JPS57121009A - Preparation of water-soluble high-molecular weight polymer - Google Patents

Preparation of water-soluble high-molecular weight polymer

Info

Publication number
JPS57121009A
JPS57121009A JP831681A JP831681A JPS57121009A JP S57121009 A JPS57121009 A JP S57121009A JP 831681 A JP831681 A JP 831681A JP 831681 A JP831681 A JP 831681A JP S57121009 A JPS57121009 A JP S57121009A
Authority
JP
Japan
Prior art keywords
meth
product
salt
monomer
preparation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP831681A
Other languages
Japanese (ja)
Inventor
Shigenao Kawakami
Naomi Jinno
Shigenori Tajiri
Tatsumi Shibata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP831681A priority Critical patent/JPS57121009A/en
Publication of JPS57121009A publication Critical patent/JPS57121009A/en
Pending legal-status Critical Current

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  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE: To obtain the titled polymer free from unreacted monomer, by polymerizing an aqueous solution of a monomer such as (meth)acrylamide, (meth) acrylic acid (salt), etc. in the presence of a polymerization initiator and a photo- polymerization sensitizer, and irradiating the product with ultraviolet rays.
CONSTITUTION: A monomer solution having a concentration of ≥10(wt)%, pref. ≥30% and containing monomers composed mainly mainly of one or more compounds selected from (meth)acrylamide, (meth)acrylic acid (salt) and acidic salt and quaternarized product of dialkylaminoalkyl (meth)acrylate, is subjected to the thermal polymerization in the presence of 0.01W0.5% redox polymerization initiator (e.g. a combination of potassium persulfate and trimethylamine, etc.) and 0.01W1.0% photopolymerization sensitizer (e.g. azobisisobutyronitrile) at ≤50°C until the conversion reaches ≥80%, and then the product is photo-polymerized by irradiating with ultraviolet radiation having a wavelength of 300W 400mμ.
COPYRIGHT: (C)1982,JPO&Japio
JP831681A 1981-01-21 1981-01-21 Preparation of water-soluble high-molecular weight polymer Pending JPS57121009A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP831681A JPS57121009A (en) 1981-01-21 1981-01-21 Preparation of water-soluble high-molecular weight polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP831681A JPS57121009A (en) 1981-01-21 1981-01-21 Preparation of water-soluble high-molecular weight polymer

Publications (1)

Publication Number Publication Date
JPS57121009A true JPS57121009A (en) 1982-07-28

Family

ID=11689743

Family Applications (1)

Application Number Title Priority Date Filing Date
JP831681A Pending JPS57121009A (en) 1981-01-21 1981-01-21 Preparation of water-soluble high-molecular weight polymer

Country Status (1)

Country Link
JP (1) JPS57121009A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0287970A2 (en) * 1987-04-17 1988-10-26 Mitsubishi Petrochemical Co., Ltd. Process for producing highly water absorptive polymer
WO2001025289A1 (en) * 1999-10-06 2001-04-12 Cytec Technology Corp. Preparation of low residual monomer content polymers
JP2003523464A (en) * 2000-01-28 2003-08-05 チバ スペシャルティ ケミカルズ ウォーター トリートメント リミテッド Polymerization method
JP2009079204A (en) * 2007-09-06 2009-04-16 Nitto Denko Corp Method for producing acrylic viscoelastic layer with combination of photopolymerization reaction and redox polymerization reaction, and adhesive tape or sheet

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0287970A2 (en) * 1987-04-17 1988-10-26 Mitsubishi Petrochemical Co., Ltd. Process for producing highly water absorptive polymer
WO2001025289A1 (en) * 1999-10-06 2001-04-12 Cytec Technology Corp. Preparation of low residual monomer content polymers
US6262141B1 (en) 1999-10-06 2001-07-17 Cytec Technology Corporation Process for the preparation of polymers having low residual monomer content
AU771636B2 (en) * 1999-10-06 2004-04-01 Kemira Oyj Preparation of low residual monomer content polymers
JP2003523464A (en) * 2000-01-28 2003-08-05 チバ スペシャルティ ケミカルズ ウォーター トリートメント リミテッド Polymerization method
JP2009079204A (en) * 2007-09-06 2009-04-16 Nitto Denko Corp Method for producing acrylic viscoelastic layer with combination of photopolymerization reaction and redox polymerization reaction, and adhesive tape or sheet

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