JPS57199218A - Morecular beam epitaxial growth equipment - Google Patents

Morecular beam epitaxial growth equipment

Info

Publication number
JPS57199218A
JPS57199218A JP56085233A JP8523381A JPS57199218A JP S57199218 A JPS57199218 A JP S57199218A JP 56085233 A JP56085233 A JP 56085233A JP 8523381 A JP8523381 A JP 8523381A JP S57199218 A JPS57199218 A JP S57199218A
Authority
JP
Japan
Prior art keywords
chamber
growth
substrate
cassette
molecular beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56085233A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0241164B2 (enExample
Inventor
Ryoji Okata
Kazuo Nishitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP56085233A priority Critical patent/JPS57199218A/ja
Publication of JPS57199218A publication Critical patent/JPS57199218A/ja
Publication of JPH0241164B2 publication Critical patent/JPH0241164B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/22—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using physical deposition, e.g. vacuum deposition or sputtering

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP56085233A 1981-06-01 1981-06-01 Morecular beam epitaxial growth equipment Granted JPS57199218A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56085233A JPS57199218A (en) 1981-06-01 1981-06-01 Morecular beam epitaxial growth equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56085233A JPS57199218A (en) 1981-06-01 1981-06-01 Morecular beam epitaxial growth equipment

Publications (2)

Publication Number Publication Date
JPS57199218A true JPS57199218A (en) 1982-12-07
JPH0241164B2 JPH0241164B2 (enExample) 1990-09-14

Family

ID=13852839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56085233A Granted JPS57199218A (en) 1981-06-01 1981-06-01 Morecular beam epitaxial growth equipment

Country Status (1)

Country Link
JP (1) JPS57199218A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6097621A (ja) * 1983-11-02 1985-05-31 Hitachi Ltd 分子線エピタキシ装置における基板搬送装置
JPS60117614A (ja) * 1983-11-30 1985-06-25 Hitachi Ltd 分子線エピタキシ装置
JPS60117615A (ja) * 1983-11-30 1985-06-25 Hitachi Ltd 分子線エピタキシ装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6097621A (ja) * 1983-11-02 1985-05-31 Hitachi Ltd 分子線エピタキシ装置における基板搬送装置
JPS60117614A (ja) * 1983-11-30 1985-06-25 Hitachi Ltd 分子線エピタキシ装置
JPS60117615A (ja) * 1983-11-30 1985-06-25 Hitachi Ltd 分子線エピタキシ装置

Also Published As

Publication number Publication date
JPH0241164B2 (enExample) 1990-09-14

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