Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinkawa Ltd
Original Assignee
Shinkawa Ltd
Shinkawa Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinkawa Ltd, Shinkawa Seisakusho Co LtdfiledCriticalShinkawa Ltd
Priority to JP56052801ApriorityCriticalpatent/JPS57167646A/ja
Publication of JPS57167646ApublicationCriticalpatent/JPS57167646A/ja
Publication of JPS6158977B2publicationCriticalpatent/JPS6158977B2/ja
Processo per l'autoallineamento di un doppio strato di silicio policristallino, in un dispositivo a circuito integrato, mediante un'operazione di ossidazione.
Uniforme controllata di ritagli a dispositivo per l'adduzione striscia di una miscela basilare di gomma attraverso l'apertura d'alimentazione di una macchina a coclea.