JPS57143367A - Photo-setting coating film composition - Google Patents
Photo-setting coating film compositionInfo
- Publication number
- JPS57143367A JPS57143367A JP56028670A JP2867081A JPS57143367A JP S57143367 A JPS57143367 A JP S57143367A JP 56028670 A JP56028670 A JP 56028670A JP 2867081 A JP2867081 A JP 2867081A JP S57143367 A JPS57143367 A JP S57143367A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- polymerization initiator
- photo
- coating film
- film composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000000945 filler Substances 0.000 abstract 2
- 239000003505 polymerization initiator Substances 0.000 abstract 2
- RKYJPYDJNQXILT-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxycarbonyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OCCOC(=O)C=C RKYJPYDJNQXILT-UHFFFAOYSA-N 0.000 abstract 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical compound OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 abstract 1
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 125000002947 alkylene group Chemical group 0.000 abstract 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- 238000013329 compounding Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000001023 inorganic pigment Substances 0.000 abstract 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical class C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 239000000454 talc Substances 0.000 abstract 1
- 229910052623 talc Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
Abstract
PURPOSE: To prepare the titled composition containing a specific monofunctional monoacrylate compound, a polymerization initiator, a filler, etc. and suitable as an etching resist ink for through-hole printed circuit board.
CONSTITUTION: The objective composition is prepared by compounding (A) 100pts.wt. of an aliphatic or aromatic monofunctional monoacrylate compound of formulaI[R1 is 1W4C lower alkyl, aliphatic dicarboxylic acid residue of formula II (n is 0W4), or aromatic carbonyl group of formula III (R3 is carboxyl, 1W4C alkyl, etc.); X is 1W4C lower alkylene; R2 is H or CH3; m is 1W4](e.g. acryloyloxyethyl monophthalate of formula IV), (B) about 0.1W5pts. of a polymerization initiator (e.g. benzoin ether), (C) one or more fillers (e.g. ≤ about 20pts. of an alkali-soluble polymer, ≤ about 25pts. of β-naphthalenesulfonic acid salt, etc.) and if necessary, (D) about 20W100pts. of an inorganic pigment (e.g. talc).
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56028670A JPS57143367A (en) | 1981-02-28 | 1981-02-28 | Photo-setting coating film composition |
KR8200895A KR890000960B1 (en) | 1981-02-28 | 1982-03-02 | Photo-curable coating composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56028670A JPS57143367A (en) | 1981-02-28 | 1981-02-28 | Photo-setting coating film composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57143367A true JPS57143367A (en) | 1982-09-04 |
JPS6118923B2 JPS6118923B2 (en) | 1986-05-15 |
Family
ID=12254939
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56028670A Granted JPS57143367A (en) | 1981-02-28 | 1981-02-28 | Photo-setting coating film composition |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS57143367A (en) |
KR (1) | KR890000960B1 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58202440A (en) * | 1982-05-21 | 1983-11-25 | Mitsui Toatsu Chem Inc | Ultraviolet-curing composition for filling hole |
JPS5936711A (en) * | 1982-08-20 | 1984-02-29 | 株式会社アデランス | Pan-single planting wig flocking machine |
JPS5989316A (en) * | 1982-11-12 | 1984-05-23 | Mitsui Toatsu Chem Inc | Solder resist ink composition curable by ultraviolet rays |
JPS63112608A (en) * | 1986-10-31 | 1988-05-17 | Denki Kagaku Kogyo Kk | Ultraviolet-curable composition |
JPH0598112A (en) * | 1991-10-04 | 1993-04-20 | Toagosei Chem Ind Co Ltd | Curable resin composition |
JP2010053177A (en) * | 2008-08-26 | 2010-03-11 | Nisshin Steel Co Ltd | Inkjet ink composition for etching resist |
JP2013531089A (en) * | 2010-05-18 | 2013-08-01 | スリーエム イノベイティブ プロパティズ カンパニー | Polymerizable ionic liquids containing aromatic carboxylate anions |
JP2019023171A (en) * | 2017-07-24 | 2019-02-14 | 日本精化株式会社 | Anionic hydrophilic group-containing (meth) acrylate compound and coating composition containing the compound |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0445931Y2 (en) * | 1986-05-30 | 1992-10-28 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55102290A (en) * | 1979-01-26 | 1980-08-05 | Sanwa Kagaku Kogyo Kk | Ink for filling hole of copper through hole printed circuit board |
JPS568417A (en) * | 1979-07-02 | 1981-01-28 | Somar Corp | Uv-curable resin composition |
-
1981
- 1981-02-28 JP JP56028670A patent/JPS57143367A/en active Granted
-
1982
- 1982-03-02 KR KR8200895A patent/KR890000960B1/en active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55102290A (en) * | 1979-01-26 | 1980-08-05 | Sanwa Kagaku Kogyo Kk | Ink for filling hole of copper through hole printed circuit board |
JPS568417A (en) * | 1979-07-02 | 1981-01-28 | Somar Corp | Uv-curable resin composition |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58202440A (en) * | 1982-05-21 | 1983-11-25 | Mitsui Toatsu Chem Inc | Ultraviolet-curing composition for filling hole |
JPH0363737B2 (en) * | 1982-05-21 | 1991-10-02 | Mitsui Toatsu Chemicals | |
JPS5936711A (en) * | 1982-08-20 | 1984-02-29 | 株式会社アデランス | Pan-single planting wig flocking machine |
JPS5989316A (en) * | 1982-11-12 | 1984-05-23 | Mitsui Toatsu Chem Inc | Solder resist ink composition curable by ultraviolet rays |
JPH0414151B2 (en) * | 1982-11-12 | 1992-03-11 | Mitsui Toatsu Chemicals | |
JPS63112608A (en) * | 1986-10-31 | 1988-05-17 | Denki Kagaku Kogyo Kk | Ultraviolet-curable composition |
JPH0598112A (en) * | 1991-10-04 | 1993-04-20 | Toagosei Chem Ind Co Ltd | Curable resin composition |
JP2010053177A (en) * | 2008-08-26 | 2010-03-11 | Nisshin Steel Co Ltd | Inkjet ink composition for etching resist |
JP2013531089A (en) * | 2010-05-18 | 2013-08-01 | スリーエム イノベイティブ プロパティズ カンパニー | Polymerizable ionic liquids containing aromatic carboxylate anions |
JP2019023171A (en) * | 2017-07-24 | 2019-02-14 | 日本精化株式会社 | Anionic hydrophilic group-containing (meth) acrylate compound and coating composition containing the compound |
Also Published As
Publication number | Publication date |
---|---|
JPS6118923B2 (en) | 1986-05-15 |
KR830009175A (en) | 1983-12-17 |
KR890000960B1 (en) | 1989-04-15 |
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