JPS57136755A - Disc operating device for ion implanting device - Google Patents
Disc operating device for ion implanting deviceInfo
- Publication number
- JPS57136755A JPS57136755A JP2221481A JP2221481A JPS57136755A JP S57136755 A JPS57136755 A JP S57136755A JP 2221481 A JP2221481 A JP 2221481A JP 2221481 A JP2221481 A JP 2221481A JP S57136755 A JPS57136755 A JP S57136755A
- Authority
- JP
- Japan
- Prior art keywords
- disc
- chamber
- motor
- implantation chamber
- wefers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Abstract
PURPOSE:To make capable of automatic operations such as removal, rotation, and transfer of a disc by providing a movable sealed chamber for containing a motor to rotate the disc on which wefers are mountd in an ion implantation chamber. CONSTITUTION:A lock chamber 7 the internal pressure of which is optionally changed between vacuum and atmospheric pressure is provided on the side of a vacuum ion implantation chamber 1 through a gate valve 9, and a disc 3 on which wefers are mounted is moved between both chambers using a carriage. A sealed chamber, which contains a motor 32 to rotate the disc 3 and which is movable reciprocatingly on a rail 18, is provided in the implantation chamber 1, on the top of it a rotating shaft 17 provided with an engaging device for engaging removably with the disc 3 is provided removably, and the sealed chamber is lined air-tightly to the external of the implantation chamber 1. Thus dust from the motor 32 can be prevented to infiltrate, and various operations of the disc 3 can be automated easily.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2221481A JPS57136755A (en) | 1981-02-19 | 1981-02-19 | Disc operating device for ion implanting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2221481A JPS57136755A (en) | 1981-02-19 | 1981-02-19 | Disc operating device for ion implanting device |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57083317A Division JPS581960A (en) | 1982-05-19 | 1982-05-19 | Ion implantation chamber device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57136755A true JPS57136755A (en) | 1982-08-23 |
Family
ID=12076547
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2221481A Pending JPS57136755A (en) | 1981-02-19 | 1981-02-19 | Disc operating device for ion implanting device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57136755A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6247940A (en) * | 1985-08-27 | 1987-03-02 | Nec Corp | Ion implanting apparatus |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55104057A (en) * | 1979-02-02 | 1980-08-09 | Hitachi Ltd | Ion implantation device |
-
1981
- 1981-02-19 JP JP2221481A patent/JPS57136755A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55104057A (en) * | 1979-02-02 | 1980-08-09 | Hitachi Ltd | Ion implantation device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6247940A (en) * | 1985-08-27 | 1987-03-02 | Nec Corp | Ion implanting apparatus |
JPH0530017B2 (en) * | 1985-08-27 | 1993-05-07 | Nippon Electric Co |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS55104057A (en) | Ion implantation device | |
US4186542A (en) | Apparatus for vacuum-sealing a vial | |
CA1011351A (en) | Valve means for vacuum holding device | |
DE3064623D1 (en) | Ion source in a vacuum chamber and method for its operation | |
IN171303B (en) | ||
JPS56174146U (en) | ||
GB1469427A (en) | Positioning assembly for valve closure members | |
US5354380A (en) | Apparatus for the insertion and removal of a mask through the airlock of a vacuum coating apparatus | |
JPS57136755A (en) | Disc operating device for ion implanting device | |
JPS56128555A (en) | Ion implantation device | |
JPS56109354A (en) | Photosensitive plate equipping device of composer | |
JPS5339874A (en) | Vacuum pincette | |
GB1428258A (en) | Refuse compactor | |
JPS5638587A (en) | Vacuum device | |
JPS56114160A (en) | Autoloading mechanism | |
IN170972B (en) | ||
JPS57191880A (en) | Magnetic disk device | |
JPS55131463A (en) | Method and apparatus for cutting semiconductor block | |
JPS5223709A (en) | Refrigerating method of movable blower bearing for high-temperature ga s compressed delivery blade | |
JPS5746456A (en) | Ion injector | |
JPS51144664A (en) | Implantation detector of lifting electromagnet | |
CA1007220A (en) | Valve for deep vacuum chambers | |
JPS526460A (en) | Manufacturing method of field emission type negative electrode | |
JPS6480036A (en) | Device for fixing material to be treated | |
GB1356026A (en) | Casting methods |