JPS57199929A - Vacuum gage for sputtering device - Google Patents

Vacuum gage for sputtering device

Info

Publication number
JPS57199929A
JPS57199929A JP8445181A JP8445181A JPS57199929A JP S57199929 A JPS57199929 A JP S57199929A JP 8445181 A JP8445181 A JP 8445181A JP 8445181 A JP8445181 A JP 8445181A JP S57199929 A JPS57199929 A JP S57199929A
Authority
JP
Japan
Prior art keywords
opening
vacuum gage
magnetic poles
vacuum
sandwich
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8445181A
Other languages
Japanese (ja)
Inventor
Hiroaki Wakamatsu
Masaki Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8445181A priority Critical patent/JPS57199929A/en
Publication of JPS57199929A publication Critical patent/JPS57199929A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L21/00—Vacuum gauges
    • G01L21/30—Vacuum gauges by making use of ionisation effects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measuring Fluid Pressure (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To make the measurement of the degree of vacuum more accurate and to make the detection of gaseous pressure near a target possible by providing magnetic poles near the opening of a conduit communicating with a vacuum gage in such a way as to sandwich said opening. CONSTITUTION:In a chamber of a sputtering device, magnetic poles are provided near the opening of a conduit communicating with a vacuum gage in such a way as to sandwich said opening. For example, the conduit of a vacuum gage 1 opens into a chamber wall 2, and a pair of magnetic poles 3 are mounted to the wall in such a way as to sandwich said opening. Then, in spite of flowing of the plasma flow 4 generated in the chamber toward the conduit, it is bent vertically by the magnetic field between the magnetic poles, whereby the plasma flowing into the vacuum gage is reduced and the influence that the plasma flow gives upon thermo electrons or ion current is substantially eliminated.
JP8445181A 1981-06-03 1981-06-03 Vacuum gage for sputtering device Pending JPS57199929A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8445181A JPS57199929A (en) 1981-06-03 1981-06-03 Vacuum gage for sputtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8445181A JPS57199929A (en) 1981-06-03 1981-06-03 Vacuum gage for sputtering device

Publications (1)

Publication Number Publication Date
JPS57199929A true JPS57199929A (en) 1982-12-08

Family

ID=13830975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8445181A Pending JPS57199929A (en) 1981-06-03 1981-06-03 Vacuum gage for sputtering device

Country Status (1)

Country Link
JP (1) JPS57199929A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6253331U (en) * 1985-09-25 1987-04-02
JPS6434536U (en) * 1987-08-26 1989-03-02

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6253331U (en) * 1985-09-25 1987-04-02
JPS6434536U (en) * 1987-08-26 1989-03-02

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