Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Nippon Genshiryoku Jigyo KK
Momentive Performance Materials Japan LLC
Nagayanagi Co Ltd
Nippon Atomic Industry Group Co Ltd
Original Assignee
Toshiba Corp
Nippon Genshiryoku Jigyo KK
Toshiba Silicone Co Ltd
Nagayanagi Co Ltd
Tokyo Shibaura Electric Co Ltd
Nippon Atomic Industry Group Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Nippon Genshiryoku Jigyo KK, Toshiba Silicone Co Ltd, Nagayanagi Co Ltd, Tokyo Shibaura Electric Co Ltd, Nippon Atomic Industry Group Co LtdfiledCriticalToshiba Corp
Priority to JP5390681ApriorityCriticalpatent/JPS5916484B2/ja
Publication of JPS57167703ApublicationCriticalpatent/JPS57167703A/ja
Publication of JPS5916484B2publicationCriticalpatent/JPS5916484B2/ja
Procedimiento y dispositivo para la inyeccion de una materia en formafluida dentro de una corriente gaseosa caliente y aparato para la realizacion de este procedimiento.