JPS57149817A - Manufacture of fibrous silica - Google Patents

Manufacture of fibrous silica

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Publication number
JPS57149817A
JPS57149817A JP3442581A JP3442581A JPS57149817A JP S57149817 A JPS57149817 A JP S57149817A JP 3442581 A JP3442581 A JP 3442581A JP 3442581 A JP3442581 A JP 3442581A JP S57149817 A JPS57149817 A JP S57149817A
Authority
JP
Japan
Prior art keywords
gaseous oxygen
halogen
reaction chamber
fibrous silica
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3442581A
Other languages
Japanese (ja)
Other versions
JPS605527B2 (en
Inventor
Yoichiro Nakanishi
Takako Honjo
Akio Shindo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP3442581A priority Critical patent/JPS605527B2/en
Publication of JPS57149817A publication Critical patent/JPS57149817A/en
Publication of JPS605527B2 publication Critical patent/JPS605527B2/en
Expired legal-status Critical Current

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Abstract

PURPOSE: To manufacture high purity fibrous sulica without producing a harmful by-product by gasifying an organosilicon compound contg. no halogen and bringing the resulting gas into contact with gaseous oxygen to carry out thermal decomposition.
CONSTITUTION: An organosilicon compound contg. no halogen such as tetra- ethoxysilane is gasified, fed to a reaction chamber together with an inert gas as a carrier, and brought into contact with gaseous oxygen. The preferred ratio between the organosiclicon compound and the gaseous oxygen is about 1:(12W 40) by vol. In the reaction chamber thermal decomposition is carried out under reduced pressure. The decomposition temp. is ≥about 600, preferably about 600W1,000°C. The formed fibrous silica is grown on a substrate such as quartz. It is desirable to stick a metallic chloride such as barium chloride to the substrate before-hand. The resulting fibrous silica is amorphous and has a hydrophobic surface and about 2.0W2.2g/cm3 density.
COPYRIGHT: (C)1982,JPO&Japio
JP3442581A 1981-03-09 1981-03-09 Manufacturing method of fibrous silica Expired JPS605527B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3442581A JPS605527B2 (en) 1981-03-09 1981-03-09 Manufacturing method of fibrous silica

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3442581A JPS605527B2 (en) 1981-03-09 1981-03-09 Manufacturing method of fibrous silica

Publications (2)

Publication Number Publication Date
JPS57149817A true JPS57149817A (en) 1982-09-16
JPS605527B2 JPS605527B2 (en) 1985-02-12

Family

ID=12413848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3442581A Expired JPS605527B2 (en) 1981-03-09 1981-03-09 Manufacturing method of fibrous silica

Country Status (1)

Country Link
JP (1) JPS605527B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6397390U (en) * 1986-12-15 1988-06-23

Also Published As

Publication number Publication date
JPS605527B2 (en) 1985-02-12

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