JPS57163233A - Radiation sensitive positive type polymer - Google Patents
Radiation sensitive positive type polymerInfo
- Publication number
- JPS57163233A JPS57163233A JP4885281A JP4885281A JPS57163233A JP S57163233 A JPS57163233 A JP S57163233A JP 4885281 A JP4885281 A JP 4885281A JP 4885281 A JP4885281 A JP 4885281A JP S57163233 A JPS57163233 A JP S57163233A
- Authority
- JP
- Japan
- Prior art keywords
- positive type
- ammonium perchlorate
- pmma
- tetraalkyl ammonium
- radiation sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 title abstract 3
- 229920000642 polymer Polymers 0.000 title 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 abstract 4
- 239000004926 polymethyl methacrylate Substances 0.000 abstract 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 abstract 3
- 125000005207 tetraalkylammonium group Chemical group 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 2
- 239000002861 polymer material Substances 0.000 abstract 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 1
- 206010070834 Sensitisation Diseases 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 230000008313 sensitization Effects 0.000 abstract 1
- KBLZDCFTQSIIOH-UHFFFAOYSA-M tetrabutylazanium;perchlorate Chemical compound [O-]Cl(=O)(=O)=O.CCCC[N+](CCCC)(CCCC)CCCC KBLZDCFTQSIIOH-UHFFFAOYSA-M 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4885281A JPS57163233A (en) | 1981-03-31 | 1981-03-31 | Radiation sensitive positive type polymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4885281A JPS57163233A (en) | 1981-03-31 | 1981-03-31 | Radiation sensitive positive type polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57163233A true JPS57163233A (en) | 1982-10-07 |
| JPH0125054B2 JPH0125054B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-05-16 |
Family
ID=12814790
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4885281A Granted JPS57163233A (en) | 1981-03-31 | 1981-03-31 | Radiation sensitive positive type polymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57163233A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0197950A (ja) * | 1986-09-01 | 1989-04-17 | Sanyo Electric Co Ltd | 高分子放射線感応材料 |
| JPH02264259A (ja) * | 1989-04-03 | 1990-10-29 | Toppan Printing Co Ltd | ポジ型レジスト組成物およびパターン形成方法 |
-
1981
- 1981-03-31 JP JP4885281A patent/JPS57163233A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0197950A (ja) * | 1986-09-01 | 1989-04-17 | Sanyo Electric Co Ltd | 高分子放射線感応材料 |
| US4855214A (en) * | 1986-09-01 | 1989-08-08 | Sanyo Electric Co., Ltd. | Radiation-sensitive high-polymeric material |
| JPH02264259A (ja) * | 1989-04-03 | 1990-10-29 | Toppan Printing Co Ltd | ポジ型レジスト組成物およびパターン形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0125054B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-05-16 |
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