JPS57152128A - Electron beam drawing device - Google Patents

Electron beam drawing device

Info

Publication number
JPS57152128A
JPS57152128A JP3535281A JP3535281A JPS57152128A JP S57152128 A JPS57152128 A JP S57152128A JP 3535281 A JP3535281 A JP 3535281A JP 3535281 A JP3535281 A JP 3535281A JP S57152128 A JPS57152128 A JP S57152128A
Authority
JP
Japan
Prior art keywords
blanking
diaphragm
repeller
electrons
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3535281A
Other languages
English (en)
Inventor
Katsuhiro Kawasaki
Tadao Konishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3535281A priority Critical patent/JPS57152128A/ja
Publication of JPS57152128A publication Critical patent/JPS57152128A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP3535281A 1981-03-13 1981-03-13 Electron beam drawing device Pending JPS57152128A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3535281A JPS57152128A (en) 1981-03-13 1981-03-13 Electron beam drawing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3535281A JPS57152128A (en) 1981-03-13 1981-03-13 Electron beam drawing device

Publications (1)

Publication Number Publication Date
JPS57152128A true JPS57152128A (en) 1982-09-20

Family

ID=12439466

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3535281A Pending JPS57152128A (en) 1981-03-13 1981-03-13 Electron beam drawing device

Country Status (1)

Country Link
JP (1) JPS57152128A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01100919A (ja) * 1987-10-14 1989-04-19 Mitsubishi Electric Corp 電子ビーム加工装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619856A (en) * 1979-07-25 1981-02-24 Hitachi Ltd Electron-ray device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619856A (en) * 1979-07-25 1981-02-24 Hitachi Ltd Electron-ray device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01100919A (ja) * 1987-10-14 1989-04-19 Mitsubishi Electric Corp 電子ビーム加工装置

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