JPS57129900A - Chemical etching method - Google Patents

Chemical etching method

Info

Publication number
JPS57129900A
JPS57129900A JP1708181A JP1708181A JPS57129900A JP S57129900 A JPS57129900 A JP S57129900A JP 1708181 A JP1708181 A JP 1708181A JP 1708181 A JP1708181 A JP 1708181A JP S57129900 A JPS57129900 A JP S57129900A
Authority
JP
Japan
Prior art keywords
crystal
sample
soln
etching
catechol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1708181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS614800B2 (enrdf_load_stackoverflow
Inventor
Mutsuyuki Otsubo
Yasuro Mitsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1708181A priority Critical patent/JPS57129900A/ja
Priority to EG62881A priority patent/EG15090A/xx
Publication of JPS57129900A publication Critical patent/JPS57129900A/ja
Publication of JPS614800B2 publication Critical patent/JPS614800B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Weting (AREA)
JP1708181A 1981-02-06 1981-02-06 Chemical etching method Granted JPS57129900A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1708181A JPS57129900A (en) 1981-02-06 1981-02-06 Chemical etching method
EG62881A EG15090A (en) 1981-02-06 1981-10-28 A method and apparatus for excavating horizontal tunnels

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1708181A JPS57129900A (en) 1981-02-06 1981-02-06 Chemical etching method

Publications (2)

Publication Number Publication Date
JPS57129900A true JPS57129900A (en) 1982-08-12
JPS614800B2 JPS614800B2 (enrdf_load_stackoverflow) 1986-02-13

Family

ID=11934018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1708181A Granted JPS57129900A (en) 1981-02-06 1981-02-06 Chemical etching method

Country Status (2)

Country Link
JP (1) JPS57129900A (enrdf_load_stackoverflow)
EG (1) EG15090A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63293830A (ja) * 1987-05-26 1988-11-30 Nec Corp 半導体結晶のエッチング方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0924383A (ja) * 1995-07-10 1997-01-28 Nippon Enjiniyaa Service Kk 洗車排水の処理方法及び装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63293830A (ja) * 1987-05-26 1988-11-30 Nec Corp 半導体結晶のエッチング方法

Also Published As

Publication number Publication date
EG15090A (en) 1985-12-31
JPS614800B2 (enrdf_load_stackoverflow) 1986-02-13

Similar Documents

Publication Publication Date Title
US4385971A (en) Electrolytic etch for eliminating shorts and shunts in large area amorphous silicon solar cells
ES8502290A1 (es) Un metodo de eliminar un paso de corriente de cortocircuito
US4390405A (en) Oxygen electrode and method for preparation thereof
ES464139A1 (es) Un metodo en el que se deposita electronicamente una aleac- cion de oro-cobalto sobre un sustrato.
CA2124082A1 (en) Device for the Electrolytic Coating of Small Parts
JPS57129900A (en) Chemical etching method
DE2158681C3 (de) Verfahren zur Behandlung eines lichtemittierenden Halbleiter-Bauelements mit PN-Übergang
US5391269A (en) Method of making an article comprising a silicon body
FR2385820A1 (fr) Methode et dispositif d'attache electrochimique d'un materiau semi-conducteur
JPS56125844A (en) Manufacture of semiconductor element
Suz et al. Determination of selenium (IV) by cathodic stripping voltammetry using a copper microelectrode
JPS6173333A (ja) 洗浄方法
JP3237125B2 (ja) 導電性膜の陽極酸化方法
JPS5785987A (en) Plating method for lead-indium alloy
JPS5566868A (en) Lead storage battery
GB1262019A (en) Ion-sensitive electrode
JPS6331125A (ja) 半導体装置の製造方法
JPS62206834A (ja) 電気化学エツチング用電極
JP3294621B2 (ja) 陽極酸化方法
JPS6056800B2 (ja) 部分銀メツキにおける下地銅メツキのはみ出し部分剥離方法および銀メツキ表面仕上げ方法
JPS6142921A (ja) 陽極酸化方法およびその装置
JPS5666746A (en) Simple identificating method for sn and sn-pb alloy
JPS5837981B2 (ja) 半導体表面に附されているＣｒでなる又はＣｒを含む金属層の選択的加工法
JPS648296A (en) Production of silicon dioxide film
Britton et al. Isolation of the coating layers of tinplate