JPS57172730A - Relative location detecting device of mask substrate and wafer - Google Patents

Relative location detecting device of mask substrate and wafer

Info

Publication number
JPS57172730A
JPS57172730A JP56057905A JP5790581A JPS57172730A JP S57172730 A JPS57172730 A JP S57172730A JP 56057905 A JP56057905 A JP 56057905A JP 5790581 A JP5790581 A JP 5790581A JP S57172730 A JPS57172730 A JP S57172730A
Authority
JP
Japan
Prior art keywords
wafer
mask
image
alignment reference
wave length
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56057905A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6211778B2 (nl
Inventor
Toshiaki Shinozaki
Ichiro Mori
Toru Tojo
Kazuyoshi Sugihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56057905A priority Critical patent/JPS57172730A/ja
Publication of JPS57172730A publication Critical patent/JPS57172730A/ja
Publication of JPS6211778B2 publication Critical patent/JPS6211778B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP56057905A 1981-04-17 1981-04-17 Relative location detecting device of mask substrate and wafer Granted JPS57172730A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56057905A JPS57172730A (en) 1981-04-17 1981-04-17 Relative location detecting device of mask substrate and wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56057905A JPS57172730A (en) 1981-04-17 1981-04-17 Relative location detecting device of mask substrate and wafer

Publications (2)

Publication Number Publication Date
JPS57172730A true JPS57172730A (en) 1982-10-23
JPS6211778B2 JPS6211778B2 (nl) 1987-03-14

Family

ID=13068998

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56057905A Granted JPS57172730A (en) 1981-04-17 1981-04-17 Relative location detecting device of mask substrate and wafer

Country Status (1)

Country Link
JP (1) JPS57172730A (nl)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02223806A (ja) * 1989-02-27 1990-09-06 Sumitomo Heavy Ind Ltd 色収差を利用した二重焦点検出装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02223806A (ja) * 1989-02-27 1990-09-06 Sumitomo Heavy Ind Ltd 色収差を利用した二重焦点検出装置

Also Published As

Publication number Publication date
JPS6211778B2 (nl) 1987-03-14

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