JPS57122527A - Electron beam exposing method - Google Patents

Electron beam exposing method

Info

Publication number
JPS57122527A
JPS57122527A JP56008798A JP879881A JPS57122527A JP S57122527 A JPS57122527 A JP S57122527A JP 56008798 A JP56008798 A JP 56008798A JP 879881 A JP879881 A JP 879881A JP S57122527 A JPS57122527 A JP S57122527A
Authority
JP
Japan
Prior art keywords
stage
holder
substrate
electron beam
notches
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56008798A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6355777B2 (OSRAM
Inventor
Teruaki Okino
Hiroaki Okuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
NTT Inc
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP56008798A priority Critical patent/JPS57122527A/ja
Publication of JPS57122527A publication Critical patent/JPS57122527A/ja
Publication of JPS6355777B2 publication Critical patent/JPS6355777B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP56008798A 1981-01-23 1981-01-23 Electron beam exposing method Granted JPS57122527A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56008798A JPS57122527A (en) 1981-01-23 1981-01-23 Electron beam exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56008798A JPS57122527A (en) 1981-01-23 1981-01-23 Electron beam exposing method

Publications (2)

Publication Number Publication Date
JPS57122527A true JPS57122527A (en) 1982-07-30
JPS6355777B2 JPS6355777B2 (OSRAM) 1988-11-04

Family

ID=11702875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56008798A Granted JPS57122527A (en) 1981-01-23 1981-01-23 Electron beam exposing method

Country Status (1)

Country Link
JP (1) JPS57122527A (OSRAM)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0421167U (OSRAM) * 1990-06-15 1992-02-21

Also Published As

Publication number Publication date
JPS6355777B2 (OSRAM) 1988-11-04

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