JPS5719319A - Vacuum heat treatment furnace having highly clean atmosphere forming mechanism - Google Patents
Vacuum heat treatment furnace having highly clean atmosphere forming mechanismInfo
- Publication number
- JPS5719319A JPS5719319A JP9168980A JP9168980A JPS5719319A JP S5719319 A JPS5719319 A JP S5719319A JP 9168980 A JP9168980 A JP 9168980A JP 9168980 A JP9168980 A JP 9168980A JP S5719319 A JPS5719319 A JP S5719319A
- Authority
- JP
- Japan
- Prior art keywords
- heat treatment
- chamber
- atmosphere
- vacuum heat
- torr
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
- C21D1/773—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material under reduced pressure or vacuum
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Furnace Details (AREA)
Abstract
PURPOSE:To provide a vacuum heat treatment furnace which purifies a heat treatment atmosphere at high degrees by providing a panel which is cooled by a cryogenic refrigerant in the same space as that of a heat treatment chamber or the one communicating therewith. CONSTITUTION:A vacuum heat treatment chamber 2 is operated by maintaining the pressure therein at 1-760Torr by gaseous Ar or gaseous N2, and the surface temp. of a cryogenic panel 4 is controlled to 173-214 deg.K by a cooling gas 6. Namely, the H2O partial pressure and CWHV partial pressure in the atmosphere in the chamber 2 are controlled to 1X10<-6>Torr (corresponding to 173 deg.K dew point)-1X10<-2> Torr (corresponding to 214 deg.K dew point) irrespectively of the partial pressure in the chamber 2. As a result, the atmosphere necessary for oxidation-free heat treatment operation is easily obtained without flowing a large amount of high purity inert gas or reducing gas into the chamber 2 or without lowering the entire pressure of the atmosphere in the chamber 2 down to 5X10<-5>Torr by the use of a large diameter oil diffusing pump. Here, 1 in the figure denotes the object to be treated, and 5 an agitating fan, respectively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9168980A JPS6040497B2 (en) | 1980-07-07 | 1980-07-07 | Vacuum heat treatment furnace with highly clean atmosphere generation mechanism |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9168980A JPS6040497B2 (en) | 1980-07-07 | 1980-07-07 | Vacuum heat treatment furnace with highly clean atmosphere generation mechanism |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5719319A true JPS5719319A (en) | 1982-02-01 |
JPS6040497B2 JPS6040497B2 (en) | 1985-09-11 |
Family
ID=14033466
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9168980A Expired JPS6040497B2 (en) | 1980-07-07 | 1980-07-07 | Vacuum heat treatment furnace with highly clean atmosphere generation mechanism |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6040497B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6057186A (en) * | 1983-09-09 | 1985-04-02 | 日本真空技術株式会社 | Vacuum melting furnace |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01168935A (en) * | 1987-12-23 | 1989-07-04 | Yoshinobu Miyata | Antistatic pile fabric |
JPH01221581A (en) * | 1988-02-25 | 1989-09-05 | Yoshinobu Miyata | Antistatic pile fabric |
JPH0280674A (en) * | 1988-09-17 | 1990-03-20 | Toyota Motor Corp | Antistatic moquette |
-
1980
- 1980-07-07 JP JP9168980A patent/JPS6040497B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6057186A (en) * | 1983-09-09 | 1985-04-02 | 日本真空技術株式会社 | Vacuum melting furnace |
Also Published As
Publication number | Publication date |
---|---|
JPS6040497B2 (en) | 1985-09-11 |
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