JPS57143367A - Photo-setting coating film composition - Google Patents

Photo-setting coating film composition

Info

Publication number
JPS57143367A
JPS57143367A JP56028670A JP2867081A JPS57143367A JP S57143367 A JPS57143367 A JP S57143367A JP 56028670 A JP56028670 A JP 56028670A JP 2867081 A JP2867081 A JP 2867081A JP S57143367 A JPS57143367 A JP S57143367A
Authority
JP
Japan
Prior art keywords
formula
polymerization initiator
photo
coating film
film composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56028670A
Other languages
Japanese (ja)
Other versions
JPS6118923B2 (en
Inventor
Yuji Ikegami
Kenji Osawa
Takao Ito
Koichiro Tanno
Hajime Tokumitsu
Hiroshi Imai
Masayuki Osawa
Keiji Kurata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP56028670A priority Critical patent/JPS57143367A/en
Priority to KR8200895A priority patent/KR890000960B1/en
Publication of JPS57143367A publication Critical patent/JPS57143367A/en
Publication of JPS6118923B2 publication Critical patent/JPS6118923B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/26Esters containing oxygen in addition to the carboxy oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light

Abstract

PURPOSE: To prepare the titled composition containing a specific monofunctional monoacrylate compound, a polymerization initiator, a filler, etc. and suitable as an etching resist ink for through-hole printed circuit board.
CONSTITUTION: The objective composition is prepared by compounding (A) 100pts.wt. of an aliphatic or aromatic monofunctional monoacrylate compound of formulaI[R1 is 1W4C lower alkyl, aliphatic dicarboxylic acid residue of formula II (n is 0W4), or aromatic carbonyl group of formula III (R3 is carboxyl, 1W4C alkyl, etc.); X is 1W4C lower alkylene; R2 is H or CH3; m is 1W4](e.g. acryloyloxyethyl monophthalate of formula IV), (B) about 0.1W5pts. of a polymerization initiator (e.g. benzoin ether), (C) one or more fillers (e.g. ≤ about 20pts. of an alkali-soluble polymer, ≤ about 25pts. of β-naphthalenesulfonic acid salt, etc.) and if necessary, (D) about 20W100pts. of an inorganic pigment (e.g. talc).
COPYRIGHT: (C)1982,JPO&Japio
JP56028670A 1981-02-28 1981-02-28 Photo-setting coating film composition Granted JPS57143367A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP56028670A JPS57143367A (en) 1981-02-28 1981-02-28 Photo-setting coating film composition
KR8200895A KR890000960B1 (en) 1981-02-28 1982-03-02 Photo-curable coating composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56028670A JPS57143367A (en) 1981-02-28 1981-02-28 Photo-setting coating film composition

Publications (2)

Publication Number Publication Date
JPS57143367A true JPS57143367A (en) 1982-09-04
JPS6118923B2 JPS6118923B2 (en) 1986-05-15

Family

ID=12254939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56028670A Granted JPS57143367A (en) 1981-02-28 1981-02-28 Photo-setting coating film composition

Country Status (2)

Country Link
JP (1) JPS57143367A (en)
KR (1) KR890000960B1 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58202440A (en) * 1982-05-21 1983-11-25 Mitsui Toatsu Chem Inc Ultraviolet-curing composition for filling hole
JPS5936711A (en) * 1982-08-20 1984-02-29 株式会社アデランス Pan-single planting wig flocking machine
JPS5989316A (en) * 1982-11-12 1984-05-23 Mitsui Toatsu Chem Inc Solder resist ink composition curable by ultraviolet rays
JPS63112608A (en) * 1986-10-31 1988-05-17 Denki Kagaku Kogyo Kk Ultraviolet-curable composition
JPH0598112A (en) * 1991-10-04 1993-04-20 Toagosei Chem Ind Co Ltd Curable resin composition
JP2010053177A (en) * 2008-08-26 2010-03-11 Nisshin Steel Co Ltd Inkjet ink composition for etching resist
JP2013531089A (en) * 2010-05-18 2013-08-01 スリーエム イノベイティブ プロパティズ カンパニー Polymerizable ionic liquids containing aromatic carboxylate anions
JP2019023171A (en) * 2017-07-24 2019-02-14 日本精化株式会社 Anionic hydrophilic group-containing (meth) acrylate compound and coating composition containing the compound

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0445931Y2 (en) * 1986-05-30 1992-10-28

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55102290A (en) * 1979-01-26 1980-08-05 Sanwa Kagaku Kogyo Kk Ink for filling hole of copper through hole printed circuit board
JPS568417A (en) * 1979-07-02 1981-01-28 Somar Corp Uv-curable resin composition

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55102290A (en) * 1979-01-26 1980-08-05 Sanwa Kagaku Kogyo Kk Ink for filling hole of copper through hole printed circuit board
JPS568417A (en) * 1979-07-02 1981-01-28 Somar Corp Uv-curable resin composition

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58202440A (en) * 1982-05-21 1983-11-25 Mitsui Toatsu Chem Inc Ultraviolet-curing composition for filling hole
JPH0363737B2 (en) * 1982-05-21 1991-10-02 Mitsui Toatsu Chemicals
JPS5936711A (en) * 1982-08-20 1984-02-29 株式会社アデランス Pan-single planting wig flocking machine
JPS5989316A (en) * 1982-11-12 1984-05-23 Mitsui Toatsu Chem Inc Solder resist ink composition curable by ultraviolet rays
JPH0414151B2 (en) * 1982-11-12 1992-03-11 Mitsui Toatsu Chemicals
JPS63112608A (en) * 1986-10-31 1988-05-17 Denki Kagaku Kogyo Kk Ultraviolet-curable composition
JPH0598112A (en) * 1991-10-04 1993-04-20 Toagosei Chem Ind Co Ltd Curable resin composition
JP2010053177A (en) * 2008-08-26 2010-03-11 Nisshin Steel Co Ltd Inkjet ink composition for etching resist
JP2013531089A (en) * 2010-05-18 2013-08-01 スリーエム イノベイティブ プロパティズ カンパニー Polymerizable ionic liquids containing aromatic carboxylate anions
JP2019023171A (en) * 2017-07-24 2019-02-14 日本精化株式会社 Anionic hydrophilic group-containing (meth) acrylate compound and coating composition containing the compound

Also Published As

Publication number Publication date
JPS6118923B2 (en) 1986-05-15
KR830009175A (en) 1983-12-17
KR890000960B1 (en) 1989-04-15

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