10-22 1987-04-29 Hoechst Aktiengesellschaft Stripping solvent for photoresists
CN108359525A (en) * 2018-03-15 2018-08-03 东莞市庆海化工有限公司 A kind of used in electronic industry remover and preparation method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0219789A2 (en) * 1985-10-22 1987-04-29 Hoechst Aktiengesellschaft Stripping solvent for photoresists
CN108359525A (en) * 2018-03-15 2018-08-03 东莞市庆海化工有限公司 A kind of used in electronic industry remover and preparation method

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