JPS57153255A - Measuring method for nonelectrolytic plating reaction - Google Patents

Measuring method for nonelectrolytic plating reaction

Info

Publication number
JPS57153255A
JPS57153255A JP56038631A JP3863181A JPS57153255A JP S57153255 A JPS57153255 A JP S57153255A JP 56038631 A JP56038631 A JP 56038631A JP 3863181 A JP3863181 A JP 3863181A JP S57153255 A JPS57153255 A JP S57153255A
Authority
JP
Japan
Prior art keywords
electrode
time
electric charge
polarization value
electric potential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56038631A
Other languages
Japanese (ja)
Inventor
Tomoko Sato
Masayuki Suzuki
Kenichi Sugano
Yuichi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56038631A priority Critical patent/JPS57153255A/en
Publication of JPS57153255A publication Critical patent/JPS57153255A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N17/00Investigating resistance of materials to the weather, to corrosion, or to light
    • G01N17/02Electrochemical measuring systems for weathering, corrosion or corrosion-protection measurement

Abstract

PURPOSE:To determine the velocity of deposition in nonelectrolytic plating reaction simply and quickly, by giving a fixed quantity of electric charge to a material to be plated instantaneously and measuring fluctuation of electric potential as the relation between polarization value and time. CONSTITUTION:An action electrode 11 consists of a material to be plated and a reference electrode 12 using as a standard for measuring electric potential fluctuation of the electrode 11 and also, an opposite electrode 13 using at the time of supplying an electric charge, are provided in a cell 14. A capacitor 15 is charged by a variable direct current power source 16 and the stored electric charge is given to the electrode 11 instantaneously by an electric charge giving mechanism 17. The electric potential fluctuation of the electrode 11 is measured as the relation between a polarization value eta and a time t and is sent to comparators 21 and 22 set at the different polarization values eta1 and eta2. These comparators 21 and 22 are connected with a clock 23 and the time difference at the time of each comparator has got polarization value, is measured.
JP56038631A 1981-03-19 1981-03-19 Measuring method for nonelectrolytic plating reaction Pending JPS57153255A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56038631A JPS57153255A (en) 1981-03-19 1981-03-19 Measuring method for nonelectrolytic plating reaction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56038631A JPS57153255A (en) 1981-03-19 1981-03-19 Measuring method for nonelectrolytic plating reaction

Publications (1)

Publication Number Publication Date
JPS57153255A true JPS57153255A (en) 1982-09-21

Family

ID=12530581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56038631A Pending JPS57153255A (en) 1981-03-19 1981-03-19 Measuring method for nonelectrolytic plating reaction

Country Status (1)

Country Link
JP (1) JPS57153255A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015011026A (en) * 2013-07-02 2015-01-19 アンコーシーズ・ゲーエムベーハー Electrochemical analysis method for in-situ fingerprinting for electrochemical deposition and/or electrochemical etching

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015011026A (en) * 2013-07-02 2015-01-19 アンコーシーズ・ゲーエムベーハー Electrochemical analysis method for in-situ fingerprinting for electrochemical deposition and/or electrochemical etching

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