JPS57189136A - Lithographic resist of high resolution and method thereof - Google Patents

Lithographic resist of high resolution and method thereof

Info

Publication number
JPS57189136A
JPS57189136A JP6485482A JP6485482A JPS57189136A JP S57189136 A JPS57189136 A JP S57189136A JP 6485482 A JP6485482 A JP 6485482A JP 6485482 A JP6485482 A JP 6485482A JP S57189136 A JPS57189136 A JP S57189136A
Authority
JP
Japan
Prior art keywords
high resolution
lithographic resist
lithographic
resist
resolution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6485482A
Other languages
English (en)
Japanese (ja)
Inventor
Ai Rii Kangu
Jiensen Uiriamu
Kiyuukaa Piitaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Verizon Laboratories Inc
Original Assignee
GTE Laboratories Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GTE Laboratories Inc filed Critical GTE Laboratories Inc
Publication of JPS57189136A publication Critical patent/JPS57189136A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
JP6485482A 1981-04-20 1982-04-20 Lithographic resist of high resolution and method thereof Pending JPS57189136A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US25593681A 1981-04-20 1981-04-20

Publications (1)

Publication Number Publication Date
JPS57189136A true JPS57189136A (en) 1982-11-20

Family

ID=22970460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6485482A Pending JPS57189136A (en) 1981-04-20 1982-04-20 Lithographic resist of high resolution and method thereof

Country Status (3)

Country Link
JP (1) JPS57189136A (fr)
CA (1) CA1220375A (fr)
DE (1) DE3213771A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60116132A (ja) * 1983-11-29 1985-06-22 Fujitsu Ltd ネガ型レジストパタ−ンの形成方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3743743A1 (de) * 1987-12-23 1989-07-06 Basf Ag Polymere konditionierungsmittel zur vorbehandlung von nichtmetallischen oberflaechen fuer eine chemische metallisierung
US5512418A (en) * 1993-03-10 1996-04-30 E. I. Du Pont De Nemours And Company Infra-red sensitive aqueous wash-off photoimaging element

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60116132A (ja) * 1983-11-29 1985-06-22 Fujitsu Ltd ネガ型レジストパタ−ンの形成方法
JPH0318179B2 (fr) * 1983-11-29 1991-03-11 Fujitsu Ltd

Also Published As

Publication number Publication date
DE3213771A1 (de) 1982-11-25
CA1220375A (fr) 1987-04-14

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