JPS571821B2 - - Google Patents

Info

Publication number
JPS571821B2
JPS571821B2 JP3867777A JP3867777A JPS571821B2 JP S571821 B2 JPS571821 B2 JP S571821B2 JP 3867777 A JP3867777 A JP 3867777A JP 3867777 A JP3867777 A JP 3867777A JP S571821 B2 JPS571821 B2 JP S571821B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3867777A
Other versions
JPS53123929A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3867777A priority Critical patent/JPS53123929A/ja
Publication of JPS53123929A publication Critical patent/JPS53123929A/ja
Publication of JPS571821B2 publication Critical patent/JPS571821B2/ja
Granted legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP3867777A 1977-04-05 1977-04-05 Developing liquid for use in radiant ray positive type resist Granted JPS53123929A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3867777A JPS53123929A (en) 1977-04-05 1977-04-05 Developing liquid for use in radiant ray positive type resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3867777A JPS53123929A (en) 1977-04-05 1977-04-05 Developing liquid for use in radiant ray positive type resist

Publications (2)

Publication Number Publication Date
JPS53123929A JPS53123929A (en) 1978-10-28
JPS571821B2 true JPS571821B2 (ja) 1982-01-13

Family

ID=12531896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3867777A Granted JPS53123929A (en) 1977-04-05 1977-04-05 Developing liquid for use in radiant ray positive type resist

Country Status (1)

Country Link
JP (1) JPS53123929A (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55148427A (en) * 1979-05-09 1980-11-19 Nec Corp Manufacturing of pattern
JPS55150227A (en) * 1979-05-10 1980-11-22 Nec Corp Method of fabricating pattern
DE3039110A1 (de) * 1980-10-16 1982-05-13 Siemens AG, 1000 Berlin und 8000 München Verfahren fuer die spannungsfreie entwicklung von bestrahlten polymethylmetacrylatschichten
JPH035756A (ja) * 1989-06-01 1991-01-11 Fuji Photo Film Co Ltd 水なしｐｓ版用現像液

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS512430A (en) * 1974-05-28 1976-01-10 Ibm Mechiru isopuchiru ketongenzozai
JPS51147324A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Solvent for electronic wire resist
JPS526203A (en) * 1975-06-30 1977-01-18 Ibm Method of forming positive resist image

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS512430A (en) * 1974-05-28 1976-01-10 Ibm Mechiru isopuchiru ketongenzozai
JPS51147324A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Solvent for electronic wire resist
JPS526203A (en) * 1975-06-30 1977-01-18 Ibm Method of forming positive resist image

Also Published As

Publication number Publication date
JPS53123929A (en) 1978-10-28

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