CA1220375A - Resist lithographique a grande resolution et methode de fabrication - Google Patents

Resist lithographique a grande resolution et methode de fabrication

Info

Publication number
CA1220375A
CA1220375A CA000399440A CA399440A CA1220375A CA 1220375 A CA1220375 A CA 1220375A CA 000399440 A CA000399440 A CA 000399440A CA 399440 A CA399440 A CA 399440A CA 1220375 A CA1220375 A CA 1220375A
Authority
CA
Canada
Prior art keywords
accordance
vinyl
medium
cationic polymer
poly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000399440A
Other languages
English (en)
Inventor
William Jensen
Kang I. Lee
Peter Cukor
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Verizon Laboratories Inc
Original Assignee
GTE Laboratories Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GTE Laboratories Inc filed Critical GTE Laboratories Inc
Application granted granted Critical
Publication of CA1220375A publication Critical patent/CA1220375A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
CA000399440A 1981-04-20 1982-03-25 Resist lithographique a grande resolution et methode de fabrication Expired CA1220375A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US25593681A 1981-04-20 1981-04-20
US255,936 1981-04-20

Publications (1)

Publication Number Publication Date
CA1220375A true CA1220375A (fr) 1987-04-14

Family

ID=22970460

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000399440A Expired CA1220375A (fr) 1981-04-20 1982-03-25 Resist lithographique a grande resolution et methode de fabrication

Country Status (3)

Country Link
JP (1) JPS57189136A (fr)
CA (1) CA1220375A (fr)
DE (1) DE3213771A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60116132A (ja) * 1983-11-29 1985-06-22 Fujitsu Ltd ネガ型レジストパタ−ンの形成方法
DE3743743A1 (de) * 1987-12-23 1989-07-06 Basf Ag Polymere konditionierungsmittel zur vorbehandlung von nichtmetallischen oberflaechen fuer eine chemische metallisierung
US5512418A (en) * 1993-03-10 1996-04-30 E. I. Du Pont De Nemours And Company Infra-red sensitive aqueous wash-off photoimaging element

Also Published As

Publication number Publication date
JPS57189136A (en) 1982-11-20
DE3213771A1 (de) 1982-11-25

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Legal Events

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