JPS57122517A - Alignment mark detector for electron beam exposure - Google Patents

Alignment mark detector for electron beam exposure

Info

Publication number
JPS57122517A
JPS57122517A JP56007244A JP724481A JPS57122517A JP S57122517 A JPS57122517 A JP S57122517A JP 56007244 A JP56007244 A JP 56007244A JP 724481 A JP724481 A JP 724481A JP S57122517 A JPS57122517 A JP S57122517A
Authority
JP
Japan
Prior art keywords
data
electron beam
mark
alignment mark
location
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56007244A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0328048B2 (US06235095-20010522-C00021.png
Inventor
Korehito Matsuda
Nobuo Shimazu
Kiichi Takamoto
Susumu Ozasa
Hisatake Yokouchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP56007244A priority Critical patent/JPS57122517A/ja
Publication of JPS57122517A publication Critical patent/JPS57122517A/ja
Publication of JPH0328048B2 publication Critical patent/JPH0328048B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56007244A 1981-01-22 1981-01-22 Alignment mark detector for electron beam exposure Granted JPS57122517A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56007244A JPS57122517A (en) 1981-01-22 1981-01-22 Alignment mark detector for electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56007244A JPS57122517A (en) 1981-01-22 1981-01-22 Alignment mark detector for electron beam exposure

Publications (2)

Publication Number Publication Date
JPS57122517A true JPS57122517A (en) 1982-07-30
JPH0328048B2 JPH0328048B2 (US06235095-20010522-C00021.png) 1991-04-17

Family

ID=11660590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56007244A Granted JPS57122517A (en) 1981-01-22 1981-01-22 Alignment mark detector for electron beam exposure

Country Status (1)

Country Link
JP (1) JPS57122517A (US06235095-20010522-C00021.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62229939A (ja) * 1986-03-31 1987-10-08 Advantest Corp 荷電粒子ビ−ム露光装置におけるマ−ク位置検出回路

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023782A (US06235095-20010522-C00021.png) * 1973-06-08 1975-03-14

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023782A (US06235095-20010522-C00021.png) * 1973-06-08 1975-03-14

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62229939A (ja) * 1986-03-31 1987-10-08 Advantest Corp 荷電粒子ビ−ム露光装置におけるマ−ク位置検出回路

Also Published As

Publication number Publication date
JPH0328048B2 (US06235095-20010522-C00021.png) 1991-04-17

Similar Documents

Publication Publication Date Title
JPH0349042B2 (US06235095-20010522-C00021.png)
JPS6275206A (ja) 電子ビ−ム測長装置
JPS5598842A (en) Position detection system
US4286154A (en) Method of detecting a mark by an electron beam and an apparatus therefor
JPS5621321A (en) Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus
US6115117A (en) Method and apparatus for surface inspection
US4916315A (en) Scanning electron microscope for observing and measuring minute pattern of sample
JPS57122517A (en) Alignment mark detector for electron beam exposure
JPH05296754A (ja) エッジ検出方法
JPH02126108A (ja) 電子ビーム測長装置
JPH0724256B2 (ja) サイズ測定装置
JP2758979B2 (ja) マーク位置検出方法
JPS5795628A (en) Electron beam exposure device
JPH1050244A (ja) ビーム検出信号の処理回路
JPS6327642B2 (US06235095-20010522-C00021.png)
JPS58105542A (ja) 電子ビ−ム露光装置のマ−ク検出装置
JPS56162837A (en) Electron beam exposure device
JP2658871B2 (ja) 電子線露光におけるマーク位置検出方法およびその装置
JPH0568672B2 (US06235095-20010522-C00021.png)
JPH02143106A (ja) 電子ビーム測長方法および装置
JPS56130921A (en) Adjusting method of axis of charged particle beam
JPS5693321A (en) Method for pattern inspection
JPS57198628A (en) Inspecting device for pattern
JPH0147892B2 (US06235095-20010522-C00021.png)
JPS5481782A (en) Position mark detecting method of electron beam exposure unit