JPS57122435A - Dot expansion of light copolymer mask - Google Patents

Dot expansion of light copolymer mask

Info

Publication number
JPS57122435A
JPS57122435A JP56185572A JP18557281A JPS57122435A JP S57122435 A JPS57122435 A JP S57122435A JP 56185572 A JP56185572 A JP 56185572A JP 18557281 A JP18557281 A JP 18557281A JP S57122435 A JPS57122435 A JP S57122435A
Authority
JP
Japan
Prior art keywords
dot expansion
copolymer mask
light copolymer
light
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56185572A
Other languages
English (en)
Other versions
JPS6357771B2 (ja
Inventor
Baanaado Heiaato Robaato
Uiriamu Oniiru Jieimuzu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JPS57122435A publication Critical patent/JPS57122435A/ja
Publication of JPS6357771B2 publication Critical patent/JPS6357771B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP56185572A 1980-11-21 1981-11-20 Dot expansion of light copolymer mask Granted JPS57122435A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/209,202 US4343876A (en) 1980-11-21 1980-11-21 Dot-enlargement process for photopolymer litho masks

Publications (2)

Publication Number Publication Date
JPS57122435A true JPS57122435A (en) 1982-07-30
JPS6357771B2 JPS6357771B2 (ja) 1988-11-14

Family

ID=22777790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56185572A Granted JPS57122435A (en) 1980-11-21 1981-11-20 Dot expansion of light copolymer mask

Country Status (4)

Country Link
US (1) US4343876A (ja)
EP (1) EP0052806B1 (ja)
JP (1) JPS57122435A (ja)
DE (1) DE3173827D1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037552A (ja) * 1983-06-30 1985-02-26 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− 光重合体画像の拡大方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4571373A (en) * 1984-06-11 1986-02-18 Minnesota Mining And Manufacturing Company Exposure latitude improvement in printing positive-acting color pre-press proofs
DE59010729D1 (de) * 1989-04-24 1997-07-31 Siemens Ag Photostrukturierungsverfahren
US5234794A (en) * 1989-04-24 1993-08-10 Siemens Aktiengesellschaft Photostructuring method
US5239329B1 (en) * 1992-03-09 2000-03-07 Tonya A Evatt Photographic retouching implement
FR2716547A1 (fr) * 1994-02-24 1995-08-25 Fujitsu Ltd Procédé pour former un motif de résist et pour fabriquer un dispositif à semi-conducteur.
US20070254234A1 (en) * 2006-04-26 2007-11-01 Precision Coatings, Inc. Stabilized azo dye and method for its preparation

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE613384A (ja) * 1961-02-02
BE627820A (ja) * 1962-02-01
BE631588A (ja) * 1962-04-27
US4173673A (en) * 1975-11-17 1979-11-06 E. I. Du Pont De Nemours And Company Dot-etchable masks from photopolymerizable elements
JPS5299103A (en) * 1976-02-16 1977-08-19 Fuji Photo Film Co Ltd Method of reducing strength of dot image
SU737911A1 (ru) * 1977-05-03 1980-05-30 Украинский Научно-Исследовательский Институт Полиграфической Промышленности Раствор дл укреплени печатающих элементов фотополимерных печатных форм
US4125650A (en) * 1977-08-08 1978-11-14 International Business Machines Corporation Resist image hardening process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037552A (ja) * 1983-06-30 1985-02-26 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− 光重合体画像の拡大方法

Also Published As

Publication number Publication date
JPS6357771B2 (ja) 1988-11-14
EP0052806A2 (en) 1982-06-02
DE3173827D1 (en) 1986-03-27
US4343876A (en) 1982-08-10
EP0052806A3 (en) 1983-03-16
EP0052806B1 (en) 1986-02-19

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